Timothy E. Glassman

Person

Millshora, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Conformal low temperature hermetic dielectric diffusion barriers
- Patent number 12,040,226
- Issue date Jul 16, 2024
- Intel Corporation
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal low temperature hermetic dielectric diffusion barriers
- Patent number 11,670,545
- Issue date Jun 6, 2023
- Intel Corporation
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal low temperature hermetic dielectric diffusion barriers
- Patent number 11,587,827
- Issue date Feb 21, 2023
- Intel Corporation
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resistive random access memory device and methods of fabrication
- Patent number 11,489,112
- Issue date Nov 1, 2022
- Intel Corporation
- Namrata S. Asuri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resistive random access memory device with switching multi-layer st...
- Patent number 11,430,948
- Issue date Aug 30, 2022
- Intel Corporation
- Timothy Glassman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RRAM devices with reduced forming voltage
- Patent number 11,342,499
- Issue date May 24, 2022
- Intel Corporation
- Timothy E. Glassman
- G11 - INFORMATION STORAGE
Information Patent Grant
Conformal low temperature hermetic dielectric diffusion barriers
- Patent number 11,251,076
- Issue date Feb 15, 2022
- Intel Corporation
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal low temperature hermetic dielectric diffusion barriers
- Patent number 10,763,161
- Issue date Sep 1, 2020
- Intel Corporation
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal low temperature hermetic dielectric diffusion barriers
- Patent number 10,529,619
- Issue date Jan 7, 2020
- Intel Corporation
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal low temperature hermetic dielectric diffusion barriers
- Patent number 10,438,844
- Issue date Oct 8, 2019
- Intel Corporation
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal low temperature hermetic dielectric diffusion barriers
- Patent number 9,935,002
- Issue date Apr 3, 2018
- Intel Corporation
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal low temperature hermetic dielectric diffusion barriers
- Patent number 9,754,821
- Issue date Sep 5, 2017
- Intel Corporation
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-insulator-metal (MIM) capacitor with insulator stack having a...
- Patent number 9,691,839
- Issue date Jun 27, 2017
- Intel Corporation
- Nick Lindert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal low temperature hermetic dielectric diffusion barriers
- Patent number 9,330,963
- Issue date May 3, 2016
- Intel Corporation
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to form memory devices having a capacitor with a recessed e...
- Patent number 8,441,097
- Issue date May 14, 2013
- Intel Corporation
- Joseph M. Steigerwald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source reagent compositions and method for forming metal films on a...
- Patent number 8,299,286
- Issue date Oct 30, 2012
- Advanced Technology Materials, Inc.
- Robin A. Gardiner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Source reagent compositions and method for forming metal films on a...
- Patent number 7,323,581
- Issue date Jan 29, 2008
- Advanced Technology Materials, Inc.
- Robin A. Gardiner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for making a semiconductor device having an ultra-thin high-...
- Patent number 6,787,440
- Issue date Sep 7, 2004
- Intel Corporation
- Christopher G. Parker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making a semiconductor device having a high-k gate diele...
- Patent number 6,716,707
- Issue date Apr 6, 2004
- Intel Corporation
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making a semiconductor device having a high-k gate diele...
- Patent number 6,713,358
- Issue date Mar 30, 2004
- Intel Corporation
- Robert S. Chau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming metal films on a substrate by chemical vapor depo...
- Patent number 6,110,529
- Issue date Aug 29, 2000
- Robin A. Gardiner
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Apparatus and method for the in-situ generation of dopants
- Patent number 6,001,172
- Issue date Dec 14, 1999
- Advanced Technology Materials, Inc.
- Gautam Bhandari
- C30 - CRYSTAL GROWTH
Information Patent Grant
Precursor compositions for ion implantation of antimony and ion imp...
- Patent number 5,972,743
- Issue date Oct 26, 1999
- Advanced Technology Materials, Inc.
- Timothy E. Glassman
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method of forming bismuth-containing films by using bismuth amide c...
- Patent number 5,902,639
- Issue date May 11, 1999
- Advanced Technology Materials, Inc.
- Timothy E. Glassman
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Precursor compositions for chemical vapor deposition, and ligand ex...
- Patent number 5,820,664
- Issue date Oct 13, 1998
- Advanced Technology Materials, Inc.
- Robin A. Gardiner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lanthanide/phosphorus precursor compositions for MOCVD of lanthanid...
- Patent number 5,698,022
- Issue date Dec 16, 1997
- Advanced Technology Materials, Inc.
- Timothy E. Glassman
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Tantalum and niobium reagents useful in chemical vapor deposition p...
- Patent number 5,679,815
- Issue date Oct 21, 1997
- Advanced Technology Materials, Inc.
- Peter S. Kirlin
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical vapor deposition of tantalum- or niobium-containing coatings
- Patent number 5,677,002
- Issue date Oct 14, 1997
- Advanced Technology Materials
- Peter S. Kirlin
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS
- Publication number 20240282624
- Publication date Aug 22, 2024
- Intel Corporation
- Sean KING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS
- Publication number 20230260833
- Publication date Aug 17, 2023
- Intel Corporation
- Sean KING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS
- Publication number 20220344201
- Publication date Oct 27, 2022
- Intel Corporation
- Sean KING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS
- Publication number 20220122881
- Publication date Apr 21, 2022
- Intel Corporation
- Sean KING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS
- Publication number 20200357687
- Publication date Nov 12, 2020
- Intel Corporation
- Sean KING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A RESISTIVE RANDOM ACCESS MEMORY DEVICE WITH SWITCHING MULTI-LAYER...
- Publication number 20200203603
- Publication date Jun 25, 2020
- Intel Corporation
- Timothy Glassman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A RESISTIVE RANDOM ACCESS MEMORY DEVICE AND METHODS OF FABRICATION
- Publication number 20200203602
- Publication date Jun 25, 2020
- Intel Corporation
- Namrata S. Asuri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RRAM DEVICES WITH REDUCED FORMING VOLTAGE
- Publication number 20200144496
- Publication date May 7, 2020
- Intel Corporation
- Timothy E. GLASSMAN
- G11 - INFORMATION STORAGE
Information Patent Application
CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS
- Publication number 20200105588
- Publication date Apr 2, 2020
- Intel Corporation
- Sean KING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS
- Publication number 20190371658
- Publication date Dec 5, 2019
- Intel Corporation
- Sean KING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS
- Publication number 20180218940
- Publication date Aug 2, 2018
- Intel Corporation
- Sean KING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM-UP FILL (BUF) OF METAL FEATURES FOR SEMICONDUCTOR STRUCTURES
- Publication number 20180130707
- Publication date May 10, 2018
- Intel Corporation
- Scott B. CLENDENNING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS
- Publication number 20170372947
- Publication date Dec 28, 2017
- Intel Corporation
- Sean KING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS
- Publication number 20160247715
- Publication date Aug 25, 2016
- Intel Corporation
- Sean KING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION (ALD) OF TAALC FOR CAPACITOR INTEGRATION
- Publication number 20140001598
- Publication date Jan 2, 2014
- Nick Lindert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS
- Publication number 20130292835
- Publication date Nov 7, 2013
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL-INSULATOR-METAL (MIM) CAPACITOR WITH INSULATOR STACK HAVING A...
- Publication number 20130270676
- Publication date Oct 17, 2013
- Nick Lindert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A...
- Publication number 20110171382
- Publication date Jul 14, 2011
- Advanced Technology Materials, Inc.
- Robin A. Gardiner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method For Depositing Gate Metal For CMOS Devices
- Publication number 20110147851
- Publication date Jun 23, 2011
- Christopher D. Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO FORM MEMORY DEVICES HAVING A CAPACITOR WITH A RECESSED E...
- Publication number 20110147888
- Publication date Jun 23, 2011
- Joseph M. Steigerwald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reducing variability in delivery rates of solid state precursors
- Publication number 20060102079
- Publication date May 18, 2006
- Timothy E. Glassman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Atomic layer deposition of high quality high-k transition metal and...
- Publication number 20060045968
- Publication date Mar 2, 2006
- Matthew V. Metz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for making a semiconductor device having a high-k gate diele...
- Publication number 20040180523
- Publication date Sep 16, 2004
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for making a semiconductor device having an ultra-thin high-...
- Publication number 20040110361
- Publication date Jun 10, 2004
- Christopher G. Parker
- H01 - BASIC ELECTRIC ELEMENTS

