Valentin N. Todorow

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing using pulsed-voltage and radio-frequency power
- Patent number 11,848,176
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 11,776,789
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 11,462,388
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed-voltage hardware assembly for use in a plasma processing system
- Patent number 11,462,389
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-level pulse tuning
- Patent number 11,177,115
- Issue date Nov 16, 2021
- Applied Materials, Inc.
- Gary Leray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with substrate edge enhancement processing
- Patent number 11,094,511
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- Changhun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooling mechanism utilized in a plasma reactor with enhanced temper...
- Patent number 10,991,552
- Issue date Apr 27, 2021
- Applied Materials, Inc.
- Aniruddha Pal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit components for use with an extended and independent RF...
- Patent number 10,825,708
- Issue date Nov 3, 2020
- Applied Materials, Inc.
- Valentin Todorow
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Inductively coupled plasma apparatus
- Patent number 10,573,493
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Valentin N. Todorow
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Power deposition control in inductively coupled plasma (ICP) reactors
- Patent number 10,553,398
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Samer Banna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, apparatus and system for wafer dechucking using dynamic vol...
- Patent number 10,546,731
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- Haitao Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced plasma source for a plasma reactor
- Patent number 10,290,469
- Issue date May 14, 2019
- Applied Materials, Inc.
- Valentin N. Todorow
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High efficiency triple-coil inductively coupled plasma source with...
- Patent number 10,271,416
- Issue date Apr 23, 2019
- Applied Materials, Inc.
- Samer Banna
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Cooling mechanism utlized in a plasma reactor with enhanced tempera...
- Patent number 10,249,475
- Issue date Apr 2, 2019
- Applied Materials, Inc.
- Aniruddha Pal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shielded lid heater assembly
- Patent number 10,083,816
- Issue date Sep 25, 2018
- Applied Materials, Inc.
- Michael D. Willwerth
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High efficiency inductively coupled plasma source with customized R...
- Patent number 9,945,033
- Issue date Apr 17, 2018
- Applied Materials, Inc.
- Samer Banna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Frequency tuning for dual level radio frequency (RF) pulsing
- Patent number 9,595,423
- Issue date Mar 14, 2017
- Applied Materials, Inc.
- Gary Leray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-bias calculation on a substrate in a process chamber with bias...
- Patent number 9,406,540
- Issue date Aug 2, 2016
- Applied Materials, Inc.
- Gary Leray
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inductively coupled plasma reactor having RF phase control and meth...
- Patent number 9,378,930
- Issue date Jun 28, 2016
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shielded lid heater assembly
- Patent number 9,362,148
- Issue date Jun 7, 2016
- Applied Materials, Inc.
- Michael D. Willwerth
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Frequency tuning for dual level radio frequency (RF) pulsing
- Patent number 9,318,304
- Issue date Apr 19, 2016
- Applied Materials, Inc.
- Gary Leray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extended and independent RF powered cathode substrate for extreme e...
- Patent number 8,988,848
- Issue date Mar 24, 2015
- Applied Materials, Inc.
- Valentin Todorow
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Methods to eliminate “M-shape” etch rate profile in inductively cou...
- Patent number 8,956,500
- Issue date Feb 17, 2015
- Applied Materials, Inc.
- Stephen Yuen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma source with phase control
- Patent number 8,933,628
- Issue date Jan 13, 2015
- Applied Materials, Inc.
- Samer Banna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for stable plasma processing
- Patent number 8,801,896
- Issue date Aug 12, 2014
- Applied Materials, Inc.
- Valentin N. Todorow
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for forming a magnetic field and methods of use thereof
- Patent number 8,773,020
- Issue date Jul 8, 2014
- Applied Materials, Inc.
- Gary Leray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling substrate temperature in a pr...
- Patent number 8,633,423
- Issue date Jan 21, 2014
- Applied Materials, Inc.
- Xing Lin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods for calibrating RF power applied to a plurality of RF coils...
- Patent number 8,492,980
- Issue date Jul 23, 2013
- Applied Materials, Inc.
- Samer Banna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shielded lid heater assembly
- Patent number 8,419,893
- Issue date Apr 16, 2013
- Applied Materials, Inc.
- Michael D. Willwerth
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing a workpiece in a plasma reactor with independe...
- Patent number 8,383,002
- Issue date Feb 26, 2013
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
- Publication number 20240030002
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
- Publication number 20230030927
