Todd P. Lukanc

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for automated generation of masks for spacer form...
- Patent number 9,274,410
- Issue date Mar 1, 2016
- Cypress Semiconductor Corporation
- Wai Lo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for designing and manufacturing optical lithogr...
- Patent number 9,064,078
- Issue date Jun 23, 2015
- GLOBALFOUNDRIES Inc.
- Piyush Verma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods for optical proximity correction in the design and fabricat...
- Patent number 8,975,195
- Issue date Mar 10, 2015
- GLOBALFOUNDRIES, INC.
- Todd Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of forming an electronic device including forming features w...
- Patent number 8,003,545
- Issue date Aug 23, 2011
- Spansion LLC
- Todd Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for integrated circuit device design and manufact...
- Patent number 7,657,864
- Issue date Feb 2, 2010
- GLOBALFOUNDRIES Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for designing an integrated circuit device
- Patent number 7,543,256
- Issue date Jun 2, 2009
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for increasing manufacturability of a circuit layout
- Patent number 7,487,492
- Issue date Feb 3, 2009
- Advanced Micro Devices, Inc.
- Ajay Singhal
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Two mask photoresist exposure pattern for dense and isolated regions
- Patent number 7,368,225
- Issue date May 6, 2008
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimizing an integrated circuit layout by taking into consideratio...
- Patent number 7,313,769
- Issue date Dec 25, 2007
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for integrated circuit device design and manufact...
- Patent number 7,269,804
- Issue date Sep 11, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for metrology recipe generation and review and an...
- Patent number 7,207,017
- Issue date Apr 17, 2007
- Advanced Micro Devices, Inc.
- Cyrus Tabery
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for design rule creation and selection
- Patent number 7,194,725
- Issue date Mar 20, 2007
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of lithographic image alignment for use with a dual mask exp...
- Patent number 7,108,946
- Issue date Sep 19, 2006
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for generating trenches for vias
- Patent number 7,076,750
- Issue date Jul 11, 2006
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Predefined critical spaces in IC patterning to reduce line end pull...
- Patent number 7,071,085
- Issue date Jul 4, 2006
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for determining an illumination intensity profile...
- Patent number 7,027,130
- Issue date Apr 11, 2006
- Advanced Micro Devices, Inc.
- Christopher A. Spence
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduce line end pull back by exposing and etching space after mask...
- Patent number 7,015,148
- Issue date Mar 21, 2006
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microdevice having non-linear structural component and method of fa...
- Patent number 6,995,433
- Issue date Feb 7, 2006
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic photomask and method of manufacture to improve photoma...
- Patent number 6,974,652
- Issue date Dec 13, 2005
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of extending the areas of clear field phase shift generation
- Patent number 6,818,358
- Issue date Nov 16, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Two mask photoresist exposure pattern for dense and isolated regions
- Patent number 6,803,178
- Issue date Oct 12, 2004
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and enhancing clear field phase shift masks with border arou...
- Patent number 6,797,438
- Issue date Sep 28, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-aligned conductive plugs in a semiconductor device
- Patent number 6,768,204
- Issue date Jul 27, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of enhancing gate patterning properties with reflective hard...
- Patent number 6,753,266
- Issue date Jun 22, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of enhancing clear field phase shift masks with chrome borde...
- Patent number 6,749,971
- Issue date Jun 15, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of enhancing clear field phase shift masks with border regio...
- Patent number 6,749,970
- Issue date Jun 15, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for forming a photoresist mask
- Patent number 6,689,541
- Issue date Feb 10, 2004
- Advanced Micro Devices, Inc.
- Scott A. Bell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of enhancing clear field phase shift masks by adding paralle...
- Patent number 6,675,369
- Issue date Jan 6, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for etching an organic dielectric using a silyated photores...
- Patent number 6,660,645
- Issue date Dec 9, 2003
- Advanced Micro Devices, Inc.
- Scott A. Bell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining an etch endpoint
- Patent number 6,641,747
- Issue date Nov 4, 2003
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND SYSTEMS FOR DESIGNING AND MANUFACTURING OPTICAL LITHOGR...
- Publication number 20150040078
- Publication date Feb 5, 2015
- GLOBALFOUNDRIES, INC.
- Piyush VERMA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS FOR OPTICAL PROXIMITY CORRECTION IN THE DESIGN AND FABRICAT...
- Publication number 20140220786
- Publication date Aug 7, 2014
- GLOBALFOUNDRIES, Inc.
- Todd Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR AUTOMATED GENERATION OF MASKS FOR SPACER FORM...
- Publication number 20110195348
- Publication date Aug 11, 2011
- Wai Lo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING AN ELECTRONIC DEVICE INCLUDING FORMING FEATURES W...
- Publication number 20090209107
- Publication date Aug 20, 2009
- SPANSION LLC
- Todd Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR INTEGRATED CIRCUIT DEVICE DESIGN AND MANUFACT...
- Publication number 20070209030
- Publication date Sep 6, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device and method for determining an illumination intensity profile...
- Publication number 20050243299
- Publication date Nov 3, 2005
- Christopher A. Spence
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for integrated circuit device design and manufact...
- Publication number 20050229125
- Publication date Oct 13, 2005
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of enhancing clear field phase shift masks with chrome borde...
- Publication number 20040023123
- Publication date Feb 5, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of enhancing clear field phase shift masks with border regio...
- Publication number 20040009407
- Publication date Jan 15, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SIDEWALL SPACER DEFINITION OF GATES
- Publication number 20030003751
- Publication date Jan 2, 2003
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Barrier layer integrity test
- Publication number 20020151093
- Publication date Oct 17, 2002
- Christy Mei-Chu Woo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Two mask via pattern to improve pattern definition
- Publication number 20020106587
- Publication date Aug 8, 2002
- Advanced Micro Devices, Inc.
- Todd Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Phase shift mask and system and method for making the same
- Publication number 20020102471
- Publication date Aug 1, 2002
- Todd Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of providing a frontside contact to a substrate of SOI device
- Publication number 20020094666
- Publication date Jul 18, 2002
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch bias distribution across semiconductor wafer
- Publication number 20010031506
- Publication date Oct 18, 2001
- Marina V. Plat
- H01 - BASIC ELECTRIC ELEMENTS

