Toshio Itoh

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma-enhanced cyclic layer deposition process for barrier layers
- Patent number 7,732,325
- Issue date Jun 8, 2010
- Applied Materials, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-enhanced cyclic layer deposition process for barrier layers
- Patent number 7,473,638
- Issue date Jan 6, 2009
- Applied Materials, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integration of titanium and titanium nitride layers
- Patent number 7,094,685
- Issue date Aug 22, 2006
- Applied Materials, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integration of titanium and titanium nitride layers
- Patent number 6,911,391
- Issue date Jun 28, 2005
- Applied Materials, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Computer readable medium for controlling a method of cleaning a pro...
- Patent number 6,482,746
- Issue date Nov 19, 2002
- Applied Materials, Inc.
- Anand Vasudev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment of tantalum nitride compound films formed by chemi...
- Patent number 6,455,421
- Issue date Sep 24, 2002
- Applied Materials, Inc.
- Toshio Itoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD process for DCS-based tungsten silicide
- Patent number 6,297,152
- Issue date Oct 2, 2001
- Applied Materials, Inc.
- Toshio Itoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning a process chamber
- Patent number 6,242,347
- Issue date Jun 5, 2001
- Applied Materials, Inc.
- Anand Vasudev
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA-ENHANCED CYCLIC LAYER DEPOSITION PROCESS FOR BARRIER LAYERS
- Publication number 20090111264
- Publication date Apr 30, 2009
- MICHAEL X. YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED CYCLIC LAYER DEPOSITION PROCESS FOR BARRIER LAYERS
- Publication number 20060292864
- Publication date Dec 28, 2006
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integration of titanium and titanium nitride layers
- Publication number 20050277290
- Publication date Dec 15, 2005
- APPLIED MATERIALS, INC.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integration of titanium and titanium nitride layers
- Publication number 20030143841
- Publication date Jul 31, 2003
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chamber hardware design for titanium nitride atomic layer deposition
- Publication number 20030116087
- Publication date Jun 26, 2003
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma treatment of tantalum nitride compound films formed by chemi...
- Publication number 20020192952
- Publication date Dec 19, 2002
- APPLIED MATERIALS, INC.
- Toshio Itoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for cleaning a process chamber
- Publication number 20010027030
- Publication date Oct 4, 2001
- APPLIED MATERIALS, INC.
- Anand Vasudev
- H01 - BASIC ELECTRIC ELEMENTS

Toshio Itoh

Person

Patents Grantslast 30 patents

Plasma-enhanced cyclic layer deposition process for barrier layers

Plasma-enhanced cyclic layer deposition process for barrier layers

Integration of titanium and titanium nitride layers

Integration of titanium and titanium nitride layers

Computer readable medium for controlling a method of cleaning a pro...

Plasma treatment of tantalum nitride compound films formed by chemi...

CVD process for DCS-based tungsten silicide

Method for cleaning a process chamber

Patents Applicationslast 30 patents

PLASMA-ENHANCED CYCLIC LAYER DEPOSITION PROCESS FOR BARRIER LAYERS

PLASMA-ENHANCED CYCLIC LAYER DEPOSITION PROCESS FOR BARRIER LAYERS

Integration of titanium and titanium nitride layers

Integration of titanium and titanium nitride layers

Chamber hardware design for titanium nitride atomic layer deposition

Plasma treatment of tantalum nitride compound films formed by chemi...

Method for cleaning a process chamber