Tsunehiro Nishi

Person

Niigata-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist compositions and patterning process
- Patent number 8,921,025
- Issue date Dec 30, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tatsushi Kaneko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming process, chemically amplified positive resist compo...
- Patent number 8,658,346
- Issue date Feb 25, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist-modifying composition and pattern forming process
- Patent number 8,426,105
- Issue date Apr 23, 2013
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acetal compounds and their preparation, polymers, resist compositio...
- Patent number 8,420,290
- Issue date Apr 16, 2013
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming process and resist-modifying composition
- Patent number 8,367,310
- Issue date Feb 5, 2013
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist-modifying composition and pattern forming process
- Patent number 8,329,384
- Issue date Dec 11, 2012
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double patterning process
- Patent number 8,247,166
- Issue date Aug 21, 2012
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double patterning process
- Patent number 8,129,099
- Issue date Mar 6, 2012
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Carboxyl-containing lactone compound, polymer, resist composition,...
- Patent number 8,062,831
- Issue date Nov 22, 2011
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Shinachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 7,985,528
- Issue date Jul 26, 2011
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorinated monomer, fluorinated polymer, resist composition and pa...
- Patent number 7,981,589
- Issue date Jul 19, 2011
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Lactone-containing compound, polymer, resist composition, and patte...
- Patent number 7,871,752
- Issue date Jan 18, 2011
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluoroalcohol preparation method, fluorinated monomer, polymer, res...
- Patent number 7,868,199
- Issue date Jan 11, 2011
- Eudyna Devices Inc.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Lactone-containing compound, polymer, resist composition, and patte...
- Patent number 7,833,694
- Issue date Nov 16, 2010
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Lactone-containing compounds, polymers, resist compositions, and pa...
- Patent number RE41580
- Issue date Aug 24, 2010
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- 430 - Radiation imagery chemistry: process, composition, or product thereof
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 7,727,704
- Issue date Jun 1, 2010
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,718,342
- Issue date May 18, 2010
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 7,691,561
- Issue date Apr 6, 2010
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 7,638,260
- Issue date Dec 29, 2009
- Shin-Etsu Chemical Co., Ltd.
- Akihiro Seki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and patterning process
- Patent number 7,618,765
- Issue date Nov 17, 2009
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 7,618,764
- Issue date Nov 17, 2009
- Shin-Etsu Chemical Co., Ltd.
- Shigeo Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 7,611,821
- Issue date Nov 3, 2009
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer, resist composition and patterning process
- Patent number 7,601,479
- Issue date Oct 13, 2009
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer, resist composition and patterning process
- Patent number 7,598,015
- Issue date Oct 6, 2009
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and patterning process
- Patent number 7,541,133
- Issue date Jun 2, 2009
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photo acid generator, chemical amplification resist material
- Patent number 7,211,367
- Issue date May 1, 2007
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, resist material and patterning processing
- Patent number 7,157,207
- Issue date Jan 2, 2007
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist polymer, resist composition and patterning process
- Patent number 7,135,270
- Issue date Nov 14, 2006
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photo acid generator, chemical amplification resist material and pa...
- Patent number 7,090,961
- Issue date Aug 15, 2006
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acetal compound, polymer, resist composition and patterning process
- Patent number 6,962,767
- Issue date Nov 8, 2005
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING...
- Publication number 20110054133
- Publication date Mar 3, 2011
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING PROCESS, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPO...
- Publication number 20110033799
- Publication date Feb 10, 2011
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS
- Publication number 20100310986
- Publication date Dec 9, 2010
- Tatsushi KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20100297554
- Publication date Nov 25, 2010
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20100297563
- Publication date Nov 25, 2010
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING PROCESS AND RESIST-MODIFYING COMPOSITION
- Publication number 20100209849
- Publication date Aug 19, 2010
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACETAL COMPOUNDS AND THEIR PREPARATION, POLYMERS, RESIST COMPOSITIO...
- Publication number 20100136485
- Publication date Jun 3, 2010
- Koji HASEGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DOUBLE PATTERNING PROCESS
- Publication number 20100062380
- Publication date Mar 11, 2010
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20100062374
- Publication date Mar 11, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro NISHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20100062366
- Publication date Mar 11, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20100062373
- Publication date Mar 11, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro NISHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20100062372
- Publication date Mar 11, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro NISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBOXYL-CONTAINING LACTONE COMPOUND, POLYMER, RESIST COMPOSITION,...
- Publication number 20090274984
- Publication date Nov 5, 2009
- Satoshi SHINACHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTE...
- Publication number 20090233242
- Publication date Sep 17, 2009
- Koji HASEGAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
DOUBLE PATTERNING PROCESS
- Publication number 20090208886
- Publication date Aug 20, 2009
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PA...
- Publication number 20090035699
- Publication date Feb 5, 2009
- Koji HASEGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive resist compositions and patterning process
- Publication number 20080268370
- Publication date Oct 30, 2008
- Shin-Etsu Chemical Co., Ltd.
- Shigeo Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and patterning process
- Publication number 20080254386
- Publication date Oct 16, 2008
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist compositions and patterning process
- Publication number 20080124653
- Publication date May 29, 2008
- Shin-Etsu Chemical Co., Ltd.
- Akihiro Seki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and patterning process
- Publication number 20080124652
- Publication date May 29, 2008
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lactone-containing compound, polymer, resist composition, and patte...
- Publication number 20080026331
- Publication date Jan 31, 2008
- Shin-Etsu Chemical Co., Ltd.
- Koji HASEGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS
- Publication number 20080008959
- Publication date Jan 10, 2008
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS
- Publication number 20080008961
- Publication date Jan 10, 2008
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro NISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS
- Publication number 20080008960
- Publication date Jan 10, 2008
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist polymer, preparing method, resist composition and patterning...
- Publication number 20070264592
- Publication date Nov 15, 2007
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition and patterning process
- Publication number 20070231741
- Publication date Oct 4, 2007
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluoroalcohol preparation method, fluorinated monomer, polymer, res...
- Publication number 20070179309
- Publication date Aug 2, 2007
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20070148594
- Publication date Jun 28, 2007
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photo acid generator, chemical amplification resist material and pa...
- Publication number 20060160023
- Publication date Jul 20, 2006
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Polymer, resist composition and patterning process
- Publication number 20050282082
- Publication date Dec 22, 2005
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Tsunehiro Nishi

