Patent Application
20090211602
This application is related to co-pending Attorney docket number FKL-072, entitled “System and Method For Removing Post-Etch Residue”, filed herewith; and FKL-073, entitled “System and Method For Removing Edge Bead Material”, filed herewith. The contents of each of these applications are herein incorporated by reference in their entireties.
The invention relates to wafer processing, and more particularly, to an Edge-bead Removal System and method for using the same.
Minimizing defects during wafer processing will continue to be a critical path to attaining cost effective manufacturing of advanced semiconductor devices. Hard particles can block etch processes causing an electrical “open” or “short” in the circuit. In of lesser size and if lucky with the location on the device, the hard particle may only create fatal perturbations in the active features' critical dimension (line/space or contact hole)
The required gate level defect density for 15 nm gate technology is going to be approximately 0.01/cm2 at 10 nm in size per International Technology Roadmap for Semiconductors (ITRS) 2005 roadmap. Prior art edge-bead cleaning procedures are not adequate to meet these requirements and it is anticipated that an improved edge-bead removal system and associated procedures will be required to meet the future device defect densities.
Embodiments of the invention provide edge-bead removal systems, subsystem, and procedures for removing edge-bead material from one or more surfaces of semiconductor wafers. Embodiments of the invention may be applied to process wafers at different points in a manufacturing cycle, and the wafers can include one or more metal layers.
A more complete appreciation of the invention and many of the attendant advantages thereof will become readily apparent with reference to the following detailed description, particularly when considered in conjunction with the accompanying drawings, in which:
a-4c show exemplary schematic views of a edge-bead removal system in accordance with embodiments of the invention;
a-5c show exemplary schematic views of another edge-bead removal system in accordance with embodiments of the invention;
a-6c show exemplary schematic views of an additional edge-bead removal system in accordance with embodiments of the invention;
Embodiments of the invention provide edge-bead removal systems, subsystems, and procedures for removing edge-bead material from one or more surfaces of semiconductor wafers using edge-bead removal subsystems. Embodiments of the invention may be applied to process wafers at different points in a manufacturing cycle, and the wafers can include one or more metal layers. The terms “wafer” and “substrate” are used interchangeably herein to refer to a thin slice of material, such as a silicon crystal or glass material, upon which microcircuits are constructed, for example by diffusion, deposition, and etching of various materials.
With reference to
The coating/developing processing system 1 also includes a CD metrology system for obtaining CD metrology data from test areas on the patterned wafers. The CD metrology system may be located within the processing system 1, for example at one of the multiple-stage process unit groups 31, 32, 33, 34, 35. The CD metrology system can be a light scattering system such as an optical digital Profilometry (ODP) system.
The ODP system may include a scatterometer, incorporating beam profile ellipsometry (ellipsometer), and beam profile reflectometry (reflectometer), commercially available from Therma-Wave, Inc. (1250 Reliance Way, Fremont, Calif. 94539) or Nanometrics, Inc. (1550 Buckeye Drive, Milpitas, Calif. 95035). ODP software is available from Timbre Technologies Inc. (2953 Bunker Hill Lane, Santa Clara, Calif. 95054).
When performing optical metrology, such as Scatterometry, a structure on a substrate, such as a semiconductor wafer or flat panel, is illuminated with electromagnetic (EM) radiation, and a diffracted signal received from the structure is utilized to reconstruct the profile of the structure. The structure may include a periodic structure, or a non-periodic structure. Additionally, the structure may include an operating structure on the substrate (i.e., a via, or contact hole, or an interconnect line or trench, or a feature formed in a mask layer associated therewith), or the structure may include a periodic grating or non-periodic grating formed proximate to an operating structure formed on a substrate. For example, the periodic grating can be formed adjacent a transistor formed on the substrate. Alternatively, the periodic grating can be formed in an area of the transistor that does not interfere with the operation of the transistor. The profile of the periodic grating is obtained to determine whether the periodic grating, and by extension the operating structure adjacent the periodic grating, has been fabricated according to specifications.
Still referring to
The load/unload section 10 includes a first sub-arm mechanism 21 that is responsible for loading/unloading the wafer W into/from each cassette 13. The first sub-arm mechanism 21 has a holder portion for holding the wafer 14, a back and forth moving mechanism (not shown) for moving the holder portion back and forth, an X-axis moving mechanism (not shown) for moving the holder portion in an X-axis direction, a Z-axis moving mechanism (not shown) for moving the holder portion in a Z-axis direction, and a θ (theta) rotation mechanism (not shown) for rotating the holder portion around the Z-axis. The first sub-arm mechanism 21 can gain access to an alignment unit (ALIM) 41 and an extension unit (EXT) 42 belonging to a third (G3) process unit group 33, as further described below.
With specific reference to
Units belonging to first (G1) and second (G2) process unit groups 31, 32, are arranged at the front portion 2 of the coating/developing processing system 1. Units belonging to the third (G3) process unit group 33 are arranged next to the load/unload section 10. Units belonging to a fourth (G4) process unit group 34 are arranged next to the interface section 12. Units belonging to a fifth (G5) process unit group 35 are arranged in a back portion 3 of the processing system 1.
With reference to
With reference to
Similarly, the fourth (G4) process unit group 34 has a cooling unit (COL) 39, an extension-cooling unit (EXTCOL) 45, an extension unit (EXT) 42, another cooling unit (COL) 39, two prebaking units (PREBAKE) 43 and two postbaking units (POBAKE) 44 stacked sequentially from the bottom. Although, only two prebaking units 43 and only two postbaking units 44 are shown, G3 and G4 may contain any number of prebaking units 43 and postbaking units 44. Furthermore, any or all of the prebaking units 43 and postbaking units 44 may be configured to perform PEB, post application bake (PAB), and post developing bake (PDB) processes.
In an exemplary embodiment, the cooling unit (COL) 39 and the extension cooling unit (EXTCOL) 45, to be operated at low processing temperatures, are arranged at lower stages, and the prebaking unit (PREBAKE) 43, the postbaking unit (POBAKE) 44 and the adhesion unit (AD) 40, to be operated at high temperatures, are arranged at the upper stages. With this arrangement, thermal interference between units may be reduced. Alternatively, these units may have different arrangements.
At the front side of the interface section 12, a movable pick-up cassette (PCR) 15 and a non-movable buffer cassette (BR) 16 are arranged in two stages. At the backside of the interface section 12, a peripheral light exposure system 23 is arranged. The peripheral light exposure system 23 can contain a lithography tool or and ODP system. Alternately, the lithography tool and the ODP system may be remote to and cooperatively coupled to the coating/developing processing system 1. At the center portion of the interface section 12, a second sub-arm mechanism 24 is provided, which is movable independently in the X and Z directions, and which is capable of gaining access to both cassettes (PCR) 15 and (BR) 16 and the peripheral light exposure system 23. In addition, the second sub-arm mechanism 24 is rotatable around the Z-axis by an angle of θ and is designed to be able to gain access not only to the extension unit (EXT) 42 located in the fourth (G4) processing unit group 34 but also to a wafer transfer table (not shown) near a remote light exposure system (not shown).
In the processing system 1, the fifth (G5) processing unit group 35 may be arranged at the back portion 3 of the backside of the main arm mechanism 22. The fifth (G5) processing unit group 35 may be slidably shifted in the Y-axis direction along a guide rail 25. Since the fifth (G5) processing unit group 35 may be shifted as mentioned, maintenance operation may be applied to the main arm mechanism 22 easily from the backside.
The prebaking unit (PREBAKE) 43, the postbaking unit (POBAKE) 44, and the adhesion unit (AD) 40 each comprise a heat treatment system in which wafers 14 are heated to temperatures above room temperature.
