Tetsuo Aoyama

Person

Osaka-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching liquid composition
- Patent number 8,545,716
- Issue date Oct 1, 2013
- Hayashi Pure Chemical Ind., Ltd.
- Tsuguhiro Tago
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Aqueous fluoride compositions for cleaning semiconductor devices
- Patent number 7,399,365
- Issue date Jul 15, 2008
- EKC Technology, Inc.
- Tetsuo Aoyama
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Separation-material composition for photo-resist and manufacturing...
- Patent number 7,341,827
- Issue date Mar 11, 2008
- Sony Corporation
- Masafumi Muramatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning composition for removing resists and method of manufacturi...
- Patent number 7,250,391
- Issue date Jul 31, 2007
- Renesas Technology Corp.
- Itaru Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning agent and cleaning method
- Patent number 6,875,288
- Issue date Apr 5, 2005
- Tokyo Electron Limited
- Hideto Gotoh
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning agent and cleaning process using the same
- Patent number 6,686,322
- Issue date Feb 3, 2004
- Sharp Kabushiki Kaisha
- Masahiro Nohara
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Resist stripping agent and process of producing semiconductor devic...
- Patent number 6,638,694
- Issue date Oct 28, 2003
- Mitsubishi Gas Chemical Company, Inc.
- Kazuto Ikemoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method using an oxidizing agent, chelating agent and fluor...
- Patent number 6,514,352
- Issue date Feb 4, 2003
- Tokyo Electron Limited
- Hideto Gotoh
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Resist film removing composition and method for manufacturing thin...
- Patent number 6,500,270
- Issue date Dec 31, 2002
- Sharp Corporation
- Masahiro Nohara
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning agent for a semiconductor device and a method of manufactu...
- Patent number 6,462,005
- Issue date Oct 8, 2002
- Texas Instruments Incorporated
- Hideto Gotoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping composition and process for stripping photore...
- Patent number 6,458,517
- Issue date Oct 1, 2002
- Sharp Kabushiki Kaisha
- Masahiro Nohara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist removing composition
- Patent number 6,440,326
- Issue date Aug 27, 2002
- Mitsubishi Gas Chemical Company, Inc.
- Taketo Maruyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Resist stripping composition
- Patent number 6,372,410
- Issue date Apr 16, 2002
- Mitsubishi Gas Chemical Company, Inc.
- Kazuto Ikemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning agent for use in producing semiconductor devices and proce...
- Patent number 6,265,309
- Issue date Jul 24, 2001
- Mitsubishi Gas Chemicals Co., Inc.
- Hideto Gotoh
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method and apparatus for manufacturing semiconductor device
- Patent number 6,199,567
- Issue date Mar 13, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Itaru Kanno
- B08 - CLEANING
Information Patent Grant
Cleaning liquid for semiconductor devices
- Patent number 5,972,862
- Issue date Oct 26, 1999
- Mitsubishi Gas Chemical
- Yoshimi Torii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning liquid for semiconductor devices
- Patent number 5,962,385
- Issue date Oct 5, 1999
- Mitsubishi Gas Chemical Company, Inc.
- Taketo Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing semiconductor device and rinse for cleaning sem...
- Patent number 5,911,836
- Issue date Jun 15, 1999
- Mitsubishi Gas Chemical Company, Inc.
- Mayumi Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Removing agent composition for a photoresist and process for produc...
- Patent number 5,846,695
- Issue date Dec 8, 1998
- Mitsubishi Gas Chemical Company, Inc.
- Keiichi Iwata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flux washing agent
- Patent number 5,693,599
- Issue date Dec 2, 1997
- Mitsubishi Gas Chemical Company, Inc.
- Tetsuo Aoyama
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Stripping and cleaning agent for removing dry-etching and photoresi...
- Patent number 5,630,904
- Issue date May 20, 1997
- Mitsubishi Gas Chemical Co., Inc.
- Tetsuo Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing solution for producing printed circuit boards and a proc...
- Patent number 5,538,832
- Issue date Jul 23, 1996
- Mitsubishi Gas Chemical Company, Inc.
- Tetsuo Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparing aqueous quaternary ammonium hydroxide solution
- Patent number 5,393,386
- Issue date Feb 28, 1995
- Mitsubishi Gas Chemical Company, Inc.
- Tetsuo Aoyama
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Active carbon materials, process for the preparation thereof and th...
- Patent number 5,338,462
- Issue date Aug 16, 1994
- Mitsubishi Gas Chemical Company, Inc.
- Hisaki Abe
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Active carbon materials, process for the preparation thereof and th...
- Patent number 5,242,879
- Issue date Sep 7, 1993
- Mitsubishi Gas Chemical Company, Inc.
- Hisaki Abe
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Surface treating agent for aluminum line pattern substrate
- Patent number 5,174,816
- Issue date Dec 29, 1992
- Mitsubishi Gas Chemical Company, Inc.
- Tetsuo Aoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Positive type photoresist developer
- Patent number 5,175,078
- Issue date Dec 29, 1992
- Mitsubishi Gas Chemical Company, Inc.
- Tetsuo Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for production of quaternary ammonium hydroxides
- Patent number 4,776,929
- Issue date Oct 11, 1988
- Mitsubishi Gas Chemical Company, Inc.
- Tetsuo Aoyama
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Process for the preparation of carboxylic acid esters
- Patent number 4,613,684
- Issue date Sep 23, 1986
- Mitsubishi Gas Chemical Company, Inc.
- Tetsuo Aoyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for preparation of tertiary olefins
- Patent number 4,521,638
- Issue date Jun 4, 1985
- Mitsubishi Gas Chemical Company, Inc.
- Koichi Kida
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
ETCHING LIQUID COMPOSITION
- Publication number 20100230631
- Publication date Sep 16, 2010
- SANYO ELECTRIC CO., LTD.
- Tsuguhiro Tago
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANISOTROPIC SILICON ETCHANT COMPOSITION
- Publication number 20090218542
- Publication date Sep 3, 2009
- Hayashi Pure Chemical Ind, Ltd.
- Kenji Isami
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Aqueous fluoride compositions for cleaning semiconductor devices
- Publication number 20090099051
- Publication date Apr 16, 2009
- EKC Technology, Inc.
- Tetsuo Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Aqueous fluoride compositions for cleaning semiconductor devices
- Publication number 20050014667
- Publication date Jan 20, 2005
- Tetsuo Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning composition for removing resists and method of manufacturi...
- Publication number 20040106531
- Publication date Jun 3, 2004
- Renesas Technology Corp.
- Itaru Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripper composition
- Publication number 20040081922
- Publication date Apr 29, 2004
- Kazuto Ikemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Separation-material composition for photo-resist and manufacturing...
- Publication number 20040038154
- Publication date Feb 26, 2004
- Masafumi Muramatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST STRIPPING AGENT AND PROCESS OF PRODUCING SEMICONDUCTOR DEVIC...
- Publication number 20030186175
- Publication date Oct 2, 2003
- Kazuto Ikemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning method
- Publication number 20020066465
- Publication date Jun 6, 2002
- Hideto Gotoh
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Cleaning agent and cleaning method
- Publication number 20020064963
- Publication date May 30, 2002
- Hideto Gotoh
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Photoresist stripping composition and process for stripping photore...
- Publication number 20020009674
- Publication date Jan 24, 2002
- Masahiro Nohara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST FILM REMOVING COMPOSITION AND METHOD FOR MANUFACTURING THIN...
- Publication number 20010013502
- Publication date Aug 16, 2001
- SHARP CORPORATION; MITSUBISHI GAS CHEMICAL COMPANY INCORPORATED
- MASAHIRO NOHARA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Tetsuo Aoyama

