Tetsuro Nakasugi

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Imprint apparatus and imprint method
- Patent number 12,078,925
- Issue date Sep 3, 2024
- Kioxia Corporation
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus, imprint method, and manufacturing method of semi...
- Patent number 11,953,825
- Issue date Apr 9, 2024
- Kioxia Corporation
- Masayuki Hatano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus, imprint method, and method of manufacturing semi...
- Patent number 11,004,683
- Issue date May 11, 2021
- TOSHIBA MEMORY CORPORATION
- Kazuya Fukuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and imprint apparatus
- Patent number 10,796,948
- Issue date Oct 6, 2020
- TOSHIBA MEMORY CORPORATION
- Anupam Mitra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template forming method, template, and template base material
- Patent number 9,885,118
- Issue date Feb 6, 2018
- TOSHIBA MEMORY CORPORATION
- Masatoshi Tsuji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pattern forming method
- Patent number 9,381,540
- Issue date Jul 5, 2016
- Kabushiki Kaisha Toshiba
- Takeshi Koshiba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern formation method
- Patent number 9,360,752
- Issue date Jun 7, 2016
- Kabushiki Kaisha Toshiba
- Masatoshi Tsuji
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Substrate holding apparatus, pattern transfer apparatus, and patter...
- Patent number 9,188,879
- Issue date Nov 17, 2015
- Kabushiki Kaisha Toshiba
- Kentaro Kasa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 9,046,763
- Issue date Jun 2, 2015
- Kabushiki Kaisha Toshiba
- Takeshi Koshiba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for manufacturing mold
- Patent number 8,992,789
- Issue date Mar 31, 2015
- Kabushiki Kaisha Toshiba
- Masato Suzuki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imprint method and imprint apparatus
- Patent number 8,973,494
- Issue date Mar 10, 2015
- Kabushiki Kaisha Toshiba
- Masayuki Hatano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for fabricating pellicle, photo mask, and semiconductor device
- Patent number 8,895,210
- Issue date Nov 25, 2014
- Kabushiki Kaisha Toshiba
- Masato Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing photo mask, method for manufacturing semic...
- Patent number 8,883,373
- Issue date Nov 11, 2014
- Kabushiki Kaisha Toshiba
- Akiko Mimotogi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus and method
- Patent number 8,550,801
- Issue date Oct 8, 2013
- Kabushiki Kaisha Toshiba
- Yohko Furutono
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imprint method
- Patent number 8,419,995
- Issue date Apr 16, 2013
- Kabushiki Kaisha Toshiba
- Ikuo Yoneda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Template inspection method and manufacturing method for semiconduct...
- Patent number 8,227,267
- Issue date Jul 24, 2012
- Kabushiki Kaisha Toshiba
- Ikuo Yoneda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imprint method
- Patent number 8,202,463
- Issue date Jun 19, 2012
- Kabushiki Kaisha Toshiba
- Ikuo Yoneda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Control method for semiconductor manufacturing apparatus, control s...
- Patent number 8,180,472
- Issue date May 15, 2012
- Kabushiki Kaisha Toshiba
- Masayuki Hatano
- G05 - CONTROLLING REGULATING
Information Patent Grant
Pattern formation method and a method for manufacturing a semicondu...
- Patent number 8,118,585
- Issue date Feb 21, 2012
- Kabushiki Kaisha Toshiba
- Masayuki Hatano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam drawing apparatus, deflection amplifier, deflection c...
- Patent number 7,985,958
- Issue date Jul 26, 2011
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Character pattern extracting method, charged particle beam drawing...
- Patent number 7,889,910
- Issue date Feb 15, 2011
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure method, hot spot detecting apparatus, semico...
- Patent number 7,648,809
- Issue date Jan 19, 2010
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam lithography apparatus, lithography method, lithograph...
- Patent number 7,482,604
- Issue date Jan 27, 2009
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure method of character projection syste...
- Patent number 7,459,705
- Issue date Dec 2, 2008
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and a program for correcting conditions for controll...
- Patent number 7,435,978
- Issue date Oct 14, 2008
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam writing method, electron beam writing apparatus and s...
- Patent number 7,368,737
- Issue date May 6, 2008
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography system, method of electron beam lithograp...
- Patent number 7,283,885
- Issue date Oct 16, 2007
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure parameter obtaining method, exposure parameter evaluating...
- Patent number 7,264,909
- Issue date Sep 4, 2007
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam drawing equipment, method of adjusting apertu...
- Patent number 7,242,014
- Issue date Jul 10, 2007
- Kabushiki Kaisha Toshiba
- Takumi Ota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correction system, method of correcting deflection distortion, prog...
- Patent number 7,202,488
- Issue date Apr 10, 2007
- Kabushiki Kaisha Toshiba
