Tomohisa Hoshino

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electrolytic processing jig and electrolytic processing method
- Patent number 11,542,627
- Issue date Jan 3, 2023
- Tokyo Electron Limited
- Tomohisa Hoshino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrolytic treatment apparatus and electrolytic treatment method
- Patent number 11,427,921
- Issue date Aug 30, 2022
- Tokyo Electron Limited
- Tomohisa Hoshino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrolytic processing jig and electrolytic processing method
- Patent number 11,427,920
- Issue date Aug 30, 2022
- Tokyo Electron Limited
- Tomohisa Hoshino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Manufacturing apparatus and manufacturing method for semiconductor...
- Patent number 11,111,592
- Issue date Sep 7, 2021
- Tokyo Electron Limited
- Tomohisa Hoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 10,903,081
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Tomohisa Hoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and template
- Patent number 10,428,438
- Issue date Oct 1, 2019
- Tokyo Electron Limited
- Haruo Iwatsu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrolytic treatment apparatus and electrolytic treatment method
- Patent number 10,392,719
- Issue date Aug 27, 2019
- Tokyo Electron Limited
- Tomohisa Hoshino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Adhesion layer forming method, adhesion layer forming system and re...
- Patent number 10,354,915
- Issue date Jul 16, 2019
- Tokyo Electron Limited
- Tomohisa Hoshino
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Probe needle, method for manufacturing the probe needle and method...
- Patent number 8,159,256
- Issue date Apr 17, 2012
- Tokyo Electron Limited
- Tomohisa Hoshino
- G01 - MEASURING TESTING
Information Patent Grant
Method for manufacturing an interposer
- Patent number 7,891,090
- Issue date Feb 22, 2011
- Tokyo Electron Limited
- Masami Yakabe
- G01 - MEASURING TESTING
Information Patent Grant
Through substrate, interposer and manufacturing method of through s...
- Patent number 7,866,038
- Issue date Jan 11, 2011
- Tokyo Electron Limited
- Masami Yakabe
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Vaporizer and processor
- Patent number 7,827,932
- Issue date Nov 9, 2010
- Tokyo Electron Limited
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Probe and method for fabricating the same
- Patent number 7,692,434
- Issue date Apr 6, 2010
- Tokyo Electron Limited
- Tomohisa Hoshino
- G01 - MEASURING TESTING
Information Patent Grant
Probe needle, method for manufacturing the probe needle and method...
- Patent number 7,619,424
- Issue date Nov 17, 2009
- Tokyo Electron Limited
- Tomohisa Hoshino
- G01 - MEASURING TESTING
Information Patent Grant
Gas phase growth system, method of operating the system, and vapori...
- Patent number 7,323,220
- Issue date Jan 29, 2008
- Tokyo Electron Ltd.
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fabrication process of a semiconductor device including a CVD proce...
- Patent number 6,893,953
- Issue date May 17, 2005
- Tokyo Electron Limited
- Tomohisa Hoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contractor, method for manufacturing the same, and probe card using...
- Patent number 6,747,465
- Issue date Jun 8, 2004
- Tokyo Electron Limited
- Masayoshi Esashi
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
ELECTROLYTIC TREATMENT APPARATUS AND ELECTROLYTIC TREATMENT METHOD
- Publication number 20210285119
- Publication date Sep 16, 2021
- TOKYO ELECTRON LIMITED
- Tomohisa Hoshino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROLYTIC PROCESSING JIG AND ELECTROLYTIC PROCESSING METHOD
- Publication number 20190233963
- Publication date Aug 1, 2019
- TOKYO ELECTRON LIMITED
- Tomohisa Hoshino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROLYTIC PROCESSING JIG AND ELECTROLYTIC PROCESSING METHOD
- Publication number 20190218682
- Publication date Jul 18, 2019
- TOKYO ELECTRON LIMITED
- Tomohisa Hoshino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR SEMICONDUCTOR...
- Publication number 20180355501
- Publication date Dec 13, 2018
- TOKYO ELECTRON LIMITED
- Tomohisa Hoshino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20180122641
- Publication date May 3, 2018
- TOKYO ELECTRON LIMITED
- Tomohisa Hoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...
- Publication number 20170167029
- Publication date Jun 15, 2017
- TOKYO ELECTRON LIMITED
- Tomohisa Hoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...
- Publication number 20170170021
- Publication date Jun 15, 2017
- TOKYO ELECTRON LIMITED
