Thorsten Lill

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Non-elastomeric, non-polymeric, non-metallic membrane valves for se...
- Patent number 12,253,190
- Issue date Mar 18, 2025
- Lam Research Corporation
- Mariusch Gregor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resistive random access memory with preformed filaments
- Patent number 12,127,486
- Issue date Oct 22, 2024
- Lam Research Corporation
- Hyungsuk Yoon
Information Patent Grant
Turbomolecular pump and cathode assembly for etching reactor
- Patent number 12,106,946
- Issue date Oct 1, 2024
- Lam Research Corporation
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stack simplification for high aspect ratio patterning and vert...
- Patent number 12,080,592
- Issue date Sep 3, 2024
- Lam Research Corporation
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching with sidewall cleaning
- Patent number 12,029,133
- Issue date Jul 2, 2024
- Lam Research Corporation
- Thorsten Lill
- G11 - INFORMATION STORAGE
Information Patent Grant
Conformal damage-free encapsulation of chalcogenide materials
- Patent number 11,832,533
- Issue date Nov 28, 2023
- Lam Research Corporation
- James Samuel Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Non-elastomeric, non-polymeric, non-metallic membrane valves for se...
- Patent number 11,796,085
- Issue date Oct 24, 2023
- Lam Research Corporation
- Mariusch Gregor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned vertical integration of three-terminal memory devices
- Patent number 11,792,987
- Issue date Oct 17, 2023
- Lam Research Corporation
- Thorsten Lill
Information Patent Grant
Electron excitation atomic layer etch
- Patent number 11,637,022
- Issue date Apr 25, 2023
- Lam Research Corporation
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Predicting etch characteristics in thermal etching and atomic layer...
- Patent number 11,520,953
- Issue date Dec 6, 2022
- Lam Research Corporation
- Thorsten Lill
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Thermal atomic layer etch with rapid temperature cycling
- Patent number 11,380,556
- Issue date Jul 5, 2022
- Lam Research Corporation
- Theodoros Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching utilizing cryogenic wafer temperatures
- Patent number 11,289,306
- Issue date Mar 29, 2022
- Lam Research Corporation
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal damage-free encapsulation of chalcogenide materials
- Patent number 11,239,420
- Issue date Feb 1, 2022
- Lam Research Corporation
- James Samuel Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Internal plasma grid for semiconductor fabrication
- Patent number 11,171,021
- Issue date Nov 9, 2021
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion injector and lens system for ion beam milling
- Patent number 11,062,920
- Issue date Jul 13, 2021
- Lam Research Corporation
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining process rate
- Patent number 11,056,322
- Issue date Jul 6, 2021
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etch without need for wafer tilt or rotation
- Patent number 10,998,167
- Issue date May 4, 2021
- Lam Research Corporation
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etch without need for wafer tilt or rotation
- Patent number 10,825,652
- Issue date Nov 3, 2020
- Lam Research Corporation
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active showerhead
- Patent number 10,804,079
- Issue date Oct 13, 2020
- Lam Research Corporation
- Mariusch Gregor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt etch back
- Patent number 10,784,086
- Issue date Sep 22, 2020
- Lam Research Corporation
- Jialing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching using a combination of plasma and vapor treatm...
- Patent number 10,784,118
- Issue date Sep 22, 2020
- Lam Research Corporation
- Andreas Fischer
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Dry plasma etch method to pattern MRAM stack
- Patent number 10,749,103
- Issue date Aug 18, 2020
- Lam Research Corporation
- Samantha Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer etching 3D structures: Si and SiGe and Ge smoothness o...
- Patent number 10,727,073
- Issue date Jul 28, 2020
- Lam Research Corporation
- Samantha Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer etching methods and apparatus
- Patent number 10,692,724
- Issue date Jun 23, 2020
- Lam Research Corporation
- David Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Differentially pumped reactive gas injector
- Patent number 10,580,628
- Issue date Mar 3, 2020
- Lam Research Corporation
- Ivan L. Berry
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control of directionality in atomic layer etching
- Patent number 10,559,475
- Issue date Feb 11, 2020
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrating atomic scale processes: ALD (atomic layer deposition) a...
- Patent number 10,515,816
- Issue date Dec 24, 2019
- Lam Research Corporation
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Component of a plasma processing apparatus having a protective in s...
- Patent number 10,497,544
- Issue date Dec 3, 2019
- Lam Research Corporation
- Harmeet Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Use of ion beam etching to generate gate-all-around structure
- Patent number 10,483,085
- Issue date Nov 19, 2019
- Lam Research Corporation
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling ion energy within a plasma chamber
- Patent number 10,424,461
- Issue date Sep 24, 2019
