Tim Stachowiak

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming a photo-cured layer
- Patent number 12,105,417
- Issue date Oct 1, 2024
- Canon Kabushiki Kaisha
- Teresa Perez Estrada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition
- Patent number 11,981,759
- Issue date May 14, 2024
- Canon Kabushiki Kaisha
- Fen Wan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Planarization method and photocurable composition
- Patent number 11,752,519
- Issue date Sep 12, 2023
- Canon Kabushiki Kaisha
- Toshiki Ito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Curable composition for making cured layer with high thermal stability
- Patent number 11,434,313
- Issue date Sep 6, 2022
- Canon Kabushiki Kaisha
- Fei Li
- B32 - LAYERED PRODUCTS
Information Patent Grant
Photocurable composition for forming cured layers with high thermal...
- Patent number 11,434,312
- Issue date Sep 6, 2022
- Canon Kabushiki Kaisha
- Fen Wan
- B32 - LAYERED PRODUCTS
Information Patent Grant
Method of forming a cured layer by controlling drop spreading
- Patent number 11,249,397
- Issue date Feb 15, 2022
- Canon Kabushiki Kaisha
- Niyaz Khusnatdinov
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Pattern forming method and methods for manufacturing processed subs...
- Patent number 10,935,884
- Issue date Mar 2, 2021
- Canon Kabushiki Kaisha
- Keiko Chiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method as well as production methods for processed...
- Patent number 10,883,006
- Issue date Jan 5, 2021
- Canon Kabushiki Kaisha
- Keiko Chiba
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Pattern forming method as well as production methods for processed...
- Patent number 10,845,700
- Issue date Nov 24, 2020
- Canon Kabushiki Kaisha
- Keiko Chiba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method as well as production methods for processed...
- Patent number 10,754,245
- Issue date Aug 25, 2020
- Canon Kabushiki Kaisha
- Toshiki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method as well as production methods for processed...
- Patent number 10,754,244
- Issue date Aug 25, 2020
- Canon Kabushiki Kaisha
- Toshiki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate pretreatment for reducing fill time in nanoimprint lithog...
- Patent number 10,668,677
- Issue date Jun 2, 2020
- Canon Kabushiki Kaisha
- Niyaz Khusnatdinov
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Curing substrate pretreatment compositions in nanoimprint lithography
- Patent number 10,620,539
- Issue date Apr 14, 2020
- Canon Kabushiki Kaisha
- Timothy Brian Stachowiak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint resist with fluorinated photoinitiator and substrate pretre...
- Patent number 10,509,313
- Issue date Dec 17, 2019
- Canon Kabushiki Kaisha
- Weijun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate pretreatment and etch uniformity in nanoimprint lithography
- Patent number 10,488,753
- Issue date Nov 26, 2019
- Canon Kabushiki Kaisha
- Timothy Stachowiak
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Fluid droplet methodology and apparatus for imprint lithography
- Patent number 10,481,491
- Issue date Nov 19, 2019
- Canon Kabushiki Kaisha
- Edward Brian Fletcher
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Imprint resist with fluorinated photoinitiator and substrate pretre...
- Patent number 10,451,966
- Issue date Oct 22, 2019
- Canon Kabushiki Kaisha
- Weijun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate pretreatment compositions for nanoimprint lithography
- Patent number 10,317,793
- Issue date Jun 11, 2019
- Canon Kabushiki Kaisha
- Timothy Brian Stachowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanoimprint lithography adhesion layer
- Patent number 10,189,188
- Issue date Jan 29, 2019
- Canon Kabushiki Kaisha
- Fen Wan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint resist and substrate pretreatment for reducing fill time in...
- Patent number 10,134,588
- Issue date Nov 20, 2018
- Canon Kabushiki Kaisha
- Weijun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removing substrate pretreatment compositions in nanoimprint lithogr...
- Patent number 10,095,106
- Issue date Oct 9, 2018
- Canon Kabushiki Kaisha
- Timothy Brian Stachowiak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanostructured compositions containing nanoparticles and carbon nan...
- Patent number 9,481,798
- Issue date Nov 1, 2016
- Lockheed Martin Corporation
- Timothy B. Stachowiak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Nanoparticle paste formulations and methods for production and use...
- Patent number 9,005,483
- Issue date Apr 14, 2015
- Lockheed Martin Corporation
- Alfred A. Zinn
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Nanostructured compositions containing nanoparticles and carbon nan...
- Patent number 8,834,746
- Issue date Sep 16, 2014
- Lockheed Martin Corporation
- Timothy B. Stachowiak
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING...
- Publication number 20240191088
- Publication date Jun 13, 2024
- Canon Kabushiki Kaisha
- Yuto ITO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PHOTOCURABLE COMPOSITION
- Publication number 20240052183
- Publication date Feb 15, 2024
- Canon Kabushiki Kaisha
- Fei LI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PHOTOCURABLE COMPOSITION
- Publication number 20230374167
- Publication date Nov 23, 2023
- Canon Kabushiki Kaisha
- Fen Wan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION
- Publication number 20230330702