In some embodiments, the coating/developing processing system 1 can include one or more edge-bead removal systems that may be incorporated into the coating/developing processing system 1, or be incorporated as additional modules.
a-4c show exemplary schematic views of a edge-bead removal system in accordance with embodiments of the invention. In the illustrated embodiment, an exemplary edge-bead removal system 400 is shown that comprises a processing chamber 405, a wafer table 403 for supporting a wafer 401, and a translation unit 404 coupled to the wafer table 403 and to the processing chamber 405. The wafer table 403 can include a vacuum system (not shown) for coupling the wafer 401 to the wafer table 403. The translation unit 404 can be used to align the wafer table 403 in one or more directions and can be used to rotate the wafer table. For example, revolution rates can vary from approximately 0.10 rpm to approximately 6,000 rpm; the revolution rate accuracy can vary from approximately +1 rpm to approximately −1 rpm; and the acceleration rates can vary from approximately 100 rpm/sec to approximately 50,000 rpm/sec.
The edge-bead removal subsystem 410 can be coupled to the processing chamber 405 using first coupling element 407 and second coupling element 408. For example, the first coupling element 407 and second coupling element 408 can be configured as a flexible arm. Edge-bead removal subsystem 410 can comprise an upper cleaning assembly 411, a middle cleaning assembly 412, and a lower assembly 413 that can be used to form a cleaning space 423. The edge-bead removal system 400 can also include a supply subsystem 420 coupled to the edge-bead removal subsystem 410 and to the processing chamber 405. The supply subsystem 420 can be configured to provide processing fluids and gasses at the correct temperatures and flow rates. For example, processing gasses can include inert gasses, air, reactive gasses, and non-reactive gasses.
The upper cleaning assembly 411 can have a length L1, a height H1, and a width W1 associated therewith. The length L1 can vary from approximately 5 mm to approximately 100 mm, the height H1 can vary from approximately 5 mm to approximately 20 mm, and the width W1 can vary from approximately 5 mm to approximately 50 mm. The middle cleaning assembly 412 can have a length L2, a height H2, and a width W2 associated therewith. The length L2 can vary from approximately 5 mm to approximately 50 mm, the height H2 can vary from approximately 5 mm to approximately 20 mm, and the width W2 can vary from approximately 5 mm to approximately 50 mm. The lower assembly 413 can have a length L3 a height H3, and a width W3 associated therewith. The length L3 can vary from approximately 5 mm to approximately 50 mm, the height H3a can vary from approximately 5 mm to approximately 20 mm, and the width W3 can vary from approximately 5 mm to approximately 50 mm.
The processing chamber 405 can include one or more exhaust ports 421 coupled to the process space 406. For example, the exhaust port 421 may comprise one or more valves (not shown) and/or one or more exhaust sensors (not shown). Those skilled in the art will recognize that the one or more valves may be used for controlling flow in and/or out of the process space 406, and one or more exhaust sensors may be used for determining the processing state for the edge-bead removal system 400. In addition, one or more of the exhaust ports 421 may be coupled to an evacuation unit (not shown) and/or an exhaust system (not shown) using flexible hoses/tubes/pipes/conduits. Exhaust port 421 can be used to exhaust cleaning and/or other processing gasses that must be removed from the process space 406.
Processing chamber 405 can include a wafer transfer port 409 that can be opened during wafer transfer procedures and closed during wafer processing.
The edge-bead removal system 400 can comprise one or more recovery systems 422, and the recovery system 422 can be configured to analyze, filter, re-use, and/or remove one or more processing fluids. For example, some solvents may be re-used.
In addition, the edge-bead removal system 400 can include a controller 425 that can be coupled to the wafer table 403, the translation unit 404, the processing chamber 405, the edge-bead removal subsystem 410, the first coupling element 407, the second coupling element 408, the supply subsystem 420, exhaust port 421, recovery system 422, and the wafer transfer port 409. Alternatively, other configurations may be used.
Referring to
In the illustrated embodiment, a first flow controller 417 is shown in an exploded view of the upper cleaning assembly 411, and a second flow controller 418 is shown in an exploded view of the middle cleaning assembly 412. In addition, an upper sensor unit 433a is shown coupled to the upper cleaning assembly 411, and a lower sensor unit 433b is shown coupled to the lower assembly 413. The upper sensor unit 433a and the lower sensor unit 433b can be used to determine processing states, positions, thicknesses, temperatures, pressures, flow rates, chemistries, spin rates, acceleration rates, residues, or particles, or any combination thereof.
The upper cleaning assembly 411 can include one or more first flow controllers 417 that can be coupled to a first supply line 481, and a second supply line 482. In various embodiments, one or more of the supply lines (481 and 482) can be operated in a supply mode or in an exhaust mode. In addition, the first flow controller 417 can be coupled to a first flow port 430, and a second flow port 435, and one or more of the flow ports (430 and 435) can be operated as input ports or output ports at various times during processing. In alternate embodiments, different numbers of flow controllers, different numbers of supply lines, and different numbers of flow ports can be used. The first flow controller 417 can monitor and control the first supply line 481, the second supply line 482, the first flow port 430, and the second flow port 435 as required. The first flow port 430 can have a first shape 431 and a first angle 432 associated therewith, and the second flow port 435 can have a second shape 436 and a second angle 437 associated therewith. One or more of the shapes (431 and 436) can be rectangular, cylindrical, and/or tapered, and the angles (432 and 437) can range from approximately 10 degrees to approximately 170 degrees. Alternatively, other shapes and angles may be used.
The middle cleaning assembly 412 can include one or more second flow controllers 418 that can be coupled to a third supply line 483, and a fourth supply line 484. In various embodiments, one or more of the supply lines (483 and 484) can be operated in a supply mode or an exhaust mode. In addition, the second flow controller 418 can be coupled to a third flow port 440, a fourth flow port 445, and a fifth flow port 450, and one or more of the flow ports (440, 445, and 450) can be operated as input ports or output ports at various times during processing. In alternate embodiments, different numbers of flow controllers, different numbers of supply lines, and different numbers of flow ports can be used.
The second flow controller 418 can monitor and control the third supply line 483, the fourth supply line 484, the third flow port 440, the fourth flow port 445, and the fifth flow port 450 as required. The third flow port 440 can have a third shape 441 and a third angle 442 associated therewith, the fourth flow port 445 can have a fourth shape 446 and a fourth angle 447 associated therewith, and the fifth flow port 450 can have a fifth shape 451 and a fifth angle 452 associated therewith. One or more of the shapes (441, 446, and 451) can be rectangular, cylindrical, and/or tapered, and the angles (442, 447, and 452) can range from approximately 10 degrees to approximately 170 degrees. Alternatively, other configurations may be used.
The first flow controller 417 can have a length L4, a height H4, and a width W4 associated therewith. The length L4 can vary from approximately 10 mm to approximately 50 mm, the height H4 can vary from approximately 4 mm to approximately 10 mm, and the width W4 can vary from approximately 10 mm to approximately 50 mm. The second flow controller 418 can have a length L5, a height H5, and a width W5 associated therewith. The length L5 can vary from approximately 10 mm to approximately 50 mm, the height H5 can vary from approximately 4 mm to approximately 10 mm, and the width W5 can vary from approximately 10 mm to approximately 50 mm.