Timothy E. Glassman

Person

Patents Grantslast 30 patents

Conformal low temperature hermetic dielectric diffusion barriers

Conformal low temperature hermetic dielectric diffusion barriers

Conformal low temperature hermetic dielectric diffusion barriers

Resistive random access memory device and methods of fabrication

Resistive random access memory device with switching multi-layer st...

RRAM devices with reduced forming voltage

Conformal low temperature hermetic dielectric diffusion barriers

Conformal low temperature hermetic dielectric diffusion barriers

Conformal low temperature hermetic dielectric diffusion barriers

Conformal low temperature hermetic dielectric diffusion barriers

Conformal low temperature hermetic dielectric diffusion barriers

Conformal low temperature hermetic dielectric diffusion barriers

Metal-insulator-metal (MIM) capacitor with insulator stack having a...

Conformal low temperature hermetic dielectric diffusion barriers

Methods to form memory devices having a capacitor with a recessed e...

Source reagent compositions and method for forming metal films on a...

Source reagent compositions and method for forming metal films on a...

Method for making a semiconductor device having an ultra-thin high-...

Method for making a semiconductor device having a high-k gate diele...

Method for making a semiconductor device having a high-k gate diele...

Method of forming metal films on a substrate by chemical vapor depo...

Apparatus and method for the in-situ generation of dopants

Precursor compositions for ion implantation of antimony and ion imp...

Method of forming bismuth-containing films by using bismuth amide c...

Precursor compositions for chemical vapor deposition, and ligand ex...

Lanthanide/phosphorus precursor compositions for MOCVD of lanthanid...

Tantalum and niobium reagents useful in chemical vapor deposition p...

Chemical vapor deposition of tantalum- or niobium-containing coatings

Patents Applicationslast 30 patents

CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS

CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS

CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS

CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS

CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS

A RESISTIVE RANDOM ACCESS MEMORY DEVICE WITH SWITCHING MULTI-LAYER...

A RESISTIVE RANDOM ACCESS MEMORY DEVICE AND METHODS OF FABRICATION

RRAM DEVICES WITH REDUCED FORMING VOLTAGE

CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS

CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS

CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS

BOTTOM-UP FILL (BUF) OF METAL FEATURES FOR SEMICONDUCTOR STRUCTURES

CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS

CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS

ATOMIC LAYER DEPOSITION (ALD) OF TAALC FOR CAPACITOR INTEGRATION

CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS

METAL-INSULATOR-METAL (MIM) CAPACITOR WITH INSULATOR STACK HAVING A...

SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A...

Method For Depositing Gate Metal For CMOS Devices

METHODS TO FORM MEMORY DEVICES HAVING A CAPACITOR WITH A RECESSED E...

Reducing variability in delivery rates of solid state precursors

Atomic layer deposition of high quality high-k transition metal and...

Method for making a semiconductor device having a high-k gate diele...

Method for making a semiconductor device having an ultra-thin high-...