Claims
- 1. A method of forming on a substrate a metal film, comprising depositing said metal film on said substrate via chemical vapor deposition from a metalorganic reagent solution consisting essentially of a metalorganic complex dissolved in a solvent or suspending agent;
- wherein said metalorganic complex has the formula:
- MA.sub.Y X
- wherein:
- M is a y-valent metal selected from the group consisting of Mg, Ca, Sr. Ba, Sc, Y, La, Ce, Ti, Zr, Hf, Pr, V, Nb, Ta, Nd, Cr, W, Pm, Mn, Re, Sm, Ru, Eu, Co, Rh, Ir, Gd, Ni, Tb, Cu, Dy, Ho, Tl, Er, Pb, Tm, Bi, and Yb;
- A is a monodentate or multidentate organic ligand selected from the group consisting of .beta.-diketonates, .beta.-thioketonates, cyclopentadienyls, alkyls, perfluoroalkyls, alkoxides, perfluoroalkoxides, and Schiff bases, and A is coordinated to M which allows complexing of MA.sub.Y with X;
- y is an integer having a value of 2, 3 or 4;
- each of the A ligands is the same or different; and
- X is a monodentate or multidentate ligand coordinated to M and X is selected from the group consisting of:
- oxyhydrocarbyl ligands;
- nitrogenous oxyhydrocarbyl ligands;
- fluorooxyhydrocarbyl ligands;
- thiooxyhydrocarbyl ligands;
- amines and polyamines;
- bipyridines;
- ligands of the formula: ##STR2## wherein G is --O--, --S--, or --NR--, wherein R is H or hydrocarbyl; crown ethers;
- thioethers; and
- ligands of the formula:
- R.sup.0 (C(R.sup.1).sub.2 C(R.sup.2).sub.2 O).sub.n R.sup.0
- wherein:
- R.sup.0 =H, methyl, ethyl, n-propyl, cyanato, perfluoroethyl, perfluoro-n-propyl, or vinyl;
- R.sup.1 =H, F, or a sterically acceptable hydrocarbyl substituent;
- R.sup.2 =H, F, or a sterically acceptable hydrocarbyl substituent;
- n=2, 3, 4, 5, or 6; and
- each R.sup.0, R.sup.1, and R.sup.2 is the same as or different from the other R.sup.0, R.sup.1, and R.sup.2, respectively,
- wherein said solvent or suspending agent comprises one, two or three components selected from the group consisting of:
- alkyl nitrites of the formula NR.sub.b :
- wherein R.sub.b is H, C.sub.1 -C.sub.1 -C.sub.8 alkyl, or C.sub.1 -C.sub.8 perfluoroalkyl;
- C.sub.2 -C.sub.12 alkanols;
- C.sub.6 -C.sub.12 aliphatic hydrocarbons;
- C.sub.6 -C.sub.18 aromatic hydrocarbons;
- dialkyl esters;
- glymes having from 1 to 20 ethoxy --(C.sub.2 H.sub.4 O)-- repeat units; and
- organic ethers selected from the group consisting of dialkyl ethers, cyclic ethers and crown ethers;
- wherein said method comprises:
- volatilizing the metalorganic reagent liquid solution to yield a metal source vapor; and
- contacting the metal source vapor with the substrate, to deposit the metal-containing film thereon.
- 2. A method according to claim 1, wherein M is selected from the group consisting of Cu, Ba, Sr, La, Nd, Ce, Pr, Sm, Eu, Th, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Bi, Tl, Y, Pb, Ni, Pd, Pt, Al, Ga, In, Ag, Au, Co, Rh, Ir, Fe, Ru, Sn, Li, Na, K, Rb, Cs, Ca, Mg, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W.
- 3. A method according to claim 1, wherein A is selected from the group consisting of .beta.-diketonates, .beta.-thioketonates, cyclopentadienyls, alkyls, perfluoroalkyls, alkoxides, perfluoroalkoxides, and Schiff bases.
- 4. A method according to claim 1, wherein A is selected from the group consisting of .beta.-diketonates and cyclopentadienyls.
- 5. A method according to claim 1, wherein A is a .beta.-diketonate.
- 6. A method according to claim 1, wherein A is selected from the group consisting of:
- (i) 2,2,6,6-tetramethyl-3,5-heptanedionate;
- (ii) 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate;
- (iii) 1,1,1,2,2,3,3-heptafluoro-7,7-dimethyl-4,6-octanedionate
- (iv) cyclopentadienyl;
- (v) 4,4'-(ethane-1,2-diyldiimino) bis (3-pentene-2-one);
- (vi) pentamethylcyclopentadienyl and other substituted cyclopentadienyls;
- (vii) 2,4-pentanedionate; and
- (viii) 1,1,1-trifluoro-2,4-pentanedionate.
- 7. A method according to claim 1, wherein X is selected from the group consisting of:
- (i) oxyhydrocarbyl ligands;
- (ii) nitrogenous oxyhydrocarbyl ligands;
- (iii) fluorooxyhydrocarbyl ligands; and
- (iv) thiooxyhydrocarbyl ligands.
- 8. A method according to claim 1, wherein X is selected from the group consisting of:
- (a) amines and polyamines;
- (b) bipyridines;
- (c) ligands of the formula: ##STR3## wherein G is --O--, --S--, or --NR--, wherein R is H or hydrocarbyl; (d) crown ethers;
- (e) thioethers; and
- (f) ligands of the formula:
- R.sup.0 O(C(R.sup.1).sub.2 C(R.sup.2).sub.2 O).sub.n R.sup.0
- wherein:
- R.sup.0 =H, methyl, ethyl, n-propyl, cyanato, perfluoroethyl, perfluoro-n-propyl, or vinyl;
- R.sup.1 =H, F, or a sterically acceptable hydrocarbyl substituent;
- R.sup.2 =H, F, or a sterically acceptable hydrocarbyl substituent;
- n=2, 3, 4, 5, or 6; and
- each R.sup.0, R.sup.1, and R.sup.2 is the same as or different from the other R.sup.0, R.sup.1, and R.sup.2, respectively.
- 9. A method according to claim 1, wherein X is selected from the group consisting of tetraglyme, tetrahydrofuran, bipyridine, and 18-crown-6 ethers.
- 10. A method according to claim 1, wherein X comprises a liquid of the formula:
- R.sup.0 O(C(R.sup.1).sub.2 (R.sup.2).sub.2 O).sub.n R.sup.0
- wherein:
- R.sup.0 =H, methyl, ethyl, n-propyl, cyanato, perfluoroethyl, perfluoro-n-propyl, or vinyl;
- R.sup.1 =H, F, or a sterically acceptable hydrocarbyl substituent;
- R.sup.2 =H, F, or a sterically acceptable hydrocarbyl substituent;
- n=2, 3, 4, 5, or 6; and
- each R.sup.0, R.sup.1, and R.sup.2 is the same as or different from the other R.sup.0, R.sup.1, and R.sup.2, respectively.
- 11. A method according to claim 1, wherein X comprises a ligand of the formula:
- R.sup.0 O(C(R.sup.1).sub.2 C(R.sup.2).sub.2 O).sub.4 R.sup.0
- wherein:
- each R.sup.0, R.sup.1, and R.sup.2 is selected independently, and
- R.sup.0 =H, CH.sub.3, or C.sub.2 H.sub.5 ;
- R.sup.1 and R.sup.2 =H or F.
- 12. A method according to claim 1, wherein: A is a .beta.-diketonate; and X is tetraglyme, 18-crown-6 ether, or bipyridine.
- 13. A method according to claim 1, wherein each of the ligands A is a constituent moiety of a single group which is coordinatively attached to M thereby.
- 14. A method according to claim 1, wherein the ligand X and at least one of said ligands A is a constituent moiety of a single group which is coordinatively attached to M thereby.
- 15. A method according to claim 1, wherein said composition comprises said components of the metalorganic complex in said solvent, wherein said components react in-situ in said solvent to form said metalorganic complex.
- 16. A method according to claim 1, wherein said composition comprises precursors of the metalorganic complex in said solvent, wherein said precursors react in-situ in said solvent to form said metalorganic complex.
- 17. A method according to claim 1 wherein the solvent or suspending agent is selected from the group consisting of:
- 45-88% tetrahydrofuran, 10-35% isopropanol and 2-20% tetraglyme;
- 75-95% isopropanol and 5-25% tetraglyme;
- 80-98% tetrahydrofuran and 2-20% tetraglyme;
- 85-99% butyl acetate and 1-15% tetraglyme; and
- 85-99% butyl acetate and 1-15% tetrathiocyclodecane.
- 18. A method according to claim 1 wherein the crown ethers are selected from the group comprising:
- 12-crown-4 ether;
- 15-crown-5 ether; and
- 18-crown-6 ether.
- 19. A method according to claim 1 wherein the solvent or suspending agent is selected from the group consisting of:
- butyl acetate;
- ethanol;
- isopropanol;
- tetraglyme; and
- tetrahydrofuran.
- 20. A method according to claim 1 wherein the organic ethers are selected from the group consisting of dialkyl ethers comprising:
- C.sub.1 -C.sub.6 alkyl moieties;
- C.sub.4 -C.sub.8 cyclic ethers; and
- C.sub.12 -C.sub.60 crown O.sub.4 -O.sub.20 ethers.
- 21. A method of forming a metal-containing film on a substrate, comprising providing a metal source reagent solution consisting essentially of a metal source reagent and solvent medium, volatilizing the metal source reagent liquid solution to yield a metal source vapor, and contacting the metal source vapor with the substrate, to deposit the metal-containing film thereon, wherein the metal source reagent(s) and the solvent medium are selected from the group of metal source reagent(s) and associated solvent media consisting of:
- ______________________________________Metal Source Reagent(s) Solvent Medium______________________________________Al(thd).sub.3 80-98% tetrahydrofuran and 2-20% tetraglymeAl(OR).sub.3 80-98% tetrahydrofuran and 2-20% tetraglymeBa(thd).sub.2 (tetraglyme) 85-99% butyl acetate andCa(thd).sub.2 (tetraglyme) 1-15% tetraglymeCu(thd).sub.2Ba(thd).sub.2 (tetraglyme) 85-98% butyl acetate andSr(thd).sub.2 (tetraglyme) 1-15% tetraglymeTi(OiPr).sub.2 (thd).sub.2Ca(thd).sub.2 (tetraglyme) 75-95% butyl acetate withSr(thd).sub.2 (tetraglyme) 5-25% tetraglymeCr(thd).sub.3 80-98% tetrahydrofuran with 2-20% tetraglymeEr(thd).sub.3 85-99% butyl acetate and 1-15% tetraglymeIr(acac).sub.3 butyl acetateor Ir(thd).sub.3La(thd).sub.3 tetrahydrofuran(MeO).sub.3 P.dbd.OMgAl(OiPr).sub.8 isopropanolNb(OiPr).sub.4 thd 45-88% tetrahydrofuran 10-35% isopropanol 2-20% tetraglymePb(thd).sub.2 80-98% tetrahydrofuran andLa(thd).sub.3 2-20% tetraglymeTi(OiPr).sub.2 (thd).sub.2Pb(thd).sub.2 80-98% tetrahydrofuran andTi(OiPr).sub.2 thd.sub.2 2-20% tetraglymePb(thd).sub.2 45-88% tetrahydrofuranZr(thd).sub.4 10-35% isopropanol 2-20% tetraglymePb(thd).sub.2 45-88% tetrahydrofuranZr(thd).sub.4 10-35% isopropanolTi(OiPr).sub.2 (thd).sub.2 2-20% tetraglymeRu(acac).sub.3 butyl acetateor Ru(the).sub.3Sn (alkyl).sub.2 (.beta.-diketonate).sub.2 butyl acetatewherein alkyl.dbd.C.sub.1 --C.sub.18 alkylSn (acetate).sub.2 butyl acetate or 85-99% butyl acetate and 1-15% tetraglymeSr(thd).sub.2 (tetraglyme) 45-88% tetrahydrofuranBiPh.sub.3 10-35% isopropanolTa(OiPr).sub.4 (thd) 2-20% tetraglymeTa(OEt).sub.5 1% ethanol solution[O.dbd.Ti(thd).sub.2 ].sub.n butyl acetatewherein n is 1 or 2Zr(thd).sub.4 80-98% tetrahydrofuran andY(thd).sub.3 2-20% tetraglyme[O.dbd.Zr(thd).sub.2 ].sub.n butyl acetatewherein n is 1 or 2 or butyl acetate/tetraglymeY(thd).sub.3 isopropanolY(thd).sub.3 butyl acetate/tetraglymeBa(thd).sub.2Cu(thd).sub.2Cu(shfac).sub.2 85-99% butyl acetate and 1-15% tetraglymeSr(shfac).sub.2 85-99% butyl acetate and 1-15% tetraglymeSr(sthd).sub.2 85-99% butyl acetate and 1-15% tetraglymeSr(sthd).sub.2 85-99% butyl acetate and 1-15% tetrathiocyclodecaneCa(sthd).sub.2 85-99% butyl acetate andSr(sthd).sub.2 1-15% tetraglymeGa(sthd).sub.3Ce(sthd).sub.4Ca(sthd).sub.2 85-99% butyl acetate andGa(sthd).sub.3 1-15% tetraglymeCe(sthd).sub.4Ca(sthd).sub.2 85-99% butyl acetate andSr(sthd).sub.2 1-15% tetrathiocyclodecaneGa(sthd).sub.3Ce(sthd).sub.4Cu(shfac).sub.2 45-88% tetrahydrofuran 10-35% isopropanol 2-20% tetraglymeCu(hfac).sub.2 85-99% butyl acetate and 1-15% tetraglymeSr(thd).sub.2 85-99% butyl acetate and 1-15% tetraglymeSr(thd).sub.2 85-99% butyl acetate and 1-15% tetrathiocyclodecaneCu(hfac).sub.2 45-88% tetrahydrofuran 10-35% isopropanol 2-20% tetraglymeTi(hfac).sub.3 85-99% butyl acetate and 1-15% tetraglymeTi(hfac).sub.3 butyl acetate/cyclohexylthiolMo(hfac).sub.3 butyl acetate/t-butylthiolMo(thd).sub.3 butyl acetatecyclohexylthiol______________________________________
- wherein when the solvent medium contains multiple solvent components, the percentages specified are percentages by weight, based on the weight of the total solvent medium, and with the total percentage of all solvent components being 100%;
- R is selected from the group consisting of C.sub.1 -C.sub.8 alkyl, C.sub.2 -C.sub.8 cycloalkyl, C.sub.2 -C.sub.10 alkenyl, C.sub.2 -C.sub.15 cycloalkenyl, C.sub.6 -C.sub.10 aryl, and fluorinated derivatives thereof.