- Publication date Feb 2, 2023
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED-VOLTAGE HARDWARE ASSEMBLY FOR USE IN A PLASMA PROCESSING SYSTEM
- Publication number 20220037120
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
- Publication number 20220037119
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER
- Publication number 20220037121
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL-LEVEL PULSE TUNING
- Publication number 20200381214
- Publication date Dec 3, 2020
- Applied Materials, Inc.
- Gary LERAY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER WITH SUBSTRATE EDGE ENHANCEMENT PROCESSING
- Publication number 20200152431
- Publication date May 14, 2020
- Applied Materials, Inc.
- Changhun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS KIT COMPONENTS FOR USE WITH AN EXTENDED AND INDEPENDENT RF...
- Publication number 20190221463
- Publication date Jul 18, 2019
- Applied Materials, Inc.
- VALENTIN TODOROW
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
COOLING MECHANISM UTLIZED IN A PLASMA REACTOR WITH ENHANCED TEMPERA...
- Publication number 20190198295
- Publication date Jun 27, 2019
- Applied Materials, Inc.
- Aniruddha PAL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHIELDED LID HEATER ASSEMBLY
- Publication number 20160254123
- Publication date Sep 1, 2016
- Applied Materials, Inc.
- Michael D. WILLWERTH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED PLASMA APPARATUS
- Publication number 20160196953
- Publication date Jul 7, 2016
- Applied Materials, Inc.
- VALENTIN N. TODOROW
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREQUENCY TUNING FOR DUAL LEVEL RADIO FREQUENCY (RF) PULSING
- Publication number 20160196958
- Publication date Jul 7, 2016
- Applied Materials, Inc.
- Gary LERAY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR EXTENDING CHAMBER COMPONENT LIFE FOR PLASMA PROCESSING...
- Publication number 20150294843
- Publication date Oct 15, 2015
- Applied Materials, Inc.
- Feng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING MECHANISM UTLIZED IN A PLASMA REACTOR WITH ENHANCED TEMPERA...
- Publication number 20150279634
- Publication date Oct 1, 2015
- Applied Materials, Inc.
- Aniruddha PAL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH MAGNETIC CATHODE LINER FOR CRITICAL DIMENS...
- Publication number 20150221481
- Publication date Aug 6, 2015
- Michael D. Willwerth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH EFFICIENCY INDUCTIVELY COUPLED PLASMA SOURCE WITH CUSTOMIZED R...
- Publication number 20150191823
- Publication date Jul 9, 2015
- Applied Materials, Inc.
- Samer Banna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FREQUENCY TUNING FOR DUAL LEVEL RADIO FREQUENCY (RF) PULSING
- Publication number 20150130354
- Publication date May 14, 2015
- Applied Materials, Inc.
- Gary LERAY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER DEPOSITION CONTROL IN INDUCTIVELY COUPLED PLASMA (ICP) REACTORS
- Publication number 20150068682
- Publication date Mar 12, 2015
- Applied Materials, Inc.
- SAMER BANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED PLASMA SOURCE FOR A PLASMA REACTOR
- Publication number 20140367046
- Publication date Dec 18, 2014
- Applied Materials, Inc.
- Valentin N. TODOROW
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR STABLE PLASMA PROCESSING
- Publication number 20140345803
- Publication date Nov 27, 2014
- Applied Materials, Inc.
- Valentin N. Todorow
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION SHIELD FOR PLASMA ENHANCED SUBSTRATE PROCESSING
- Publication number 20140151331
- Publication date Jun 5, 2014
- Applied Materials, Inc.
- VALENTIN N. TODOROW
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHIELDED LID HEATER ASSEMBLY
- Publication number 20130189848
- Publication date Jul 25, 2013
- Michael D. WILLWERTH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS KIT COMPONENTS FOR USE WITH AN EXTENDED AND INDEPENDENT RF...
- Publication number 20130154175
- Publication date Jun 20, 2013
- Applied Materials, Inc.
- VALENTIN TODOROW
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
EXTENDED AND INDEPENDENT RF POWERED CATHODE SUBSTRATE FOR EXTREME E...
- Publication number 20130155568
- Publication date Jun 20, 2013
- Applied Materials, Inc.
- VALENTIN TODOROW
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
INDUCTIVELY COUPLED PLASMA APPARATUS
- Publication number 20130134129
- Publication date May 30, 2013
- Applied Materials, Inc.
- VALENTIN N. TODOROW
- B44 - DECORATIVE ARTS
Information Patent Application
METHOD AND APPARATUS FOR STABLE PLASMA PROCESSING
- Publication number 20130118687
- Publication date May 16, 2013
- VALENTIN N. TODOROW
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH EFFICIENCY TRIPLE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH...
- Publication number 20130105086
- Publication date May 2, 2013
- Applied Materials, Inc.
- SAMER BANNA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURE WITH PHASE CONTROL
- Publication number 20130106286
- Publication date May 2, 2013
- Applied Materials, Inc.
- SAMER BANNA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20130107415
- Publication date May 2, 2013
- Applied Materials, Inc.
- SAMER BANNA
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
SELF-BIAS CALCULATION ON A SUBSTRATE IN A PROCESS CHAMBER WITH BIAS...
- Publication number 20130110435
- Publication date May 2, 2013
- Applied Materials, Inc.
- GARY LERAY
- G06 - COMPUTING CALCULATING COUNTING

Valentin N. Todorow

Person

Patents Grantslast 30 patents

Plasma processing using pulsed-voltage and radio-frequency power

Plasma processing assembly using pulsed-voltage and radio-frequency...

