Tomoaki SATO

Person

Yamaguchi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Treatment liquid for semiconductor wafers
- Patent number 12,195,658
- Issue date Jan 14, 2025
- Tokuyama Corporation
- Yuki Kikkawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Onium salt-containing treatment liquid for semiconductor wafers
- Patent number 12,024,663
- Issue date Jul 2, 2024
- Tokuyama Corporation
- Yuki Kikkawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inhibitor for RuO4 gas generation and method for inhibiting RuO4 ga...
- Patent number 11,932,590
- Issue date Mar 19, 2024
- Tokuyama Corporation
- Tomoaki Sato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Treatment liquid for semiconductor with ruthenium and method of pro...
- Patent number 11,674,230
- Issue date Jun 13, 2023
- Tokuyama Corporation
- Tomoaki Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Quaternary alkyl ammonium hypochlorite solution, method of producin...
- Patent number 11,572,331
- Issue date Feb 7, 2023
- Tokuyama Corporation
- Takafumi Shimoda
- B08 - CLEANING
Information Patent Grant
Quaternary alkyl ammonium hypochlorite solution, method of producin...
- Patent number 11,390,577
- Issue date Jul 19, 2022
- Tokuyama Corporation
- Takafumi Shimoda
- B08 - CLEANING
Information Patent Grant
Group III nitride semiconductor light-emitting element and wafer in...
- Patent number 10,818,823
- Issue date Oct 27, 2020
- Stanley Electric Co., Ltd.
- Tomoaki Sato
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INHIBITOR FOR RuO4 GAS GENERATION AND METHOD FOR INHIBITING RuO4 GA...
- Publication number 20240182404
- Publication date Jun 6, 2024
- Tokuyama Corporation
- Tomoaki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING SEMICONDUCTOR CONTAINING TRANSITION METAL, ME...
- Publication number 20240055272
- Publication date Feb 15, 2024
- Tokuyama Corporation
- Yuki KIKKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER PROCESSING LIQUID CONTAINING HYPOBROMITE IONS A...
- Publication number 20240014045
- Publication date Jan 11, 2024
- Tokuyama Corporation
- Takafumi SHIMODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM AND METHOD OF PRO...
- Publication number 20230257887
- Publication date Aug 17, 2023
- Tokuyama Corporation
- Tomoaki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM
- Publication number 20230207329
- Publication date Jun 29, 2023
- Tokuyama Corporation
- Tomoaki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID FOR SEMICONDUCTORS AND METHOD FOR PRODUCING SAME
- Publication number 20230126771
- Publication date Apr 27, 2023
- Tokuyama Corporation
- Yuki KIKKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR WAFER TREATMENT LIQUID AND PRODUTION METHOD THEREOF
- Publication number 20220411937
- Publication date Dec 29, 2022
- Tokuyama Corporation
- Tomoaki SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR TREATMENT LIQUID
- Publication number 20220328320
- Publication date Oct 13, 2022
- Tokuyama Corporation
- Yuki KIKKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
QUATERNARY ALKYL AMMONIUM HYPOCHLORITE SOLUTION, METHOD OF PRODUCIN...
- Publication number 20220315522
- Publication date Oct 6, 2022
- Tokuyama Corporation
- Takafumi SHIMODA
- B08 - CLEANING
Information Patent Application
RUTHENIUM OXIDE GAS ABSORBENT LIQUID, ANALYSIS METHOD FOR RUTHENIUM...
- Publication number 20220316996
- Publication date Oct 6, 2022
- Tokuyama Corporation
- Tomoaki SATO
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
TREATMENT LIQUID FOR SEMICONDUCTOR WAFERS
- Publication number 20220298416
- Publication date Sep 22, 2022
- Tokuyama Corporation
- Yuki KIKKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ONIUM SALT-CONTAINING TREATMENT LIQUID FOR SEMICONDUCTOR WAFERS
- Publication number 20220073820
- Publication date Mar 10, 2022
- Tokuyama Corporation
- Yuki KIKKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR INHIBITING GENERATION OF RUTHENIUM-CONTAINING GAS FROM R...
- Publication number 20220033976
- Publication date Feb 3, 2022
- Tokuyama Corporation
- Tomoaki SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR WAFER TREATMENT LIQUID CONTAINING HYPOCHLORITE IONS A...
- Publication number 20220010206
- Publication date Jan 13, 2022
- Tokuyama Corporation
- Takafumi SHIMODA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM AND METHOD OF PRO...
- Publication number 20210388508
- Publication date Dec 16, 2021
- Tokuyama Corporation
- Tomoaki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INHIBITOR FOR RuO4 GAS GENERATION AND METHOD FOR INHIBITING RuO4 GA...
- Publication number 20210340095
- Publication date Nov 4, 2021
- Tokuyama Corporation
- Tomoaki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
QUATERNARY ALKYL AMMONIUM HYPOCHLORITE SOLUTION, METHOD OF PRODUCIN...
- Publication number 20210155878
- Publication date May 27, 2021
- Tokuyama Corporation
- Takafumi SHIMODA
- B08 - CLEANING
Information Patent Application
GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND WAFER IN...
- Publication number 20190198714
- Publication date Jun 27, 2019
- STANLEY ELECTRIC CO., LTD
- Tomoaki SATO
- H01 - BASIC ELECTRIC ELEMENTS

Tomoaki SATO

Person

Patents Grantslast 30 patents

Treatment liquid for semiconductor wafers

Onium salt-containing treatment liquid for semiconductor wafers

Inhibitor for RuO4 gas generation and method for inhibiting RuO4 ga...

Treatment liquid for semiconductor with ruthenium and method of pro...

Quaternary alkyl ammonium hypochlorite solution, method of producin...

Quaternary alkyl ammonium hypochlorite solution, method of producin...

Group III nitride semiconductor light-emitting element and wafer in...

Patents Applicationslast 30 patents

INHIBITOR FOR RuO4 GAS GENERATION AND METHOD FOR INHIBITING RuO4 GA...

METHOD FOR PROCESSING SEMICONDUCTOR CONTAINING TRANSITION METAL, ME...

SEMICONDUCTOR WAFER PROCESSING LIQUID CONTAINING HYPOBROMITE IONS A...

TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM AND METHOD OF PRO...

TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM

TREATMENT LIQUID FOR SEMICONDUCTORS AND METHOD FOR PRODUCING SAME

SEMICONDUCTOR WAFER TREATMENT LIQUID AND PRODUTION METHOD THEREOF

SEMICONDUCTOR TREATMENT LIQUID

QUATERNARY ALKYL AMMONIUM HYPOCHLORITE SOLUTION, METHOD OF PRODUCIN...

RUTHENIUM OXIDE GAS ABSORBENT LIQUID, ANALYSIS METHOD FOR RUTHENIUM...

TREATMENT LIQUID FOR SEMICONDUCTOR WAFERS

ONIUM SALT-CONTAINING TREATMENT LIQUID FOR SEMICONDUCTOR WAFERS

METHOD FOR INHIBITING GENERATION OF RUTHENIUM-CONTAINING GAS FROM R...

SEMICONDUCTOR WAFER TREATMENT LIQUID CONTAINING HYPOCHLORITE IONS A...

TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM AND METHOD OF PRO...

INHIBITOR FOR RuO4 GAS GENERATION AND METHOD FOR INHIBITING RuO4 GA...

QUATERNARY ALKYL AMMONIUM HYPOCHLORITE SOLUTION, METHOD OF PRODUCIN...

GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND WAFER IN...