- 22. A method according to claim 21, wherein the metal in the metal coordination complex(es) comprises a metal selected from the group consisting of: Mg, Sc, La, Ce, Ti, Zr, Hf, Pr, V, Nb, Ta, Nd, Cr, W, Pm, Mn, Re, Sm, Fe, Ru, Eu, Co, Rh, Ir, Gd, Ni, Tb, Dy, Ho, Al, Er, Sn, Pb, Tm, Lu, Th, Pd, Pt, Ga, In, Au, Ag, Li, Na, K, Rb, Cs, Mo, and Yb.
- 23. A method according to claim 21, wherein the metal source reagent liquid solution comprises a multi-component solution including at least two said metal source complexes.
- 24. A m ethod according to claim 21, wherein the metal source reagent liquid solution comprises at least one solvent species selected from the group consisting of: glymes, aliphatic hydrocarbons, aromatic hydrocarbons, ethers, esters, nitrites, and alcohols.
- 25. A method according to claim 24, wherein the solvent comprises at least one solvent species selected from the group consisting of: glyme solvents having from 1 to 20 ethoxy --(C.sub.2 H.sub.4 O)-- repeat units; C.sub.2 -C.sub.12 alkanols, organic ethers selected from the group consisting of dialkyl ethers comprising C.sub.1 -C.sub.6 alkyl moieties, C.sub.4 -C.sub.8 cyclic ethers, and C.sub.12 -C.sub.60 -crown-O.sub.4 -O.sub.20 ethers wherein the prefixed C.sub.i range is the number i of carbon atoms in the ether compound and the suffixed O.sub.i range is the number i of oxygen atoms in the ether compound; C.sub.6 -C.sub.12 aliphatic hydrocarbons; and C.sub.6 -C.sub.18 aromatic hydrocarbons.
- 26. A method of forming a metal sulfide film on a substrate, comprising providing a metal source reagent solution comprising a metal source reagent and solvent medium, volatilizing the metal source reagent liquid solution to yield a metal source vapor, and contacting the metal source vapor with the substrate, optionally in the presence of a sulfur-containing gas, to deposit the metal-containing film thereon, wherein the metal source reagent(s) and the solvent medium, are selected from the group of metal source reagent(s) and associated solvent media consisting of:
- ______________________________________Cu(shfac).sub.2 85-99% butyl acetate and 1-15% tetraglymeSr(shfac).sub.2 85-99% butyl acetate and 1-15% tetraglymeSr(shfac).sub.2 85-99% butyl acetate and 1-15% tetraglymeSr(shfac).sub.2 85-99% butyl acetate and 1-15% tetrathiocyclodecaneCa(sthd).sub.2 85-99% butyl acetate and 1-15% tetraglymeSr(sthd).sub.2Ga(sthd).sub.3Ce(sthd).sub.4Ca(sthd).sub.2 85-99% butyl acetate andGa(sthd).sub.3 1-15% tetraglymeCe(sthd).sub.4Ca(sthd).sub.2 85-99% butyl acetate and 1-15% tetrathiocyclodecaneSr(sthd).sub.2 butyl acetate and cyclohexylthiolGa(sthd).sub.3 butyl acetate and t-butylthiolCe(sthd).sub.4Cu(shfac).sub.2 45-88% tetrahydrofuran 10-35% isopropanol 2-20% tetraglymeCu(hfac).sub.2 85-99% butyl acetate and 1-15% tetraglymeSr(thd).sub.2 85-99% butyl acetate and 1-15% tetraglymeSr(thd).sub.2 85-99% butyl acetate and 1-15% tetrathiocyclodecaneCu(hfac).sub.2 45-88% tetrahydrofuranacetate 10-35% isopropanol 2-20% tetraglymeTi(hfac).sub.3 85-99% butyl acetate and 1-15% tetraglyme butyl acetate and cyclohexylthiolTi(hfac).sub.3 butyl acetate nd t-butylthiolMo(hfac).sub.3 butyl acetate and t-butylthiol______________________________________
- 27. A method according to claim 26, wherein the contacting of the metal source vapor with the substrate is carried out in the presence of said sulfur-containing gas, and said sulfur-containing gas is selected from the group of sulfur compounds consisting of hydrogen sulfide, t-butylthiol, and cyclohexylthiol.
- 28. A method of forming a metal sulfide film on a substrate, comprising providing a metal source reagent solution comprising a metal .beta.-thioketonate source reagent and compatible solvent medium for said metal .beta.-thioketonate source reagent, volatilizing the metal source reagent liquid solution to yield a metal source vapor, and contacting the metal source vapor with the substrate, to deposit the metal sulfide film thereon.
- 29. A method according to claim 28, wherein the contacting of the metal source vapor with the substrate is carried out in the presence of hydrogen sulfide.
- 30. A method according to claim 29, wherein the hydrogen sulfide is in the metal source reagent liquid solution, or is added in the vapor phase to the metal source vapor.
- 31. A method according to claim 28, wherein the metal moiety of said metal .beta.-thioketonate source reagent is selected from the group consisting of Cu, Sr, Ca, Ga, Ce, Ti, and Mo.
