Tatsuya Fujii

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,747,726
- Issue date Sep 5, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yuki Fukumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,372,329
- Issue date Jun 28, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 11,204,551
- Issue date Dec 21, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 11,099,479
- Issue date Aug 24, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 10,514,602
- Issue date Dec 24, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Tatsuya Fujii
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,451,968
- Issue date Oct 22, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Tatsuya Fujii
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method for forming resist pattern, compound, an...
- Patent number 10,394,122
- Issue date Aug 27, 2019
- TOYKO OHKA KOGYO CO., LTD.
- Issei Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,324,377
- Issue date Jun 18, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 10,261,416
- Issue date Apr 16, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Tomotaka Yamada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 10,241,406
- Issue date Mar 26, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,101,658
- Issue date Oct 16, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type resist composition, method for forming resist pattern...
- Patent number 9,766,541
- Issue date Sep 19, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for EUV or EB, and method of forming resist pattern
- Patent number 9,057,948
- Issue date Jun 16, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...
- Publication number 20240210825
- Publication date Jun 27, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- KhanhTin Nguyen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING COMPOSITION, METHOD OF CLEANING COATING FILM FORMING DEVIC...
- Publication number 20220411727
- Publication date Dec 29, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Tatsuya FUJII
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210003918
- Publication date Jan 7, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Yuki FUKUMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200409262
- Publication date Dec 31, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Yuki FUKUMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200159118
- Publication date May 21, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Tatsuya FUJII
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200159119
- Publication date May 21, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Tatsuya FUJII
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200142303
- Publication date May 7, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito YAHAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20190219920
- Publication date Jul 18, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180072651
- Publication date Mar 15, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tatsuya FUJII
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20180067394
- Publication date Mar 8, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tomotaka YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20180037534
- Publication date Feb 8, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tatsuya FUJII
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20170371241
- Publication date Dec 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito YAHAGI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20170369697
- Publication date Dec 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito YAHAGI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20170369698
- Publication date Dec 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Issei SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20160376233
- Publication date Dec 29, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto YAMAZAKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20160363860
- Publication date Dec 15, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Taku HIRAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20160209745
- Publication date Jul 21, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Taku HIRAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN
- Publication number 20140093824
- Publication date Apr 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130143159
- Publication date Jun 6, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tatsuya Fujii

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method for forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Resist composition and method for forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method for forming resist pattern, compound, an...

Resist composition and method of forming resist pattern

Resist composition and method for forming resist pattern

Resist composition and method for forming resist pattern

Resist composition and method of forming resist pattern

Positive-type resist composition, method for forming resist pattern...

Resist composition for EUV or EB, and method of forming resist pattern

Patents Applicationslast 30 patents

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...

CLEANING COMPOSITION, METHOD OF CLEANING COATING FILM FORMING DEVIC...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN