Toralf Gruner

Person

Aalen-Hofen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method and device for characterizing the surface shape of an optica...
- Patent number 11,927,500
- Issue date Mar 12, 2024
- Carl Zeiss SMT GmbH
- Steffen Siegler
- G01 - MEASURING TESTING
Information Patent Grant
Projection exposure method and projection lens with setting of the...
- Patent number 11,906,904
- Issue date Feb 20, 2024
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 11,809,085
- Issue date Nov 7, 2023
- Carl Zeiss SMT GmbH
- Hans Michael Stiepan
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Compensation of creep effects in an imaging device
- Patent number 11,415,895
- Issue date Aug 16, 2022
- Carl Zeiss SMT GmbH
- Marwène Nefzi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure s...
- Patent number 11,366,395
- Issue date Jun 21, 2022
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure s...
- Patent number 11,360,393
- Issue date Jun 14, 2022
- Carl Zeiss SMT GmbH
- Ben Wylie-Van Eerd
- G02 - OPTICS
Information Patent Grant
Method and device for determining the heating state of an optical e...
- Patent number 11,320,314
- Issue date May 3, 2022
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for a microlithographic projection exposure apparatus, and m...
- Patent number 11,187,990
- Issue date Nov 30, 2021
- Carl Zeiss SMT GmbH
- Johannes Lippert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for determining the heating state of a mirror in...
- Patent number 11,156,922
- Issue date Oct 26, 2021
- Carl Zeiss SMT GmbH
- Willem Michiel De Rapper
- G02 - OPTICS
Information Patent Grant
Projection exposure method and projection lens with setting of the...
- Patent number 11,143,967
- Issue date Oct 12, 2021
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Optical module with an anticollision device for module components
- Patent number 11,054,755
- Issue date Jul 6, 2021
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element, and method for correcting the wavefront effect of...
- Patent number 11,029,515
- Issue date Jun 8, 2021
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G02 - OPTICS
Information Patent Grant
Method and device for the correction of imaging defects
- Patent number 11,003,088
- Issue date May 11, 2021
- Carl Zeiss SMT GmbH
- Franz Sorg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 10,908,509
- Issue date Feb 2, 2021
- Carl Zeiss SMT GmbH
- Johannes Lippert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror arrangement for lithography exposure apparatus and optical s...
- Patent number 10,684,466
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Wouter Bernardus Johannes Hakvoort
- G02 - OPTICS
Information Patent Grant
Method and device for the correction of imaging defects
- Patent number 10,620,543
- Issue date Apr 14, 2020
- Carl Zeiss SMT GmbH
- Franz Sorg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens, projection exposure apparatus and projection expos...
- Patent number 10,591,825
- Issue date Mar 17, 2020
- Carl Zeiss SMT GmbH
- Stephan Andre
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective including a reflective optical co...
- Patent number 10,578,976
- Issue date Mar 3, 2020
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Attenuation filter for projection lens, projection lens having atte...
- Patent number 10,416,569
- Issue date Sep 17, 2019
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus and measuring devic...
- Patent number 10,345,710
- Issue date Jul 9, 2019
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical component for use in a radiation source module of a project...
- Patent number 10,288,894
- Issue date May 14, 2019
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithography projection objective
- Patent number 10,281,824
- Issue date May 7, 2019
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus with a highly flexible manipulator
- Patent number 10,261,425
- Issue date Apr 16, 2019
- Carl Zeiss SMT GmbH
- Alexander Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus comprising a measuring system for mea...
- Patent number 10,162,270
- Issue date Dec 25, 2018
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus including mechanism to reduce influen...
- Patent number 10,162,267
- Issue date Dec 25, 2018
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective including a reflective optical co...
- Patent number 10,146,137
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective comprising deflection mirrors and...
- Patent number 10,120,176
- Issue date Nov 6, 2018
- Carl Zeiss SMT GmbH
- Thomas Schicketanz
- G02 - OPTICS
Information Patent Grant
Illumination intensity correction device for predefining an illumin...
- Patent number 10,067,424
- Issue date Sep 4, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens, projection exposure apparatus and projection expos...
- Patent number 10,048,592
- Issue date Aug 14, 2018
- Carl Zeiss SMT GmbH
- Stephan Andre
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective
- Patent number 10,042,146
- Issue date Aug 7, 2018
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF SETTING UP A PROJECTION EXPOSURE SYSTEM, A PROJECTION EXP...