Todd P. Lukanc

Person

Patents Grantslast 30 patents

Method and system for automated generation of masks for spacer form...

Methods and systems for designing and manufacturing optical lithogr...

Methods for optical proximity correction in the design and fabricat...

Method of forming an electronic device including forming features w...

System and method for integrated circuit device design and manufact...

System and method for designing an integrated circuit device

Method for increasing manufacturability of a circuit layout

Two mask photoresist exposure pattern for dense and isolated regions

Optimizing an integrated circuit layout by taking into consideratio...

System and method for integrated circuit device design and manufact...

Method and system for metrology recipe generation and review and an...

System and method for design rule creation and selection

Method of lithographic image alignment for use with a dual mask exp...

Method and apparatus for generating trenches for vias

Predefined critical spaces in IC patterning to reduce line end pull...

Device and method for determining an illumination intensity profile...

Reduce line end pull back by exposing and etching space after mask...

Microdevice having non-linear structural component and method of fa...

Lithographic photomask and method of manufacture to improve photoma...

Method of extending the areas of clear field phase shift generation

Two mask photoresist exposure pattern for dense and isolated regions

Method and enhancing clear field phase shift masks with border arou...

Self-aligned conductive plugs in a semiconductor device

Method of enhancing gate patterning properties with reflective hard...

Method of enhancing clear field phase shift masks with chrome borde...

Method of enhancing clear field phase shift masks with border regio...

Process for forming a photoresist mask

Method of enhancing clear field phase shift masks by adding paralle...

Process for etching an organic dielectric using a silyated photores...

Method and apparatus for determining an etch endpoint

Patents Applicationslast 30 patents

METHODS AND SYSTEMS FOR DESIGNING AND MANUFACTURING OPTICAL LITHOGR...

METHODS FOR OPTICAL PROXIMITY CORRECTION IN THE DESIGN AND FABRICAT...

METHOD AND SYSTEM FOR AUTOMATED GENERATION OF MASKS FOR SPACER FORM...

METHOD OF FORMING AN ELECTRONIC DEVICE INCLUDING FORMING FEATURES W...

SYSTEM AND METHOD FOR INTEGRATED CIRCUIT DEVICE DESIGN AND MANUFACT...

Device and method for determining an illumination intensity profile...

System and method for integrated circuit device design and manufact...

Method of enhancing clear field phase shift masks with chrome borde...

Method of enhancing clear field phase shift masks with border regio...

SIDEWALL SPACER DEFINITION OF GATES

Barrier layer integrity test

Two mask via pattern to improve pattern definition

Phase shift mask and system and method for making the same

Method of providing a frontside contact to a substrate of SOI device

Etch bias distribution across semiconductor wafer