Tze-Chung Lin

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method for semiconductor device structure
- Patent number 12,154,970
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tze-Chung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor fabrication system embedded with effective baking module
- Patent number 12,033,863
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Yu Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor devices and methods of manufacturing thereof
- Patent number 12,033,895
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Shu Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High selectivity etching with germanium-containing gases
- Patent number 12,021,125
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tze-Chung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure with inner spacer layer and method f...
- Patent number 11,973,129
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,855,192
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inner spacer formation in multi-gate transistors
- Patent number 11,830,928
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for FinFET fabrication and structure thereof
- Patent number 11,646,234
- Issue date May 9, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure with inner spacer layer
- Patent number 11,605,728
- Issue date Mar 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure and method for forming the same
- Patent number 11,417,751
- Issue date Aug 16, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tze-Chung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for semiconductor manufacturing
- Patent number 11,373,878
- Issue date Jun 28, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor fabrication system embedded with effective baking module
- Patent number 11,222,794
- Issue date Jan 11, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanowire stack GAA device and methods for producing the same
- Patent number 11,201,243
- Issue date Dec 14, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chansyun David Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device structure with inner spacer...
- Patent number 11,152,491
- Issue date Oct 19, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inner spacer formation in multi-gate transistors
- Patent number 11,107,904
- Issue date Aug 31, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for FinFET fabrication and structure thereof
- Patent number 11,056,393
- Issue date Jul 6, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR FABRICATION SYSTEM EMBEDDED WITH EFFECTIVE BAKING MODULE
- Publication number 20240347345
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Han-Yu Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Selectivity Etching With Germanium-Containing Gases
- Publication number 20240290854
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- Tze-Chung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER LAYER
- Publication number 20240234549
- Publication date Jul 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Han-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240097011
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Han-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK TRIMMING IN METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240006177
- Publication date Jan 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Chien KUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FINFET FABRICATION AND STRUCTURE THEREOF
- Publication number 20230282520
- Publication date Sep 7, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOLATION STRUCTURE FOR SEMICONDUCTOR DEVICE
- Publication number 20230268386
- Publication date Aug 24, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Han-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER LAYER AND METHOD F...
- Publication number 20230215936
- Publication date Jul 6, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Han-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inner Spacer Formation in Multi-Gate Transistors
- Publication number 20230118700
- Publication date Apr 20, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20230080290
- Publication date Mar 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Shu Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING OF SEMICONDUCTOR STRUCTURES WITH FLUORINE-CONTAINING GASES
- Publication number 20230064393
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tze-Chung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Devices with Uniform Gate Regions
- Publication number 20230027676
- Publication date Jan 26, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Chia-Chien Kuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY ETCHING WITH GERMANIUM-CONTAINING GASES
- Publication number 20230017512
- Publication date Jan 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tze-Chung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SEMICONDUCTOR DEVICE STRUCTURE
- Publication number 20220336635
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tze-Chung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20220319861
- Publication date Oct 6, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- HAN-YU LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20220173224
- Publication date Jun 2, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Han-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Fabrication System Embedded with Effective Baking Module
- Publication number 20220130693
- Publication date Apr 28, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Han-Yu Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER LAYER
- Publication number 20220045194
- Publication date Feb 10, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Han-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20220020595
- Publication date Jan 20, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- HAN-YU LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inner Spacer Formation in Multi-Gate Transistors
- Publication number 20210391447
- Publication date Dec 16, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for FinFET Fabrication and Structure Thereof
- Publication number 20210327764
- Publication date Oct 21, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20210313449
- Publication date Oct 7, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tze-Chung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOWIRE STACK GAA DEVICE AND METHODS FOR PRODUCING THE SAME
- Publication number 20210066490
- Publication date Mar 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chansyun David Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inner Spacer Formation in Multi-Gate Transistors
- Publication number 20200127119
- Publication date Apr 23, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for FinFET Fabrication and Structure Thereof
- Publication number 20200105604
- Publication date Apr 2, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER...
- Publication number 20200066872
- Publication date Feb 27, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Han-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Fabrication System Embedded with Effective Baking Module
- Publication number 20190304812
- Publication date Oct 3, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Han-Yu Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tze-Chung Lin

Person

Patents Grantslast 30 patents

Method for semiconductor device structure

Semiconductor fabrication system embedded with effective baking module

Semiconductor devices and methods of manufacturing thereof

High selectivity etching with germanium-containing gases

Semiconductor device structure with inner spacer layer and method f...

Semiconductor device and manufacturing method thereof

Inner spacer formation in multi-gate transistors

Method for FinFET fabrication and structure thereof

Semiconductor device structure with inner spacer layer

Semiconductor device structure and method for forming the same

Technique for semiconductor manufacturing

Semiconductor fabrication system embedded with effective baking module

Nanowire stack GAA device and methods for producing the same

Method for forming semiconductor device structure with inner spacer...

Inner spacer formation in multi-gate transistors

Method for FinFET fabrication and structure thereof

Patents Applicationslast 30 patents

SEMICONDUCTOR FABRICATION SYSTEM EMBEDDED WITH EFFECTIVE BAKING MODULE

High Selectivity Etching With Germanium-Containing Gases

SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER LAYER

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

HARD MASK TRIMMING IN METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHOD FOR FINFET FABRICATION AND STRUCTURE THEREOF

ISOLATION STRUCTURE FOR SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER LAYER AND METHOD F...

Inner Spacer Formation in Multi-Gate Transistors

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF

DRY ETCHING OF SEMICONDUCTOR STRUCTURES WITH FLUORINE-CONTAINING GASES

Semiconductor Devices with Uniform Gate Regions

HIGH SELECTIVITY ETCHING WITH GERMANIUM-CONTAINING GASES

METHOD FOR SEMICONDUCTOR DEVICE STRUCTURE

TECHNIQUE FOR SEMICONDUCTOR MANUFACTURING

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

Semiconductor Fabrication System Embedded with Effective Baking Module

SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER LAYER

TECHNIQUE FOR SEMICONDUCTOR MANUFACTURING

Inner Spacer Formation in Multi-Gate Transistors

Method for FinFET Fabrication and Structure Thereof

SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME

NANOWIRE STACK GAA DEVICE AND METHODS FOR PRODUCING THE SAME

Inner Spacer Formation in Multi-Gate Transistors

Method for FinFET Fabrication and Structure Thereof

METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER...

Semiconductor Fabrication System Embedded with Effective Baking Module