- Publication number 20230367231
- Publication date Nov 16, 2023
- Carl Zeiss SMT GMBH
- Eva SCHNEIDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, AND METHOD FOR OPERATING AN OPTICAL SYSTEM
- Publication number 20230324648
- Publication date Oct 12, 2023
- Carl Zeiss SMT GMBH
- Andre Dirauf
- G02 - OPTICS
Information Patent Application
MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM
- Publication number 20230305290
- Publication date Sep 28, 2023
- Carl Zeiss SMT GMBH
- Hartmut Enkisch
- G02 - OPTICS
Information Patent Application
SUPPORT FOR AN OPTICAL ELEMENT
- Publication number 20230236516
- Publication date Jul 27, 2023
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM AND METHOD OF OPERATING AN OPTICAL SYSTEM
- Publication number 20230176492
- Publication date Jun 8, 2023
- Carl Zeiss SMT GMBH
- Toralf GRUNER
- G02 - OPTICS
Information Patent Application
A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE
- Publication number 20230142187
- Publication date May 11, 2023
- Carl Zeiss SMT GMBH
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20230122333
- Publication date Apr 20, 2023
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FACET ASSEMBLY FOR A FACET MIRROR
- Publication number 20230026528
- Publication date Jan 26, 2023
- Carl Zeiss SMT GMBH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20220299733
- Publication date Sep 22, 2022
- Carl Zeiss SMT GMBH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20220260924
- Publication date Aug 18, 2022
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR CHARACTERIZING THE SURFACE SHAPE OF AN OPTICA...
- Publication number 20220236139
- Publication date Jul 28, 2022
- Carl Zeiss SMT GMBH
- Steffen SIEGLER
- G01 - MEASURING TESTING
Information Patent Application
ASSEMBLY IN AN OPTICAL SYSTEM, IN PARTICULAR OF A MICROLITHOGRAPHIC...
- Publication number 20220214627
- Publication date Jul 7, 2022
- Carl Zeiss SMT GMBH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20220113634
- Publication date Apr 14, 2022
- Carl Zeiss SMT GMBH
- Hans Michael STIEPAN
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
STOP, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20220107567
- Publication date Apr 7, 2022
- Carl Zeiss SMT GMBH
- Benjahman Julius Modeste
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION LENS WITH SETTING OF THE...
- Publication number 20220026814
- Publication date Jan 27, 2022
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G02 - OPTICS
Information Patent Application
COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE
- Publication number 20210405542
- Publication date Dec 30, 2021
- Carl Zeiss SMT GMBH
- Marwène Nefzi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND M...
- Publication number 20210149310
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Johannes LIPPERT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR DETERMINING THE HEATING STATE OF AN OPTICAL E...
- Publication number 20210148762
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G01 - MEASURING TESTING
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...
- Publication number 20210055662
- Publication date Feb 25, 2021
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD AND DEVICE FOR DETERMINING THE HEATING STATE OF A MIRROR IN...
- Publication number 20210041790
- Publication date Feb 11, 2021
- Carl Zeiss SMT GMBH
- Willem Michiel De Rapper
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT, AND METHOD FOR CORRECTING THE WAVEFRONT EFFECT OF...
- Publication number 20200393673
- Publication date Dec 17, 2020
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS
- Publication number 20200233314
- Publication date Jul 23, 2020
- Carl Zeiss SMT GMBH
- Franz Sorg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...
- Publication number 20200174379
- Publication date Jun 4, 2020
- Carl Zeiss SMT GMBH
- Ben WYLIE-VAN EERD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION LENS WITH SETTING OF THE...
- Publication number 20200081350
- Publication date Mar 12, 2020
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G02 - OPTICS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20200026195
- Publication date Jan 23, 2020
- Carl Zeiss SMT GMBH
- Johannes LIPPERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS
- Publication number 20190302627
- Publication date Oct 3, 2019
- Carl Zeiss SMT GMBH
- Franz Sorg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL MODULE WITH AN ANTICOLLISION DEVICE FOR MODULE COMPONENTS
- Publication number 20190171118
- Publication date Jun 6, 2019
- Carl Zeiss SMT GMBH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS WITH A MEASUREMENT BEAM PATH
- Publication number 20190107784
- Publication date Apr 11, 2019
- Carl Zeiss SMT GMBH
- Alexander WOLF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...
- Publication number 20190101832
- Publication date Apr 4, 2019
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
ATTENUATION FILTER FOR PROJECTION LENS, PROJECTION LENS HAVING ATTE...
- Publication number 20190064676
- Publication date Feb 28, 2019
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Toralf Gruner