- 32. A method of forming a metal-containing film on a substrate, comprising providing a metal source reagent solution consisting essentially of a metal source reagent and solvent medium, volatilizing the metal source reagent liquid solution to yield a metal source vapor, and contacting the metal source vapor with the substrate, to deposit the metal-containing film thereon, wherein the composition of the metal-containing film, metal source reagent, and solvent medium, are selected from the group consisting of:
- ______________________________________Metal Contain-ing Film Metal Source Reagent Solvent Medium______________________________________Al.sub.2 O.sub.3 Al(thd).sub.3 tetrahydrofuran/tetraglymeAl.sub.2 O.sub.3 Al(OR).sub.3 tetrahydrofuran/tetraglymeBaCaCuO Ba(thd).sub.2 (tetraglyme), butyl acetate/tetraglyme Ca(thd).sub.2, Cu(thd).sub.2Ba.sub.x Sr.sub.1-x TiO.sub.3 Ba(thd).sub.2 (tetraglyme) butyl acetate/tetraglymex.dbd.0 to 1 Sr(thd).sub.2 (tetraglyme) Ti(OiPr).sub.2 (thd).sub.2BiSrCaCuO Sr(thd).sub.2 (tetraglyme) isopropanol/tetraglyme; Ca(thd).sub.2 (tetraglyme) Bi(C.sub.6 H.sub.5).sub.3 Cu(thd).sub.2Cr.sub.2 O.sub.3 Cr(thd).sub.3 tetrahydrofuran/tetraglyme;Er doping Er(thd).sub.3 butyl acetate/tetraglymeof SiO.sub.2Ir Ir(acac).sub.3 or butyl acetate Ir(thd).sub.3LaPO.sub.4 La(thd).sub.3 tetrahydrofuran O.dbd.P(OMe).sub.3MgAl.sub.2 O.sub.4 MgAl.sub.2 (OiPr).sub.8 isopropanolNb.sub.2 O.sub.5 Nb(OiPr).sub.4 (thd) tetrahydrofuran/isopropanol/ tetraglymePbLa.sub.x Ti.sub.1-x O.sub.3 Pb(thd).sub.2 tetrahydrofuran/tetaglyme La(thd).sub.3 Ti(OiPr).sub.2 (thd).sub.2PbTiO.sub.3 Pb(thd).sub.2 tetrahydrofuran/tetraglyme Ti(OiPr).sub.2 (thd).sub.2PbZrO.sub.3 Pb(thd).sub.2 tetrahydrofuran/isopropanol/ Zr(thd).sub.4 tetraglymePbZr.sub.x Ti.sub.1-x O.sub.3 Pb(thd).sub.2 tetrahydrofuran/isopropanol/x.dbd.0 to 1 Zr(thd).sub.4 tetraglyme Ti(OiPr).sub.2 (thd).sub.2PbZr.sub.x Ti.sub.1-x O.sub.3 Pb(thd).sub.2 tetrahydrofuran/isopropanol/x.dbd.0 to 1 [O.dbd.Zr(thd).sub.2 ].sub.n tetraglyme, or [O.dbd.Ti(thd).sub.2 ].sub.n butyl acetate/tetraglyme n.dbd.1 or 2RuO.sub.2 Ru(acac).sub.3 or butyl acetate Ru(thd).sub.3SnO.sub.2 Sn(alkyl).sub.2 (.beta.-diketonate).sub.2 butyl acetate alkyl.dbd.C.sub.1 --C.sub.18SnO.sub.2 Sn (acetate).sub.2 butyl acetateSrBi.sub.2 Ta.sub.2 O.sub.9 Sr(thd).sub.2 tg tetrahydrofuran/isopropanol/ BiPh.sub.3 tetraglyme Ta(OiPr).sub.4 thdTa.sub.2 O.sub.5 Ta(OEt).sub.5 ethanolTa.sub.2 O.sub.5 Ta(OR).sub.4 (thd) tetrahydrofuran/isopropanol/ R.dbd.ethyl, isopropyl tetraglymeTiO.sub.2 [O.dbd.Ti(thd).sub.2 ].sub.n butyl acetate/tetraglyme n.dbd.1 or 2V.sub.2 O.sub.5 O.dbd.V(thd).sub.3 butyl acetate/tetraglymeY.sub.2 O.sub.3 --ZrO.sub.2 Zr(thd).sub.4 tetrahydrofuran/tetraglyme; Y(thd).sub.3Y.sub.2 O.sub.3 Y(thd).sub.3 isopropanolYBaCuO Y(thd).sub.3 butyl acetate/tetraglyme Ba(thd).sub.2 (tetraglyme) or tetraglyme Cu(thd).sub.2ZrO.sub.2 [O.dbd.Zr(thd).sub.2 ].sub.n butyl acetate/tetraglyme n.dbd.1 or 2CuS Cu(shfac).sub.2 butyl acetate/tetraglymeSrS Sr(shfac).sub.2 butyl acetate/tetraglymeSrS Sr(sthd).sub.2 butyl acetate/tetraglymeSrS Sr(sthd).sub.2 butyl acetate/ tetrathiocyclodecane(Ca, Sr)Ga.sub.2 S.sub.4, Ca(sthd).sub.2 butyl acetate/tetraglymecerium-doped Sr(sthd).sub.2 Ga(sthd).sub.3 Ce(sthd).sub.4(Ca, Sr)Ga.sub.2 S.sub.4, Ca(sthd).sub.2 butyl acetate/cerium-doped Sr(sthd).sub.2 tetrathiocyclodecane Ga(sthd).sub.3 Ce(sthd).sub.4CuS Cu(shfac).sub.2 tetrahydrofuranacetate isopropanol tetraglymeCuS Cu(hfac).sub.2 butyl acetate/tetraglyme butyl acetate/ tetrathiocyclodecaneSrS Sr(thd).sub.2 butyl acetate/tetraglyme butyl acetate/ tetrathiocyclodecaneSrS Sr(thd).sub.2 butyl acetate/ tetrathiocyclodecane butyl acetate/t-butylthiol butyl acetate/ cyclohexylthiolCuS Cu(hfac).sub.2 tetrahydrofuran isopropanol tetraglymeTiS.sub.2 Ti(hfac).sub.3 butyl acetate/tetraglyme butyl acetate/ cyclohexylthiolTiS.sub.2 Ti(hfac).sub.3 butyl acetateMoS.sub.2 Mo(hfac).sub.3 butyl acetateMoS.sub.2 Mo(thd).sub.3 butyl acetate.______________________________________
- R is selected from the group consisting of C.sub.1 -C.sub.8 alkyl, C.sub.2 -C.sub.8 cycloalkyl, C.sub.2 -C.sub.10 alkenyl, C.sub.2 -C.sub.15 cycloalkenyl, C.sub.6 -C.sub.10 aryl, and fluorinated derivatives thereof.
