Toshinobu Ishihara

Person

Niigata-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing substrate for making microarray
- Patent number 9,410,951
- Issue date Aug 9, 2016
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- G01 - MEASURING TESTING
Information Patent Grant
Method for producing molecule immobilizing substrate, and molecule...
- Patent number 9,034,661
- Issue date May 19, 2015
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing hollow structure
- Patent number 8,367,311
- Issue date Feb 5, 2013
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- B32 - LAYERED PRODUCTS
Information Patent Grant
Method for manufacturing substrate for making microarray
- Patent number 8,148,053
- Issue date Apr 3, 2012
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- G01 - MEASURING TESTING
Information Patent Grant
Double patterning process
- Patent number 8,129,100
- Issue date Mar 6, 2012
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double patterning process
- Patent number 8,129,099
- Issue date Mar 6, 2012
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,105,764
- Issue date Jan 31, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for manufacturing substrate for making microarray
- Patent number 8,053,179
- Issue date Nov 8, 2011
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank, and method of manufacture
- Patent number 7,622,228
- Issue date Nov 24, 2009
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Okazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-depositing target and preparation of phase shift mask blank
- Patent number 7,598,004
- Issue date Oct 6, 2009
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halftone phase shift mask blank, halftone phase shift mask, and pat...
- Patent number 7,556,892
- Issue date Jul 7, 2009
- Shin-Etsu Chemical Co., Ltd.
- Kimihiro Okada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Halftone phase shift mask blank, and method of manufacture
- Patent number 7,179,545
- Issue date Feb 20, 2007
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Okazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon-containing polymer, resist composition and patterning process
- Patent number 6,994,945
- Issue date Feb 7, 2006
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing polymer, resist composition and patterning process
- Patent number 6,919,161
- Issue date Jul 19, 2005
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing polymer, resist composition and patterning process
- Patent number 6,902,772
- Issue date Jun 7, 2005
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 6,830,866
- Issue date Dec 14, 2004
- Shi-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning method
- Patent number 6,818,148
- Issue date Nov 16, 2004
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High molecular weight silicone compounds, resist compositions, and...
- Patent number 6,730,453
- Issue date May 4, 2004
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,623,909
- Issue date Sep 23, 2003
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist compositions and patterning process
- Patent number 6,455,223
- Issue date Sep 24, 2002
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dendritic polymers and making method
- Patent number 6,414,101
- Issue date Jul 2, 2002
- Shin-Etsu Chemical Co., Ltd.
- Osamu Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive resist composition, pattern forming m...
- Patent number 6,335,141
- Issue date Jan 1, 2002
- Shin-Etsu Chemical, Co., Ltd.
- Satoshi Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive resist composition, pattern forming m...
- Patent number 6,312,869
- Issue date Nov 6, 2001
- Shin-Etsu Chemical, Co., Ltd.
- Satoshi Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High molecular weight silicone compounds resist compositions, and p...
- Patent number 6,309,796
- Issue date Oct 30, 2001
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers and chemically amplified positive resist compositions
- Patent number 6,156,477
- Issue date Dec 5, 2000
- Shin-Etsu Chemical Co., Ltd.
- Kiyoshi Motomi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition
- Patent number 6,156,481
- Issue date Dec 5, 2000
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 6,136,502
- Issue date Oct 24, 2000
- Shin-Etsu Chemical Co., Ltd.
- Watanabe Satoshi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive resist composition, pattern forming m...
- Patent number 6,114,462
- Issue date Sep 5, 2000
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 6,106,993
- Issue date Aug 22, 2000
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cross-linked polymer solid electrolyte, method of manufacturing cro...
- Patent number 6,096,234
- Issue date Aug 1, 2000
- Shin-Etsu Chemical Co., Ltd.
- Toru Nakanishi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING HOLLOW STRUCTURE
- Publication number 20110123935
- Publication date May 26, 2011
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- B32 - LAYERED PRODUCTS
Information Patent Application
METHOD FOR PRODUCING MOLECULE IMMOBILIZING SUBSTRATE, AND MOLECULE...
- Publication number 20100233827
- Publication date Sep 16, 2010
- Shin-Etsu Chemical Co., Ltd.
- Wataru KUSAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERNING PROCESS
- Publication number 20100086878
- Publication date Apr 8, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing substrate for making microarray
- Publication number 20100055337
- Publication date Mar 4, 2010
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Application
DOUBLE PATTERNING PROCESS
- Publication number 20090253084
- Publication date Oct 8, 2009
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DOUBLE PATTERNING PROCESS
- Publication number 20090208886
- Publication date Aug 20, 2009
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS
- Publication number 20090081595
- Publication date Mar 26, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
FILM-DEPOSITING TARGET AND PREPARATION OF PHASE SHIFT MASK BLANK
- Publication number 20090057143
- Publication date Mar 5, 2009
- Hiroki YOSHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for manufacturing substrate for microarray
- Publication number 20080233292
- Publication date Sep 25, 2008
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- G01 - MEASURING TESTING
Information Patent Application
Method for manufacturing substrate for making microarray
- Publication number 20080233521
- Publication date Sep 25, 2008
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for manufacturing substrate for making microarray
- Publication number 20080233309
- Publication date Sep 25, 2008
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Method for manufacturing substrate for making microarray
- Publication number 20080233409
- Publication date Sep 25, 2008
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
HALFTONE PHASE SHIFT MASK BLANK, AND METHOD OF MANUFACTURE
- Publication number 20070099092
- Publication date May 3, 2007
- Satoshi Okazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rinse and resist patterning process using the same
- Publication number 20050284502
- Publication date Dec 29, 2005
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Halftone phase shift mask blank, halftone phase shift mask, and pat...
- Publication number 20050244722
- Publication date Nov 3, 2005
- Shin-Etsu Chemical Co., Ltd.
- Kimihiro Okada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film-depositing target and preparation of phase shift mask blank
- Publication number 20050217988
- Publication date Oct 6, 2005
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Halftone phase shift mask blank, and method of manufacture
- Publication number 20040072016
- Publication date Apr 15, 2004
- Satoshi Okazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon-containing polymer, resist composition and patterning process
- Publication number 20040013980
- Publication date Jan 22, 2004
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Silicon-containing polymer, resist composition and patterning process
- Publication number 20040006191
- Publication date Jan 8, 2004
- Takanobu Takeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition and patterning process
- Publication number 20030013039
- Publication date Jan 16, 2003
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Silicon-containing polymer, resist composition and patterning process
- Publication number 20020168581
- Publication date Nov 14, 2002
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
High molecular weight silicone compounds, resist compositions, and...
- Publication number 20020058205
- Publication date May 16, 2002
- Mutsuo Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20020012871
- Publication date Jan 31, 2002
- SHIN-ETSU CHEMICAL CO., LTD.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Toshinobu Ishihara