- Takumi Ota
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND MANUFACTURING METHOD OF SEMI...
- Publication number 20230221635
- Publication date Jul 13, 2023
- KIOXIA Corporation
- Masayuki HATANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT APPARATUS AND IMPRINT METHOD
- Publication number 20220252975
- Publication date Aug 11, 2022
- KIOXIA Corporation
- Kazuya FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMI...
- Publication number 20210225638
- Publication date Jul 22, 2021
- Toshiba Memory Corporation
- Kazuya FUKUHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND IMPRINT APPARATUS
- Publication number 20200402843
- Publication date Dec 24, 2020
- KIOXIA Corporation
- Anupam MITRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND MANUFACTURING METHOD OF SEMI...
- Publication number 20200073233
- Publication date Mar 5, 2020
- Toshiba Memory Corporation
- Masayuki HATANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND IMPRINT APPARATUS
- Publication number 20200006124
- Publication date Jan 2, 2020
- Toshiba Memory Corporation
- Anupam MITRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMI...
- Publication number 20190221421
- Publication date Jul 18, 2019
- Toshiba Memory Corporation
- Kazuya FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS AND IMPRINT METHOD
- Publication number 20190079391
- Publication date Mar 14, 2019
- Toshiba Memory Corporation
- Kazuya FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND IMPRINT APPARATUS
- Publication number 20180151418
- Publication date May 31, 2018
- Toshiba Memory Corporation
- Anupam MITRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPLATE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20180119288
- Publication date May 3, 2018
- Toshiba Memory Corporation
- Masatoshi Tsuji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEMPLATE FORMING METHOD, TEMPLATE, AND TEMPLATE BASE MATERIAL
- Publication number 20160247673
- Publication date Aug 25, 2016
- Kabushiki Kaisha Toshiba
- Masatoshi TSUJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20150224536
- Publication date Aug 13, 2015
- Kabushiki Kaisha Toshiba
- Takeshi KOSHIBA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PATTERN FORMATION METHOD AND PATTERN FORMATION DEVICE
- Publication number 20140246808
- Publication date Sep 4, 2014
- Masatoshi TSUJI
- B82 - NANO-TECHNOLOGY
Information Patent Application
MOLD AND MOLD BLANK SUBSTRATE
- Publication number 20140072668
- Publication date Mar 13, 2014
- Ikuo YONEDA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD FOR MANUFACTURING MOLD
- Publication number 20130240480
- Publication date Sep 19, 2013
- Kabushiki Kaisha Toshiba
- Masato SUZUKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUBSTRATE HOLDING APPARATUS, PATTERN TRANSFER APPARATUS, AND PATTER...
- Publication number 20130222782
- Publication date Aug 29, 2013
- Kentaro KASA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FABRICATING PELLICLE, PHOTO MASK, AND SEMICONDUCTOR DEVICE
- Publication number 20130130158
- Publication date May 23, 2013
- Masato Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING PHOTO MASK, METHOD FOR MANUFACTURING SEMIC...
- Publication number 20130130157
- Publication date May 23, 2013
- Akiko Mimotogi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING APPARATUS
- Publication number 20130077066
- Publication date Mar 28, 2013
- Ryoichi INANAMI
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND DEVICE FOR FORMING PATTERN
- Publication number 20120164346
- Publication date Jun 28, 2012
- Ikuo Yoneda
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMPRINT APPARATUS AND METHOD
- Publication number 20120061882
- Publication date Mar 15, 2012
- Yohko Furutono
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT METHOD AND IMPRINT APPARATUS
- Publication number 20110192300
- Publication date Aug 11, 2011
- Masayuki Hatano
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN FORMATION METHOD AND A METHOD FOR MANUFACTURING A SEMICONDU...
- Publication number 20110097827
- Publication date Apr 28, 2011
- Masayuki HATANO
- B82 - NANO-TECHNOLOGY
Information Patent Application
TEMPLATE, METHOD OF MANUFACTURING THE SAME, AND METHOD OF FORMING P...
- Publication number 20100264113
- Publication date Oct 21, 2010
- Ikuo YONEDA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20100237045
- Publication date Sep 23, 2010
- Takeshi KOSHIBA
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMPRINT METHOD
- Publication number 20100078860
- Publication date Apr 1, 2010
- Ikuo Yoneda
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
TEMPLATE INSPECTION METHOD AND MANUFACTURING METHOD FOR SEMICONDUCT...
- Publication number 20100075443
- Publication date Mar 25, 2010
- Ikuo YONEDA
- G01 - MEASURING TESTING
Information Patent Application
CONTROL METHOD FOR SEMICONDUCTOR MANUFACTURING APPARATUS, CONTROL S...
- Publication number 20100023146
- Publication date Jan 28, 2010
- Masayuki HATANO
- G05 - CONTROLLING REGULATING
Information Patent Application
TEMPLATE AND PATTERN FORMING METHOD
- Publication number 20090315223
- Publication date Dec 24, 2009
- Ikuo Yoneda
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMPRINT METHOD
- Publication number 20090267267
- Publication date Oct 29, 2009
- Ikuo Yoneda
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Tetsuro Nakasugi

