Tomoyuki Sakoda

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of integrating metal-containing films into semiconductor dev...
- Patent number 7,674,710
- Issue date Mar 9, 2010
- Tokyo Electron Limited
- Shigeo Ashigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device and computer storage...
- Patent number 7,629,183
- Issue date Dec 8, 2009
- Tokyo Electron Limited
- Kenji Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
FeRAM sidewall diffusion barrier etch
- Patent number 6,713,342
- Issue date Mar 30, 2004
- Texas Instruments Incorporated
- Francis G. Celii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact structure with an oxide silicidation barrier
- Patent number 6,303,952
- Issue date Oct 16, 2001
- Texas Instruments Incorporated
- Katsuhiro Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating reliable multilayer bottom electrode for fer...
- Patent number 6,238,932
- Issue date May 29, 2001
- Texas Instruments Incorporated
- Katsuhiro Aoki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE TREATING APPARATUS AND TREATING GAS EMITTING MECHANISM
- Publication number 20090038548
- Publication date Feb 12, 2009
- Tokyo Electron Limited
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Manufacturing Semiconductor Device and Computer Storage...
- Publication number 20080248595
- Publication date Oct 9, 2008
- Tokyo Electron Limited
- Kenji Matsumoto
- C30 - CRYSTAL GROWTH
Information Patent Application
Film Deposition Method And Film Deposition System
- Publication number 20080171142
- Publication date Jul 17, 2008
- Kenji Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF INTEGRATING METAL-CONTAINING FILMS INTO SEMICONDUCTOR DEV...
- Publication number 20080119033
- Publication date May 22, 2008
- TOKYO ELECTRON LIMITED
- Shigeo Ashigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas treatment device and heat readiting method
- Publication number 20070022954
- Publication date Feb 1, 2007
- TOKYO ELECTRON LIMITED
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma etching of Ir and PZT using a hard mask and C12/N2/O2 and C1...
- Publication number 20030176073
- Publication date Sep 18, 2003
- Chentsau Ying
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FeRAM sidewall diffusion barrier etch
- Publication number 20030129847
- Publication date Jul 10, 2003
- Francis G. Celii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Detection of AIOx ears for process control in FeRAM processing
- Publication number 20030124791
- Publication date Jul 3, 2003
- Scott R. Summerfelt
- H01 - BASIC ELECTRIC ELEMENTS

Tomoyuki Sakoda

Person

Patents Grantslast 30 patents

Method of integrating metal-containing films into semiconductor dev...

Method for manufacturing semiconductor device and computer storage...

FeRAM sidewall diffusion barrier etch

Contact structure with an oxide silicidation barrier

Method for fabricating reliable multilayer bottom electrode for fer...

Patents Applicationslast 30 patents

SUBSTRATE TREATING APPARATUS AND TREATING GAS EMITTING MECHANISM

Method for Manufacturing Semiconductor Device and Computer Storage...

Film Deposition Method And Film Deposition System

METHOD OF INTEGRATING METAL-CONTAINING FILMS INTO SEMICONDUCTOR DEV...

Gas treatment device and heat readiting method

Plasma etching of Ir and PZT using a hard mask and C12/N2/O2 and C1...

FeRAM sidewall diffusion barrier etch

Detection of AIOx ears for process control in FeRAM processing