- Publication date Oct 19, 2023
- Canon Kabushiki Kaisha
- Toshiki Ito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PHOTOCURABLE COMPOSITION INCLUDING A NON-REACTIVE POLYMER
- Publication number 20230257496
- Publication date Aug 17, 2023
- Canon Kabushiki Kaisha
- Timothy Brian STACHOWIAK
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOCURABLE COMPOSITION INCLUDING A REACTIVE POLYMER
- Publication number 20230257617
- Publication date Aug 17, 2023
- Canon Kabushiki Kaisha
- Fen WAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF FORMING A PHOTO-CURED LAYER
- Publication number 20230103545
- Publication date Apr 6, 2023
- Canon Kabushiki Kaisha
- Teresa Perez Estrada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CURABLE COMPOSITION FOR MAKING CURED LAYER WITH HIGH THERMAL STABILITY
- Publication number 20220185915
- Publication date Jun 16, 2022
- Canon Kabushiki Kaisha
- Fei LI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PHOTOCURABLE COMPOSITION FOR FORMING CURED LAYERS WITH HIGH THERMAL...
- Publication number 20220185914
- Publication date Jun 16, 2022
- Canon Kabushiki Kaisha
- Fen WAN
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION
- Publication number 20210394230
- Publication date Dec 23, 2021
- Canon Kabushiki Kaisha
- Toshiki Ito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD OF FORMING A CURED LAYER BY CONTROLLING DROP SPREADING
- Publication number 20210157236
- Publication date May 27, 2021
- Canon Kabushiki Kaisha
- Niyaz KHUSNATDINOV
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PATTERN FORMING METHOD AND METHODS FOR MANUFACTURING PROCESSED SUBS...
- Publication number 20190391484
- Publication date Dec 26, 2019
- Canon Kabushiki Kaisha
- Keiko Chiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Pretreatment for Reducing Fill Time in Nanoimprint Lithog...
- Publication number 20180272634
- Publication date Sep 27, 2018
- Canon Kabushiki Kaisha
- Niyaz Khusnatdinov
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
SUBSTRATE PRETREATMENT AND ETCH UNIFORMITY IN NANOIMPRINT LITHOGRAPHY
- Publication number 20180275511
- Publication date Sep 27, 2018
- Canon Kabushiki Kaisha
- Timothy Stachowiak
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
SUBSTRATE PRETREATMENT COMPOSITIONS FOR NANOIMPRINT LITHOGRAPHY
- Publication number 20180252999
- Publication date Sep 6, 2018
- Canon Kabushiki Kaisha
- Timothy Brian Stachowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUID DROPLET METHODOLOGY AND APPARATUS FOR IMPRINT LITHOGRAPHY
- Publication number 20180164678
- Publication date Jun 14, 2018
- Canon Kabushiki Kaisha
- Edward Brian FLETCHER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT RESIST WITH FLUORINATED PHOTOINITIATOR AND SUBSTRATE PRETRE...
- Publication number 20170371240
- Publication date Dec 28, 2017
- Canon Kabushiki Kaisha
- Weijun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOIMPRINT LITHOGRAPHY ADHESION LAYER
- Publication number 20170335150
- Publication date Nov 23, 2017
- Canon Kabushiki Kaisha
- Fen Wan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMING METHOD AS WELL AS PRODUCTION METHODS FOR PROCESSED...
- Publication number 20170285463
- Publication date Oct 5, 2017
- Canon Kabushiki Kaisha
- Toshiki Ito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMING METHOD AS WELL AS PRODUCTION METHODS FOR PROCESSED...
- Publication number 20170285464
- Publication date Oct 5, 2017
- Canon Kabushiki Kaisha
- Toshiki Ito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMING METHOD AS WELL AS PRODUCTION METHODS FOR PROCESSED...
- Publication number 20170285466
- Publication date Oct 5, 2017
- Canon Kabushiki Kaisha
- Keiko Chiba
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMING METHOD AS WELL AS PRODUCTION METHODS FOR PROCESSED...
- Publication number 20170283632
- Publication date Oct 5, 2017
- Canon Kabushiki Kaisha
- Keiko Chiba
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
REMOVING SUBSTRATE PRETREATMENT COMPOSITIONS IN NANOIMPRINT LITHOGR...
- Publication number 20170282440
- Publication date Oct 5, 2017
- Canon Kabushiki Kaisha
- Timothy Brian Stachowiak
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
CURING SUBSTRATE PRETREATMENT COMPOSITIONS IN NANOIMPRINT LITHOGRAPHY
- Publication number 20170285479
- Publication date Oct 5, 2017
- Canon Kabushiki Kaisha
- Timothy Brian Stachowiak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT RESIST AND SUBSTRATE PRETREATMENT FOR REDUCING FILL TIME IN...
- Publication number 20170287708
- Publication date Oct 5, 2017
- Canon Kabushiki Kaisha
- Weijun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PRETREATMENT FOR REDUCING FILL TIME IN NANOIMPRINT LITHOG...
- Publication number 20170068159
- Publication date Mar 9, 2017
- Canon Kabushiki Kaisha
- Niyaz Khusnatdinov
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PRETREATMENT AND ETCH UNIFORMITY IN NANOIMPRINT LITHOGRAPHY
- Publication number 20170068161
- Publication date Mar 9, 2017
- Canon Kabushiki Kaisha
- Timothy Stachowiak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PRETREATMENT FOR REDUCING FILL TIME IN NANOIMPRINT LITHOG...
- Publication number 20170066208
- Publication date Mar 9, 2017
- Canon Kabushiki Kaisha
- Niyaz Khusnatdinov
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
NANOPARTICLE PASTE FORMULATIONS AND METHODS FOR PRODUCTION AND USE...
- Publication number 20130209692
- Publication date Aug 15, 2013
- Lockheed Martin Corporation
- Alfred A. ZINN
- H01 - BASIC ELECTRIC ELEMENTS

