Tza-Jing Gung

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Metal oxide preclean chamber with improved selectivity and flow con...
- Patent number 12,100,576
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning of SIN with CCP plasma or RPS clean
- Patent number 12,027,354
- Issue date Jul 2, 2024
- Applied Materials, Inc.
- Jothilingam Ramalingam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analyzing in-plane distortion
- Patent number 11,948,846
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Wenjiao Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Cleaning of sin with CCP plasma or RPS clean
- Patent number 11,915,918
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Jothilingam Ramalingam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,898,236
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Zhiyong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon-containing layer for bit line resistance reduction
- Patent number 11,637,107
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analyzing in-plane distortion
- Patent number 11,637,043
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Wenjiao Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Silicon-containing layer for bit line resistance reduction
- Patent number 11,626,410
- Issue date Apr 11, 2023
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic housing systems
- Patent number 11,587,764
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Directional selective junction clean with field polymer protections
- Patent number 11,562,909
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Yu Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stack overlay improvement
- Patent number 11,339,475
- Issue date May 24, 2022
- Applied Materials, Inc.
- Xinhai Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition (PVD) chamber with in situ chamber cleani...
- Patent number 11,289,312
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Adolph M. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
On stack overlay improvement for 3D NAND
- Patent number 11,276,569
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic flowable deposition and high-density plasma treatment proces...
- Patent number 11,152,248
- Issue date Oct 19, 2021
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck with variable pixelated magnetic field
- Patent number 10,790,180
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Chih-Hsun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High pressure RF-DC sputtering and methods to improve film uniformi...
- Patent number 10,763,090
- Issue date Sep 1, 2020
- Applied Materials, Inc.
- Adolph Miller Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic flowable deposition and high-density plasma treatment proces...
- Patent number 10,707,116
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxide with higher utilization and lower cost
- Patent number 10,595,477
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Lei Guo
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information Patent Grant
Single oxide metal deposition chamber
- Patent number 10,597,785
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering showerhead
- Patent number 10,577,689
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Power deposition control in inductively coupled plasma (ICP) reactors
- Patent number 10,553,398
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Samer Banna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with irradiance curing lens
- Patent number 10,541,159
- Issue date Jan 21, 2020
- Applied Materials, Inc.
- Orlando Trejo
- G02 - OPTICS
Information Patent Grant
Dry etch rate reduction of silicon nitride films
- Patent number 10,515,796
- Issue date Dec 24, 2019
- Applied Materials, Inc.
- Michael Wenyoung Tsiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck with variable pixelated magnetic field
- Patent number 10,460,968
- Issue date Oct 29, 2019
- Applied Materials, Inc.
- Chih-Hsun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for electrical and magnetic uniformity and skew...
- Patent number 10,410,889
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- S. M. Reza Sadjadi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnet configurations for radial uniformity tuning of ICP plasmas
- Patent number 10,249,479
- Issue date Apr 2, 2019
- Applied Materials, Inc.
- Joseph F. Aubuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling a magnetic field in a plasma c...
- Patent number 10,115,566
- Issue date Oct 30, 2018
- Applied Materials, Inc.
- Steven Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual radio-frequency tuner for process control of a plasma process
- Patent number 10,109,462
- Issue date Oct 23, 2018
- Applied Materials, Inc.
- Edward P. Hammond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering target for PVD chamber
- Patent number 10,060,024
- Issue date Aug 28, 2018
- Applied Materials, Inc.
- Zhendong Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electromagnetic dipole for plasma density tuning in a substrate pro...
- Patent number 9,779,953
- Issue date Oct 3, 2017
- Applied Materials, Inc.
- Joseph F. Aubuchon
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ANALYZING IN-PLANE DISTORTION
- Publication number 20240243018
- Publication date Jul 18, 2024
- Applied Materials, Inc.
- Wenjiao Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ANALYZING IN-PLANE DISTORTION
- Publication number 20230238289
- Publication date Jul 27, 2023
- Applied Materials, Inc.
- Wenjiao Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MAGNETIC HOUSING SYSTEMS
- Publication number 20230154726
- Publication date May 18, 2023
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20230122956
- Publication date Apr 20, 2023
- Zhiyong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR SEAMLESS GAP FILLING USING GRADIENT OXIDATION
- Publication number 20230113514
- Publication date Apr 13, 2023
- Applied Materials, Inc.
- Shih Chung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN
- Publication number 20220415636
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Jothilingam Ramalingam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN
- Publication number 20220415637
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Jothilingam Ramalingam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon-Containing Layer for Bit Line Resistance Reduction
- Publication number 20220406788
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon-Containing Layer for Bit Line Resistance Reduction
- Publication number 20220406790
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTIONAL SELECTIVE JUNCTION CLEAN WITH FIELD POLYMER PROTECTIONS
- Publication number 20220336223
- Publication date Oct 20, 2022
- Applied Materials, Inc.
- Yu Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220310364
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Halbert CHONG
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220310363
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Halbert CHONG
- B08 - CLEANING
Information Patent Application
ANALYZING IN-PLANE DISTORTION
- Publication number 20220138396
- Publication date May 5, 2022
- Applied Materials, Inc.
- Wenjiao Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DIRECTIONAL SELECTIVE JUNCTION CLEAN WITH FIELD POLYMER PROTECTIONS
- Publication number 20210366722
- Publication date Nov 25, 2021
- Applied Materials, Inc.
- Yu Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXIDE PRECLEAN CHAMBER WITH IMPROVED SELECTIVITY AND FLOW CON...
- Publication number 20210343508
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210319989
- Publication date Oct 14, 2021
- Applied Materials, Inc.
- Halbert CHONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANI...
- Publication number 20200395198
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- ADOLPH M. ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMI...
- Publication number 20200357616
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Adolph Miller ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CYCLIC FLOWABLE DEPOSITION AND HIGH-DENSITY PLASMA TREATMENT PROCES...
- Publication number 20200286773
- Publication date Sep 10, 2020
- Applied Materials, Inc.
- Jingmei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM STACK OVERLAY IMPROVEMENT FOR 3D NAND APPLICATION
- Publication number 20200173022
- Publication date Jun 4, 2020
- Applied Materials, Inc.
- Xinhai HAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETIC HOUSING SYSTEMS
- Publication number 20200144029
- Publication date May 7, 2020
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ON STACK OVERLAY IMPROVEMENT FOR 3D NAND
- Publication number 20200043723
- Publication date Feb 6, 2020
- Applied Materials, Inc.
- Yongjing LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH VARIABLE PIXELATED MAGNETIC FIELD
- Publication number 20200013661
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Chih-Hsun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT METHODS FOR SILICON NITRIDE THIN FILMS
- Publication number 20190233940
- Publication date Aug 1, 2019
- Applied Materials, Inc.
- Jinrui GUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY ETCH RATE REDUCTION OF SILICON NITRIDE FILMS
- Publication number 20190157077
- Publication date May 23, 2019
- Applied Materials, Inc.
- Michael Wenyoung TSIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OXIDE WITH HIGHER UTILIZATION AND LOWER COST
- Publication number 20190074176
- Publication date Mar 7, 2019
- Applied Materials, Inc.
- Lei GUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CYCLIC FLOWABLE DEPOSITION AND HIGH-DENSITY PLASMA TREATMENT PROCES...
- Publication number 20180330980
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Jingmei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DUAL RADIO-FREQUENCY TUNER FOR PROCESS CONTROL OF A PLASMA PROCESS
- Publication number 20180261431
- Publication date Sep 13, 2018
- Applied Materials, Inc.
- Edward P. HAMMOND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING SHOWERHEAD
- Publication number 20180087155
- Publication date Mar 29, 2018
- Applied Materials, Inc.
- Anantha K. SUBRAMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SINGLE OXIDE METAL DEPOSITION CHAMBER
- Publication number 20180073150
- Publication date Mar 15, 2018
- Applied Materials, Inc.
- Anantha K. SUBRAMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tza-Jing Gung

