Tom Zhong

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of uniformly coating a substrate
- Patent number 7,030,039
- Issue date Apr 18, 2006
- ASML Holding N.V.
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of uniformly coating a substrate
- Patent number 7,018,943
- Issue date Mar 28, 2006
- ASML Holding N.V.
- Gurer Emir
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of uniformly coating a substrate
- Patent number 6,977,098
- Issue date Dec 20, 2005
- ASML Holding N.V.
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Environment exchange control for material on a wafer surface
- Patent number 6,911,091
- Issue date Jun 28, 2005
- ASML Netherlands B.V.
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Environment exchange control for material on a wafer surface
- Patent number 6,844,027
- Issue date Jan 18, 2005
- ASML Holding N.V.
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Environment exchange control for material on a wafer surface
- Patent number 6,780,461
- Issue date Aug 24, 2004
- ASML Holding N.V.
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for two dimensional adaptive process control of critical dim...
- Patent number 6,662,466
- Issue date Dec 16, 2003
- ASML Holdings, N.V.
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Environment exchange control for material on a wafer surface
- Patent number 6,468,586
- Issue date Oct 22, 2002
- Silicon Valley Group, Inc.
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for two dimensional adaptive process control of critical dim...
- Patent number 6,327,793
- Issue date Dec 11, 2001
- Silicon Valley Group
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Environment exchange control for material on a wafer surface
- Patent number 6,254,936
- Issue date Jul 3, 2001
- Silicon Valley Group, Inc.
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Environment exchange control for material on a wafer surface
- Publication number 20030190427
- Publication date Oct 9, 2003
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Environment exchange control for material on a wafer surface
- Publication number 20030010289
- Publication date Jan 16, 2003
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of uniformly coating a substrate
- Publication number 20020127334
- Publication date Sep 12, 2002
- Emir Gurer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for two dimensional adaptive process control of critical dim...
- Publication number 20020112370
- Publication date Aug 22, 2002
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Method of uniformly coating a substrate
- Publication number 20020098283
- Publication date Jul 25, 2002
- Emir Gurer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of uniformly coating a substrate
- Publication number 20020004100
- Publication date Jan 10, 2002
- Emir Gurer
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method of uniformly coating a substrate

Method of uniformly coating a substrate

Method of uniformly coating a substrate

Environment exchange control for material on a wafer surface

Environment exchange control for material on a wafer surface

Environment exchange control for material on a wafer surface

Method for two dimensional adaptive process control of critical dim...

Environment exchange control for material on a wafer surface

Method for two dimensional adaptive process control of critical dim...

Environment exchange control for material on a wafer surface

Patents Applicationslast 30 patents

Environment exchange control for material on a wafer surface

Environment exchange control for material on a wafer surface

Method of uniformly coating a substrate

Method for two dimensional adaptive process control of critical dim...

Method of uniformly coating a substrate

Method of uniformly coating a substrate