- Tomohisa Hoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROLYTIC TREATMENT APPARATUS AND ELECTROLYTIC TREATMENT METHOD
- Publication number 20170159202
- Publication date Jun 8, 2017
- TOKYO ELECTRON LIMITED
- Tomohisa HOSHINO
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ADHESION LAYER FORMING METHOD, ADHESION LAYER FORMING SYSTEM AND RE...
- Publication number 20160284592
- Publication date Sep 29, 2016
- TOKYO ELECTRON LIMITED
- Tomohisa Hoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND TEMPLATE
- Publication number 20160108538
- Publication date Apr 21, 2016
- TOKYO ELECTRON LIMITED
- Haruo IWATSU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
CIRCUIT BOARD FOR SEMICONDUCTOR DEVICE INSPECTION APPARATUS AND MAN...
- Publication number 20130206460
- Publication date Aug 15, 2013
- TOKYO ELECTRON LIMTED
- Jun Mochizuki
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CONTACT TERMINAL FOR A PROBE CARD, AND THE PROBE CARD
- Publication number 20130099813
- Publication date Apr 25, 2013
- TOKYO ELECTRON LIMITED
- Tomohisa HOSHINO
- G01 - MEASURING TESTING
Information Patent Application
CONTACT STRUCTURE AND METHOD OF MANUFACTURING CONTACT STRUCTURE
- Publication number 20130033282
- Publication date Feb 7, 2013
- TOKYO ELECTRON LIMITED
- Yohei Sato
- G01 - MEASURING TESTING
Information Patent Application
INTERPOSER AND MANUFACTURING METHOD FOR THE SAME
- Publication number 20120085655
- Publication date Apr 12, 2012
- Tokyo Elecron Limited
- Kenichi Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERPOSER, PROBE CARD AND METHOD FOR MANUFACTURING THE INTERPOSER
- Publication number 20110109338
- Publication date May 12, 2011
- TOKYO ELECTRON LIMITED
- Masami Yakabe
- G01 - MEASURING TESTING
Information Patent Application
PROBE NEEDLE, METHOD FOR MANUFACTURING THE PROBE NEEDLE AND METHOD...
- Publication number 20100077597
- Publication date Apr 1, 2010
- TOKYO ELECTRON LIMITED
- Tomohisa HOSHINO
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF POSITIONING AN ANISOTROPIC CONDUCTIVE CONNECTOR, METHOD O...
- Publication number 20090015281
- Publication date Jan 15, 2009
- JSR Corporation
- Mutsuhiko Yoshioka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Vaporizer and Processor
- Publication number 20090000740
- Publication date Jan 1, 2009
- TOKYO ELECTRON LIMITED
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Interposer, Probe Card and Method for Manufacturing the Interposer
- Publication number 20080171452
- Publication date Jul 17, 2008
- Masami Yakabe
- G01 - MEASURING TESTING
Information Patent Application
Interposer And Manufacturing Method For The Same
- Publication number 20080067073
- Publication date Mar 20, 2008
- Kenichi Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Probe and Method for Fabricating the Same
- Publication number 20080001102
- Publication date Jan 3, 2008
- TOKYO ELECTRON LIMITED
- Tomohisa Hoshino
- G01 - MEASURING TESTING
Information Patent Application
Probe
- Publication number 20070257692
- Publication date Nov 8, 2007
- Masami Yakabe
- G01 - MEASURING TESTING
Information Patent Application
Probe Needle, Method for Manufacturing the Probe Needle and Method...
- Publication number 20070259506
- Publication date Nov 8, 2007
- Tomohisa Hoshino
- G01 - MEASURING TESTING
Information Patent Application
Through Substrate, Interposer and Manufacturing Method of Through S...
- Publication number 20070246253
- Publication date Oct 25, 2007
- Masami Yakabe
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Capacity type sensor
- Publication number 20070194395
- Publication date Aug 23, 2007
- Tomohisa Hoshino
- G01 - MEASURING TESTING
Information Patent Application
Deposition apparatus and deposition method, and process gas supply...
- Publication number 20050249874
- Publication date Nov 10, 2005
- TOKYO ELECTRON LIMITED
- Tomohisa Hoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas phase growth system, method of operating the system, and vapori...
- Publication number 20050092250
- Publication date May 5, 2005
- TOKYO ELECTRON LIMITED
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Contactor, method for manufacturing the same, and probe card using...
- Publication number 20020057099
- Publication date May 16, 2002
- Masayoshi Esashi
- G01 - MEASURING TESTING
Information Patent Application
Gas phase growth system, method of operating the system, and vapori...
- Publication number 20020017246
- Publication date Feb 14, 2002
- TOKYO ELECTRON LIMITED
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Fabrication process of a semiconductor device including a CVD proce...
- Publication number 20020009872
- Publication date Jan 24, 2002
- Tomohisa Hoshino
- H01 - BASIC ELECTRIC ELEMENTS