- 33. A method of forming a metal-containing film on a substrate, comprising providing a metal source reagent solution comprising a metal source reagent and solvent medium, volatilizing the metal source reagent liquid solution to yield a metal source vapor, and contacting the metal source vapor with the substrate, to deposit the metal-containing film thereon, wherein the composition of the metal-containing film, metal source reagent, and solvent medium, are selected from the group consisting of:
- ______________________________________Metal Contain-ing Film Metal Source Reagent Solvent Medium______________________________________Al.sub.2 O.sub.3 Al(thd).sub.3 tetrahydrofuran/tetraglymeAl.sub.2 O.sub.3 Al(OR).sub.3 tetrahydrofuran/tetraglymeBaCaCuO Ba(thd).sub.2 (tetraglyme), butyl acetate/tetraglyme Ca(thd).sub.2, Cu(thd).sub.2Ba.sub.x Sr.sub.1-x TiO.sub.3 Ba(thd).sub.2 (tetraglyme) butyl acetate/tetraglymex.dbd.0 to 1 Sr(thd).sub.2 (tetraglyme) Ti(OiPr).sub.2 (thd).sub.2BiSrCaCuO Sr(thd).sub.2 (tetraglyme) isopropanol/tetraglyme Ca(thd).sub.2 (tetraglyme) Bi(C.sub.6 H.sub.5).sub.3 Cu(thd).sub.2Cr.sub.2 O.sub.3 Cr(thd).sub.3 tetrahydrofuran/tetraglymeEr doping Er(thd).sub.3 butyl acetate/tetraglymeof SiO.sub.2Ir Ir(acac).sub.3 butyl acetate Ir(thd).sub.3LaPO.sub.4 La(thd).sub.3 tetrahydrofuran O.dbd.P(OMe).sub.3MgAl.sub.2 O.sub.4 MgAl.sub.2 (OiPr).sub.8 isopropanolNb.sub.2 O.sub.5 Nb(OiPr).sub.4 (thd) tetrahydrofuran/isopropanol/ tetraglymePbLa.sub.x Ti.sub.1-x O.sub.3 Pb(thd).sub.2 tetrahydrofuran/tetaglyme La(thd).sub.3 Ti(OiPr).sub.2 (thd).sub.2PbTiO.sub.3 Pb(thd).sub.2 tetrahydrofuran/tetraglyme Ti(OiPr).sub.2 (thd).sub.2PbZrO.sub.3 Pb(thd).sub.2 tetrahydrofuran/isopropanol/ Zr(thd).sub.4 tetraglymePbZr.sub.x Ti.sub.1-x O.sub.3 Pb(thd).sub.2 tetrahydrofuran/isopropanol/x.dbd.0 to 1 Zr(thd).sub.4 tetraglyme Ti(OiPr).sub.2 (thd).sub.2PbZr.sub.x Ti.sub.1-x O.sub.3 Pb(thd).sub.2 tetrahydrofuran/isopropanol/x.dbd.0 to 1 [O.dbd.Zr(thd).sub.2 ].sub.n tetraglyme, or [O.dbd.Ti(thd).sub.2 ].sub.n butyl acetate/tetraglyme n.dbd.1 or 2RuO.sub.2 Ru(acac).sub.3 or butyl acetate Ru(thd).sub.3SnO.sub.2 Sn(alkyl).sub.2 (.beta.-diketonate).sub.2 butyl acetate alkyl.dbd.C.sub.1 --C.sub.18SnO.sub.2 Sn (acetate).sub.2 butyl acetateSrBi.sub.2 Ta.sub.2 O.sub.9 Sr(thd).sub.2 tg tetrahydrofuran/isopropanol/ BiPh.sub.3 tetraglyme Ta(OiPr).sub.4 thdTa.sub.2 O.sub.5 Ta(OEt).sub.5 ethanolTa.sub.2 O.sub.5 Ta(OR).sub.4 (thd) tetrahydrofuran/isopropanol/ R.dbd.ethyl, isopropyl tetraglymeTiO.sub.2 [O.dbd.Ti(thd).sub.2 ].sub.n butyl acetate/tetraglyme n.dbd.1 or 2V.sub.2 O.sub.5 O.dbd.V(thd).sub.3 butyl acetate/tetraglymeY.sub.2 O.sub.3 --ZrO.sub.2 Zr(thd).sub.4 tetrahydrofuran/tetraglyme; Y(thd).sub.3Y.sub.2 O.sub.3 Y(thd).sub.3 isopropanolYBaCuO Y(thd).sub.3 butyl acetate/tetraglyme Ba(thd).sub.2 (tetraglyme) or tetraglyme Cu(thd).sub.2ZrO.sub.2 [O.dbd.Zr(thd).sub.2 ].sub.n butyl acetate/tetraglyme n.dbd.1 or 2CuS Cu(shfac).sub.2 butyl acetate/tetraglymeSrS Sr(shfac).sub.2 butyl acetate/tetraglymeSrS Sr(sthd).sub.2 butyl acetate/tetraglymeSrS Sr(sthd).sub.2 butyl acetate/ tetrathiocyclodecane(Ca, Sr)Ga.sub.2 S.sub.4, Ca(sthd).sub.2 butyl acetate/tetraglymecerium-doped Sr(sthd).sub.2 Ga(sthd).sub.3 Ce(sthd).sub.4(Ca, Sr)Ga.sub.2 S.sub.4, Ca(sthd).sub.2 butyl acetate/cerium-doped Sr(sthd).sub.2 tetrathiocyclodecane Ga(sthd).sub.3 Ce(sthd).sub.4CuS Cu(shfac).sub.2 tetrahydrofuranacetate isopropanol tetraglymeCuS Cu(hfac).sub.2 butyl acetate/tetraglyme butyl acetate/ tetrathiocyclodecaneSrS Sr(thd).sub.2 butyl acetate/tetraglyme butyl acetate/ tetrathiocyclodecaneSrS Sr(thd).sub.2 butyl acetate/ tetrathiocyclodecane butyl acetate/t-butylthiol butyl acetate/ cyclohexylthiolCuS Cu(hfac).sub.2 tetrahydrofuran isopropanol tetraglymeTiS.sub.2 Ti(hfac).sub.3 butyl acetate/tetraglyme butyl acetate/ cyclohexylthiolTiS.sub.2 Ti(hfac).sub.3 butyl acetateMoS.sub.2 Mo(hfac).sub.3 butyl acetateMoS.sub.2 Mo(thd).sub.3 butyl acetate.______________________________________
- wherein the contacting of the metal source vapor with the substrate is carried out in the presence of a sulfur-containing gas;
- R is selected from the group consisting of C.sub.1 -C.sub.8 alkyl, C.sub.2 -C.sub.8 cycloalkyl, C.sub.2 -C.sub.10 alkenyl, C.sub.2 -C.sub.15 cycloalkenyl, C.sub.6 -C.sub.10 aryl, and fluorinated derivatives thereof.