One or more of the flow ports (430, 435, 440, 445, and 450) can have outside diameters that can range from approximately 0.5 mm to approximately 5.0 mm, inside diameters that can range from approximately 0.1 mm to approximately 2.0 mm, and lengths that range from approximately 2 mm to approximately 10 mm. The dimensions can be dependent upon the wafer type, the type of edge-bead material being removed, and the chemistries being used. In addition, the distance between the tip of a flow port and the wafer 401 can be changed during processing as the edge-bead removal subsystem 410 is moved with respect to the edge of the wafer. The minimum separation distance can be dependent upon the wafer type, the type of edge-bead material being removed, and/or the chemistries being used and can vary from approximately 0.5 mm to approximately 1.5 mm. In other examples, one or more of the flow ports (430, 435, 440, 445, and 450) can include a nozzle, and a nozzle can have a diameter that ranges from approximately 0.1 mm to approximately 2.0 mm, can have a length that ranges from approximately 2 mm to approximately 10 mm.
In some cleaning procedures, Propylene Glycol Monomethyl Ether Acetate can be used as cleaning fluids or rinsing agent. In other removal procedures, other solvents or blends of solvents or liquids can be used based on the type and amount of undesired film. In addition, cleaning fluids or rinsing agents can include the following as single materials or blends: N-Butyl Acetate, Cyclohexanone, Ethyl Lactate, Acetone, Isopropyl alcohol, 4-methyl 2-Pentanone, Gamma Butyl Lactone. In other cleaning procedures, water or diluted HF or diluted sulfuric acid/hydrogen peroxide can be used for removing polymer films and/or edge-bead material.
The operating temperature for the wafer 401 can range from approximately minus 30 degrees Celsius to approximately 150 degrees Celsius. The operating temperature within the cleaning space 423 can range from approximately minus 20 degrees Celsius to approximately 145 degrees Celsius. The temperature at the wafer edge can range from approximately minus 10 degrees Celsius to approximately 140 degrees Celsius, and the temperature at the wafer edge may be different from the temperature at the interior of the wafer 401. The temperature of the edge-bead material 402 can range from approximately minus 10 degrees Celsius to approximately 140 degrees Celsius so that the edge-bead material 402 can be efficiently removed. In alternate examples, the edge-bead removal subsystem 410 may include electrical, resistance, thermoelectric, and/or optical heating elements (not shown). In other examples, Nitrogen or any other gas may be used for controlling the temperature at the wafer edge and may be provided through one or more of the flow ports in the edge-bead removal subsystem 410.
a-5c show exemplary schematic views of another edge-bead removal system in accordance with embodiments of the invention. In the illustrated embodiment, an exemplary edge-bead removal system 500 is shown that comprises a processing chamber 505, a wafer table 503 for supporting a wafer 501, and a translation unit 504 coupled to the wafer table 503 and to the processing chamber 505. The wafer table 503 can include a vacuum system (not shown) for coupling the wafer 501 to the wafer table 503. The translation unit 504 can be used to align the wafer table 503 in one or more directions and can be used to rotate the wafer table. For example, revolution rates can vary from approximately 0.10 rpm to approximately 6,000 rpm; the revolution rate accuracy can vary from approximately +1 rpm to approximately −1 rpm; and the acceleration rates can vary from approximately 100 rpm/sec to approximately 50,000 rpm/sec.
The edge-bead removal subsystem 510 can be coupled to the processing chamber 505 using first coupling element 507 and second coupling element 508. For example, the first coupling element 507 and second coupling element 508 can be configured as a flexible arm. Edge-bead removal subsystem 510 can comprise an upper cleaning assembly 511, a middle cleaning assembly 512, and a lower cleaning assembly 513 that can be used to form a cleaning space 523. The edge-bead removal system 500 can also include a supply subsystem 520 coupled to the edge-bead removal subsystem 510 and to the processing chamber 505. The supply subsystem 520 can be configured to provide processing fluids and gasses at the correct temperatures and flow rates.
The upper cleaning assembly 511 can have a length L1, a height H1, and a width W1 associated therewith. The length L1 can vary from approximately 5 mm to approximately 100 mm, the height H1 can vary from approximately 5 mm to approximately 20 mm, and the width W1 can vary from approximately 5 mm to approximately 50 mm. The middle cleaning assembly 512 can have a length L2, a height H2, and a width W2 associated therewith. The length L2 can vary from approximately 5 mm to approximately 50 mm, the height H2 can vary from approximately 5 mm to approximately 20 mm, and the width W2 can vary from approximately 5 mm to approximately 50 mm. The lower cleaning assembly 513 can have a length L3 a height H3, and a width W3 associated therewith. The length L3 can vary from approximately 5 mm to approximately 50 mm, the height H3 can vary from approximately 5 mm to approximately 20 mm, and the width W3 can vary from approximately 5 mm to approximately 50 mm.
The processing chamber 505 can include one or more exhaust ports 521 coupled to the process space 506. For example, the exhaust port 521 may comprise one or more valves (not shown) and/or one or more exhaust sensors (not shown). Those skilled in the art will recognize that the one or more valves may be used for controlling flow in and/or out of the process space 506, and one or more exhaust sensors may be used for determining the processing state for the edge-bead removal system 500. In addition, one or more of the exhaust ports 521 may be coupled to an evacuation unit (not shown) and/or an exhaust system (not shown) using flexible hoses/tubes/pipes/conduits. Exhaust port 521 can be used to exhaust cleaning and/or other processing gasses that must be removed from the process space 506.
Processing chamber 505 can include a wafer transfer port 509 that can be opened during wafer transfer procedures and closed during wafer processing.
The edge-bead removal system 500 can comprise one or more recovery systems 522, and the recovery system 522 can be configured to analyze, filter, re-use, and/or remove one or more processing fluids. For example, some solvents may be re-used.
In addition, the edge-bead removal system 500 can include a controller 525 that can be coupled to the wafer table 503, the translation unit 504, the processing chamber 505, the edge-bead removal subsystem 510, the first coupling element 507, the second coupling element 508, the supply subsystem 520, exhaust port 521, recovery system 522, and the wafer transfer port 509. Alternatively, other configurations may be used.
Referring to
In the illustrated embodiment, a first flow controller 517 is shown in an exploded view of the upper cleaning assembly 511, and a second flow controller 518 is shown in an exploded view of the middle cleaning assembly 512. In addition, an upper sensor unit 533a is shown coupled to the upper cleaning assembly 511, and a lower sensor unit 533b is shown coupled to the lower cleaning assembly 513. The upper sensor unit 533a and the lower sensor unit 533b can be used to determine processing states, positions, thicknesses, temperatures, pressures, flow rates, chemistries, spin rates, acceleration rates, residues, or particles, or any combination thereof.
The upper cleaning assembly 511 can include one or more first flow controllers 517 that can be coupled to a first supply line 581, and a second supply line 582. In various embodiments, one or more of the supply lines (581 and 582) can be operated in a supply mode or in an exhaust mode. In addition, the first flow controller 517 can be coupled to a first flow port 530, and a second flow port 535, and one or more of the flow ports (530 and 535) can be operated as input ports or output ports at various times during processing. In alternate embodiments, different numbers of flow controllers, different numbers of supply lines, and different numbers of flow ports can be used. The first flow controller 517 can monitor and control the first supply line 581, the second supply line 582, the first flow port 530, and the second flow port 535 as required. The first flow port 530 can have a first shape 531 and a first angle 532 associated therewith, and the second flow port 535 can have a second shape 536 and a second angle 537 associated therewith. One or more of the shapes (531 and 536) can be rectangular, cylindrical, and/or tapered, and the angles (532 and 537) can range from approximately 10 degrees to approximately 170 degrees. Alternatively, other shapes and angles may be used.
