Tomowaki Takahashi

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Projection optical system and exposure apparatus with the same
- Patent number 7,692,767
- Issue date Apr 6, 2010
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and device manufactu...
- Patent number 7,630,057
- Issue date Dec 8, 2009
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 7,483,122
- Issue date Jan 27, 2009
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
Reflection-type projection-optical systems, and exposure apparatus...
- Patent number 7,470,033
- Issue date Dec 30, 2008
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Reflective-type projection optical system and exposure apparatus eq...
- Patent number 7,436,589
- Issue date Oct 14, 2008
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method...
- Patent number 7,312,851
- Issue date Dec 25, 2007
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and device manufactu...
- Patent number 7,283,206
- Issue date Oct 16, 2007
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Catadioptric projection systems
- Patent number RE39296
- Issue date Sep 19, 2006
- Nikon Corporation
- Tomowaki Takahashi
- 359 - Optical: systems and elements
Information Patent Grant
Catadioptric system and exposure device having this system
- Patent number 7,030,965
- Issue date Apr 18, 2006
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Exposure apparatus having catadioptric projection optical system
- Patent number RE39024
- Issue date Mar 21, 2006
- Nikon Corporation
- Tomowaki Takahashi
- 359 - Optical: systems and elements
Information Patent Grant
Dual-imaging optical system
- Patent number 6,867,931
- Issue date Mar 15, 2005
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Projection optical system
- Patent number 6,781,766
- Issue date Aug 24, 2004
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus, projection exposure method and catad...
- Patent number 6,707,616
- Issue date Mar 16, 2004
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Catadioptric reduction projection optical system and exposure appar...
- Patent number RE38438
- Issue date Feb 24, 2004
- Nikon Corporation
- Tomowaki Takahashi
- 359 - Optical: systems and elements
Information Patent Grant
Exposure apparatus having catadioptric projection optical system
- Patent number RE38421
- Issue date Feb 10, 2004
- Nikon Corporation
- Tomowaki Takahashi
- 359 - Optical: systems and elements
Information Patent Grant
Projection optical system
- Patent number 6,538,821
- Issue date Mar 25, 2003
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Dual-imaging optical system
- Patent number 6,392,822
- Issue date May 21, 2002
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Catoptric reduction projection optical system and exposure apparatu...
- Patent number 6,302,548
- Issue date Oct 16, 2001
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Catoptric reduction projection optical system and exposure apparatu...
- Patent number 6,213,610
- Issue date Apr 10, 2001
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Catoptric reduction projection optical system and projection exposu...
- Patent number 6,172,825
- Issue date Jan 9, 2001
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Dual-imaging optical system
- Patent number 6,157,498
- Issue date Dec 5, 2000
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Catoptric reduction projection optical system
- Patent number 6,109,756
- Issue date Aug 29, 2000
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Catadioptric optical system
- Patent number 6,097,537
- Issue date Aug 1, 2000
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Exposure apparatus having catadioptric projection optical system
- Patent number 5,999,333
- Issue date Dec 7, 1999
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Catadioptric optical system
- Patent number 5,969,882
- Issue date Oct 19, 1999
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Projection optical system
- Patent number 5,956,182
- Issue date Sep 21, 1999
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Catadioptric reduction projection optical system and exposure appar...
- Patent number 5,861,997
- Issue date Jan 19, 1999
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Exposure apparatus having catadioptric projection optical system
- Patent number 5,808,805
- Issue date Sep 15, 1998
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Catadioptric projection systems
- Patent number 5,805,334
- Issue date Sep 8, 1998
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Grant
Catadioptric optical system and exposure apparatus having the same
- Patent number 5,691,802
- Issue date Nov 25, 1997
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
Reflective-Type Projection Optical System and Exposure Apparatus Eq...
- Publication number 20090097106
- Publication date Apr 16, 2009
- NIKON CORPORATION
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Application
Projection optical system, exposure apparatus, and exposure method
- Publication number 20080079924
- Publication date Apr 3, 2008
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Application
Reflection-type projection-optical systems, and exposure apparatus...
- Publication number 20070223119
- Publication date Sep 27, 2007
- NIKON CORPORATION
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Application
Projection optical system and exposure apparatus with the same
- Publication number 20070126990
- Publication date Jun 7, 2007
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Application
Projection optical system, exposure apparatus, and device manufactu...
- Publication number 20070046918
- Publication date Mar 1, 2007
- NIKON CORPORATION
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Application
Projection optical system, exposure apparatus, and device manufactu...
- Publication number 20060262277
- Publication date Nov 23, 2006
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Application
Reflective-type projection optical system and exposure apparatus eq...
- Publication number 20060098273
- Publication date May 11, 2006
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Application
Projection optical system, exposure apparatus, and exposure method
- Publication number 20060012767
- Publication date Jan 19, 2006
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Application
Projection optical system and exposure device having the projection...
- Publication number 20040189965
- Publication date Sep 30, 2004
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Application
Catadioptric system and exposure device having this system
- Publication number 20040130806
- Publication date Jul 8, 2004
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Application
Projection optical system and exposure apparatus equipped with the...
- Publication number 20040125353
- Publication date Jul 1, 2004
- Nikon Corporation
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Application
Projection optical system
- Publication number 20030137745
- Publication date Jul 24, 2003
- NIKON CORPORATION
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Application
Dual-imaging optical system
- Publication number 20020163733
- Publication date Nov 7, 2002
- NIKON CORPORATION
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Application
Projection optical system
- Publication number 20020080498
- Publication date Jun 27, 2002
- Tomowaki Takahashi
- G02 - OPTICS
Information Patent Application
Catoptric reduction projection optical system and exposure apparatu...
- Publication number 20010002155
- Publication date May 31, 2001
- NIKON CORPORATION
- Tomowaki Takahashi
- G02 - OPTICS

