Toshiharu MIWA

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Diagnosis system and diagnosis method for lithium ion secondary bat...
- Patent number 9,147,913
- Issue date Sep 29, 2015
- Hitachi, Ltd.
- Toshiharu Miwa
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus abnormality diagnosis method and system
- Patent number 8,676,553
- Issue date Mar 18, 2014
- Hitachi, Ltd.
- Toshiharu Miwa
- G05 - CONTROLLING REGULATING
Information Patent Grant
Apparatus abnormality monitoring method and system
- Patent number 8,566,070
- Issue date Oct 22, 2013
- Hitachi, Ltd.
- Kenji Tamaki
- G05 - CONTROLLING REGULATING
Information Patent Grant
Apparatus anomaly monitoring method and system
- Patent number 8,515,719
- Issue date Aug 20, 2013
- Hitachi, Ltd.
- Kenji Tamaki
- G05 - CONTROLLING REGULATING
Information Patent Grant
Manufacturing method and manufacturing system of semiconductor device
- Patent number 8,043,772
- Issue date Oct 25, 2011
- Renesas Electronics Corporation
- Toshiharu Miwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining parameter of product design and its supporti...
- Patent number 7,289,859
- Issue date Oct 30, 2007
- Hitachi, Ltd.
- Toshiharu Miwa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay inspection apparatus for semiconductor substrate and method...
- Patent number 6,801,827
- Issue date Oct 5, 2004
- Hitachi, Ltd.
- Yasuhiro Yoshitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure processing method and exposure system for the same
- Patent number 6,721,940
- Issue date Apr 13, 2004
- Hitachi, Ltd.
- Toshiharu Miwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay inspection apparatus for semiconductor substrate and method...
- Patent number 6,697,698
- Issue date Feb 24, 2004
- Hitachi, Ltd.
- Yasuhiro Yoshitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure method
- Patent number 6,653,032
- Issue date Nov 25, 2003
- Hitachi, Ltd.
- Toshiharu Miwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MAINTENANCE DEVICE, MAINTENANCE SYSTEM, AND MAINTENANCE PROGRAM
- Publication number 20150242822
- Publication date Aug 27, 2015
- HITACHI, LTD.
- Hiroyuki Magara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BATTERY SYSTEM MAINTENANCE MANAGEMENT SYSTEM AND METHOD
- Publication number 20150046109
- Publication date Feb 12, 2015
- Hitachi, Ltd
- Toshiharu Miwa
- G01 - MEASURING TESTING
Information Patent Application
Inspection System, Charger/Discharger, and Inspection Method of Sec...
- Publication number 20130335009
- Publication date Dec 19, 2013
- Hitachi, Ltd
- Daisuke KATSUMATA
- G01 - MEASURING TESTING
Information Patent Application
DIAGNOSIS SYSTEM AND DIAGNOSIS METHOD FOR LITHIUM ION SECONDARY BAT...
- Publication number 20120259569
- Publication date Oct 11, 2012
- Toshiharu Miwa
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS ABNORMALITY MONITORING METHOD AND SYSTEM
- Publication number 20120136629
- Publication date May 31, 2012
- Kenji Tamaki
- G05 - CONTROLLING REGULATING
Information Patent Application
APPARATUS ANOMALY MONITORING METHOD AND SYSTEM
- Publication number 20110276828
- Publication date Nov 10, 2011
- Kenji Tamaki
- G05 - CONTROLLING REGULATING
Information Patent Application
APPARATUS ABNORMALITY DIAGNOSIS METHOD AND SYSTEM
- Publication number 20110264424
- Publication date Oct 27, 2011
- Toshiharu Miwa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MANUFACTURING METHOD AND MANUFACTURING SYSTEM OF SEMICONDUCTOR DEVICE
- Publication number 20090286174
- Publication date Nov 19, 2009
- Renesas Technology Corp.
- Toshiharu MIWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining parameter of product design and its supporti...
- Publication number 20070078553
- Publication date Apr 5, 2007
- Toshiharu Miwa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and system for manufacturing semiconductor devices
- Publication number 20030033046
- Publication date Feb 13, 2003
- Hitachi, Ltd
- Yasuhiro Yoshitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for manufacturing semiconductor devices
- Publication number 20030018406
- Publication date Jan 23, 2003
- Hitachi, Ltd
- Yasuhiro Yoshitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Exposure processing method and exposure system for the same
- Publication number 20020100013
- Publication date Jul 25, 2002
- Hitachi, Ltd
- Toshiharu Miwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method and exposure system the same
- Publication number 20020076629
- Publication date Jun 20, 2002
- Hitachi, Ltd
- Toshiharu Miwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Toshiharu MIWA

Person

Patents Grantslast 30 patents

Diagnosis system and diagnosis method for lithium ion secondary bat...

Apparatus abnormality diagnosis method and system

Apparatus abnormality monitoring method and system

Apparatus anomaly monitoring method and system

Manufacturing method and manufacturing system of semiconductor device

Method for determining parameter of product design and its supporti...

Overlay inspection apparatus for semiconductor substrate and method...

Exposure processing method and exposure system for the same

Overlay inspection apparatus for semiconductor substrate and method...

Exposure method

Patents Applicationslast 30 patents

MAINTENANCE DEVICE, MAINTENANCE SYSTEM, AND MAINTENANCE PROGRAM

BATTERY SYSTEM MAINTENANCE MANAGEMENT SYSTEM AND METHOD

Inspection System, Charger/Discharger, and Inspection Method of Sec...

DIAGNOSIS SYSTEM AND DIAGNOSIS METHOD FOR LITHIUM ION SECONDARY BAT...

APPARATUS ABNORMALITY MONITORING METHOD AND SYSTEM

APPARATUS ANOMALY MONITORING METHOD AND SYSTEM

APPARATUS ABNORMALITY DIAGNOSIS METHOD AND SYSTEM

MANUFACTURING METHOD AND MANUFACTURING SYSTEM OF SEMICONDUCTOR DEVICE

Method for determining parameter of product design and its supporti...

Method and system for manufacturing semiconductor devices

Method and system for manufacturing semiconductor devices

Exposure processing method and exposure system for the same

Exposure method and exposure system the same