The middle cleaning assembly 512 can include one or more second flow controllers 518 that can be coupled to a third supply line 583, and a fourth supply line 584. In various embodiments, one or more of the supply lines (583 and 584) can be operated in a supply mode or an exhaust mode. In addition, the second flow controller 518 can be coupled to a third flow port 540, a fourth flow port 545, and a fifth flow port 550, and one or more of the flow ports (540, 545, and 550) can be operated as input ports or output ports at various times during processing. In alternate embodiments, different numbers of flow controllers, different numbers of supply lines, and different numbers of flow ports can be used.
The second flow controller 518 can monitor and control the third supply line 583, the fourth supply line 584, the third flow port 540, the fourth flow port 545, and the fifth flow port 550 as required. The third flow port 540 can have a third shape 541 and a third angle 542 associated therewith, the fourth flow port 545 can have a fourth shape 546 and a fourth angle 547 associated therewith, and the fifth flow port 550 can have a fifth shape 551 and a fifth angle 552 associated therewith. Alternatively, other configurations may be used. One or more of the shapes (541, 546, and 551) can be rectangular, cylindrical, and/or tapered, and the angles (542, 547, and 552) can range from approximately 10 degrees to approximately 170 degrees. Alternatively, other shapes and angles may be used.
The first flow controller 517 can have a length L4, a height H4, and a width W4 associated therewith. The length L4 can vary from approximately 10 mm to approximately 50 mm, the height H4 can vary from approximately 4 mm to approximately 10 mm, and the width W4 can vary from approximately 10 mm to approximately 50 mm. The second flow controller 518 can have a length L5, a height H5, and a width W5 associated therewith. The length L5 can vary from approximately 10 mm to approximately 50 mm, the height H5 can vary from approximately 4 mm to approximately 10 mm, and the width W5 can vary from approximately 10 mm to approximately 50 mm.
One or more of the flow ports (530, 535, 540, 545, and 550) can have outside diameters that can range from approximately 0.5 mm to approximately 5.0 mm, inside diameters that can range from approximately 0.1 mm to approximately 2.0 mm, and lengths that range from approximately 2 mm to approximately 10 mm. The dimensions can be dependent upon the wafer type, the type of residue being removed, and the chemistries being used. In addition, the distance between the tip of a flow port and the wafer 501 can be changed during processing as the edge-bead removal subsystem 510 is moved with respect to the edge of the wafer. The minimum separation distance can be dependent upon the wafer type, the type of residue being removed, and/or the chemistries being used, and can vary from approximately 0.5 mm to approximately 1.5 mm. In other examples, one or more of the flow ports (530, 535, 540, 545, and 550) can include a nozzle, and a nozzle can have a diameter that ranges from approximately 0.1 mm to approximately 2.0 mm, can have a length that ranges from approximately 2 mm to approximately 10 mm.
In some cleaning procedures, Propylene Glycol Monomethyl Ether Acetate can be used as cleaning fluids or rinsing agents. In other removal procedures, other solvents or blends of solvents or liquids can be used based on the type and amount of undesired film. In addition, cleaning fluids or rinsing agents can include the following as single materials or blends: N-Butyl Acetate, Cyclohexanone, Ethyl Lactate, Acetone, Isopropyl alcohol, 4-methyl 2-Pentanone, Gamma Butyl Lactone. In other cleaning procedures, water or diluted HF or diluted sulfuric acid/hydrogen peroxide can be used for removing film material and/or edge-bead material.
The lower cleaning assembly 513 can include one or more collection devices 590 and each collection device 590 can have one or more inputs and one or more outputs. In some embodiments, a collection device 590 can be coupled to a return line 591 and return line output 592 can be coupled to a recovery system (not shown), and the collection device 590 may be used to collect and remove cleaning fluids, rinsing agents, drying agents, chemical agents, and/or reaction products. The collection device 590 can have a length L7, a height H7, and a width W7 associated therewith. The length L7 can vary from approximately 1 mm to approximately 10 mm, the height H7 can vary from approximately 1 mm to approximately 10 mm, and the width W7 can vary from approximately 1 mm to approximately 10 mm.
The operating temperature for the wafer 501 can range from approximately minus 30 degrees Celsius to approximately 150 degrees Celsius. The operating temperature within the cleaning space 523 can range from approximately minus 20 degrees Celsius to approximately 145 degrees Celsius. The temperature at the wafer edge can range from approximately minus 10 degrees Celsius to approximately 140 degrees Celsius, and the temperature at the wafer edge may be different from the temperature at the interior of the wafer 501. The temperature of the edge-bead material 502 can range from approximately minus 10 degrees Celsius to approximately 140 degrees Celsius so that the edge-bead material 502 can be efficiently removed. In alternate examples, the edge-bead removal subsystem 510 may include electrical, resistance, thermoelectric, and/or optical heating elements (not shown). In other examples, Nitrogen or any other gas may be used for controlling the temperature at the wafer edge and may be provided through one or more of the flow ports in the edge-bead removal subsystem 510.
a-6c show exemplary schematic views of an additional edge-bead removal system in accordance with embodiments of the invention. In the illustrated embodiment, an exemplary edge-bead removal system 600 is shown that comprises a processing chamber 605, a wafer table 603 for supporting a wafer 601, and a translation unit 604 coupled to the wafer table 603 and to the processing chamber 605. The wafer table 603 can include a vacuum system (not shown) for coupling the wafer 601 to the wafer table 603. The translation unit 604 can be used to align the wafer table 603 in one or more directions and can be used to rotate the wafer table. For example, revolution rates can vary from approximately 0.10 rpm to approximately 6,000 rpm; the revolution rate accuracy can vary from approximately +1 rpm to approximately −1 rpm; and the acceleration rates can vary from approximately 100 rpm/sec to approximately 50,000 rpm/sec.
The edge-bead removal subsystem 610 can be coupled to the processing chamber 605 using first coupling element 607 and second coupling element 608. For example, the first coupling element 607 and second coupling element 608 can be configured as a flexible arm. Edge-bead removal subsystem 610 can comprise an upper cleaning assembly 611, a middle cleaning assembly 612, and a lower cleaning assembly 613 that can be used to form a cleaning space 623. The edge-bead removal system 600 can also include a supply subsystem 620 coupled to the edge-bead removal subsystem 610 and to the processing chamber 605. The supply subsystem 620 can be configured to provide processing fluids and gasses at the correct temperatures and flow rates.
The upper cleaning assembly 611 can have a length L1, a height H1, and a width W1 associated therewith. The length L1 can vary from approximately 5 mm to approximately 100 mm, the height H1 can vary from approximately 5 mm to approximately 20 mm, and the width W1 can vary from approximately 5 mm to approximately 50 mm. The middle cleaning assembly 612 can have a length L2, a height H2, and a width W2 associated therewith. The length L2 can vary from approximately 5 mm to approximately 50 mm, the height H2 can vary from approximately 5 mm to approximately 20 mm, and the width W2 can vary from approximately 5 mm to approximately 50 mm. The lower cleaning assembly 613 can have a length L3 a height H3, and a width W3 associated therewith. The length L3 can vary from approximately 5 mm to approximately 50 mm, the height H3 can vary from approximately 5 mm to approximately 20 mm, and the width W3 can vary from approximately 5 mm to approximately 50 mm.
The processing chamber 605 can include one or more exhaust ports 621 coupled to the process space 606. For example, the exhaust port 621 may comprise one or more valves (not shown) and/or one or more exhaust sensors (not shown). Those skilled in the art will recognize that the one or more valves may be used for controlling flow in and/or out of the process space 606, and one or more exhaust sensors may be used for determining the processing state for the edge-bead removal system 600. In addition, one or more of the exhaust ports 621 may be coupled to an evacuation unit (not shown) and/or an exhaust system (not shown) using flexible hoses/tubes/pipes/conduits. Exhaust port 621 can be used to exhaust cleaning and/or other processing gasses that must be removed from the process space 606.