Person

Patents Grantslast 30 patents

Method and device for characterizing the surface shape of an optica...

Projection exposure method and projection lens with setting of the...

Mirror, in particular for a microlithographic projection exposure a...

Compensation of creep effects in an imaging device

Mirror, in particular for a microlithographic projection exposure s...

Mirror, in particular for a microlithographic projection exposure s...

Method and device for determining the heating state of an optical e...

Mirror for a microlithographic projection exposure apparatus, and m...

Method and device for determining the heating state of a mirror in...

Projection exposure method and projection lens with setting of the...

Optical module with an anticollision device for module components

Optical element, and method for correcting the wavefront effect of...

Method and device for the correction of imaging defects

Mirror, in particular for a microlithographic projection exposure a...

Mirror arrangement for lithography exposure apparatus and optical s...

Method and device for the correction of imaging defects

Projection lens, projection exposure apparatus and projection expos...

Catadioptric projection objective including a reflective optical co...

Attenuation filter for projection lens, projection lens having atte...

Microlithographic projection exposure apparatus and measuring devic...

Optical component for use in a radiation source module of a project...

Microlithography projection objective

Projection exposure apparatus with a highly flexible manipulator

Projection exposure apparatus comprising a measuring system for mea...

Projection exposure apparatus including mechanism to reduce influen...

Catadioptric projection objective including a reflective optical co...

Catadioptric projection objective comprising deflection mirrors and...

Illumination intensity correction device for predefining an illumin...

Projection lens, projection exposure apparatus and projection expos...

Catadioptric projection objective

Patents Applicationslast 30 patents

METHOD OF SETTING UP A PROJECTION EXPOSURE SYSTEM, A PROJECTION EXP...

OPTICAL SYSTEM, AND METHOD FOR OPERATING AN OPTICAL SYSTEM

MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM

SUPPORT FOR AN OPTICAL ELEMENT

OPTICAL SYSTEM AND METHOD OF OPERATING AN OPTICAL SYSTEM

A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

FACET ASSEMBLY FOR A FACET MIRROR

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

METHOD AND DEVICE FOR CHARACTERIZING THE SURFACE SHAPE OF AN OPTICA...

ASSEMBLY IN AN OPTICAL SYSTEM, IN PARTICULAR OF A MICROLITHOGRAPHIC...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

STOP, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

PROJECTION EXPOSURE METHOD AND PROJECTION LENS WITH SETTING OF THE...

COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND M...

METHOD AND DEVICE FOR DETERMINING THE HEATING STATE OF AN OPTICAL E...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...

METHOD AND DEVICE FOR DETERMINING THE HEATING STATE OF A MIRROR IN...

OPTICAL ELEMENT, AND METHOD FOR CORRECTING THE WAVEFRONT EFFECT OF...

METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...

PROJECTION EXPOSURE METHOD AND PROJECTION LENS WITH SETTING OF THE...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS

OPTICAL MODULE WITH AN ANTICOLLISION DEVICE FOR MODULE COMPONENTS

PROJECTION LENS WITH A MEASUREMENT BEAM PATH

CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...

ATTENUATION FILTER FOR PROJECTION LENS, PROJECTION LENS HAVING ATTE...