Plasma processing assembly using pulsed-voltage and radio-frequency...

Pulsed-voltage hardware assembly for use in a plasma processing system

Dual-level pulse tuning

Processing chamber with substrate edge enhancement processing

Cooling mechanism utilized in a plasma reactor with enhanced temper...

Process kit components for use with an extended and independent RF...

Inductively coupled plasma apparatus

Power deposition control in inductively coupled plasma (ICP) reactors

Method, apparatus and system for wafer dechucking using dynamic vol...

Enhanced plasma source for a plasma reactor

High efficiency triple-coil inductively coupled plasma source with...

Cooling mechanism utlized in a plasma reactor with enhanced tempera...

Shielded lid heater assembly

High efficiency inductively coupled plasma source with customized R...

Frequency tuning for dual level radio frequency (RF) pulsing

Self-bias calculation on a substrate in a process chamber with bias...

Inductively coupled plasma reactor having RF phase control and meth...

Shielded lid heater assembly

Frequency tuning for dual level radio frequency (RF) pulsing

Extended and independent RF powered cathode substrate for extreme e...

Methods to eliminate “M-shape” etch rate profile in inductively cou...

Inductively coupled plasma source with phase control

Method and apparatus for stable plasma processing

Apparatus for forming a magnetic field and methods of use thereof

Methods and apparatus for controlling substrate temperature in a pr...

Methods for calibrating RF power applied to a plurality of RF coils...

Shielded lid heater assembly

Method of processing a workpiece in a plasma reactor with independe...

Patents Applicationslast 30 patents

PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...

PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...

PULSED-VOLTAGE HARDWARE ASSEMBLY FOR USE IN A PLASMA PROCESSING SYSTEM

PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...

PLASMA PROCESSING USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER

DUAL-LEVEL PULSE TUNING

PROCESSING CHAMBER WITH SUBSTRATE EDGE ENHANCEMENT PROCESSING

PROCESS KIT COMPONENTS FOR USE WITH AN EXTENDED AND INDEPENDENT RF...

COOLING MECHANISM UTLIZED IN A PLASMA REACTOR WITH ENHANCED TEMPERA...

SHIELDED LID HEATER ASSEMBLY

INDUCTIVELY COUPLED PLASMA APPARATUS

FREQUENCY TUNING FOR DUAL LEVEL RADIO FREQUENCY (RF) PULSING

METHODS FOR EXTENDING CHAMBER COMPONENT LIFE FOR PLASMA PROCESSING...

COOLING MECHANISM UTLIZED IN A PLASMA REACTOR WITH ENHANCED TEMPERA...

ELECTROSTATIC CHUCK WITH MAGNETIC CATHODE LINER FOR CRITICAL DIMENS...

HIGH EFFICIENCY INDUCTIVELY COUPLED PLASMA SOURCE WITH CUSTOMIZED R...

FREQUENCY TUNING FOR DUAL LEVEL RADIO FREQUENCY (RF) PULSING

POWER DEPOSITION CONTROL IN INDUCTIVELY COUPLED PLASMA (ICP) REACTORS

ENHANCED PLASMA SOURCE FOR A PLASMA REACTOR

METHOD AND APPARATUS FOR STABLE PLASMA PROCESSING

DEPOSITION SHIELD FOR PLASMA ENHANCED SUBSTRATE PROCESSING

SHIELDED LID HEATER ASSEMBLY

PROCESS KIT COMPONENTS FOR USE WITH AN EXTENDED AND INDEPENDENT RF...

EXTENDED AND INDEPENDENT RF POWERED CATHODE SUBSTRATE FOR EXTREME E...

INDUCTIVELY COUPLED PLASMA APPARATUS

METHOD AND APPARATUS FOR STABLE PLASMA PROCESSING

HIGH EFFICIENCY TRIPLE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH...

INDUCTIVELY COUPLED PLASMA SOURE WITH PHASE CONTROL

ELECTROSTATIC CHUCK

SELF-BIAS CALCULATION ON A SUBSTRATE IN A PROCESS CHAMBER WITH BIAS...