- 34. A method according to claim 33, wherein said sulfur-containing gas is selected from the group of sulfur compounds consisting of hydrogen sulfide, t-butyl thiol, and cyclohexyl thiol.
- 35. A method of forming a metal-containing film on a substrate, comprising providing a metal source reagent solution comprising a metal source reagent and solvent medium, volatilizing the metal source reagent liquid solution to yield a metal source vapor, and contacting the metal source vapor with the substrate, to deposit the metal-containing film thereon, wherein the composition of the metal-containing film, metal source reagent, and solvent medium, are selected from the group consisting of:
- ______________________________________Metal Contain-ing Film Metal Source Reagent Solvent Medium______________________________________Al.sub.2 O.sub.3 Al(thd).sub.3 tetrahydrofuran/tetraglymeAl.sub.2 O.sub.3 Al(OR).sub.3 tetrahydrofuran/tetraglymeBaCaCuO Ba(thd).sub.2 (tetraglyme), butyl acetate/tetraglyme Ca(thd).sub.2, Cu(thd).sub.2Ba.sub.x Sr.sub.1-x TiO.sub.3 Ba(thd).sub.2 (tetraglyme) butyl acetate/tetraglymex.dbd.0 to 1 Sr(thd).sub.2 (tetraglyme) Ti(OiPr).sub.2 (thd).sub.2BiSrCaCuO Sr(thd).sub.2 (tetraglyme) isopropanol/tetraglyme Ca(thd).sub.2 (tetraglyme) Bi(C.sub.6 H.sub.5).sub.3 Cu(thd).sub.2Cr.sub.2 O.sub.3 Cr(thd).sub.3 tetrahydrofuran/tetraglymeEr doping Er(thd).sub.3 butyl acetate/tetraglymeof SiO.sub.2Ir Ir(acac).sub.3 butyl acetate Ir(thd).sub.3LaPO.sub.4 La(thd).sub.3 tetrahydrofuran O.dbd.P(OMe).sub.3MgAl.sub.2 O.sub.4 MgAl.sub.2 (OiPr).sub.8 isopropanolNb.sub.2 O.sub.5 Nb(OiPr).sub.4 (thd) tetrahydrofuran/isopropanol/ tetraglymePbLa.sub.x Ti.sub.1-x O.sub.3 Pb(thd).sub.2 tetrahydrofuran/tetraglyme La(thd).sub.3 Ti(OiPr).sub.2 (thd).sub.2PbTiO.sub.3 Pb(thd).sub.2 tetrahydrofuran/tetraglyme Ti(OiPr).sub.2 (thd).sub.2PbZrO.sub.3 Pb(thd).sub.2 tetrahydrofuran/isopropanol/ Zr(thd).sub.4 tetraglymePbZr.sub.x Ti.sub.1-x O.sub.3 Pb(thd).sub.2 tetrahydrofuran/isopropanol/x.dbd.0 to 1 Zr(thd).sub.4 tetraglyme Ti(OiPr).sub.2 (thd).sub.2PbZr.sub.x Ti.sub.1-x O.sub.3 Pb(thd).sub.2 tetrahydrofuran/isopropanol/x.dbd.0 to 1 [O.dbd.Zr(thd).sub.2 ].sub.n tetraglyme, or [O.dbd.Ti(thd).sub.2 ].sub.n butyl acetate/tetraglyme n.dbd.1 or 2RuO.sub.2 Ru(acac).sub.3 or butyl acetate Ru(thd).sub.3SnO.sub.2 Sn(alkyl).sub.2 (.beta.-diketonate).sub.2 butyl acetate alkyl.dbd.C.sub.1 --C.sub.18SnO.sub.2 Sn (acetate).sub.2 butyl acetateSrBi.sub.2 Ta.sub.2 O.sub.9 Sr(thd).sub.2 tg tetrahydrofuran/isopropanol/ BiPh.sub.3 tetraglyme Ta(OiPr).sub.4 thdTa.sub.2 O.sub.5 Ta(OEt).sub.5 ethanolTa.sub.2 O.sub.5 Ta(OR).sub.4 (thd) tetrahydrofuran/isopropanol/ R.dbd.ethyl, isopropyl tetraglymeTiO.sub.2 [O.dbd.Ti(thd).sub.2 ].sub.n butyl acetate/tetraglyme n.dbd.1 or 2V.sub.2 O.sub.5 O.dbd.V(thd).sub.3 butyl acetate/tetraglyme.Y.sub.2 O.sub.3 --ZrO.sub.2 Zr(thd).sub.4 tetrahydrofuran/tetraglyme; Y(thd).sub.3Y.sub.2 O.sub.3 Y(thd).sub.3 isopropanolYBaCuO Y(thd).sub.3 butyl acetate/tetraglyme Ba(thd).sub.2 (tetraglyme) or tetraglyme Cu(thd).sub.2ZrO.sub.2 [O.dbd.Zr(thd).sub.2 ].sub.n butyl acetate/tetraglyme n.dbd.1 or 2CuS Cu(shfac).sub.2 butyl acetate/tetraglymeSrS Sr(shfac).sub.2 butyl acetate/tetraglymeSrS Sr(sthd).sub.2 butyl acetate/tetraglymeSrS Sr(sthd).sub.2 butyl acetate/ tetrathiocyclodecane(Ca, Sr)Ga.sub.2 S.sub.4, Ca(sthd).sub.2 butyl acetate/tetraglymecerium-doped Sr(sthd).sub.2 Ga(sthd).sub.3 Ce(sthd).sub.4(Ca, Sr)Ga.sub.2 S.sub.4, Ca(sthd).sub.2 butyl acetate/cerium-doped Sr(sthd).sub.2 tetrathiocyclodecane Ga(sthd).sub.3 Ce(sthd).sub.4CuS Cu(shfac).sub.2 tetrahydrofuranacetate isopropanol tetraglymeCuS Cu(hfac).sub.2 butyl acetate/tetraglyme butyl acetate/ tetrathiocyclodecaneSrS Sr(thd).sub.2 butyl acetate/tetraglyme butyl acetate/ tetrathiocyclodecaneSrS Sr(thd).sub.2 butyl acetate/ tetrathiocyclodecane butyl acetate/t-butylthiol butyl acetate/ cyclohexylthiolCuS Cu(hfac).sub.2 tetrahydrofuran isopropanol tetraglymeTiS.sub.2 Ti(hfac).sub.3 butyl acetate/tetraglyme butyl acetate/ cyclohexylthiolTiS.sub.2 Ti(hfac).sub.3 butyl acetateMoS.sub.2 Mo(hfac).sub.3 butyl acetateMoS.sub.2 Mo(thd).sub.3 butyl acetate,______________________________________
- wherein said solvent medium contains a sulfur compound therein;
- R is selected from the group consisting of C.sub.1 -C.sub.8 alkyl, C.sub.2 -C.sub.8 cycloalkyl, C.sub.2 -C.sub.10 alkenyl, C.sub.2 -C.sub.15 cycloalkenyl, C.sub.6 -C.sub.10 aryl, and fluorinated derivatives thereof.
