TIMOTHY A. BRUNNER

Person

RIDGEFIELD, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Variable diffraction grating
- Patent number 11,703,771
- Issue date Jul 18, 2023
- ASML Holding N.V.
- Ali Alsaqqa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for calculating non-correctable EUV blank flatness for blank...
- Patent number 10,552,569
- Issue date Feb 4, 2020
- GLOBALFOUNDRIES Inc.
- Christina Turley
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV mask for monitoring focus in EUV lithography
- Patent number 10,012,898
- Issue date Jul 3, 2018
- International Business Machines Corporation
- Timothy Allan Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for monitoring focus in EUV lithography
- Patent number 9,921,466
- Issue date Mar 20, 2018
- International Business Machines Corporation
- Timothy Allan Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method to measure focus-dependent pattern shift in in...
- Patent number 9,899,183
- Issue date Feb 20, 2018
- GLOBALFOUNDRIES Inc.
- Lei Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using tensile mask to minimize buckling in substrate
- Patent number 9,741,581
- Issue date Aug 22, 2017
- GLOBALFOUNDRIES Inc.
- Sunit S. Mahajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for monitoring focus in EUV lithography
- Patent number 9,588,440
- Issue date Mar 7, 2017
- International Business Machines Corporation
- Timothy Allan Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
On-product focus offset metrology for use in semiconductor chip man...
- Patent number 9,411,223
- Issue date Aug 9, 2016
- GLOBALFOUNDRIES Inc.
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Differential dose and focus monitor
- Patent number 9,411,249
- Issue date Aug 9, 2016
- GLOBALFOUNDRIES Inc.
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment data based process control system
- Patent number 9,360,858
- Issue date Jun 7, 2016
- GLOBALFOUNDRIES INC.
- Christopher P. Ausschnitt
- G05 - CONTROLLING REGULATING
Information Patent Grant
Mask that provides improved focus control using orthogonal edges
- Patent number 9,310,674
- Issue date Apr 12, 2016
- International Business Machines Corporation
- Jaione Tirapu Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of predicting problematic areas for lithography i...
- Patent number 9,075,944
- Issue date Jul 7, 2015
- Mentor Graphics Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Polarization monitoring reticle design for high numerical aperture...
- Patent number 8,679,708
- Issue date Mar 25, 2014
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Grant
Test method for determining reticle transmission stability
- Patent number 8,582,078
- Issue date Nov 12, 2013
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Grant
System and method of predicting problematic areas for lithography i...
- Patent number 8,484,586
- Issue date Jul 9, 2013
- Mentor Graphics Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Polarization monitoring reticle design for high numerical aperture...
- Patent number 8,368,890
- Issue date Feb 5, 2013
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Grant
EMF correction model calibration using asymmetry factor data obtain...
- Patent number 8,271,910
- Issue date Sep 18, 2012
- International Business Machines Corporation
- Jaione Tirapu-Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fast method to model photoresist images using focus blur and resist...
- Patent number 8,238,644
- Issue date Aug 7, 2012
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of predicting problematic areas for lithography i...
- Patent number 8,239,789
- Issue date Aug 7, 2012
- International Business Machines Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photolithography focus improvement by reduction of autofocus radiat...
- Patent number 8,227,180
- Issue date Jul 24, 2012
- International Business Machines Corporation
- Timothy Allan Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing self-aligned mask, articles produced by same a...
- Patent number 8,119,322
- Issue date Feb 21, 2012
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test method for determining reticle transmission stability
- Patent number 8,023,102
- Issue date Sep 20, 2011
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Grant
System and method of predicting problematic areas for lithography i...
- Patent number 8,001,495
- Issue date Aug 16, 2011
- International Business Machines Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Radiation-sensitive composition and method of fabricating a device...
- Patent number 7,901,864
- Issue date Mar 8, 2011
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase calibration for attenuating phase-shift masks
- Patent number 7,642,016
- Issue date Jan 5, 2010
- International Business Machines Corporation
- Michael S. Hibbs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to optimize grating test pattern for lithography monitoring...
- Patent number 7,585,601
- Issue date Sep 8, 2009
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double exposure double resist layer process for forming gate patterns
- Patent number 7,473,648
- Issue date Jan 6, 2009
- International Business Machines Corporation
- Timothy A. Brunner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving grating test pattern for lithography monitoring...
- Patent number 7,455,939
- Issue date Nov 25, 2008
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus blur measurement and control method
- Patent number 7,439,001
- Issue date Oct 21, 2008
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle film optimized for immersion lithography systems with NA>1
- Patent number 7,416,820
- Issue date Aug 26, 2008
- International Business Machines Corporation
- Timothy A Brunner
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS AND METHODS FOR MULTI-EXPOSURE OF A SUBSTRATE
