Tomio Y. Katata

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device having oxidized metal film and manufacture met...
- Patent number 8,148,274
- Issue date Apr 3, 2012
- Kabushiki Kaisha Toshiba
- Junichi Wada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device having oxidized metal film and manufacture met...
- Patent number 7,994,054
- Issue date Aug 9, 2011
- Kabushiki Kaisha Toshiba
- Atsuko Sakata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device having oxidized metal film and manufacture met...
- Patent number 7,791,202
- Issue date Sep 7, 2010
- Kabushiki Kaisha Toshiba
- Atsuko Sakata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 7,399,706
- Issue date Jul 15, 2008
- Kabushiki Kaisha Toshiba
- Seiichi Omoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having oxidized metal film and manufacture met...
- Patent number 7,351,656
- Issue date Apr 1, 2008
- Kabushiki Kaihsa Toshiba
- Atsuko Sakata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 6,946,387
- Issue date Sep 20, 2005
- Kabushiki Kaisha Toshiba
- Junichi Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,768,202
- Issue date Jul 27, 2004
- Kabushiki Kaisha Toshiba
- Yasushi Oikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device having an aluminum wir...
- Patent number 6,720,253
- Issue date Apr 13, 2004
- Kabushiki Kaisha Toshiba
- Junichi Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for the manufacture thereof
- Patent number 6,699,726
- Issue date Mar 2, 2004
- Kabushiki Kaisha Toshiba
- Osamu Hidaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,673,704
- Issue date Jan 6, 2004
- Kabushiki Kaisha Toshiba
- Junichi Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an oxide film on a gate side wall of a gate struc...
- Patent number 6,605,521
- Issue date Aug 12, 2003
- Kabushiki Kaisha Toshiba
- Atul C. Ajmera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hot plate and semiconductor device manufacturing method using the same
- Patent number 6,566,632
- Issue date May 20, 2003
- Kabushiki Kaisha Toshiba
- Tomio Katata
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Filter, filtering frame, and semiconductor device manufacturing met...
- Patent number 6,521,010
- Issue date Feb 18, 2003
- Kabushiki Kaisha Toshiba
- Tomio Katata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for the manufacture thereof
- Patent number 6,521,927
- Issue date Feb 18, 2003
- Kabushiki Kaisha Toshiba
- Osamu Hidaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hot plate and method of manufacturing semiconductor device
- Patent number 6,500,686
- Issue date Dec 31, 2002
- Kabushiki Kaisha Toshiba
- Tomio Katata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of producing the same
- Patent number 6,462,395
- Issue date Oct 8, 2002
- Fujitsu Limited
- Masatoshi Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 6,440,843
- Issue date Aug 27, 2002
- Kabushiki Kaisha Toshiba
- Junichi Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,436,813
- Issue date Aug 20, 2002
- Kabushiki Kaisha Toshiba
- Yasushi Oikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus and film forming method
- Patent number 6,423,192
- Issue date Jul 23, 2002
- Kabushiki Kaisha Toshiba
- Junichi Wada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing a multilayer thin film by means of magnetron s...
- Patent number 6,342,131
- Issue date Jan 29, 2002
- Kabushiki Kaisha Toshiba
- Viraj Y. Sardesai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wiring layer of a semiconductor integrated circuit
- Patent number 6,313,535
- Issue date Nov 6, 2001
- Kabushiki Kaisha Toshiba
- Junichiro Iba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 6,307,267
- Issue date Oct 23, 2001
- Kabushiki Kaisha Toshiba
- Junichi Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High throughput A1-Cu thin film sputtering process on small contact...
- Patent number 6,140,236
- Issue date Oct 31, 2000
- Kabushiki Kaisha Toshiba
- Darryl Restaino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of filling contact holes and wiring grooves of a semiconduct...
- Patent number 6,071,810
- Issue date Jun 6, 2000
- Kabushiki Kaisha Toshiba
- Junichi Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with electrode formed of conductive layer cons...
- Patent number 6,048,791
- Issue date Apr 11, 2000
- Kabushiki Kaisha Toshiba
- Tomio Katata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a ternary compound low resistive electrode
- Patent number 6,001,718
- Issue date Dec 14, 1999
- Kabushiki Kaisha Toshiba
- Tomio Katata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for fabricating a metallization structure
- Patent number 5,943,601
- Issue date Aug 24, 1999
- International Business Machines Corporation
- Takamasa Usui
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE HAVING OXIDIZED METAL FILM AND MANUFACTURE MET...
- Publication number 20120152168
- Publication date Jun 21, 2012
- Kabushiki Kaisha Toshiba
- Atsuko Sakata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device
- Publication number 20080272494
- Publication date Nov 6, 2008
- Kabushiki Kaisha Toshiba
- Seiichi Omoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having oxidized metal film and manufacture met...
- Publication number 20080261398
- Publication date Oct 23, 2008
- Kabushiki Kaisha Toshiba
- Atsuko Sakata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device having oxidized metal film and manufacture met...
- Publication number 20080122102
- Publication date May 29, 2008
- Kabushiki Kaisha Toshiba
- Atsuko Sakata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20080099921
- Publication date May 1, 2008
- Kabushiki Kaisha Toshiba
- Tomio KATATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having oxidized metal film and manufacture met...
- Publication number 20080090410
- Publication date Apr 17, 2008
- Atsuko Sakata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20080083990
- Publication date Apr 10, 2008
- Kabushiki Kaisha Toshiba
- Akitsugu Hatazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20080001298
- Publication date Jan 3, 2008
- Kabushiki Kaisha Toshiba
- Shuichi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having oxidized metal film and manufacture met...
- Publication number 20060214305
- Publication date Sep 28, 2006
- Atsuko Sakata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of manufacturing a semiconductor device and semiconductor de...
- Publication number 20050272258
- Publication date Dec 8, 2005
- Toshiyuki Morita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20050186793
- Publication date Aug 25, 2005
- Seiichi Omoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and an apparatus for manufacturing a semiconductor device
- Publication number 20050148177
- Publication date Jul 7, 2005
- Kabushiki Kaisha Toshiba
- Kazuhiro Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20040043602
- Publication date Mar 4, 2004
- KABUSHIKI KAISHA TOSHIBA
- Junichi Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for the manufacture thereof
- Publication number 20030134464
- Publication date Jul 17, 2003
- KABUSHIKI KAISHA TOSHIBA
- Osamu Hidaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming an oxide film on a gate side wall of a gate struc...
- Publication number 20030036253
- Publication date Feb 20, 2003
- KABUSHIKI KAISHA TOSHIBA
- Atul C. Ajmera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20020192938
- Publication date Dec 19, 2002
- KABUSHIKI KAISHA TOSHIBA
- Junichi Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20020192946
- Publication date Dec 19, 2002
- KABUSHIKI KAISHA TOSHIBA
- Yasushi Oikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR THE MANUFACTURE THEREOF
- Publication number 20020040988
- Publication date Apr 11, 2002
- OSAMU HIDAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing thereof
- Publication number 20020033539
- Publication date Mar 21, 2002
- KABUSHIKI KAISHA TOSHIBA
- Junichi Wada
- H01 - BASIC ELECTRIC ELEMENTS

