Theodoros Panagopoulos

Person

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate support assembly
- Patent number 10,257,887
- Issue date Apr 9, 2019
- Applied Materials, Inc.
- Alexander Matyushkin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate support assembly having rapid temperature control
- Patent number 9,883,549
- Issue date Jan 30, 2018
- Applied Materials, Inc.
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing with rapid temperature gradient control
- Patent number 9,275,887
- Issue date Mar 1, 2016
- Applied Materials, Inc.
- Alexander Matyushkin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Electrostatic chuck having a plurality of heater coils
- Patent number 8,663,391
- Issue date Mar 4, 2014
- Applied Materials, Inc.
- Alexander Matyushkin
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma reactor with center-fed multiple zone gas distribution for i...
- Patent number 8,236,133
- Issue date Aug 7, 2012
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with electrostatic chuck having dual temperature...
- Patent number 8,226,769
- Issue date Jul 24, 2012
- Applied Materials, Inc.
- Alexander Matyushkin
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for controlling temperature of a substrate
- Patent number 8,075,729
- Issue date Dec 13, 2011
- Applied Materials, Inc.
- John Holland
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma control using dual cathode frequency mixing
- Patent number 7,838,430
- Issue date Nov 23, 2010
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process using combined capacitively and inductively coupled plasma...
- Patent number 7,780,864
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual plasma source process using a variable frequency capacitively...
- Patent number 7,727,413
- Issue date Jun 1, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process for inductively coupling power through a gas distrib...
- Patent number 7,674,394
- Issue date Mar 9, 2010
- Applied Materials, Inc.
- Alexander Paterson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching having a controlled distribution of process results
- Patent number 7,648,914
- Issue date Jan 19, 2010
- Applied Materials, Inc.
- Thomas J. Kropewnicki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor apparatus with a VHF capacitively coupled plasma sou...
- Patent number 7,645,357
- Issue date Jan 12, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling temperature of a substrate
- Patent number 7,544,251
- Issue date Jun 9, 2009
- Applied Materials, Inc.
- John Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generation and control using dual frequency RF signals
- Patent number 7,510,665
- Issue date Mar 31, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling temperature of a substrate
- Patent number 7,436,645
- Issue date Oct 14, 2008
- Applied Materials, Inc.
- John Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generation and control using a dual frequency RF source
- Patent number 7,431,857
- Issue date Oct 7, 2008
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor apparatus with independent capacitive and toroidal p...
- Patent number 7,264,688
- Issue date Sep 4, 2007
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for selectively etching dielectric layers
- Patent number 6,905,968
- Issue date Jun 14, 2005
- Applied Materials, Inc.
- Chang-Lin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20180103508
- Publication date Apr 12, 2018
- Applied Materials, Inc.
- Alexander Matyushkin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY HAVING RAPID TEMPERATURE CONTROL
- Publication number 20160135252
- Publication date May 12, 2016
- Applied Materials, Inc.
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUSES FOR CONTROLLING PLASMA IN A PLASMA PROCESSI...
- Publication number 20130256271
- Publication date Oct 3, 2013
- Theodoros Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK HAVING A PLURALITY OF HEATER COILS
- Publication number 20120285619
- Publication date Nov 15, 2012
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS EMPLOYING MULTIPLE ZONE GAS DISTRIBUTION FOR IMPROVE...
- Publication number 20090275206
- Publication date Nov 5, 2009
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH CENTER-FED MULTIPLE ZONE GAS DISTRIBUTION FOR I...
- Publication number 20090272492
- Publication date Nov 5, 2009
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING GAS INJECTION IN PROCESS CHAMBER
- Publication number 20090236447
- Publication date Sep 24, 2009
- Applied Materials, Inc.
- THEODOROS PANAGOPOULOS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multiple frequency pulsing of multiple coil source to control plasm...
- Publication number 20090139963
- Publication date Jun 4, 2009
- Theodoros Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH AN OVERHEAD INDUCTIVE ANTENNA AND AN OVERHEAD G...
- Publication number 20080236490
- Publication date Oct 2, 2008
- ALEXANDER PATERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SPECIES AND UNIFORMITY CONTROL THROUGH PULSED VHF OPERATION
- Publication number 20080230008
- Publication date Sep 25, 2008
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS FOR INDUCTIVELY COUPLING POWER THROUGH A GAS...
- Publication number 20080206483
- Publication date Aug 28, 2008
- ALEXANDER PATERSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of processing a workpiece using a mid-chamber gas distributi...
- Publication number 20080193673
- Publication date Aug 14, 2008
- APPLIED MATERIALS, INC.
- Alexander M. Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mid-chamber gas distribution plate, tuned plasma flow control grid...
- Publication number 20080178805
- Publication date Jul 31, 2008
- APPLIED MATERIALS, INC.
- Alexander M. Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etch process for controlling line edge roughness
- Publication number 20080149592
- Publication date Jun 26, 2008
- Rodolfo P. Belen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING WITH RAPID TEMPERATURE GRADIENT CONTROL
- Publication number 20080017104
- Publication date Jan 24, 2008
- APPLIED MATERIALS, INC.
- Alexander Matyushkin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE SUPPORT WITH ELECTROSTATIC CHUCK HAVING DUAL TEMPERATURE...
- Publication number 20070258186
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual plasma source process using a variable frequency capacitively...
- Publication number 20070245961
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor apparatus with a toroidal plasma source and a VHF ca...
- Publication number 20070246161
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process using combined capacitively and inductively coupled plasma...
- Publication number 20070246443
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process using combined capacitively and inductively coupled plasma...
- Publication number 20070247074
- Publication date Oct 25, 2007
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual plasma source process using a variable frequency capacitively...
- Publication number 20070245959
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process using combined capacitively and inductively coupled plasma...
- Publication number 20070245960
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor apparatus with independent capacitive and inductive...
- Publication number 20070246163
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma reactor apparatus with a VHF capacitively coupled plasma sou...
- Publication number 20070247073
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor apparatus with an inductive plasma source and a VHF...
- Publication number 20070246162
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual plasma source process using a variable frequency capacitively...
- Publication number 20070245958
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE
- Publication number 20070139856
- Publication date Jun 21, 2007
- APPLIED MATERIALS, INC.
- John Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE
- Publication number 20070102118
- Publication date May 10, 2007
- John Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for etching having a controlled distribution of process results
- Publication number 20070042603
- Publication date Feb 22, 2007
- Thomas J. Kropewnicki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION AND CONTROL USING A DUAL FREQUENCY RF SOURCE
- Publication number 20070006971
- Publication date Jan 11, 2007
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS

Theodoros Panagopoulos

Person

Patents Grantslast 30 patents

Substrate support assembly

Substrate support assembly having rapid temperature control

Substrate processing with rapid temperature gradient control

Electrostatic chuck having a plurality of heater coils

Plasma reactor with center-fed multiple zone gas distribution for i...

Substrate support with electrostatic chuck having dual temperature...

Method and apparatus for controlling temperature of a substrate

Plasma control using dual cathode frequency mixing

Process using combined capacitively and inductively coupled plasma...

Dual plasma source process using a variable frequency capacitively...

Plasma process for inductively coupling power through a gas distrib...

Method for etching having a controlled distribution of process results

Plasma reactor apparatus with a VHF capacitively coupled plasma sou...

Method and apparatus for controlling temperature of a substrate

Plasma generation and control using dual frequency RF signals

Method and apparatus for controlling temperature of a substrate

Plasma generation and control using a dual frequency RF source

Plasma reactor apparatus with independent capacitive and toroidal p...

Process for selectively etching dielectric layers

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT ASSEMBLY

SUBSTRATE SUPPORT ASSEMBLY HAVING RAPID TEMPERATURE CONTROL

METHODS AND APPARATUSES FOR CONTROLLING PLASMA IN A PLASMA PROCESSI...

ELECTROSTATIC CHUCK HAVING A PLURALITY OF HEATER COILS

PLASMA PROCESS EMPLOYING MULTIPLE ZONE GAS DISTRIBUTION FOR IMPROVE...

PLASMA REACTOR WITH CENTER-FED MULTIPLE ZONE GAS DISTRIBUTION FOR I...

METHOD AND APPARATUS FOR CONTROLLING GAS INJECTION IN PROCESS CHAMBER

Multiple frequency pulsing of multiple coil source to control plasm...

PLASMA REACTOR WITH AN OVERHEAD INDUCTIVE ANTENNA AND AN OVERHEAD G...

PLASMA SPECIES AND UNIFORMITY CONTROL THROUGH PULSED VHF OPERATION

PLASMA PROCESS FOR INDUCTIVELY COUPLING POWER THROUGH A GAS...

Method of processing a workpiece using a mid-chamber gas distributi...

Mid-chamber gas distribution plate, tuned plasma flow control grid...

Plasma etch process for controlling line edge roughness

SUBSTRATE PROCESSING WITH RAPID TEMPERATURE GRADIENT CONTROL

SUBSTRATE SUPPORT WITH ELECTROSTATIC CHUCK HAVING DUAL TEMPERATURE...

Dual plasma source process using a variable frequency capacitively...

Plasma reactor apparatus with a toroidal plasma source and a VHF ca...

Process using combined capacitively and inductively coupled plasma...

Process using combined capacitively and inductively coupled plasma...

Dual plasma source process using a variable frequency capacitively...

Process using combined capacitively and inductively coupled plasma...

Plasma reactor apparatus with independent capacitive and inductive...

Plasma reactor apparatus with a VHF capacitively coupled plasma sou...

Plasma reactor apparatus with an inductive plasma source and a VHF...

Dual plasma source process using a variable frequency capacitively...

METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE

METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE

Method for etching having a controlled distribution of process results

PLASMA GENERATION AND CONTROL USING A DUAL FREQUENCY RF SOURCE