Tetsuya Nishizuka

Person

Amagasaki-shi,, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device manufacturing method
- Patent number 9,362,135
- Issue date Jun 7, 2016
- Tokyo Electron Limited
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 9,048,182
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 8,765,589
- Issue date Jul 1, 2014
- Tokyo Electron Limited
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,480,848
- Issue date Jul 9, 2013
- Tokyo Electron Limited
- Caizhong Tian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ceiling plate and plasma process apparatus
- Patent number 8,343,308
- Issue date Jan 1, 2013
- Tokyo Electron Limited
- Caizhong Tian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method
- Patent number 8,298,955
- Issue date Oct 30, 2012
- Tokyo Electron Limited
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,267,040
- Issue date Sep 18, 2012
- Tokyo Electron Limited
- Kiyotaka Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 7,842,617
- Issue date Nov 30, 2010
- Tokyo Electron Limited
- Tetsuya Nishizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system for treating a substrate
- Patent number 7,396,431
- Issue date Jul 8, 2008
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating a substrate
- Patent number 7,268,084
- Issue date Sep 11, 2007
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD
- Publication number 20240143870
- Publication date May 2, 2024
- TOKYO ELECTRON LIMITED
- Hironori MOKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240047220
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Kenta ONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230377899
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Takahiro YONEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150294839
- Publication date Oct 15, 2015
- TOKYO ELECTRON LIMITED
- Hiroyuki TAKABA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20150235867
- Publication date Aug 20, 2015
- TOKYO ELECTRON LIMITED
- Tetsuya NISHIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20140170845
- Publication date Jun 19, 2014
- TOKYO ELECTRON LIMITED
- Tetsuya NISHIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20140080311
- Publication date Mar 20, 2014
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING SILICON NITRIDE FILMS
- Publication number 20130344702
- Publication date Dec 26, 2013
- TOKYO ELECTRON LIMITED
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CEILING PLATE AND PLASMA PROCESS APPARATUS
- Publication number 20130081763
- Publication date Apr 4, 2013
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20130065399
- Publication date Mar 14, 2013
- TOKYO ELECTRON LIMITED
- Hirokazu Udea
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20110039407
- Publication date Feb 17, 2011
- TOKYO ELECTRON LIMITED
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR PLASMA-PROCESSING SEMICO...
- Publication number 20100279512
- Publication date Nov 4, 2010
- TOKYO ELECTRON LIMITED
- Hirokazu Udea
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD, ETCHING APPARATUS, COMPUTER PROGRAM AND STORAGE MEDIUM
- Publication number 20100243605
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CEILING PLATE AND PLASMA PROCESS APPARATUS
- Publication number 20100032094
- Publication date Feb 11, 2010
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20090242130
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20090215274
- Publication date Aug 27, 2009
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20090137125
- Publication date May 28, 2009
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20070264441
- Publication date Nov 15, 2007
- TOKYO ELECTRON LIMITED
- Kiyotaka Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system for treating a substrate
- Publication number 20060065367
- Publication date Mar 30, 2006
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for treating a substrate
- Publication number 20060065629
- Publication date Mar 30, 2006
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS

Tetsuya Nishizuka

Person

Patents Grantslast 30 patents

Semiconductor device manufacturing method

Semiconductor device manufacturing method

Semiconductor device manufacturing method

Plasma processing apparatus

Ceiling plate and plasma process apparatus

Plasma etching method

Plasma processing apparatus and plasma processing method

Etching method and etching apparatus

Plasma processing system for treating a substrate

Method for treating a substrate

Patents Applicationslast 30 patents

INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

PLASMA PROCESSING METHOD

METHOD OF ETCHING SILICON NITRIDE FILMS

CEILING PLATE AND PLASMA PROCESS APPARATUS

PLASMA PROCESSING METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

PLASMA PROCESSING APPARATUS AND METHOD FOR PLASMA-PROCESSING SEMICO...

ETCHING METHOD, ETCHING APPARATUS, COMPUTER PROGRAM AND STORAGE MEDIUM

CEILING PLATE AND PLASMA PROCESS APPARATUS

PLASMA PROCESSING APPARATUS

Plasma processing apparatus and plasma processing method

ETCHING METHOD AND ETCHING APPARATUS

Plasma Processing Apparatus and Plasma Processing Method

Plasma processing system for treating a substrate

Method for treating a substrate