Tomio Y. Katata

Person

Patents Grantslast 30 patents

Semiconductor device having oxidized metal film and manufacture met...

Semiconductor device having oxidized metal film and manufacture met...

Semiconductor device having oxidized metal film and manufacture met...

Manufacturing method of semiconductor device

Semiconductor device having oxidized metal film and manufacture met...

Semiconductor device and method for manufacturing the same

Semiconductor device and method of manufacturing the same

Method of manufacturing semiconductor device having an aluminum wir...

Semiconductor device and method for the manufacture thereof

Semiconductor device and method of manufacturing the same

Method of forming an oxide film on a gate side wall of a gate struc...

Hot plate and semiconductor device manufacturing method using the same

Filter, filtering frame, and semiconductor device manufacturing met...

Semiconductor device and method for the manufacture thereof

Hot plate and method of manufacturing semiconductor device

Semiconductor device and method of producing the same

Semiconductor device and method for manufacturing the same

Semiconductor device and method of manufacturing the same

Sputtering apparatus and film forming method

Method of depositing a multilayer thin film by means of magnetron s...

Wiring layer of a semiconductor integrated circuit

Semiconductor device and manufacturing method thereof

High throughput A1-Cu thin film sputtering process on small contact...

Method of filling contact holes and wiring grooves of a semiconduct...

Semiconductor device with electrode formed of conductive layer cons...

Semiconductor device having a ternary compound low resistive electrode

Process for fabricating a metallization structure

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE HAVING OXIDIZED METAL FILM AND MANUFACTURE MET...

Semiconductor device

Semiconductor device having oxidized metal film and manufacture met...

Semiconductor device having oxidized metal film and manufacture met...

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

Semiconductor device having oxidized metal film and manufacture met...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

Semiconductor device having oxidized metal film and manufacture met...

Method of manufacturing a semiconductor device and semiconductor de...

Manufacturing method of semiconductor device

Method and an apparatus for manufacturing a semiconductor device

Semiconductor device and method for manufacturing the same

Semiconductor device and method for the manufacture thereof

Method of forming an oxide film on a gate side wall of a gate struc...

Semiconductor device and method for manufacturing the same

Semiconductor device and method of manufacturing the same

SEMICONDUCTOR DEVICE AND METHOD FOR THE MANUFACTURE THEREOF

Semiconductor device and method of manufacturing thereof