- 36. A method according to claim 35, wherein said sulfur compound is selected from the group consisting of hydrogen sulfide, t-butylthiol and cyclohexylthiol.
- 37. A method of forming a metal-containing film on a substrate, comprising providing a metal source reagent solution comprising a metal source reagent and solvent medium volatilizing the metal source reagent liquid solution to yield a metal source vapor, and contacting the metal source vapor with the substrate, to deposit the metal-containing film thereon, wherein the composition of the metal-containing film, metal source reagent, and solvent medium, are selected from the group consisting of:
- ______________________________________Metal Contain-ing Film Metal Source Reagent Solvent Medium______________________________________Al.sub.2 O.sub.3 Al(thd).sub.3 tetrahydrofuran/tetraglymeAl.sub.2 O.sub.3 Al(OR).sub.3 tetrahydrofuran/tetraglymeBaCaCuO Ba(thd).sub.2 (tetraglyme), butyl acetate/tetraglyme Ca(thd).sub.2, Cu(thd).sub.2Ba.sub.x Sr.sub.1-x TiO.sub.3 Ba(thd).sub.2 (tetraglyme) butyl acetate/tetraglymex.dbd.0 to 1 Sr(thd).sub.2 (tetraglyme) Ti(OiPr).sub.2 (thd).sub.2BiSrCaCuO Sr(thd).sub.2 (tetraglyme) isopropanol/tetraglyme Ca(thd).sub.2 (tetraglyme) Bi(C.sub.6 H.sub.5).sub.3 Cu(thd).sub.2Cr.sub.2 O.sub.3 Cr(thd).sub.3 tetrahydrofuran/tetraglymeEr doping Er(thd).sub.3 butyl acetate/tetraglymeof SiO.sub.2Ir Ir(acac).sub.3 butyl acetate Ir(thd).sub.3LaPO.sub.4 La(thd).sub.3 tetrahydrofuran O.dbd.P(OMe).sub.3MgAl.sub.2 O.sub.4 MgAl.sub.2 (OiPr).sub.8 isopropanolNb.sub.2 O.sub.5 Nb(OiPr).sub.4 (thd) tetrahydrofuran/isopropanol/ tetraglymePbLa.sub.x Ti.sub.1-x O.sub.3 Pb(thd).sub.2 tetrahydrofuran/tetraglyme La(thd).sub.3 Ti(OiPr).sub.2 (thd).sub.2PbTiO.sub.3 Pb(thd).sub.2 tetrahydrofuran/tetraglyme Ti(OiPr).sub.2 (thd).sub.2PbZrO.sub.3 Pb(thd).sub.2 tetrahydrofuran/isopropanol/ Zr(thd).sub.4 tetraglymePbZr.sub.x Ti.sub.1-x O.sub.3 Pb(thd).sub.2 tetrahydrofuran/isopropanol/x.dbd.0 to 1 Zr(thd).sub.4 tetraglyme Ti(OiPr).sub.2 (thd).sub.2PbZr.sub.x Ti.sub.1-x O.sub.3 Pb(thd).sub.2 tetrahydrofuran/isopropanol/x.dbd.0 to 1 [O.dbd.Zr(thd).sub.2 ].sub.n tetraglyme, or [O.dbd.Ti(thd).sub.2 ].sub.n butyl acetate/tetraglyme n.dbd.1 or 2RuO.sub.2 Ru(acac).sub.3 or butyl acetate Ru(thd).sub.3SnO.sub.2 Sn(alkyl).sub.2 (.beta.-diketonate).sub.2 butyl acetate alkyl.dbd.C.sub.1 --C.sub.18SnO.sub.2 Sn (acetate).sub.2 butyl acetateSrBi.sub.2 Ta.sub.2 O.sub.9 Sr(thd).sub.2 tg tetrahydrofuran/isopropanol/ BiPh.sub.3 tetraglyme Ta(OiPr).sub.4 thdTa.sub.2 O.sub.5 Ta(OEt).sub.5 ethanolTa.sub.2 O.sub.5 Ta(OR).sub.4 (thd) tetrahydrofuran/isopropanol/ R.dbd.ethyl, isopropyl tetraglymeTiO.sub.2 [O.dbd.Ti(thd).sub.2 ].sub.n butyl acetate/tetraglyme n.dbd.1 or 2V.sub.2 O.sub.5 O.dbd.V(thd).sub.3 butyl acetate/tetraglyme.Y.sub.2 O.sub.3 --ZrO.sub.2 Zr(thd).sub.4 tetrahydrofuran/tetraglyme; Y(thd).sub.3Y.sub.2 O.sub.3 Y(thd).sub.3 isopropanolYBaCuO Y(thd).sub.3 butyl acetate/tetraglyme Ba(thd).sub.2 (tetraglyme) or tetraglyme Cu(thd).sub.2ZrO.sub.2 [O.dbd.Zr(thd).sub.2 ].sub.n butyl acetate/tetraglyme n.dbd.1 or 2CuS Cu(shfac).sub.2 butyl acetate/tetraglymeSrS Sr(shfac).sub.2 butyl acetate/tetraglymeSrS Sr(sthd).sub.2 butyl acetate/tetraglymeSrS Sr(sthd).sub.2 butyl acetate/ tetrathiocyclodecane(Ca, Sr)Ga.sub.2 S.sub.4, Ca(sthd).sub.2 butyl acetate/tetraglymecerium-doped Sr(sthd).sub.2 Ga(sthd).sub.3 Ce(sthd).sub.4(Ca, Sr)Ga.sub.2 S.sub.4, Ca(sthd).sub.2 butyl acetate/cerium-doped Sr(sthd).sub.2 tetrathiocyclodecane Ga(sthd).sub.3 Ce(sthd).sub.4CuS Cu(shfac).sub.2 tetrahydrofuranacetate isopropanol tetraglymeCuS Cu(hfac).sub.2 butyl acetate/tetraglyme butyl acetate/ tetrathiocyclodecaneSrS Sr(thd).sub.2 butyl acetate/tetraglyme butyl acetate/ tetrathiocyclodecaneSrS Sr(thd).sub.2 butyl acetate/ tetrathiocyclodecane butyl acetate/t-butylthiol butyl acetate/ cyclohexylthiolCuS Cu(hfac).sub.2 tetrahydrofuran isopropanol tetraglymeTiS.sub.2 Ti(hfac).sub.3 butyl acetate/tetraglyme butyl acetate/ cyclohexylthiolTiS.sub.2 Ti(hfac).sub.3 butyl acetateMoS.sub.2 Mo(hfac).sub.3 butyl acetateMoS.sub.2 Mo(thd).sub.3 butyl acetate,______________________________________
- further comprising reacting the metal sulfide film with a metal-coreactant to form a binary metal sulfide film on said substrate;
- R is selected from the group consisting of C.sub.1 -C.sub.8 alkyl, C.sub.2 -C.sub.8 cycloalkyl, C.sub.2 -C.sub.10 alkenyl, C.sub.2 -C.sub.15 cycloalkenyl, C.sub.6 -C.sub.10 aryl, and fluorinated derivatives thereof.
