Tom Deacon

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for depositing low dielectric constant oxide film
- Patent number 6,523,494
- Issue date Feb 25, 2003
- Applied Materials, Inc.
- Dung-Ching Perng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lamp array for thermal processing chamber
- Patent number 6,476,362
- Issue date Nov 5, 2002
- Applied Materials, Inc.
- Thomas E. Deacon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Delineation pattern for epitaxial depositions
- Patent number 6,171,966
- Issue date Jan 9, 2001
- Applied Materials, Inc.
- Thomas E. Deacon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing low dielectric constant oxide films
- Patent number 6,149,987
- Issue date Nov 21, 2000
- Applied Materials, Inc.
- Dung-Ching Perng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution for CVD systems
- Patent number 5,792,269
- Issue date Aug 11, 1998
- Applied Materials, Inc.
- Thomas E. Deacon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermally processing semiconductor wafers at non-ambient pressures
- Patent number 5,194,401
- Issue date Mar 16, 1993
- Applied Materials, Inc.
- David V. Adams
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for substrate heating utilizing various infrar...
- Patent number 5,179,677
- Issue date Jan 12, 1993
- Applied Materials, Inc.
- Roger N. Anderson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pressure-resistant thermal reactor system for semiconductor processing
- Patent number 4,920,918
- Issue date May 1, 1990
- Applied Materials, Inc.
- David V. Adams
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Heating apparatus and semiconductor manufacturing apparatus
- Publication number 20080152328
- Publication date Jun 26, 2008
- Akira Okabe
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Person

Patents Grantslast 30 patents

Apparatus for depositing low dielectric constant oxide film

Lamp array for thermal processing chamber

Delineation pattern for epitaxial depositions

Method for depositing low dielectric constant oxide films

Gas distribution for CVD systems

Thermally processing semiconductor wafers at non-ambient pressures

Apparatus and method for substrate heating utilizing various infrar...

Pressure-resistant thermal reactor system for semiconductor processing

Patents Applicationslast 30 patents

Heating apparatus and semiconductor manufacturing apparatus