- Publication number 20230296986
- Publication date Sep 21, 2023
- ASML Holding N.V.
- Timothy Allan BRUNNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VARIABLE DIFFRACTION GRATING
- Publication number 20220390861
- Publication date Dec 8, 2022
- ASML Holding N.V.
- Ali ALSAQQA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CALCULATING NON-CORRECTABLE EUV BLANK FLATNESS FOR BLANK...
- Publication number 20190080038
- Publication date Mar 14, 2019
- GLOBALFOUNDRIES INC.
- Christina TURLEY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EUV MASK FOR MONITORING FOCUS IN EUV LITHOGRAPHY
- Publication number 20180074395
- Publication date Mar 15, 2018
- International Business Machines Corporation
- Timothy Allan Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE AND METHOD TO MEASURE FOCUS-DEPENDENT PATTERN SHIFT IN IN...
- Publication number 20180033590
- Publication date Feb 1, 2018
- GLOBALFOUNDRIES INC.
- Lei Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING TENSILE MASK TO MINIMIZE BUCKLING IN SUBSTRATE
- Publication number 20170200614
- Publication date Jul 13, 2017
- GLOBALFOUNDRIES INC.
- Sunit S. Mahajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MONITORING FOCUS IN EUV LITHOGRAPHY
- Publication number 20170192364
- Publication date Jul 6, 2017
- International Business Machines Corporation
- Timothy Allan Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MONITORING FOCUS IN EUV LITHOGRAPHY
- Publication number 20160238939
- Publication date Aug 18, 2016
- International Business Machines Corporation
- Timothy Allan Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK THAT PROVIDES IMPROVED FOCUS CONTROL USING ORTHOGONAL EDGES
- Publication number 20150234269
- Publication date Aug 20, 2015
- International Business Machines Corporation
- Jaione Tirapu Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIFFERENTIAL DOSE AND FOCUS MONITOR
- Publication number 20150085266
- Publication date Mar 26, 2015
- International Business Machines Corporation
- CHRISTOPHER P. AUSSCHNITT
- G01 - MEASURING TESTING
Information Patent Application
ON-PRODUCT FOCUS OFFSET METROLOGY FOR USE IN SEMICONDUCTOR CHIP MAN...
- Publication number 20140071415
- Publication date Mar 13, 2014
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...
- Publication number 20130286370
- Publication date Oct 31, 2013
- Mentor Graphics Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Polarization Monitoring Reticle Design for High Numerical Aperture...
- Publication number 20130091475
- Publication date Apr 11, 2013
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Application
ALIGNMENT DATA BASED PROCESS CONTROL SYSTEM
- Publication number 20130041494
- Publication date Feb 14, 2013
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G05 - CONTROLLING REGULATING
Information Patent Application
SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...
- Publication number 20120254812
- Publication date Oct 4, 2012
- International Business Machines Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIAT...
- Publication number 20110256486
- Publication date Oct 20, 2011
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EMF CORRECTION MODEL CALIBRATION USING ASYMMETRY FACTOR DATA OBTAIN...
- Publication number 20110239169
- Publication date Sep 29, 2011
- International Business Machines Corporation
- Jaione Tirapu-Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEST METHOD FOR DETERMINING RETICLE TRANSMISSION STABILITY
- Publication number 20110205509
- Publication date Aug 25, 2011
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...
- Publication number 20110184715
- Publication date Jul 28, 2011
- International Business Machines Corporation
- Timothy A. BRUNNER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
POLARIZATION MONITORING RETICLE DESIGN FOR HIGH NUMERICAL APERTURE...
- Publication number 20100208264
- Publication date Aug 19, 2010
- International Business Machines Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TEST METHOD FOR DETERMINING RETICLE TRANSMISSION STABILITY
- Publication number 20090262317
- Publication date Oct 22, 2009
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...
- Publication number 20090265679
- Publication date Oct 22, 2009
- International Business Machines Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIAT...
- Publication number 20090208865
- Publication date Aug 20, 2009
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOCUS BLUR MEASUREMENT AND CONTROL METHOD
- Publication number 20090011346
- Publication date Jan 8, 2009
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO OPTIMIZE GRATING TEST PATTERN FOR LITHOGRAPHY MONITORING...
- Publication number 20090011342
- Publication date Jan 8, 2009
- International Business Machines Corporation
- Timothy A. BRUNNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING SELF-ALIGNED MASK, ARTICLES PRODUCED BY SAME A...
- Publication number 20080220615
- Publication date Sep 11, 2008
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FILM OPTIMIZED FOR IMMERSION LITHOGRAPHY SYSTEMS WITH NA>1
- Publication number 20080182180
- Publication date Jul 31, 2008
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO OPTIMIZE GRATING TEST PATTERN FOR LITHOGRAPHY MONITORING...
- Publication number 20080026298
- Publication date Jan 31, 2008
- International Business Machines Corporation
- Timothy A. BRUNNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fast method to model photoresist images using focus blur and resist...
- Publication number 20070224526
- Publication date Sep 27, 2007
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Double Exposure Double Resist Layer Process For Forming Gate Patterns
- Publication number 20070212863
- Publication date Sep 13, 2007
- International Business Machines Corporation
- Timothy A. Brunner
- H01 - BASIC ELECTRIC ELEMENTS