Processing chamber 605 can include a wafer transfer port 609 that can be opened during wafer transfer procedures and closed during wafer processing.
The edge-bead removal system 600 can comprise one or more recovery systems 622, and the recovery system 622 can be configured to analyze, filter, re-use, and/or remove one or more processing fluids. For example, some solvents may be re-used.
In addition, the edge-bead removal system 600 can include a controller 625 that can be coupled to the wafer table 603, the translation unit 604, the processing chamber 605, the edge-bead removal subsystem 610, the first coupling element 607, the second coupling element 608, the supply subsystem 620, exhaust port 621, recovery system 622, and the wafer transfer port 609. Alternatively, other configurations may be used.
Referring to
In the illustrated embodiment, a first flow controller 617 is shown in an exploded view of the upper cleaning assembly 611, and a second flow controller 618 is shown in an exploded view of the middle cleaning assembly 612. In addition, an upper sensor unit 633a is shown coupled to the upper cleaning assembly 611, and a lower sensor unit 633b is shown coupled to the lower cleaning assembly 613. The upper sensor unit 633a and the lower sensor unit 633b can be used to determine processing states, positions, thicknesses, temperatures, pressures, flow rates, chemistries, spin rates, acceleration rates, residues, or particles, or any combination thereof.
The upper cleaning assembly 611 can include one or more first flow controllers 617 that can be coupled to a first supply line 681, and a second supply line 682. In various embodiments, one or more of the supply lines (681 and 682) can be operated in a supply mode or in an exhaust mode. In addition, the first flow controller 617 can be coupled to a first flow port 630, and a second flow port 635, and one or more of the flow ports (630 and 635) can be operated as input ports or output ports at various times during processing. In alternate embodiments, different numbers of flow controllers, different numbers of supply lines, and different numbers of flow ports can be used. The first flow controller 617 can monitor and control the first supply line 681, the second supply line 682, the first flow port 630, and the second flow port 635 as required. The first flow port 630 can have a first shape 631 and a first angle 632 associated therewith, and the second flow port 635 can have a second shape 636 and a second angle 637 associated therewith. One or more of the shapes (631 and 636) can be rectangular, cylindrical, and/or tapered, and the angles (632 and 637) can range from approximately 10 degrees to approximately 170 degrees. Alternatively, other shapes and angles may be used.
The middle cleaning assembly 612 can include one or more second flow controllers 618 that can be coupled to a third supply line 683, and a fourth supply line 684. In various embodiments, one or more of the supply lines (683 and 684) can be operated in a supply mode or an exhaust mode. In addition, the second flow controller 618 can be coupled to a third flow port 640, a fourth flow port 645, and a fifth flow port 650, and one or more of the flow ports (640, 645, and 650) can be operated as input ports or output ports at various times during processing. In alternate embodiments, different numbers of flow controllers, different numbers of supply lines, and different numbers of flow ports can be used.
The second flow controller 618 can monitor and control the third supply line 683, the fourth supply line 684, the third flow port 640, the fourth flow port 645, and the fifth flow port 650 as required. The third flow port 640 can have a third shape 641 and a third angle 642 associated therewith, the fourth flow port 645 can have a fourth shape 646 and a fourth angle 647 associated therewith, and the fifth flow port 650 can have a fifth shape 651 and a fifth angle 652 associated therewith. Alternatively, other configurations may be used. One or more of the shapes (641, 646, and 651) can be rectangular, cylindrical, and/or tapered, and the angles (642, 647, and 652) can range from approximately 10 degrees to approximately 170 degrees. Alternatively, other shapes and angles may be used.
The lower cleaning assembly 613 can include one or more third flow controllers 619 that can be coupled to a fifth supply line 685, and a sixth supply line 686. In various embodiments, one or more of the supply lines (685 and 686) can be operated in a supply mode or an exhaust mode. In addition, the third flow controller 619 can be coupled to a sixth flow port 655, and a seventh flow port 660, and one or more of the flow ports (655 and 660) can be operated as input ports or output ports at various times during processing. In alternate embodiments, different numbers of flow controllers, different numbers of supply lines, and different numbers of flow ports can be used.
The third flow controller 619 can monitor and control the fifth supply line 685, the sixth supply line 686, the sixth flow port 655, and the seventh flow port 660 as required. The sixth flow port 655 can have a sixth shape 656 and a sixth angle 657 associated therewith, and the seventh flow port 660 can have a seventh shape 661 and a seventh angle 662 associated therewith. Alternatively, other configurations may be used.
One or more of the shapes (656 and 661) can be rectangular, cylindrical, and/or tapered, and the angles (657 and 662) can range from approximately 10 degrees to approximately 170 degrees. In some examples, one or more of the flow ports (655 and 660) can include a nozzle, and a nozzle can have a diameter that ranges from approximately 0.1 mm to approximately 2.0 mm, can have a length that ranges from approximately 2 mm to approximately 10 mm.
The first flow controller 617 can have a length L4, a height H4, and a width W4 associated therewith. The length L4 can vary from approximately 10 mm to approximately 50 mm, the height H4 can vary from approximately 4 mm to approximately 10 mm, and the width W4 can vary from approximately 10 mm to approximately 50 mm. The second flow controller 618 can have a length L5, a height H5, and a width W5 associated therewith. The length L5 can vary from approximately 10 mm to approximately 50 mm, the height H5 can vary from approximately 4 mm to approximately 10 mm, and the width W5 can vary from approximately 10 mm to approximately 50 mm. The third flow controller 619 can have a length L6, a height H6, and a width W6 associated therewith. The length L6 can vary from approximately 10 mm to approximately 50 mm, the height H6 can vary from approximately 4 mm to approximately 10 mm, and the width W6 can vary from approximately 10 mm to approximately 50 mm.
One or more of the flow ports (630, 635, 640, 645, 650, 655, and 660) can have outside diameters that can range from approximately 0.5 mm to approximately 5.0 mm, inside diameters that can range from approximately 0.1 mm to approximately 2.0 mm, and lengths that range from approximately 2 mm to approximately 10 mm. The dimensions can be dependent upon the wafer type, the type of residue being removed, and the chemistries being used. In addition, the distance between the tip of a flow port and the wafer 601 can be changed during processing as the edge-bead removal subsystem 610 is moved with respect to the edge of the wafer. The minimum separation distance can be dependent upon the wafer type, the type of residue being removed, and/or the chemistries being used and can vary from approximately 0.5 mm to approximately 1.5 mm. In other examples, one or more of the flow ports (630, 635, 640, 645, 650, 655, and 660) can include a nozzle, and a nozzle can have a diameter that ranges from approximately 0.1 mm to approximately 2.0 mm, can have a length that ranges from approximately 2 mm to approximately 10 mm.
In some cleaning procedures, Propylene Glycol Monomethyl Ether Acetate can be used as cleaning fluids or rinsing agents. In other removal procedures, other solvents or blend of solvents or liquids can be used based on the type and amount of undesired film. In addition, cleaning fluids or rinsing agents can include the following as single materials or blends: N-Butyl Acetate, Cyclohexanone, Ethyl Lactate, Acetone, Isopropyl alcohol, 4-methyl 2-Pentanone, Gamma Butyl Lactone. In other cleaning procedures, water or diluted HF or diluted sulfuric acid/hydrogen peroxide can be used for removing film material and/or edge-bead material.
