Tatsumi Mizutani

Person

Koganei-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor integrated circuit arrangement fabrication method
- Patent number RE39895
- Issue date Oct 23, 2007
- Renesas Technology Corp.
- Takafumi Tokunaga
- 438 - Semiconductor device manufacturing: process
Information Patent Grant
Sample surface processing method
- Patent number 7,259,104
- Issue date Aug 21, 2007
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing method of a specimen and surface processing appa...
- Patent number 7,049,243
- Issue date May 23, 2006
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for treating surface of semiconductor
- Patent number 6,849,191
- Issue date Feb 1, 2005
- Hitachi, Ltd.
- Tetsuo Ono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for treating surface of semiconductor
- Patent number 6,767,838
- Issue date Jul 27, 2004
- Hitachi, Ltd.
- Tetsuo Ono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Specimen surface processing method
- Patent number 6,677,244
- Issue date Jan 13, 2004
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing surface of sample
- Patent number 6,660,647
- Issue date Dec 9, 2003
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Specimen surface processing method and apparatus
- Patent number 6,492,277
- Issue date Dec 10, 2002
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment method and system
- Patent number 6,332,425
- Issue date Dec 25, 2001
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit arrangement fabrication method
- Patent number 6,309,980
- Issue date Oct 30, 2001
- Hitachi, Ltd.
- Takafumi Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment method and system
- Patent number 6,231,777
- Issue date May 15, 2001
- Hitachi, Ltd.
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit arrangement fabrication method
- Patent number 6,074,958
- Issue date Jun 13, 2000
- Hitachi, Ltd.
- Takafumi Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit arrangement fabrication method
- Patent number 5,962,347
- Issue date Oct 5, 1999
- Hitachi, Ltd.
- Takafumi Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit arrangement fabrication method
- Patent number 5,874,013
- Issue date Feb 23, 1999
- Hitachi, Ltd.
- Takafumi Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of treating surfaces with atomic or molecular beam
- Patent number 5,554,257
- Issue date Sep 10, 1996
- Hitachi, Ltd.
- Kenetsu Yokogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface processing method and an apparatus for carrying out the same
- Patent number 5,462,635
- Issue date Oct 31, 1995
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solid state device fabrication method including a surface treatment...
- Patent number 5,314,839
- Issue date May 24, 1994
- Hitachi, Ltd.
- Tatsumi Mizutani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of surface treatment for microelectronic d...
- Patent number 5,284,544
- Issue date Feb 8, 1994
- Hitachi, Ltd.
- Tatsumi Mizutani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment method and apparatus therefor
- Patent number 5,241,186
- Issue date Aug 31, 1993
- Hitachi, Ltd.
- Takashi Yunogami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of semiconductor surface measurment and an apparatus for rea...
- Patent number 5,140,272
- Issue date Aug 18, 1992
- Hitachi, Ltd.
- Shigeru Nishimatsu
- G01 - MEASURING TESTING
Information Patent Grant
Surface treatment method
- Patent number 5,108,778
- Issue date Apr 28, 1992
- Hitachi, Ltd.
- Keizo Suzuki
- C30 - CRYSTAL GROWTH
Information Patent Grant
Process for dry etching of aluminum and its alloy
- Patent number 4,511,429
- Issue date Apr 16, 1985
- Hitachi, Ltd.
- Tatsumi Mizutani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for dry-etching
- Patent number 4,412,119
- Issue date Oct 25, 1983
- Hitachi, Ltd.
- Hideo Komatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etcher having isotropic subchamber with gas outlet for produ...
- Patent number 4,352,974
- Issue date Oct 5, 1982
- Hitachi, Ltd.
- Tatsumi Mizutani
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for preventing corrosion of Al and Al alloys
- Patent number 4,308,089
- Issue date Dec 29, 1981
- Hitachi, Ltd.
- Shinya Iida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for monitoring etching
- Patent number 4,289,188
- Issue date Sep 15, 1981
- Hitachi, Ltd.
- Tatsumi Mizutani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Surface processing method of a specimen and surface processing appa...
- Publication number 20040259361
- Publication date Dec 23, 2004
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample surface processing method
- Publication number 20040058541
- Publication date Mar 25, 2004
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR TREATING SURFACE OF SEMICONDUCTOR
- Publication number 20030132198
- Publication date Jul 17, 2003
- TETSUO ONO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method
- Publication number 20020125207
- Publication date Sep 12, 2002
- Tetsuo Ono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method
- Publication number 20020123229
- Publication date Sep 5, 2002
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS

Tatsumi Mizutani

Person

Patents Grantslast 30 patents

Semiconductor integrated circuit arrangement fabrication method

Sample surface processing method

Surface processing method of a specimen and surface processing appa...

Method and apparatus for treating surface of semiconductor

Method and apparatus for treating surface of semiconductor

Specimen surface processing method

Method for processing surface of sample

Specimen surface processing method and apparatus

Surface treatment method and system

Semiconductor integrated circuit arrangement fabrication method

Surface treatment method and system

Semiconductor integrated circuit arrangement fabrication method

Semiconductor integrated circuit arrangement fabrication method

Semiconductor integrated circuit arrangement fabrication method

Method of treating surfaces with atomic or molecular beam

Surface processing method and an apparatus for carrying out the same

Solid state device fabrication method including a surface treatment...

Apparatus for and method of surface treatment for microelectronic d...

Surface treatment method and apparatus therefor

Method of semiconductor surface measurment and an apparatus for rea...

Surface treatment method

Process for dry etching of aluminum and its alloy

Method for dry-etching

Plasma etcher having isotropic subchamber with gas outlet for produ...

Method for preventing corrosion of Al and Al alloys

Method and apparatus for monitoring etching

Patents Applicationslast 30 patents

Surface processing method of a specimen and surface processing appa...

Sample surface processing method

METHOD AND APPARATUS FOR TREATING SURFACE OF SEMICONDUCTOR

Plasma processing method

Plasma processing method