Tsuguo Yamaoka

Person

Funabashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photopolymerizable composition
- Patent number 7,368,224
- Issue date May 6, 2008
- Kyowa Hakko Chemical Co., Ltd.
- Tsuguo Yamaoka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing ether compound
- Patent number 7,358,030
- Issue date Apr 15, 2008
- Kyowa Yuka Co., Ltd.
- Ikuo Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition sensitive to visible light
- Patent number 7,294,448
- Issue date Nov 13, 2007
- Kyowa Hakko Kogyo Co., Ltd.
- Tsuguo Yamaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing ether compound
- Patent number 7,015,363
- Issue date Mar 21, 2006
- Kyowa Yuka Co., Ltd.
- Ikuo Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition, pattern forming m...
- Patent number 6,335,141
- Issue date Jan 1, 2002
- Shin-Etsu Chemical, Co., Ltd.
- Satoshi Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive resist composition, pattern forming m...
- Patent number 6,312,869
- Issue date Nov 6, 2001
- Shin-Etsu Chemical, Co., Ltd.
- Satoshi Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition
- Patent number 6,245,485
- Issue date Jun 12, 2001
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 6,136,502
- Issue date Oct 24, 2000
- Shin-Etsu Chemical Co., Ltd.
- Watanabe Satoshi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive resist composition, pattern forming m...
- Patent number 6,114,462
- Issue date Sep 5, 2000
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photopolymerizable compositions including squarylium compounds
- Patent number 6,007,965
- Issue date Dec 28, 1999
- Tsuguo Yamaoka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive resist composition, pattern forming m...
- Patent number 5,942,367
- Issue date Aug 24, 1999
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-working light-sensitive composition
- Patent number 5,939,235
- Issue date Aug 17, 1999
- Fuji Photo Film Co., Ltd.
- Syunichi Kondo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 5,882,844
- Issue date Mar 16, 1999
- Shin-Etsu Chemical Co., Ltd.
- Junji Tsuchiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 5,876,900
- Issue date Mar 2, 1999
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable composition containing an addition polymerizable...
- Patent number 5,756,258
- Issue date May 26, 1998
- Kyowa Hakko Co., Ltd.
- Tsuguo Yamaoka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for resist pattern formation using positive electrodepositi...
- Patent number 5,702,872
- Issue date Dec 30, 1997
- Kansai Paint Co., Ltd.
- Genji Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable composition containing squarylium compound
- Patent number 5,681,685
- Issue date Oct 28, 1997
- Kyowa Hakko Kogyo Co., Ltd.
- Tsuguo Yamaoka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Processes for pattern formation using photosensitive compositions a...
- Patent number 5,650,259
- Issue date Jul 22, 1997
- Kansai Paint Co., Ltd.
- Genji Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type electrodeposition photoresist compositions
- Patent number 5,527,656
- Issue date Jun 18, 1996
- Kansai Paint Co., Ltd.
- Genji Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplification resist composition containing photochemical...
- Patent number 5,527,659
- Issue date Jun 18, 1996
- Kyowa Hakko Kogyo Co., Ltd.
- Tsuguo Yamaoka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive compositions containing a polymer with carboxyl and...
- Patent number 5,496,678
- Issue date Mar 5, 1996
- Kansai Paint Co., Ltd.
- Genji Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive composition
- Patent number 5,364,738
- Issue date Nov 15, 1994
- Fuji Photo Film Co., Ltd.
- Shunichi Kondo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive composition
- Patent number 5,320,931
- Issue date Jun 14, 1994
- Fuji Photo Film Co., Ltd.
- Akira Umehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable rubber
- Patent number 5,283,265
- Issue date Feb 1, 1994
- Hayakawa Rubber Company Limited
- Tetsuya Kimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photopolymerizable composition
- Patent number 5,250,385
- Issue date Oct 5, 1993
- Fuji Photo Film Co., Ltd.
- Syunichi Kondo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photosensitive composition
- Patent number 5,202,216
- Issue date Apr 13, 1993
- Fuji Photo Film Co., Ltd.
- Yoshimasa Aotani
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positively photosensitive polyimide composition
- Patent number 5,053,314
- Issue date Oct 1, 1991
- Nitto Denko Corporation
- Tsuguo Yamaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive aqueous emulsion resin composition of polystyrene or...
- Patent number 4,877,714
- Issue date Oct 31, 1989
- Nippon Paint Company
- Tahahiro Tsunoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition
- Patent number 4,564,580
- Issue date Jan 14, 1986
- Kogyo Gijutsuin
- Kunihiro Ichimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novel copolymer and photosensitive material containing the same
- Patent number 4,529,783
- Issue date Jul 16, 1985
- Daikin Kogyo Company, Ltd.
- Takahiro Tsunoda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Process for producing ether compound
- Publication number 20060074262
- Publication date Apr 6, 2006
- Kyowa Yuka Co., Ltd.
- Ikuo Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Composition sensitive to visible light
- Publication number 20060003259
- Publication date Jan 5, 2006
- Kyowa Hakko Chemical Co.,
- Tsuguo Yamaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photopolymerizable composition
- Publication number 20050164120
- Publication date Jul 28, 2005
- KYOWA HAKKO CHEMICAL CO., LTD.
- Tsuguo Yamaoka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Process for producing ether compound
- Publication number 20040181097
- Publication date Sep 16, 2004
- Ikuo Shimizu
- C07 - ORGANIC CHEMISTRY

Tsuguo Yamaoka

Person

Patents Grantslast 30 patents

Photopolymerizable composition

Process for producing ether compound

Composition sensitive to visible light

Process for producing ether compound

Chemically amplified positive resist composition, pattern forming m...

Chemically amplified positive resist composition, pattern forming m...

Positive resist composition

Resist composition and patterning process

Chemically amplified positive resist composition, pattern forming m...

Photopolymerizable compositions including squarylium compounds

Chemically amplified positive resist composition, pattern forming m...

Positive-working light-sensitive composition

Chemically amplified positive resist composition

Chemically amplified positive resist composition

Photopolymerizable composition containing an addition polymerizable...

Process for resist pattern formation using positive electrodepositi...

Photopolymerizable composition containing squarylium compound

Processes for pattern formation using photosensitive compositions a...

Positive type electrodeposition photoresist compositions

Chemical amplification resist composition containing photochemical...

Photosensitive compositions containing a polymer with carboxyl and...

Light-sensitive composition

Light-sensitive composition

Photopolymerizable rubber

Photopolymerizable composition

Positive working photosensitive composition

Positively photosensitive polyimide composition

Photosensitive aqueous emulsion resin composition of polystyrene or...

Photosensitive resin composition

Novel copolymer and photosensitive material containing the same

Patents Applicationslast 30 patents

Process for producing ether compound

Composition sensitive to visible light

Photopolymerizable composition

Process for producing ether compound