Thomas E. Wicker

Person

Vallejo, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Inductive plasma processor having coil with plural windings and met...
- Patent number 7,096,819
- Issue date Aug 29, 2006
- Lam Research Corporation
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing equipment having improved process drift co...
- Patent number 6,881,608
- Issue date Apr 19, 2005
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing equipment having improved process drift co...
- Patent number 6,673,198
- Issue date Jan 6, 2004
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low contamination high density plasma etch chambers and methods for...
- Patent number 6,583,064
- Issue date Jun 24, 2003
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductive plasma processor including current sensor for plasma exci...
- Patent number 6,583,572
- Issue date Jun 24, 2003
- Lam Research Corporation
- Robert G. Veltrop
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stacked RF excitation coil for inductive plasma processor
- Patent number 6,527,912
- Issue date Mar 4, 2003
- Lam Research Corporation
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple coil antenna for inductively-coupled plasma generation sys...
- Patent number 6,463,875
- Issue date Oct 15, 2002
- Lam Research Corporation
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contamination controlling method and apparatus for a plasma process...
- Patent number 6,464,843
- Issue date Oct 15, 2002
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low contamination high density plasma etch chambers and methods for...
- Patent number 6,394,026
- Issue date May 28, 2002
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for reducing polymer deposition on substrate support
- Patent number 6,306,244
- Issue date Oct 23, 2001
- Lam Research Corporation
- William S. Kennedy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle controlling method for a plasma processing chamber
- Patent number 6,251,793
- Issue date Jun 26, 2001
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing equipment having radiant heated ceramic liner
- Patent number 6,227,140
- Issue date May 8, 2001
- Lam Research Corporation
- William S. Kennedy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple coil antenna for inductively-coupled plasma generation sys...
- Patent number 6,164,241
- Issue date Dec 26, 2000
- Lam Research Corporation
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for control of deposit build-up on an inner surface of a...
- Patent number 6,155,203
- Issue date Dec 5, 2000
- Lam Research Corporation
- William S. Kennedy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Parallel-antenna transformer-coupled plasma generation system
- Patent number 6,155,199
- Issue date Dec 5, 2000
- Lam Research Corporation
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low contamination high density plasma etch chambers and methods for...
- Patent number 6,129,808
- Issue date Oct 10, 2000
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for control of deposit build-up on an inner su...
- Patent number 6,035,868
- Issue date Mar 14, 2000
- Lam Research Corporation
- William S. Kennedy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for preventing lightup of gas distribution holes
- Patent number 6,033,585
- Issue date Mar 7, 2000
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for igniting a plasma inside a plasma processing reactor
- Patent number 6,028,286
- Issue date Feb 22, 2000
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle controlling method and apparatus for a plasma processing c...
- Patent number 5,993,594
- Issue date Nov 30, 1999
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlling method and apparatus for a plasma processin...
- Patent number 5,863,376
- Issue date Jan 26, 1999
- Lam Research Corporation
- Thomas E. Wicker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of reducing particulates in a plasma tool through steady sta...
- Patent number 5,543,184
- Issue date Aug 6, 1996
- International Business Machines Corporation
- Michael S. Barnes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for reducing particulates in a plasma tool thr...
- Patent number 5,518,547
- Issue date May 21, 1996
- International Business Machines Corporation
- Michael S. Barnes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic wafer clamp
- Patent number 4,724,510
- Issue date Feb 9, 1988
- Tegal Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor processing equipment having improved process drift co...
- Publication number 20050145176
- Publication date Jul 7, 2005
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing equipment having improved process drift co...
- Publication number 20040092120
- Publication date May 13, 2004
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductive plasma processor method
- Publication number 20040045506
- Publication date Mar 11, 2004
- Lam Research Corporation
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductive plasma processor having coil with plural windings and met...
- Publication number 20020185228
- Publication date Dec 12, 2002
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductive plasma processor including current sensor for plasma exci...
- Publication number 20020179250
- Publication date Dec 5, 2002
- Lam Research Corporation
- Robert G. Veltrop
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stacked RF excitation coil for inductive plasma processor
- Publication number 20020140359
- Publication date Oct 3, 2002
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low contamination high density plasma etch chambers and methods for...
- Publication number 20020102858
- Publication date Aug 1, 2002
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS

Thomas E. Wicker

Person

Patents Grantslast 30 patents

Inductive plasma processor having coil with plural windings and met...

Semiconductor processing equipment having improved process drift co...

Semiconductor processing equipment having improved process drift co...

Low contamination high density plasma etch chambers and methods for...

Inductive plasma processor including current sensor for plasma exci...

Stacked RF excitation coil for inductive plasma processor

Multiple coil antenna for inductively-coupled plasma generation sys...

Contamination controlling method and apparatus for a plasma process...

Low contamination high density plasma etch chambers and methods for...

Apparatus for reducing polymer deposition on substrate support

Particle controlling method for a plasma processing chamber

Semiconductor processing equipment having radiant heated ceramic liner

Multiple coil antenna for inductively-coupled plasma generation sys...

Apparatus for control of deposit build-up on an inner surface of a...

Parallel-antenna transformer-coupled plasma generation system

Low contamination high density plasma etch chambers and methods for...

Method and apparatus for control of deposit build-up on an inner su...

Method and apparatus for preventing lightup of gas distribution holes

Method for igniting a plasma inside a plasma processing reactor

Particle controlling method and apparatus for a plasma processing c...

Temperature controlling method and apparatus for a plasma processin...

Method of reducing particulates in a plasma tool through steady sta...

Method and apparatus for reducing particulates in a plasma tool thr...

Electrostatic wafer clamp

Patents Applicationslast 30 patents

Semiconductor processing equipment having improved process drift co...

Semiconductor processing equipment having improved process drift co...

Inductive plasma processor method

Inductive plasma processor having coil with plural windings and met...

Inductive plasma processor including current sensor for plasma exci...

Stacked RF excitation coil for inductive plasma processor

Low contamination high density plasma etch chambers and methods for...