Tomowaki Takahashi

Person

Patents Grantslast 30 patents

Projection optical system and exposure apparatus with the same

Projection optical system, exposure apparatus, and device manufactu...

Projection optical system, exposure apparatus, and exposure method

Reflection-type projection-optical systems, and exposure apparatus...

Reflective-type projection optical system and exposure apparatus eq...

Projection optical system, exposure apparatus, and exposure method...

Projection optical system, exposure apparatus, and device manufactu...

Catadioptric projection systems

Catadioptric system and exposure device having this system

Exposure apparatus having catadioptric projection optical system

Dual-imaging optical system

Projection optical system

Projection exposure apparatus, projection exposure method and catad...

Catadioptric reduction projection optical system and exposure appar...

Exposure apparatus having catadioptric projection optical system

Projection optical system

Dual-imaging optical system

Catoptric reduction projection optical system and exposure apparatu...

Catoptric reduction projection optical system and exposure apparatu...

Catoptric reduction projection optical system and projection exposu...

Dual-imaging optical system

Catoptric reduction projection optical system

Catadioptric optical system

Exposure apparatus having catadioptric projection optical system

Catadioptric optical system

Projection optical system

Catadioptric reduction projection optical system and exposure appar...

Exposure apparatus having catadioptric projection optical system

Catadioptric projection systems

Catadioptric optical system and exposure apparatus having the same

Patents Applicationslast 30 patents

Reflective-Type Projection Optical System and Exposure Apparatus Eq...

Projection optical system, exposure apparatus, and exposure method

Reflection-type projection-optical systems, and exposure apparatus...

Projection optical system and exposure apparatus with the same

Projection optical system, exposure apparatus, and device manufactu...

Projection optical system, exposure apparatus, and device manufactu...

Reflective-type projection optical system and exposure apparatus eq...

Projection optical system, exposure apparatus, and exposure method

Projection optical system and exposure device having the projection...

Catadioptric system and exposure device having this system

Projection optical system and exposure apparatus equipped with the...

Projection optical system

Dual-imaging optical system

Projection optical system

Catoptric reduction projection optical system and exposure apparatu...