Tsukasa Doi

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Fukuyama-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method for forming interlayer insulation film
- Patent number 7,402,513
- Issue date Jul 22, 2008
- Sharp Kabushiki Kaisha
- Takanori Sonoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a device isolation region
- Patent number 6,187,648
- Issue date Feb 13, 2001
- Sharp Kabushiki Kaisha
- Tsukasa Doi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a copper wiring layer formed on a base...
- Patent number 5,973,400
- Issue date Oct 26, 1999
- Sharp Kabushiki Kaisha
- Masanori Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device having copper layer
- Patent number 5,744,394
- Issue date Apr 28, 1998
- Sharp Kabushiki Kaisha
- Katsuji Iguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Normal pressure CVD process for manufacture of a semiconductor devi...
- Patent number 5,459,108
- Issue date Oct 17, 1995
- Sharp Kabushiki Kaisha
- Tsukasa Doi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor memory device
- Patent number 5,241,205
- Issue date Aug 31, 1993
- Sharp Kabushiki Kaisha
- Shin Shimizu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20060134865
- Publication date Jun 22, 2006
- SHARP KABUSHIKI KAISHA
- Hiroyuki Inuzuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming interlayer insulation film
- Publication number 20050159015
- Publication date Jul 21, 2005
- SHARP KABUSHIKI KAISHA
- Takanori Sonoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20050118833
- Publication date Jun 2, 2005
- Sharp Kabushiki Kaisha
- Kazumasa Mitsumune
- H01 - BASIC ELECTRIC ELEMENTS