Person

Patents Grantslast 30 patents

Positive resist compositions and patterning process

Pattern forming process, chemically amplified positive resist compo...

Resist-modifying composition and pattern forming process

Acetal compounds and their preparation, polymers, resist compositio...

Pattern forming process and resist-modifying composition

Resist-modifying composition and pattern forming process

Double patterning process

Double patterning process

Carboxyl-containing lactone compound, polymer, resist composition,...

Positive resist composition and patterning process

Fluorinated monomer, fluorinated polymer, resist composition and pa...

Lactone-containing compound, polymer, resist composition, and patte...

Fluoroalcohol preparation method, fluorinated monomer, polymer, res...

Lactone-containing compound, polymer, resist composition, and patte...

Lactone-containing compounds, polymers, resist compositions, and pa...

Positive resist compositions and patterning process

Polymers, resist compositions and patterning process

Positive resist compositions and patterning process

Positive resist compositions and patterning process

Positive resist composition and patterning process

Positive resist compositions and patterning process

Positive resist compositions and patterning process

Polymer, resist composition and patterning process

Polymer, resist composition and patterning process

Positive resist composition and patterning process

Photo acid generator, chemical amplification resist material

Polymer, resist material and patterning processing

Resist polymer, resist composition and patterning process

Photo acid generator, chemical amplification resist material and pa...

Acetal compound, polymer, resist composition and patterning process

Patents Applicationslast 30 patents

RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING...

PATTERN FORMING PROCESS, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPO...

POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS

RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS

RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS

PATTERN FORMING PROCESS AND RESIST-MODIFYING COMPOSITION

ACETAL COMPOUNDS AND THEIR PREPARATION, POLYMERS, RESIST COMPOSITIO...

DOUBLE PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

CARBOXYL-CONTAINING LACTONE COMPOUND, POLYMER, RESIST COMPOSITION,...

LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTE...

DOUBLE PATTERNING PROCESS

FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PA...

Positive resist compositions and patterning process

Positive resist composition and patterning process

Positive resist compositions and patterning process

Positive resist composition and patterning process

Lactone-containing compound, polymer, resist composition, and patte...

POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS

Resist polymer, preparing method, resist composition and patterning...

Resist composition and patterning process

Fluoroalcohol preparation method, fluorinated monomer, polymer, res...

Polymers, resist compositions and patterning process

Photo acid generator, chemical amplification resist material and pa...

Polymer, resist composition and patterning process