Person

Patents Grantslast 30 patents

Imprint apparatus and imprint method

Imprint apparatus, imprint method, and manufacturing method of semi...

Imprint apparatus, imprint method, and method of manufacturing semi...

Pattern forming method and imprint apparatus

Template forming method, template, and template base material

Pattern forming method

Pattern formation method

Substrate holding apparatus, pattern transfer apparatus, and patter...

Pattern forming method

Method for manufacturing mold

Imprint method and imprint apparatus

Method for fabricating pellicle, photo mask, and semiconductor device

Method for manufacturing photo mask, method for manufacturing semic...

Imprint apparatus and method

Imprint method

Template inspection method and manufacturing method for semiconduct...

Imprint method

Control method for semiconductor manufacturing apparatus, control s...

Pattern formation method and a method for manufacturing a semicondu...

Electron beam drawing apparatus, deflection amplifier, deflection c...

Character pattern extracting method, charged particle beam drawing...

Electron beam exposure method, hot spot detecting apparatus, semico...

Electron beam lithography apparatus, lithography method, lithograph...

Charged particle beam exposure method of character projection syste...

System, method and a program for correcting conditions for controll...

Electron beam writing method, electron beam writing apparatus and s...

Electron beam lithography system, method of electron beam lithograp...

Exposure parameter obtaining method, exposure parameter evaluating...

Charged particle beam drawing equipment, method of adjusting apertu...

Correction system, method of correcting deflection distortion, prog...

Patents Applicationslast 30 patents

IMPRINT APPARATUS, IMPRINT METHOD, AND MANUFACTURING METHOD OF SEMI...

IMPRINT APPARATUS AND IMPRINT METHOD

IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMI...

PATTERN FORMING METHOD AND IMPRINT APPARATUS

IMPRINT APPARATUS, IMPRINT METHOD, AND MANUFACTURING METHOD OF SEMI...

PATTERN FORMING METHOD AND IMPRINT APPARATUS

IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMI...

IMPRINT APPARATUS AND IMPRINT METHOD

PATTERN FORMING METHOD AND IMPRINT APPARATUS

TEMPLATE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

TEMPLATE FORMING METHOD, TEMPLATE, AND TEMPLATE BASE MATERIAL

PATTERN FORMING METHOD

PATTERN FORMATION METHOD AND PATTERN FORMATION DEVICE

MOLD AND MOLD BLANK SUBSTRATE

METHOD FOR MANUFACTURING MOLD

SUBSTRATE HOLDING APPARATUS, PATTERN TRANSFER APPARATUS, AND PATTER...

METHOD FOR FABRICATING PELLICLE, PHOTO MASK, AND SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING PHOTO MASK, METHOD FOR MANUFACTURING SEMIC...

PATTERN FORMING APPARATUS

METHOD AND DEVICE FOR FORMING PATTERN

IMPRINT APPARATUS AND METHOD

IMPRINT METHOD AND IMPRINT APPARATUS

PATTERN FORMATION METHOD AND A METHOD FOR MANUFACTURING A SEMICONDU...

TEMPLATE, METHOD OF MANUFACTURING THE SAME, AND METHOD OF FORMING P...

PATTERN FORMING METHOD

IMPRINT METHOD

TEMPLATE INSPECTION METHOD AND MANUFACTURING METHOD FOR SEMICONDUCT...

CONTROL METHOD FOR SEMICONDUCTOR MANUFACTURING APPARATUS, CONTROL S...

TEMPLATE AND PATTERN FORMING METHOD

IMPRINT METHOD