Toshikatsu TOBANA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for plasma processing
- Patent number 11,594,398
- Issue date Feb 28, 2023
- Tokyo Electron Limited
- Yusuke Aoki
- B08 - CLEANING
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 11,569,094
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Kota Ishiharada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,251,048
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Yusuke Aoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate, device manufacturing method, and pl...
- Patent number 11,081,351
- Issue date Aug 3, 2021
- Tokyo Electron Limited
- Yusuke Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,062,882
- Issue date Jul 13, 2021
- Tokyo Electron Limited
- Yusuke Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and processing apparatus
- Patent number 10,867,778
- Issue date Dec 15, 2020
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dechuck control method and plasma processing apparatus
- Patent number 10,069,443
- Issue date Sep 4, 2018
- Tokyo Electron Limited
- Shigeru Senzaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for processing target object
- Patent number 9,911,621
- Issue date Mar 6, 2018
- Tokyo Electron Limited
- Toshikatsu Tobana
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210305057
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Kota ISHIHARADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, DEVICE MANUFACTURING METHOD, AND PL...
- Publication number 20210057212
- Publication date Feb 25, 2021
- TOKYO ELECTRON LIMITED
- Yusuke AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200402805
- Publication date Dec 24, 2020
- TOKYO ELECTRON LIMITED
- Yusuke AOKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR PLASMA PROCESSING
- Publication number 20200266036
- Publication date Aug 20, 2020
- TOKYO ELECTRON LIMITED
- Yusuke AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200234925
- Publication date Jul 23, 2020
- TOKYO ELECTRON LIMITED
- Yusuke AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE FOR SUBSTRATE PROCESSING APPARATUS
- Publication number 20200194238
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Daisuke ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND PROCESSING APPARATUS
- Publication number 20190295825
- Publication date Sep 26, 2019
- TOKYO ELECTRON LIMITED
- Hiroshi TSUJIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR APPLYING DC VOLTAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20190237305
- Publication date Aug 1, 2019
- TOKYO ELECTRON LIMITED
- Hiroshi TSUJIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING TARGET OBJECT
- Publication number 20170148641
- Publication date May 25, 2017
- TOKYO ELECTRON LIMITED
- Toshikatsu TOBANA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20160203998
- Publication date Jul 14, 2016
- TOKYO ELECTRON LIMITED
- Toshikatsu TOBANA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DECHUCK CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20130153147
- Publication date Jun 20, 2013
- TOKYO ELECTRON LIMITED
- Shigeru SENZAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Toshikatsu TOBANA

Person

Patents Grantslast 30 patents

Apparatus and method for plasma processing

Etching method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Method of processing substrate, device manufacturing method, and pl...

Plasma processing apparatus and plasma processing method

Cleaning method and processing apparatus

Dechuck control method and plasma processing apparatus

Method for processing target object

Patents Applicationslast 30 patents

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

METHOD OF PROCESSING SUBSTRATE, DEVICE MANUFACTURING METHOD, AND PL...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

APPARATUS AND METHOD FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

STRUCTURE FOR SUBSTRATE PROCESSING APPARATUS

CLEANING METHOD AND PROCESSING APPARATUS

METHOD FOR APPLYING DC VOLTAGE AND PLASMA PROCESSING APPARATUS

METHOD FOR PROCESSING TARGET OBJECT

ETCHING METHOD

DECHUCK CONTROL METHOD AND PLASMA PROCESSING APPARATUS