The operating temperature for the wafer 601 can range from approximately minus 30 degrees Celsius to approximately 150 degrees Celsius. The operating temperature within the cleaning space 623 can range from approximately minus 20 degrees Celsius to approximately 145 degrees Celsius. The temperature at the wafer edge can range from approximately minus 10 degrees Celsius to approximately 140 degrees Celsius, and the temperature at the wafer edge may be different from the temperature at the interior of the wafer 601. The temperature of the edge-bead material 602 can range from approximately minus 10 degrees Celsius to approximately 140 degrees Celsius so that the edge-bead material 602 can be efficiently removed. In alternate examples, the edge-bead removal subsystem 610 may include electrical, resistance, thermoelectric, and/or optical heating elements (not shown). In other examples, Nitrogen or any other gas may be used for controlling the temperature at the wafer edge and may be provided through one or more of the flow ports in the edge-bead removal subsystem 610.
A first edge-bead removal subsystem 710a can be coupled to the processing chamber 705 at a first location using first coupling element 707a and second coupling element 708a. For example, the first coupling element 707a and second coupling element 708a can be configured as a flexible arm. The first edge-bead removal subsystem 710a can comprise one or more cleaning assemblies as shown in
A second edge-bead removal subsystem 710b can be coupled to the processing chamber 705 at a second location using first coupling element 707b and second coupling element 708b. For example, the first coupling element 707b and second coupling element 708b can be configured as a flexible arm. The second edge-bead removal subsystem 710b can comprise one or more cleaning assemblies as shown in
The processing chamber 705 can include one or more exhaust ports 721 coupled to the process space 706. For example, the exhaust port 721 may comprise one or more valves (not shown) and/or one or more exhaust sensors (not shown). Those skilled in the art will recognize that the one or more valves may be used for controlling flow in and/or out of the process space 706, and one or more exhaust sensors may be used for determining the processing state for the edge-bead removal system 700. In addition, one or more of the exhaust ports 721 may be coupled to an evacuation unit (not shown) and/or an exhaust system (not shown) using flexible hoses. Exhaust port 721 can be used to exhaust cleaning and/or other processing gasses that must be removed from the process space 706. Port diameters can range from 0.2 mm to 10.0 mm.
Processing chamber 705 can include a wafer transfer port 709 that can be opened during wafer transfer procedures and closed during wafer processing.
The edge-bead removal system 700 can comprise one or more recovery systems 722, and the recovery system 722 can be configured to analyze, filter, re-use, and/or remove one or more processing fluids. For example, some solvents may be re-used.
In addition, the edge-bead removal system 700 can include a controller 725 that can be coupled to the wafer table 703, the translation unit 704, the processing chamber 705, the wafer transfer port 709, the exhaust port 721, the recovery system 722, the first edge-bead removal subsystem 710a, the first supply subsystem 720a, the second edge-bead removal subsystem 710b, the second supply subsystem 720b, and the coupling elements (707a, 707b, 708a, and 708b). Alternatively, other configurations may be used.
In alternate embodiments, a solvent bath (not shown) may be installed with the processing chamber 705, and may be used for storing one or more edge-bead removal subsystem (410, 510, and 610). For example, different edge-bead removal subsystems may be used as additional layers are added to the wafer. When installed, the solvent bath may be used to prevent changes in quality of residue removal process.
In 810, a wafer can be positioned on a wafer holder, and vacuum techniques can be used to fix the wafer to the wafer holder. In some embodiments, an alignment procedure can be performed using a notch in the wafer.
In 815, the wafer and the wafer holder can be rotated in a processing chamber at a first speed during a first time, and a first wafer position can be determined. The wafer can have edge-bead material on one or more outer surfaces, and feed forward data can be used to determine the type of edge-bead material and thickness of the edge-bead material. Alternatively, the edge-bead removal system can be used to determine the type of edge-bead material and thickness of the edge-bead material using sensors in the 410, 510, 610, or 710. For example, the rotational speed can range from 0 rpm to 1000 rpm. For example, the wafer and the wafer holder can be at substantially the same temperature, and the wafer edge temperature can be different from the wafer temperature.
In 820, one or more edge-bead removal subsystems can be positioned proximate a wafer surface. For example, the edge-bead removal subsystem can be positioned at a first location proximate a first wafer surface during a first time, and the first location can be determined using the first wafer position. An edge-bead removal subsystem can be configured to provide a first set of fluids and/or gasses to a first cleaning space proximate the wafer edge using a first set of flow ports, and can be configured to remove a second set of fluids and/or gasses from the first cleaning space using a second set of flow ports. In addition, the edge-bead removal subsystem can be moved to one or more positions during processing. In some alternate procedures, the edge-bead removal subsystem can provide heat to the wafer edge to raise the temperature of the edge portion of the wafer and the edge-bead material close to the edge of the wafer. In other alternate procedures, the edge-bead removal subsystem can provide a coolant gas to lower the temperature of the edge portion of the wafer and the edge-bead material close to the edge of the wafer.
In 825, one or more cleaning procedures can be performed. In some embodiments, one or more flow controllers can be used to provide one or more fluids and/or gasses in one or more directed flows onto the wafer edge and/or other wafer surfaces, and one or more flow controllers can be used to remove one or more fluids, gasses, and/or edge bead residue using one or more directed flows away from one or more of the wafer surfaces. During cleaning procedures, the cleaning agents, the spin rates, the flow rates, the position and/or speed of the edge bead removal subsystem, and processing times can be determined by a process recipe, and the cleaning chemistry/agents, the spin rates, the flow rates, the position and/or speed of the edge bead removal subsystem can change during one or more of the cleaning procedures. In addition, the cleaning chemistry/agents, the spin rates, the flow rates, and/or the flow directions can change as the position and/or speed of the edge bead removal subsystem is changed during one or more of the cleaning procedures. In various examples, the cleaning chemistry/agents, the spin rates, the flow rates, and/or the flow directions can change as the edge bead removal subsystem is moved towards the wafer edge, or as the edge bead removal subsystem is moved away from the wafer edge.
In some examples, a first set of cleaning fluids and/or gasses can be provided to at least one wafer surface proximate the wafer edge using a first set of directed flows created using one or more of the first flow ports and/or one or more of the second flow ports during a second time, the wafer can be rotated at a second speed during the second time and the edge-bead removal subsystem can be moved from the first location to a second location during the second time. In addition, a first set of residual cleaning fluids and/or gasses can be removed from one or more surfaces of the wafer proximate the wafer edge using one or more additional directed flows during the second time, and the first set of residual cleaning fluids and/or gasses can comprise edge-bead material and/or edge-bead residue. The edge-bead removal subsystem can be configured to provide the one or more additional directed flows away from the one or more surfaces of the wafer using one or more of the first flow ports and/or one or more of the second flow ports. Alternatively, the removal procedure can be performed using one or more exhaust ports and/or collection devices.
In 830, in some edge-bead removal sequences, one or more rinsing, and/or drying procedures can be performed. Alternatively, one or more rinsing and/or drying procedures may not be required. When rinsing agents and/or drying agents are required, one or more flow controllers can be used to provide one or more rinsing agents and/or drying agents in one or more additional directed flows onto the wafer edge and/or other wafer surfaces, and one or more flow controllers can be used to remove one or more rinsing agents, drying agents, and/or edge bead residue using one or more directed flows away from one or more of the wafer surfaces. During rinsing and/or drying procedures, the rinsing agents, the drying agents, the spin rates, the flow rates, the position and/or speed of the edge bead removal subsystem, and processing times can be determined by a process recipe, and the rinsing chemistry/agents, the drying chemistry/agents, the spin rates, the flow rates, the position and/or speed of the edge bead removal subsystem can change during one or more of the rinsing and/or drying procedures. In addition, the rinsing chemistry/agents, the drying chemistry/agents, the spin rates, the flow rates, and/or the flow directions can change as the position and/or speed of the edge bead removal subsystem is changed during one or more of the rinsing and/or drying procedures. In various examples, the rinsing chemistry/agents, the drying chemistry/agents, the spin rates, the flow rates, and/or the flow directions can change as the edge bead removal subsystem is moved towards the wafer edge, or as the edge bead removal subsystem is moved away from the wafer edge.