- 38. A method of forming on a substrate a metal film comprising depositing said metal film on said substrate via chemical vapor deposition from a metalorganic complex of the formula:
- MA.sub.Y X
- wherein:
- M is a y-valent metal selected from the group consisting of Mg, Sc, La, Cc, Ti, Zr, Hf, Pr, V, Nb, Ta, Nd, Cr, W, Pm, Mn, Re, Sm, Ru, Eu, Co, Rh, Ir, Gd, Ni, Tb, Dy, Ho, Er, Pb, Tm, and Yb;
- A is a monodentate or multidentate organic ligand selected from the group consisting of .beta.-diketonates, .beta.-thioketonates, cyclopentadienyls, alkyls, perfluoroalkyls, alkoxides, perfluoroalkoxides, and Schiff bases, and A is coordinated to M which allows complexing of MA.sub.Y with X;
- y is an integer having a value of 2, 3 or 4;
- each of the A ligands is the same or different; and
- X is a monodentate or multidentate ligand coordinated to M and X is selected from the group consisting of:
- oxyhydrocarbyl ligands;
- nitrogenous oxyhydrocarbyl ligands;
- fluorooxyhydrocarbyl ligands; and
- thiooxyhydrocarbyl ligands;
- amines and polyamines;
- bipyridines;
- ligands of the formula: ##STR4## wherein G is --O--, --S--, or --NR--, wherein R is H or hydrocarbyl; crown ethers;
- thioethers; and
- ligands of the formula:
- R.sup.0 O(C(R.sup.1).sub.2 C(R.sup.2).sub.2 O).sub.n R.sup.0
- wherein:
- R.sup.0 =H, methyl, ethyl, n-propyl, cyanato, perfluoroethyl, perfluoro-n-propyl, or vinyl;
- R.sup.1 =H, F, or a sterically acceptable hydrocarbyl substituent;
- R.sup.2 =H, F, or a sterically acceptable hydrocarbyl substituent;
- n=2, 3, 4, 5, or 6; and
- each R.sup.0, R.sup.1, and R.sup.2 is the same as or different from the other R.sup.0, R.sup.1, and R.sup.2, respectively,
- wherein said method comprises:
- providing the metalorganic complex in a solvent or suspending agent as a metal source reagent solution consisting essentially of said metalorganic complex and said solvent or suspending agent;
- volatilizing the metal source reagent liquid solution to yield a metal source vapor; and
- contacting the metal source vapor with the substrate, to deposit the metal-containing film thereon.
CROSS-REFERENCE TO RELATED APPLICATIONS
This is a continuation-in-part of U.S. application Ser. No. 08/414,504 filed Mar. 31, 1995, in the names of Robin A. Gardiner, Peter S. Kirlin, Thomas H. Baum, Douglas Gordon, Timothy E. Glassman, Sofia Pombrik, and Brian A. Vaartstra, now U.S. Pat. No. 5,820,664, which in turn is a continuation-in-part of U.S. application Ser. No. 08/280,143 filed Jul. 25, 1994, in the names of Peter S. Kirlin, Robin L. Binder, Robin A. Gardiner, Peter Van Buskirk, Jiming Zhang, and Gregory Stauf, now U.S. Pat. No. 5,536,323, which is a continuation of U.S. patent application Ser. No. 07/927,134, now abandoned, filed Aug. 7, 1992 in the same names, which was in turn a continuation-in-part of U.S. patent application Ser. No. 07/807,807, filed Dec. 13, 1991 in the names of Peter S. Kirlin, Robin L. Binder, and Robin A. Gardiner, now issued as U.S. Pat. No. 5,204,314, which is a continuation of U.S. patent application Ser. No. 07/549,389, filed Jul. 6, 1990 in the same names, now abandoned.
This also is a continuation-in-part of U.S. application Ser. No. 08/181,800 filed Jan. 15, 1994 in the names of Peter S. Kirlin, Duncan W. Brown, and Robin A. Gardiner, now U.S. Pat. No. 5,453,494, which is a continuation-in-part of U.S. application Ser. No. 07/918,141 filed Jul. 22, 1992 in the names of Peter S. Kirlin, et al., and issued Jan. 18, 1994 as U.S. Pat. No. 5,280,012, which in turn is a continuation of U.S. application Ser. No. 07/615,303 filed Nov. 19, 1990, now abandoned, which in turn is a divisional application of U.S. application Ser. No. 07/581,631 filed Sep. 12, 1990 in the names of Peter S. Kirlin, et al., and issued Jul. 6, 1993 as U.S. Pat. No. 5,225,561, which in turn is a continuation-in-part of U.S. application Ser. No. 07/549,389 filed Jul. 6, 1990 in the names of Peter S. Kirlin, Robin L. Binder, and Robin A. Gardiner, now abandoned.
GOVERNMENT RIGHTS IN THE INVENTION
This invention was made with Government support under Contract No. DNA001-92-C-0136 awarded by the U.S. Ballistic Missile Defense Organization (BMDO). The Government has certain rights in this invention.
US Referenced Citations (14)
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Van Buskirk, P.C. et al., "MOCVD Growth of BaTiO.sub.3 in an 8" Single-Wafer CVD Reactor," Proc. ISAF 92, Eighth Int'l Symp. Appl. Ferroelectrics, Aug. 31-Sep. 2, 1992. No page number. |
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