Person

Patents Grantslast 30 patents

Method for producing substrate for making microarray

Method for producing molecule immobilizing substrate, and molecule...

Method for producing hollow structure

Method for manufacturing substrate for making microarray

Double patterning process

Double patterning process

Patterning process

Method for manufacturing substrate for making microarray

Halftone phase shift mask blank, and method of manufacture

Film-depositing target and preparation of phase shift mask blank

Halftone phase shift mask blank, halftone phase shift mask, and pat...

Halftone phase shift mask blank, and method of manufacture

Silicon-containing polymer, resist composition and patterning process

Silicon-containing polymer, resist composition and patterning process

Silicon-containing polymer, resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning method

High molecular weight silicone compounds, resist compositions, and...

Polymers, resist compositions and patterning process

Resist compositions and patterning process

Dendritic polymers and making method

Chemically amplified positive resist composition, pattern forming m...

Chemically amplified positive resist composition, pattern forming m...

High molecular weight silicone compounds resist compositions, and p...

Polymers and chemically amplified positive resist compositions

Positive resist composition

Resist composition and patterning process

Chemically amplified positive resist composition, pattern forming m...

Chemically amplified positive resist composition

Cross-linked polymer solid electrolyte, method of manufacturing cro...

Patents Applicationslast 30 patents

METHOD FOR PRODUCING HOLLOW STRUCTURE

METHOD FOR PRODUCING MOLECULE IMMOBILIZING SUBSTRATE, AND MOLECULE...

PATTERNING PROCESS

Method for producing substrate for making microarray

DOUBLE PATTERNING PROCESS

DOUBLE PATTERNING PROCESS

PATTERNING PROCESS

FILM-DEPOSITING TARGET AND PREPARATION OF PHASE SHIFT MASK BLANK

Method for manufacturing substrate for microarray

Method for manufacturing substrate for making microarray

Method for manufacturing substrate for making microarray

Method for manufacturing substrate for making microarray

HALFTONE PHASE SHIFT MASK BLANK, AND METHOD OF MANUFACTURE

Rinse and resist patterning process using the same

Halftone phase shift mask blank, halftone phase shift mask, and pat...

Film-depositing target and preparation of phase shift mask blank

Halftone phase shift mask blank, and method of manufacture

Silicon-containing polymer, resist composition and patterning process

Silicon-containing polymer, resist composition and patterning process

Resist composition and patterning process

Silicon-containing polymer, resist composition and patterning process

High molecular weight silicone compounds, resist compositions, and...

Polymers, resist compositions and patterning process