Tim Stachowiak

Person

Patents Grantslast 30 patents

Method of forming a photo-cured layer

Photocurable composition

Planarization method and photocurable composition

Curable composition for making cured layer with high thermal stability

Photocurable composition for forming cured layers with high thermal...

Method of forming a cured layer by controlling drop spreading

Pattern forming method and methods for manufacturing processed subs...

Pattern forming method as well as production methods for processed...

Pattern forming method as well as production methods for processed...

Pattern forming method as well as production methods for processed...

Pattern forming method as well as production methods for processed...

Substrate pretreatment for reducing fill time in nanoimprint lithog...

Curing substrate pretreatment compositions in nanoimprint lithography

Imprint resist with fluorinated photoinitiator and substrate pretre...

Substrate pretreatment and etch uniformity in nanoimprint lithography

Fluid droplet methodology and apparatus for imprint lithography

Imprint resist with fluorinated photoinitiator and substrate pretre...

Substrate pretreatment compositions for nanoimprint lithography

Nanoimprint lithography adhesion layer

Imprint resist and substrate pretreatment for reducing fill time in...

Removing substrate pretreatment compositions in nanoimprint lithogr...

Nanostructured compositions containing nanoparticles and carbon nan...

Nanoparticle paste formulations and methods for production and use...

Nanostructured compositions containing nanoparticles and carbon nan...

Patents Applicationslast 30 patents

CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING...

PHOTOCURABLE COMPOSITION

PHOTOCURABLE COMPOSITION

PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION

PHOTOCURABLE COMPOSITION INCLUDING A NON-REACTIVE POLYMER

PHOTOCURABLE COMPOSITION INCLUDING A REACTIVE POLYMER

METHOD OF FORMING A PHOTO-CURED LAYER

CURABLE COMPOSITION FOR MAKING CURED LAYER WITH HIGH THERMAL STABILITY

PHOTOCURABLE COMPOSITION FOR FORMING CURED LAYERS WITH HIGH THERMAL...

PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION

METHOD OF FORMING A CURED LAYER BY CONTROLLING DROP SPREADING

PATTERN FORMING METHOD AND METHODS FOR MANUFACTURING PROCESSED SUBS...

Substrate Pretreatment for Reducing Fill Time in Nanoimprint Lithog...

SUBSTRATE PRETREATMENT AND ETCH UNIFORMITY IN NANOIMPRINT LITHOGRAPHY

SUBSTRATE PRETREATMENT COMPOSITIONS FOR NANOIMPRINT LITHOGRAPHY

FLUID DROPLET METHODOLOGY AND APPARATUS FOR IMPRINT LITHOGRAPHY

IMPRINT RESIST WITH FLUORINATED PHOTOINITIATOR AND SUBSTRATE PRETRE...

NANOIMPRINT LITHOGRAPHY ADHESION LAYER

PATTERN FORMING METHOD AS WELL AS PRODUCTION METHODS FOR PROCESSED...

PATTERN FORMING METHOD AS WELL AS PRODUCTION METHODS FOR PROCESSED...

PATTERN FORMING METHOD AS WELL AS PRODUCTION METHODS FOR PROCESSED...

PATTERN FORMING METHOD AS WELL AS PRODUCTION METHODS FOR PROCESSED...

REMOVING SUBSTRATE PRETREATMENT COMPOSITIONS IN NANOIMPRINT LITHOGR...

CURING SUBSTRATE PRETREATMENT COMPOSITIONS IN NANOIMPRINT LITHOGRAPHY

IMPRINT RESIST AND SUBSTRATE PRETREATMENT FOR REDUCING FILL TIME IN...

SUBSTRATE PRETREATMENT FOR REDUCING FILL TIME IN NANOIMPRINT LITHOG...

SUBSTRATE PRETREATMENT AND ETCH UNIFORMITY IN NANOIMPRINT LITHOGRAPHY

SUBSTRATE PRETREATMENT FOR REDUCING FILL TIME IN NANOIMPRINT LITHOG...

NANOPARTICLE PASTE FORMULATIONS AND METHODS FOR PRODUCTION AND USE...