Person

Patents Grantslast 30 patents

Metal oxide preclean chamber with improved selectivity and flow con...

Cleaning of SIN with CCP plasma or RPS clean

Analyzing in-plane distortion

Cleaning of sin with CCP plasma or RPS clean

Methods and apparatus for processing a substrate

Silicon-containing layer for bit line resistance reduction

Analyzing in-plane distortion

Silicon-containing layer for bit line resistance reduction

Magnetic housing systems

Directional selective junction clean with field polymer protections

Film stack overlay improvement

Physical vapor deposition (PVD) chamber with in situ chamber cleani...

On stack overlay improvement for 3D NAND

Cyclic flowable deposition and high-density plasma treatment proces...

Electrostatic chuck with variable pixelated magnetic field

High pressure RF-DC sputtering and methods to improve film uniformi...

Cyclic flowable deposition and high-density plasma treatment proces...

Oxide with higher utilization and lower cost

Single oxide metal deposition chamber

Sputtering showerhead

Power deposition control in inductively coupled plasma (ICP) reactors

Processing chamber with irradiance curing lens

Dry etch rate reduction of silicon nitride films

Electrostatic chuck with variable pixelated magnetic field

Systems and methods for electrical and magnetic uniformity and skew...

Magnet configurations for radial uniformity tuning of ICP plasmas

Method and apparatus for controlling a magnetic field in a plasma c...

Dual radio-frequency tuner for process control of a plasma process

Sputtering target for PVD chamber

Electromagnetic dipole for plasma density tuning in a substrate pro...

Patents Applicationslast 30 patents

ANALYZING IN-PLANE DISTORTION

ANALYZING IN-PLANE DISTORTION

MAGNETIC HOUSING SYSTEMS

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS FOR SEAMLESS GAP FILLING USING GRADIENT OXIDATION

CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN

CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN

Silicon-Containing Layer for Bit Line Resistance Reduction

Silicon-Containing Layer for Bit Line Resistance Reduction

DIRECTIONAL SELECTIVE JUNCTION CLEAN WITH FIELD POLYMER PROTECTIONS

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

ANALYZING IN-PLANE DISTORTION

DIRECTIONAL SELECTIVE JUNCTION CLEAN WITH FIELD POLYMER PROTECTIONS

METAL OXIDE PRECLEAN CHAMBER WITH IMPROVED SELECTIVITY AND FLOW CON...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANI...

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMI...

CYCLIC FLOWABLE DEPOSITION AND HIGH-DENSITY PLASMA TREATMENT PROCES...

FILM STACK OVERLAY IMPROVEMENT FOR 3D NAND APPLICATION

MAGNETIC HOUSING SYSTEMS

ON STACK OVERLAY IMPROVEMENT FOR 3D NAND

ELECTROSTATIC CHUCK WITH VARIABLE PIXELATED MAGNETIC FIELD

TREATMENT METHODS FOR SILICON NITRIDE THIN FILMS

DRY ETCH RATE REDUCTION OF SILICON NITRIDE FILMS

OXIDE WITH HIGHER UTILIZATION AND LOWER COST

CYCLIC FLOWABLE DEPOSITION AND HIGH-DENSITY PLASMA TREATMENT PROCES...

DUAL RADIO-FREQUENCY TUNER FOR PROCESS CONTROL OF A PLASMA PROCESS

SPUTTERING SHOWERHEAD

SINGLE OXIDE METAL DEPOSITION CHAMBER