Person

Patents Grantslast 30 patents

Etching liquid composition

Aqueous fluoride compositions for cleaning semiconductor devices

Separation-material composition for photo-resist and manufacturing...

Cleaning composition for removing resists and method of manufacturi...

Cleaning agent and cleaning method

Cleaning agent and cleaning process using the same

Resist stripping agent and process of producing semiconductor devic...

Cleaning method using an oxidizing agent, chelating agent and fluor...

Resist film removing composition and method for manufacturing thin...

Cleaning agent for a semiconductor device and a method of manufactu...

Photoresist stripping composition and process for stripping photore...

Photoresist removing composition

Resist stripping composition

Cleaning agent for use in producing semiconductor devices and proce...

Method and apparatus for manufacturing semiconductor device

Cleaning liquid for semiconductor devices

Cleaning liquid for semiconductor devices

Method of producing semiconductor device and rinse for cleaning sem...

Removing agent composition for a photoresist and process for produc...

Flux washing agent

Stripping and cleaning agent for removing dry-etching and photoresi...

Developing solution for producing printed circuit boards and a proc...

Method for preparing aqueous quaternary ammonium hydroxide solution

Active carbon materials, process for the preparation thereof and th...

Active carbon materials, process for the preparation thereof and th...

Surface treating agent for aluminum line pattern substrate

Positive type photoresist developer

Process for production of quaternary ammonium hydroxides

Process for the preparation of carboxylic acid esters

Process for preparation of tertiary olefins

Patents Applicationslast 30 patents

ETCHING LIQUID COMPOSITION

ANISOTROPIC SILICON ETCHANT COMPOSITION

Aqueous fluoride compositions for cleaning semiconductor devices

Aqueous fluoride compositions for cleaning semiconductor devices

Cleaning composition for removing resists and method of manufacturi...

Photoresist stripper composition

Separation-material composition for photo-resist and manufacturing...

RESIST STRIPPING AGENT AND PROCESS OF PRODUCING SEMICONDUCTOR DEVIC...

Cleaning method

Cleaning agent and cleaning method

Photoresist stripping composition and process for stripping photore...

RESIST FILM REMOVING COMPOSITION AND METHOD FOR MANUFACTURING THIN...