In some examples, a first set of rinsing agents and/or gasses can be provided to at least one wafer surface proximate the wafer edge using a first set of directed flows created using one or more of the first flow ports and/or one or more of the second flow ports during a rinse time, the wafer can be rotated at a rinse-related speed during the rinse time and the edge-bead removal subsystem can be moved from one location to another location during the rinse time. In addition, a first set of residual rinsing fluids and/or gasses can be removed from one or more surfaces of the wafer proximate the wafer edge using one or more additional directed flows during the rinse time, and the first set of residual rinsing fluids and/or gasses can comprise edge-bead material and/or edge-bead residue. The edge-bead removal subsystem can be configured to provide the one or more additional directed flows away from the one or more surfaces of the wafer using one or more of the first flow ports and/or one or more of the second flow ports. Alternatively, the removal procedure can be performed using one or more exhaust ports and/or collection devices.
In 835, a query can be performed to determine if the edge-bead material has been removed. When the edge bead has not been removed, procedure 800 can branch to 840. When edge bead has been removed, procedure 800 can branch to 845. In some embodiments, a first processing state can be determined for the wafer, the first processing state being determined using a removal amount; the wafer can be removed from the processing chamber if the first processing state is a first value (total removal); and one or more corrective actions can be performed if the first processing state is a second value (only partial removal).
In 840, one or more corrective actions can be performed. Corrective actions can include cleaning procedures, rinsing procedures, drying procedures, measuring procedures, inspection procedures, or storage procedures, or any combination thereof. For example, the wafer can be re-processed using the same or a different edge bead removal sequence and/or system.
In 845, the cleaned wafer can be removed from edge bead removal chamber.
Some edge bead removal sequences can include one or more procedures for determining a first wafer position when the wafer is rotated at a first speed for a first time, and one or more procedures for positioning the edge bead removal subsystem at a first location proximate the wafer edge that can be determined using the first wafer position during the first time. For example, measuring devices can be configured and used to determine wafer position and to position the edge bead removal subsystem. Alternately, the wafer may be stopped or not rotated during the first time. For example, the edge-bead material can include polymer residue, photoresist material, low-k, ultra-low-k material, or metallic material, or combination thereof.
In first exemplary sequences: a first wafer position can be determined as the wafer is rotated at a first speed for a first time; the edge bead removal subsystem can be positioned at a first location proximate the wafer edge during the first time, and the first location can be determined using the first wafer position; a first amount of a first cleaning fluid or agent can be applied to a first outer surface of the wafer using one or more first flow ports in the first flow controller during a second time, and the wafer can be rotated at a second speed during the second time; a second amount of a second cleaning fluid or agent can be applied to a second outer surface of the wafer using one or more second flow ports in the second flow controller during a third time, and the wafer can be rotated at a third speed during the third time; and the wafer rotation can be stopped during a fourth time.
In second exemplary sequences: a first wafer position can be determined as the wafer is rotated at a first speed for a first time; the edge bead removal subsystem can be positioned at a first location proximate the wafer edge during the first time, and the first location can be determined using the first wafer position; a first amount of a first cleaning fluid or agent can be applied to a first outer surface of the wafer using one or more first flow ports in the first flow controller during a second time, and the wafer can be rotated at a second speed during the second time; the edge bead removal subsystem can be positioned at a second location proximate the wafer edge, and the second location can be determined using the first wafer position and/or the first location; a second amount of a second cleaning fluid or agent can be applied to a second outer surface of the wafer using one or more second flow ports in the second flow controller during a third time, and the wafer can be rotated at a third speed during the third time; and the wafer rotation can be stopped during a fourth time.
In third exemplary sequences: a first wafer position can be determined as the wafer is rotated at a first speed for a first time; the edge bead removal subsystem can be positioned at a first location proximate the wafer edge during the first time, and the first location can be determined using the first wafer position; a first amount of a first cleaning agent can be applied to a first outer surface of the wafer using one or more first flow ports in the first flow controller during a second time, and the wafer can be rotated at a second speed during the second time; a second amount of a second cleaning fluid or agent can be applied to a second outer surface of the wafer using one or more second flow ports in the second flow controller during a third time, and the wafer can be rotated at a third speed during the third time; a first amount of a first rinsing agent can be applied to one or more outer surfaces of the wafer using one or more flow ports in one or more flow controllers during a fourth time, and the wafer can be rotated at a fourth speed during the fourth time; and the wafer rotation can be stopped during a fifth time.
In fourth exemplary sequences: a first wafer position can be determined as the wafer is rotated at a first speed for a first time; the edge bead removal subsystem can be positioned at a first location proximate the wafer edge during the first time, and the first location can be determined using the first wafer position; a first amount of a first cleaning fluid or agent can be applied to a first outer surface of the wafer using one or more first flow ports in the first flow controller during a second time, and the wafer can be rotated at a second speed during the second time; the edge bead removal subsystem can be positioned at a second location proximate the wafer edge, and the second location can be determined using the first wafer position and/or the first location; a second amount of a second cleaning fluid or agent can be applied to a second outer surface of the wafer using one or more second flow ports in the second flow controller during a third time, and the wafer can be rotated at a third speed during the third time; the edge bead removal subsystem can be positioned at a third location proximate the wafer edge, and the third location can be determined using the first wafer position the first location, the second location, or any combination thereof; a first amount of a first rinsing agent can be applied to one or more outer surfaces of the wafer using one or more flow ports in one or more flow controllers during a fourth time, and the wafer can be rotated at a fourth speed during the fourth time; the wafer rotation can be stopped during a fifth time.
In fifth exemplary sequences: a first wafer position can be determined as the wafer is rotated at a first speed for a first time; the edge bead removal subsystem can be positioned at a first location proximate the wafer edge during the first time, and the first location can be determined using the first wafer position; a first amount of a first cleaning fluid or agent can be applied to a first outer surface of the wafer using one or more first flow ports in the first flow controller during a second time, and the wafer can be rotated at a second speed during the second time; a second amount of a second cleaning fluid or agent can be applied to a second outer surface of the wafer using one or more second flow ports in the second flow controller during a third time, and the wafer can be rotated at a third speed during the third time; a first amount of a first drying agent can be applied to one or more outer surfaces of the wafer using one or more flow ports in one or more flow controllers during a fourth time, and the wafer can be rotated at a fourth speed during the fourth time; and the wafer rotation can be stopped during a fifth time.
In sixth exemplary sequences: a first wafer position can be determined as the wafer is rotated at a first speed for a first time; the edge bead removal subsystem can be positioned at a first location proximate the wafer edge during the first time, and the first location can be determined using the first wafer position; a first amount of a first cleaning fluid or agent can be applied to a first outer surface of the wafer using one or more first flow ports in the first flow controller during a second time, and the wafer can be rotated at a second speed during the second time; the edge bead removal subsystem can be positioned at a second location proximate the wafer edge, and the second location can be determined using the first wafer position and/or the first location; a second amount of a second cleaning fluid or agent can be applied to a second outer surface of the wafer using one or more second flow ports in the second flow controller during a third time, and the wafer can be rotated at a third speed during the third time; the edge bead removal subsystem can be positioned at a third location proximate the wafer edge, and the third location can be determined using the first wafer position the first location, the second location, or any combination thereof; a first amount of a first drying agent can be applied to one or more outer surfaces of the wafer using one or more flow ports in one or more flow controllers during a fourth time, and the wafer can be rotated at a fourth speed during the fourth time; the wafer rotation can be stopped during a fifth time.
