Ted Liang

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of repairing an opaque defect on a mask with electron beam-i...
- Patent number 6,897,157
- Issue date May 24, 2005
- Intel Corporation
- Ted Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to inspect patterns with high resolution photoemission
- Patent number 6,774,990
- Issue date Aug 10, 2004
- Intel Corporation
- Ted Liang
- G01 - MEASURING TESTING
Information Patent Grant
Enhanced inspection of extreme ultraviolet mask
- Patent number 6,720,118
- Issue date Apr 13, 2004
- Intel Corporation
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Enhanced inspection of extreme ultraviolet mask
- Patent number 6,583,068
- Issue date Jun 24, 2003
- Intel Corporation
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
PASSIVATING METAL ETCH STRUCTURES
- Publication number 20080153305
- Publication date Jun 26, 2008
- Ted Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for repairing an alternating phase-shift mask
- Publication number 20060147814
- Publication date Jul 6, 2006
- Ted Liang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Passivating metal etch structures
- Publication number 20060134920
- Publication date Jun 22, 2006
- Ted Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to locally protect extreme ultraviolet multilayer blanks use...
- Publication number 20050109278
- Publication date May 26, 2005
- Ted Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mask repair with electron beam-induced chemical etching
- Publication number 20040048398
- Publication date Mar 11, 2004
- Ted Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method to inspect patterns with high resolution photoemission
- Publication number 20040036862
- Publication date Feb 26, 2004
- Ted Liang
- G01 - MEASURING TESTING
Information Patent Application
Enhanced inspection of extreme ultraviolet mask
- Publication number 20030203289
- Publication date Oct 30, 2003
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask repair with electron beam-induced chemical etching
- Publication number 20030000921
- Publication date Jan 2, 2003
- Ted Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Enhanced inspection of extreme ultraviolet mask
- Publication number 20020142620
- Publication date Oct 3, 2002
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY

Person

Patents Grantslast 30 patents

Method of repairing an opaque defect on a mask with electron beam-i...

Method to inspect patterns with high resolution photoemission

Enhanced inspection of extreme ultraviolet mask

Enhanced inspection of extreme ultraviolet mask

Patents Applicationslast 30 patents

PASSIVATING METAL ETCH STRUCTURES

Methods for repairing an alternating phase-shift mask

Passivating metal etch structures

Method to locally protect extreme ultraviolet multilayer blanks use...

Mask repair with electron beam-induced chemical etching

Method to inspect patterns with high resolution photoemission

Enhanced inspection of extreme ultraviolet mask

Mask repair with electron beam-induced chemical etching

Enhanced inspection of extreme ultraviolet mask