Tomohisa Hoshino

Person

Patents Grantslast 30 patents

Electrolytic processing jig and electrolytic processing method

Electrolytic treatment apparatus and electrolytic treatment method

Electrolytic processing jig and electrolytic processing method

Manufacturing apparatus and manufacturing method for semiconductor...

Substrate processing method

Substrate processing method and template

Electrolytic treatment apparatus and electrolytic treatment method

Adhesion layer forming method, adhesion layer forming system and re...

Probe needle, method for manufacturing the probe needle and method...

Method for manufacturing an interposer

Through substrate, interposer and manufacturing method of through s...

Vaporizer and processor

Probe and method for fabricating the same

Probe needle, method for manufacturing the probe needle and method...

Gas phase growth system, method of operating the system, and vapori...

Fabrication process of a semiconductor device including a CVD proce...

Contractor, method for manufacturing the same, and probe card using...

Patents Applicationslast 30 patents

ELECTROLYTIC TREATMENT APPARATUS AND ELECTROLYTIC TREATMENT METHOD

ELECTROLYTIC PROCESSING JIG AND ELECTROLYTIC PROCESSING METHOD

ELECTROLYTIC PROCESSING JIG AND ELECTROLYTIC PROCESSING METHOD

MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR SEMICONDUCTOR...

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...

ELECTROLYTIC TREATMENT APPARATUS AND ELECTROLYTIC TREATMENT METHOD

ADHESION LAYER FORMING METHOD, ADHESION LAYER FORMING SYSTEM AND RE...

SUBSTRATE PROCESSING METHOD AND TEMPLATE

CIRCUIT BOARD FOR SEMICONDUCTOR DEVICE INSPECTION APPARATUS AND MAN...

CONTACT TERMINAL FOR A PROBE CARD, AND THE PROBE CARD

CONTACT STRUCTURE AND METHOD OF MANUFACTURING CONTACT STRUCTURE

INTERPOSER AND MANUFACTURING METHOD FOR THE SAME

INTERPOSER, PROBE CARD AND METHOD FOR MANUFACTURING THE INTERPOSER

PROBE NEEDLE, METHOD FOR MANUFACTURING THE PROBE NEEDLE AND METHOD...

METHOD OF POSITIONING AN ANISOTROPIC CONDUCTIVE CONNECTOR, METHOD O...

Vaporizer and Processor

Interposer, Probe Card and Method for Manufacturing the Interposer

Interposer And Manufacturing Method For The Same

Probe and Method for Fabricating the Same

Probe

Probe Needle, Method for Manufacturing the Probe Needle and Method...

Through Substrate, Interposer and Manufacturing Method of Through S...

Capacity type sensor

Deposition apparatus and deposition method, and process gas supply...

Gas phase growth system, method of operating the system, and vapori...

Contactor, method for manufacturing the same, and probe card using...

Gas phase growth system, method of operating the system, and vapori...

Fabrication process of a semiconductor device including a CVD proce...