In seventh exemplary sequences: a first wafer position can be determined as the wafer is rotated at a first speed for a first time; the edge bead removal subsystem can be positioned at a first location proximate the wafer edge during the first time, and the first location can be determined using the first wafer position; a first amount of a first cleaning fluid or agent can be applied to two or more outer surfaces of the wafer using one or more flow ports in two or more flow controllers during a second time, and the wafer can be rotated at a second speed during the second time, and the edge bead removal subsystem can be moved from the first location to a second location during the second time; the edge bead removal subsystem can be re-positioned at the first location after the second time; a first amount of a first rinsing agent can be applied to two or more outer surfaces of the wafer using one or more flow ports in one or more flow controllers during a third time, the wafer can be rotated at a third speed during the third time, and the edge bead removal subsystem can be moved from the first location to a third location during the third time; and the wafer rotation can be stopped during a fourth time.
In eighth exemplary sequences: a first wafer position can be determined as the wafer is rotated at a first speed for a first time; the edge bead removal subsystem can be positioned at a first location proximate the wafer edge during the first time, and the first location can be determined using the first wafer position; a first amount of a first cleaning fluid or agent can be applied to two or more outer surfaces of the wafer using one or more flow ports in two or more flow controllers during a second time, and the wafer can be rotated at a second speed during the second time, and the edge bead removal subsystem can be moved from the first location to a second location during the second time; the edge bead removal subsystem can be re-positioned at the first location after the second time; a first amount of a first drying agent can be applied to two or more outer surfaces of the wafer using one or more flow ports in one or more flow controllers during a third time, the wafer can be rotated at a third speed during the third time, and the edge bead removal subsystem can be moved from the first location to a third location during the third time; and the wafer rotation can be stopped during a fourth time.
In ninth exemplary sequences: a first wafer position can be determined as the wafer is rotated at a first speed for a first time; the edge bead removal subsystem can be positioned at a first location proximate the wafer edge during the first time, and the first location can be determined using the first wafer position; a first amount of a first cleaning fluid or agent can be applied to two or more outer surfaces of the wafer using one or more flow ports in two or more flow controllers during a second time, and the wafer can be rotated at a second speed during the second time, and the edge bead removal subsystem can be moved from the first location to a second location during the second time; the edge bead removal subsystem can be re-positioned at the first location after the second time; a second amount of a second cleaning fluid or agent can be applied to two or more outer surfaces of the wafer using one or more flow ports in one or more flow controllers during a third time, the wafer can be rotated at a third speed during the third time, and the edge bead removal subsystem can be moved from the first location to a third location during the third time; and the wafer rotation can be stopped during a fourth time.
In still other exemplary sequences: a first wafer position can be determined as the wafer is rotated at a first speed for a first time; the edge bead removal subsystem can be positioned at a first location proximate the wafer edge during the first time, and the first location can be determined using the first wafer position; a first amount of a first cleaning fluid or agent can be applied to two or more outer surfaces of the wafer using one or more flow ports in two or more flow controllers during a second time, the wafer can be rotated at a second speed during the second time, and the edge bead removal subsystem can be moved from the first location to a second location during the second time; one or more fluids and/or gasses can be removed from the two or more outer surfaces of the wafer using one or more additional flow ports in the flow controllers during the second time, and the one or more fluids and/or gasses can include edge bead material and cleaning material; the edge bead removal subsystem can be re-positioned at the first location after the second time; a first amount of a first rinsing agent can be applied to two or more of the outer surfaces of the wafer using one or more flow ports in one or more flow controllers during a third time, the wafer can be rotated at a third speed during the third time, and the edge bead removal subsystem can be moved from the first location to a third location during the third time; one or more additional fluids and/or gasses can be removed from the two or more outer surfaces of the wafer using one or more additional flow ports in the flow controllers during the third time, and the one or more additional fluids and/or gasses comprise additional edge bead material; and the wafer rotation can be stopped during a fourth time.
The edge bead removal sequences of the invention are faster and provide a substantially smaller amount of foreign material. The various steps in the edge bead removal sequences can have durations that can vary from approximately 0.1 second to approximately 60 seconds, the flow rates for liquids can vary from approximately 0 milliliter/second to approximately 10 milliliter/second, and the flow rates for gasses can vary from approximately zero sccm to approximately 100 sccm.
In some embodiments, edge bead removal system can be configured with a washing means to clean one or more of the cleaning assemblies and associated elements. For example, a test wafer can be held and spun at a low speed during a cleaning time specified in a process recipe, and one or more flow ports in the edge bead removal system can dispense a solvent to clean the cleaning space and the other flow ports.
One or more of the controllers described herein may be coupled to a processing system controller (not shown) capable of providing data to the edge-bead removal system. The data can include wafer information, layer information, process information, and metrology information. Wafer information can include composition data, size data, thickness data, and temperature data. Layer information can include the number of layers, the composition of the layers, and the thickness of the layers. Process information can include data concerning previous steps and the current step. Metrology information can include optical digital profile data, such as critical dimension (CD) data, profile data, and uniformity data, and optical data, such as refractive index (n) data and extinction coefficient (k) data. For example, CD data and profile data can include information for features and open areas in one or more layers, and can include uniformity data. Each controller may comprise a microprocessor, a memory (e.g., volatile and/or non-volatile memory), and a digital I/O port. A program stored in the memory may be utilized to control the aforementioned components of an edge-bead removal system according to a process recipe. A controller may be configured to analyze the process data, to compare the process data with target process data, and to use the comparison to change a process and/or control the processing system components.
In some embodiments, one or more of the flow ports can be removably coupled to a flow controller to allow the flow ports to be removed, cleaned, and/or replaced during maintenance procedures. Flow controllers can be used to control the types of fluids and/or gasses provided to the flow ports, and the flow rates for the supplied fluids and/or gasses.
The system and methods of the invention can be used without damaging and/or altering the semiconductor materials, dielectric materials, low-k materials, and ultra-low-k materials.
In other embodiments, one or more of the flow ports can produce a spray pattern, and the spray pattern can be controlled and can be used during a self-cleaning procedure. For example, a fully automated self-cleaning process can be implemented to minimize human intervention and potential error. If customer defect levels require the edge-bead removal subsystem to be cleaned periodically, this can be programmed to occur. Down time and productivity lost due to Preventative Maintenance (PM) cleaning activities are minimized since the fully automated cleaning process/design allows the cleaning cycle to occur without stopping the entire tool. In addition, since the tools is not “opened” or disassembled, no post cleaning process testing (verification) is required. Furthermore, maintenance personnel are not exposed to solvent vapors, polymer residues or potential lifting or handling injuries since the components are not removed and/or cleaned by maintenance personnel. In other cases, one or more of the edge-bead removal subsystem components may be cleaned using external cleaning procedures. The self-cleaning frequency and the self-cleaning process can be programmable and can be executed based on time, number of wafers processed or exhaust values (alarm condition or minimum exhaust value measured during processing). Nitrogen or any other gas can also be used during a self-cleaning step.
While the present invention has been illustrated by a description of various embodiments and while these embodiments have been described in considerable detail, it is not the intention of the applicants to restrict or in any way limit the scope of the appended claims to such detail. Additional advantages and modifications will readily appear to those skilled in the art. The invention in its broader aspects is therefore not limited to the specific details, representative system and methods, and illustrative examples shown and described. Accordingly, departures may be made from such details without departing from the scope of applicants' general inventive concept.
