Teppei Adachi

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and patterning process
- Patent number 12,072,627
- Issue date Aug 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,050,402
- Issue date Jul 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,693,314
- Issue date Jul 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate protective film-forming composition and pattern forming p...
- Patent number 11,662,663
- Issue date May 30, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,340,527
- Issue date May 24, 2022
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt, polymer, resist composition, and patterning process
- Patent number 11,262,653
- Issue date Mar 1, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 11,009,793
- Issue date May 18, 2021
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and pattern forming process
- Patent number 10,921,710
- Issue date Feb 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, resist composition, and pattern forming process
- Patent number 10,457,761
- Issue date Oct 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, pattern forming process, polymer, and monomer
- Patent number 10,310,376
- Issue date Jun 4, 2019
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing polymer
- Patent number 10,191,373
- Issue date Jan 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,023,674
- Issue date Jul 17, 2018
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 10,012,902
- Issue date Jul 3, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, resist pattern forming process, and method for mak...
- Patent number 9,904,169
- Issue date Feb 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 9,846,360
- Issue date Dec 19, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, polymer, positive resist composition, and patterning process
- Patent number 9,829,792
- Issue date Nov 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 9,760,010
- Issue date Sep 12, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming process and shrink agent
- Patent number 9,429,846
- Issue date Aug 30, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming process and shrink agent
- Patent number 9,360,760
- Issue date Jun 7, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt, polymer, polymer making method, resist composition,...
- Patent number 9,146,464
- Issue date Sep 29, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt, polymer, resist composition, and patterning process
- Patent number 9,091,918
- Issue date Jul 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning process and resist composition
- Patent number 9,017,931
- Issue date Apr 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230280651
- Publication date Sep 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Teppei ADACHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220236643
- Publication date Jul 28, 2022
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210200083
- Publication date Jul 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Teppei ADACHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210141306
- Publication date May 13, 2021
- Shin-Etsu Chemical Co., Ltd.
- Teppei ADACHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PREPARATION OF POLYMER AND POLYMER
- Publication number 20200140592
- Publication date May 7, 2020
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROTECTIVE FILM-FORMING COMPOSITION AND PATTERN FORMING P...
- Publication number 20200133123
- Publication date Apr 30, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20190064664
- Publication date Feb 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20190033715
- Publication date Jan 31, 2019
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20190033716
- Publication date Jan 31, 2019
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20170242339
- Publication date Aug 24, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20170226252
- Publication date Aug 10, 2017
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20170226250
- Publication date Aug 10, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER
- Publication number 20170184967
- Publication date Jun 29, 2017
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING POLYMER
- Publication number 20170097567
- Publication date Apr 6, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20170008982
- Publication date Jan 12, 2017
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20170003590
- Publication date Jan 5, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS
- Publication number 20160363866
- Publication date Dec 15, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAK...
- Publication number 20160299431
- Publication date Oct 13, 2016
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20160229940
- Publication date Aug 11, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20160168296
- Publication date Jun 16, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAK...
- Publication number 20160147142
- Publication date May 26, 2016
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20150346600
- Publication date Dec 3, 2015
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING PROCESS AND SHRINK AGENT
- Publication number 20150338744
- Publication date Nov 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING PROCESS AND SHRINK AGENT
- Publication number 20150086929
- Publication date Mar 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20140272707
- Publication date Sep 18, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT, POLYMER, POLYMER MAKING METHOD, RESIST COMPOSITION,...
- Publication number 20140162189
- Publication date Jun 12, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20140051026
- Publication date Feb 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY

Teppei Adachi

Person

Patents Grantslast 30 patents

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Substrate protective film-forming composition and pattern forming p...

Resist composition and patterning process

Sulfonium salt, polymer, resist composition, and patterning process

Monomer, polymer, resist composition, and patterning process

Resist composition and pattern forming process

Polymer, resist composition, and pattern forming process

Resist composition, pattern forming process, polymer, and monomer

Method for producing polymer

Monomer, polymer, resist composition, and patterning process

Positive resist composition and pattern forming process

Photomask blank, resist pattern forming process, and method for mak...

Resist composition and patterning process

Monomer, polymer, positive resist composition, and patterning process

Patterning process

Pattern forming process and shrink agent

Pattern forming process and shrink agent

Sulfonium salt, polymer, polymer making method, resist composition,...

Sulfonium salt, polymer, resist composition, and patterning process

Patterning process and resist composition

Patents Applicationslast 30 patents

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

PREPARATION OF POLYMER AND POLYMER

SUBSTRATE PROTECTIVE FILM-FORMING COMPOSITION AND PATTERN FORMING P...

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER

METHOD FOR PRODUCING POLYMER

MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS

PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAK...

POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAK...

RESIST COMPOSITION AND PATTERNING PROCESS

PATTERN FORMING PROCESS AND SHRINK AGENT

PATTERN FORMING PROCESS AND SHRINK AGENT

SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

SULFONIUM SALT, POLYMER, POLYMER MAKING METHOD, RESIST COMPOSITION,...

PATTERNING PROCESS AND RESIST COMPOSITION