TIMOTHY A. BRUNNER

Person

Patents Grantslast 30 patents

Variable diffraction grating

Method for calculating non-correctable EUV blank flatness for blank...

EUV mask for monitoring focus in EUV lithography

Method for monitoring focus in EUV lithography

Structure and method to measure focus-dependent pattern shift in in...

Using tensile mask to minimize buckling in substrate

Method for monitoring focus in EUV lithography

On-product focus offset metrology for use in semiconductor chip man...

Differential dose and focus monitor

Alignment data based process control system

Mask that provides improved focus control using orthogonal edges

System and method of predicting problematic areas for lithography i...

Polarization monitoring reticle design for high numerical aperture...

Test method for determining reticle transmission stability

System and method of predicting problematic areas for lithography i...

Polarization monitoring reticle design for high numerical aperture...

EMF correction model calibration using asymmetry factor data obtain...

Fast method to model photoresist images using focus blur and resist...

System and method of predicting problematic areas for lithography i...

Photolithography focus improvement by reduction of autofocus radiat...

Method for producing self-aligned mask, articles produced by same a...

Test method for determining reticle transmission stability

System and method of predicting problematic areas for lithography i...

Radiation-sensitive composition and method of fabricating a device...

Phase calibration for attenuating phase-shift masks

Method to optimize grating test pattern for lithography monitoring...

Double exposure double resist layer process for forming gate patterns

Method of improving grating test pattern for lithography monitoring...

Focus blur measurement and control method

Pellicle film optimized for immersion lithography systems with NA>1

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS AND METHODS FOR MULTI-EXPOSURE OF A SUBSTRATE

VARIABLE DIFFRACTION GRATING

METHOD FOR CALCULATING NON-CORRECTABLE EUV BLANK FLATNESS FOR BLANK...

EUV MASK FOR MONITORING FOCUS IN EUV LITHOGRAPHY

STRUCTURE AND METHOD TO MEASURE FOCUS-DEPENDENT PATTERN SHIFT IN IN...

USING TENSILE MASK TO MINIMIZE BUCKLING IN SUBSTRATE

METHOD FOR MONITORING FOCUS IN EUV LITHOGRAPHY

METHOD FOR MONITORING FOCUS IN EUV LITHOGRAPHY

MASK THAT PROVIDES IMPROVED FOCUS CONTROL USING ORTHOGONAL EDGES

DIFFERENTIAL DOSE AND FOCUS MONITOR

ON-PRODUCT FOCUS OFFSET METROLOGY FOR USE IN SEMICONDUCTOR CHIP MAN...

SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...

Polarization Monitoring Reticle Design for High Numerical Aperture...

ALIGNMENT DATA BASED PROCESS CONTROL SYSTEM

SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...

PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIAT...

EMF CORRECTION MODEL CALIBRATION USING ASYMMETRY FACTOR DATA OBTAIN...

TEST METHOD FOR DETERMINING RETICLE TRANSMISSION STABILITY

SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...

POLARIZATION MONITORING RETICLE DESIGN FOR HIGH NUMERICAL APERTURE...

TEST METHOD FOR DETERMINING RETICLE TRANSMISSION STABILITY

SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...

PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIAT...

FOCUS BLUR MEASUREMENT AND CONTROL METHOD

METHOD TO OPTIMIZE GRATING TEST PATTERN FOR LITHOGRAPHY MONITORING...

METHOD FOR PRODUCING SELF-ALIGNED MASK, ARTICLES PRODUCED BY SAME A...

PELLICLE FILM OPTIMIZED FOR IMMERSION LITHOGRAPHY SYSTEMS WITH NA>1

METHOD TO OPTIMIZE GRATING TEST PATTERN FOR LITHOGRAPHY MONITORING...

Fast method to model photoresist images using focus blur and resist...

Double Exposure Double Resist Layer Process For Forming Gate Patterns