Thomas Winter

Person

Pleasant Valley, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for performing a site-dependent dual patternin...
- Patent number 7,935,545
- Issue date May 3, 2011
- Tokyo Electron Limited
- Mark Winkler
- G05 - CONTROLLING REGULATING
Information Patent Grant
In-line lithography and etch system
- Patent number 7,842,519
- Issue date Nov 30, 2010
- Tokyo Electron Limited
- Mark G. Winkler
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and apparatus for performing a site-dependent dual damascene...
- Patent number 7,783,374
- Issue date Aug 24, 2010
- Tokyo Electron Limited
- Mark Winkler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bake plate lid cleaner and cleaning method
- Patent number 7,741,583
- Issue date Jun 22, 2010
- Tokyo Electron Limited
- Mark G. Winkler
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Method and apparatus for verifying a site-dependent wafer
- Patent number 7,729,795
- Issue date Jun 1, 2010
- Tokyo Electron Limited
- Mark G. Winkler
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Apparatus and method for removing an edge bead of a spin-coated layer
- Patent number 7,673,582
- Issue date Mar 9, 2010
- Tokyo Electron Limited
- Thomas E. Winter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for dispensing resist solution
- Patent number 7,670,643
- Issue date Mar 2, 2010
- Tokyo Electron Limited
- Thomas Winter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for creating a site-dependent evaluation library
- Patent number 7,650,200
- Issue date Jan 19, 2010
- Tokyo Electron Limited
- Mark Winkler
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and apparatus for verifying a site-dependent procedure
- Patent number 7,596,423
- Issue date Sep 29, 2009
- Tokyo Electron Limited
- Mark Winkler
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
In-line lithography and etch system
- Patent number 7,531,368
- Issue date May 12, 2009
- Tokyo Electron Limited
- Mark G. Winkler
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method and apparatus for verifying a site-dependent wafer
- Patent number 7,373,216
- Issue date May 13, 2008
- Tokyo Electron Limited
- Mark Winkler
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR DISPENSING RESIST SOLUTION
- Publication number 20090317546
- Publication date Dec 24, 2009
- TOKYO ELECTRON LIMITED
- Thomas Winter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method For Removing Edge-Bead Material
- Publication number 20090211602
- Publication date Aug 27, 2009
- TOKYO ELECTRON LIMITED
- Thomas Winter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method For Removing Post-Etch Residue
- Publication number 20090211603
- Publication date Aug 27, 2009
- TOKYO ELECTRON LIMITED
- Thomas Winter
- B08 - CLEANING
Information Patent Application
System and Method For Removing Edge-Bead Material
- Publication number 20090211604
- Publication date Aug 27, 2009
- TOKYO ELECTRON LIMITED
- Thomas Winter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-LINE LITHOGRAPHY AND ETCH SYSTEM
- Publication number 20090177311
- Publication date Jul 9, 2009
- TOKYO ELECTRON LIMITED
- Mark Winkler
- G05 - CONTROLLING REGULATING
Information Patent Application
APPARATUS AND METHODS FOR CURING A LAYER BY MONITORING GAS SPECIES...
- Publication number 20080241354
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Thomas E. Winter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR VERIFYING A SITE-DEPENDENT WAFER
- Publication number 20080243297
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Mark Winkler
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and apparatus for verifying a site-dependent procedure
- Publication number 20080243294
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Mark Winkler
- G05 - CONTROLLING REGULATING
Information Patent Application
In-line lithography and etch system
- Publication number 20080241969
- Publication date Oct 2, 2008
- TOKYO ELECTON LIMITED
- Mark Winkler
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and apparatus for performing a site-dependent dual damascene...
- Publication number 20080241970
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Mark Winkler
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and apparatus for performing a site-dependent dual patternin...
- Publication number 20080241971
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Mark Winkler
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and apparatus for creating a site-dependent evaluation library
- Publication number 20080243295
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Mark Winkler
- G05 - CONTROLLING REGULATING
Information Patent Application
BAKE PLATE LID CLEANER AND CLEANING METHOD
- Publication number 20080230534
- Publication date Sep 25, 2008
- TOKYO ELECTRON LIMITED
- Mark G. Winkler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR REMOVING AN EDGE BEAD OF A SPIN-COATED LAYER
- Publication number 20080081110
- Publication date Apr 3, 2008
- TOKYO ELECTRON LIMITED
- Thomas E. Winter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for dispensing resist solution
- Publication number 20060013953
- Publication date Jan 19, 2006
- TOKYO ELECTRON LIMITED
- Thomas Winter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Thomas Winter

Person

Patents Grantslast 30 patents

Method and apparatus for performing a site-dependent dual patternin...

In-line lithography and etch system

Method and apparatus for performing a site-dependent dual damascene...

Bake plate lid cleaner and cleaning method

Method and apparatus for verifying a site-dependent wafer

Apparatus and method for removing an edge bead of a spin-coated layer

Method and system for dispensing resist solution

Method and apparatus for creating a site-dependent evaluation library

Method and apparatus for verifying a site-dependent procedure

In-line lithography and etch system

Method and apparatus for verifying a site-dependent wafer

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR DISPENSING RESIST SOLUTION

System and Method For Removing Edge-Bead Material

System and Method For Removing Post-Etch Residue

System and Method For Removing Edge-Bead Material

IN-LINE LITHOGRAPHY AND ETCH SYSTEM

APPARATUS AND METHODS FOR CURING A LAYER BY MONITORING GAS SPECIES...

METHOD AND APPARATUS FOR VERIFYING A SITE-DEPENDENT WAFER

Method and apparatus for verifying a site-dependent procedure

In-line lithography and etch system

Method and apparatus for performing a site-dependent dual damascene...

Method and apparatus for performing a site-dependent dual patternin...

Method and apparatus for creating a site-dependent evaluation library

BAKE PLATE LID CLEANER AND CLEANING METHOD

APPARATUS AND METHOD FOR REMOVING AN EDGE BEAD OF A SPIN-COATED LAYER

Method and system for dispensing resist solution