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Tomomi Watanabe
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Joetsu-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Resist composition and pattern forming process
Patent number
12,072,628
Issue date
Aug 27, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and patterning process
Patent number
12,001,139
Issue date
Jun 4, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and pattern forming process
Patent number
11,822,245
Issue date
Nov 21, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and pattern forming process
Patent number
11,720,019
Issue date
Aug 8, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and patterning process
Patent number
11,635,685
Issue date
Apr 25, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
Resist Material, Resist Composition, Patterning Process, And Monomer
Publication number
20240361690
Publication date
Oct 31, 2024
Shin-Etsu Chemical Co., Ltd.
Jun HATAKEYAMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Resist Material, Resist Composition, And Patterning Process
Publication number
20240361691
Publication date
Oct 31, 2024
Shin-Etsu Chemical Co., Ltd.
Yutaro OTOMO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Monomer, Resist Material, Resist Composition, And Patterning Process
Publication number
20240360069
Publication date
Oct 31, 2024
Shin-Etsu Chemical Co., Ltd.
Yutaro OTOMO
C07 - ORGANIC CHEMISTRY
Information
Patent Application
AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN...
Publication number
20240184200
Publication date
Jun 6, 2024
Shin-Etsu Chemical Co., Ltd.
Tomomi Watanabe
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240118610
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240118615
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240111212
Publication date
Apr 4, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
Publication number
20240103364
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Onium Salt, Resist Composition, And Patterning Process
Publication number
20240036466
Publication date
Feb 1, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20230393462
Publication date
Dec 7, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20230393463
Publication date
Dec 7, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
Publication number
20230384677
Publication date
Nov 30, 2023
Shin-Etsu Chemical Co., Ltd.
Tomomi Watanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20230205083
Publication date
Jun 29, 2023
Shin-Etsu Chemical Co., Ltd.
Takayuki Fujiwara
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND P...
Publication number
20230123180
Publication date
Apr 20, 2023
Shin-Etsu Chemical Co., Ltd.
Tomomi Watanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20230114441
Publication date
Apr 13, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20230076505
Publication date
Mar 9, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POSITIVE RESIST MATERIAL AND PATTERNING PROCESS
Publication number
20220066319
Publication date
Mar 3, 2022
Shin-Etsu Chemical Co., Ltd.
Jun HATAKEYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20220043343
Publication date
Feb 10, 2022
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20210302837
Publication date
Sep 30, 2021
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20210302838
Publication date
Sep 30, 2021
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20210278763
Publication date
Sep 9, 2021
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...
Publication number
20210179554
Publication date
Jun 17, 2021
Shin-Etsu Chemical Co., Ltd.
Takayuki Fujiwara
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20210149300
Publication date
May 20, 2021
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...