Patent Abstracts of Japan, vol. 95, No. 4, 31 May 1995 of JP 07 028254 (Kanto Chem. Co.), 31 Jan. 1995. |
Patent Abstracts of Japan, vol.96, No. 2, 29 Feb. 1996 of JP 07 28304 A (Mitsubishi Gas Co.), 27 Oct. 1995. |
Wai Mun Lee, "A New Approach in Photoresist Stripping and Post Plasma Etch/Ash Wafer Cleaning for Submicron Processes", Extended Abstracts, Spring Meeting, (1993) May 16-21, Honolulu, vol. 93/1, 1 Jan. 1993, Pennington, NJ, pp. 488-499. |
English translation of JP 07028254 cited in the prior office action. |