- Lam Research Corporation
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...
- Publication number 20240387258
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND APPARATUSES FOR PROCESSING CHALCOGENIDES
- Publication number 20240381790
- Publication date Nov 14, 2024
- LAM RESEARCH CORPORATION
- John Hoang
Information Patent Application
TURBOMOLECULAR PUMP AND CATHODE ASSEMBLY FOR ETCHING REACTOR
- Publication number 20240355596
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING WITH SIDEWALL CLEANING
- Publication number 20240315141
- Publication date Sep 19, 2024
- LAM RESEARCH CORPORATION
- Thorsten LILL
- G11 - INFORMATION STORAGE
Information Patent Application
NON-ELASTOMERIC, NON-POLYMERIC, NON-METALLIC MEMBRANE VALVES FOR SE...
- Publication number 20240044422
- Publication date Feb 8, 2024
- LAM RESEARCH CORPORATION
- Mariusch Gregor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING
- Publication number 20230326761
- Publication date Oct 12, 2023
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON EXCITATION ATOMIC LAYER ETCH
- Publication number 20230298904
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING OF A SEMICONDUCTOR, A METAL, OR A METAL OXIDE...
- Publication number 20230274939
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Thorsten Bernd Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING OF INDIUM GALLIUM ZINC OXIDE
- Publication number 20230274949
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Aaron Lynn Routzahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTION OF CHANNEL LAYER IN THREE-TERMINAL VERTICAL MEMORY STRUC...
- Publication number 20230143057
- Publication date May 11, 2023
- LAM RESEARCH CORPORATION
- John HOANG
Information Patent Application
ATOMIC LAYER ETCHING OF MOLYBDENUM
- Publication number 20230093011
- Publication date Mar 23, 2023
- LAM RESEARCH CORPORATION
- Andreas Fischer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING
- Publication number 20220293431
- Publication date Sep 15, 2022
- LAM RESEARCH CORPORATION
- Theodoros Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-ELASTOMERIC, NON-POLYMERIC, NON-METALLIC MEMBRANE VALVES FOR SE...
- Publication number 20220252183
- Publication date Aug 11, 2022
- LAM RESEARCH CORPORATION
- Mariusch Gregor
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
TURBOMOLECULAR PUMP AND CATHODE ASSEMBLY FOR ETCHING REACTOR
- Publication number 20220186734
- Publication date Jun 16, 2022
- LAM RESEARCH CORPORATION
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DENSITY, CONTROLLED INTEGRATED CIRCUITS FACTORY
- Publication number 20220171370
- Publication date Jun 2, 2022
- LAM RESEARCH CORPORATION
- Thorsten LILL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCH TOOL FOR HIGH ASPECT RATIO ETCHING
- Publication number 20220165546
- Publication date May 26, 2022
- LAM RESEARCH CORPORATION
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING WITH SIDEWALL CLEANING
- Publication number 20220131071
- Publication date Apr 28, 2022
- LAM RESEARCH CORPORATION
- Thorsten Lill
- G11 - INFORMATION STORAGE
Information Patent Application
CONFORMAL DAMAGE-FREE ENCAPSULATION OF CHALCOGENIDE MATERIALS
- Publication number 20220115592
- Publication date Apr 14, 2022
- LAM RESEARCH CORPORATION
- James Samuel Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESISTIVE RANDOM ACCESS MEMORY WITH PREFORMED FILAMENTS
- Publication number 20220069218
- Publication date Mar 3, 2022
- LAM RESEARCH CORPORATION
- Hyungsuk YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...
- Publication number 20220051938
- Publication date Feb 17, 2022
- LAM RESEARCH CORPORATION
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED VERTICAL INTEGRATION OF THREE-TERMINAL MEMORY DEVICES
- Publication number 20210391355
- Publication date Dec 16, 2021
- LAM RESEARCH CORPORATION
- Thorsten LILL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON EXCITATION ATOMIC LAYER ETCH
- Publication number 20210280433
- Publication date Sep 9, 2021
- LAM RESEARCH CORPORATION
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING
- Publication number 20210104414
- Publication date Apr 8, 2021
- LAM RESEARCH CORPORATION
- Theo Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING METHODS AND APPARATUS
- Publication number 20200312670
- Publication date Oct 1, 2020
- LAM RESEARCH CORPORATION
- David Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20200161139
- Publication date May 21, 2020
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL DAMAGE-FREE ENCAPSULATION OF CHALCOGENIDE MATERIALS
- Publication number 20200066987
- Publication date Feb 27, 2020
- LAM RESEARCH CORPORATION
- James Samuel Sims
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE SHOWERHEAD
- Publication number 20190371573
- Publication date Dec 5, 2019
- LAM RESEARCH CORPORATION
- Mariusch Gregor
- G01 - MEASURING TESTING
Information Patent Application
PREDICTING ETCH CHARACTERISTICS IN THERMAL ETCHING AND ATOMIC LAYER...
- Publication number 20190340316
- Publication date Nov 7, 2019
- LAM RESEARCH CORPORATION
- Thorsten Lill
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DRY PLASMA ETCH METHOD TO PATTERN MRAM STACK
- Publication number 20190312194
- Publication date Oct 10, 2019
- LAM RESEARCH CORPORATION
- Samantha Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION BEAM ETCH WITHOUT NEED FOR WAFER TILT OR ROTATION
- Publication number 20190237298
- Publication date Aug 1, 2019
- LAM RESEARCH CORPORATION
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS

Thorsten Lill

Person

Patents Grantslast 30 patents

Non-elastomeric, non-polymeric, non-metallic membrane valves for se...

Resistive random access memory with preformed filaments

Turbomolecular pump and cathode assembly for etching reactor

Film stack simplification for high aspect ratio patterning and vert...

Ion beam etching with sidewall cleaning

Conformal damage-free encapsulation of chalcogenide materials

Non-elastomeric, non-polymeric, non-metallic membrane valves for se...

Self-aligned vertical integration of three-terminal memory devices

Electron excitation atomic layer etch

Predicting etch characteristics in thermal etching and atomic layer...

Thermal atomic layer etch with rapid temperature cycling

Ion beam etching utilizing cryogenic wafer temperatures

Conformal damage-free encapsulation of chalcogenide materials

Internal plasma grid for semiconductor fabrication

Ion injector and lens system for ion beam milling

Method and apparatus for determining process rate

Ion beam etch without need for wafer tilt or rotation

Ion beam etch without need for wafer tilt or rotation

Active showerhead

Cobalt etch back

Atomic layer etching using a combination of plasma and vapor treatm...

Dry plasma etch method to pattern MRAM stack

Atomic layer etching 3D structures: Si and SiGe and Ge smoothness o...

Atomic layer etching methods and apparatus

Differentially pumped reactive gas injector

Control of directionality in atomic layer etching

Integrating atomic scale processes: ALD (atomic layer deposition) a...

Component of a plasma processing apparatus having a protective in s...

Use of ion beam etching to generate gate-all-around structure

Controlling ion energy within a plasma chamber

Patents Applicationslast 30 patents

FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...

TECHNIQUES AND APPARATUSES FOR PROCESSING CHALCOGENIDES

TURBOMOLECULAR PUMP AND CATHODE ASSEMBLY FOR ETCHING REACTOR

ION BEAM ETCHING WITH SIDEWALL CLEANING

NON-ELASTOMERIC, NON-POLYMERIC, NON-METALLIC MEMBRANE VALVES FOR SE...

ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING

ELECTRON EXCITATION ATOMIC LAYER ETCH

ATOMIC LAYER ETCHING OF A SEMICONDUCTOR, A METAL, OR A METAL OXIDE...

ETCHING OF INDIUM GALLIUM ZINC OXIDE

PROTECTION OF CHANNEL LAYER IN THREE-TERMINAL VERTICAL MEMORY STRUC...

ATOMIC LAYER ETCHING OF MOLYBDENUM

THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING

NON-ELASTOMERIC, NON-POLYMERIC, NON-METALLIC MEMBRANE VALVES FOR SE...

TURBOMOLECULAR PUMP AND CATHODE ASSEMBLY FOR ETCHING REACTOR

HIGH DENSITY, CONTROLLED INTEGRATED CIRCUITS FACTORY

PLASMA ETCH TOOL FOR HIGH ASPECT RATIO ETCHING

ION BEAM ETCHING WITH SIDEWALL CLEANING

CONFORMAL DAMAGE-FREE ENCAPSULATION OF CHALCOGENIDE MATERIALS

RESISTIVE RANDOM ACCESS MEMORY WITH PREFORMED FILAMENTS

FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...

SELF-ALIGNED VERTICAL INTEGRATION OF THREE-TERMINAL MEMORY DEVICES

ELECTRON EXCITATION ATOMIC LAYER ETCH

THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING

ATOMIC LAYER ETCHING METHODS AND APPARATUS

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

CONFORMAL DAMAGE-FREE ENCAPSULATION OF CHALCOGENIDE MATERIALS

ACTIVE SHOWERHEAD

PREDICTING ETCH CHARACTERISTICS IN THERMAL ETCHING AND ATOMIC LAYER...

DRY PLASMA ETCH METHOD TO PATTERN MRAM STACK

ION BEAM ETCH WITHOUT NEED FOR WAFER TILT OR ROTATION