Wai Fan Yau

Person

Los Altos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
CVD flowable gap fill
- Patent number 9,257,302
- Issue date Feb 9, 2016
- Novellus Systems, Inc.
- Feng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching a molybdenum layer suitable for photomask fabric...
- Patent number 8,293,430
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Madhavi Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
CVD flowable gap fill
- Patent number 8,187,951
- Issue date May 29, 2012
- Novellus Systems, Inc.
- Feng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Density gradient-free gap fill
- Patent number 7,888,273
- Issue date Feb 15, 2011
- Novellus Systems, Inc.
- Feng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for photomask plasma etching using a protected mask
- Patent number 7,790,334
- Issue date Sep 7, 2010
- Applied Materials, Inc.
- Madhavi Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming low-temperature conformal dielectric films
- Patent number 7,678,709
- Issue date Mar 16, 2010
- Novellus Systems, Inc.
- Brian Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition chamber with dual frequency bias and meth...
- Patent number 7,658,969
- Issue date Feb 9, 2010
- Applied Materials, Inc.
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low dielectric constant film produced from silicon compounds compri...
- Patent number 7,651,725
- Issue date Jan 26, 2010
- Applied Materials, Inc.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD flowable gap fill
- Patent number 7,629,227
- Issue date Dec 8, 2009
- Novellus Systems, Inc.
- Feng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 7,560,377
- Issue date Jul 14, 2009
- Applied Materials, Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conformal nanolaminate dielectric deposition and etch bag gap fill...
- Patent number 7,482,247
- Issue date Jan 27, 2009
- Novellus Systems, Inc.
- George D. Papasouliotis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removal of metallic residue after plasma etching of a me...
- Patent number 7,320,942
- Issue date Jan 22, 2008
- Applied Materials, Inc.
- Xiaoyi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated low k dielectrics and etch stops
- Patent number 7,227,244
- Issue date Jun 5, 2007
- Applied Materials, Inc.
- Claes H. Bjorkman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD plasma assisted low dielectric constant films
- Patent number 7,205,249
- Issue date Apr 17, 2007
- Applied Materials, Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing low k films
- Patent number 7,160,821
- Issue date Jan 9, 2007
- Applied Materials, Inc.
- Tzu-Fang Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of decreasing the k value in sioc layer deposited by chemica...
- Patent number 7,074,708
- Issue date Jul 11, 2006
- Applied Materials, Inc.
- Frederic Gaillard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for depositing antireflective coating
- Patent number 7,070,657
- Issue date Jul 4, 2006
- Applied Materials Inc.
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low dielectric constant film produced from silicon compounds compri...
- Patent number 7,023,092
- Issue date Apr 4, 2006
- Applied Materials Inc.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,930,061
- Issue date Aug 16, 2005
- Applied Materials Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,869,896
- Issue date Mar 22, 2005
- Applied Materials, Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated low K dielectrics and etch stops
- Patent number 6,858,153
- Issue date Feb 22, 2005
- Applied Materials Inc.
- Claes H. Bjorkman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing low K films
- Patent number 6,806,207
- Issue date Oct 19, 2004
- Applied Materials Inc.
- Tzu-Fang Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD plasma assisted low dielectric constant films
- Patent number 6,800,571
- Issue date Oct 5, 2004
- Applied Materials Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for planarizing a copper interconnect structure
- Patent number 6,784,107
- Issue date Aug 31, 2004
- Hui Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of decreasing the K value in SIOC layer deposited by chemica...
- Patent number 6,784,119
- Issue date Aug 31, 2004
- Applied Materials Inc.
- Frederic Gaillard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing a low dielectric with organo silane
- Patent number 6,770,556
- Issue date Aug 3, 2004
- Applied Materials Inc.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of improving moisture resistance of low dielectric constant...
- Patent number 6,743,737
- Issue date Jun 1, 2004
- Applied Materials, Inc.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,734,115
- Issue date May 11, 2004
- Applied Materials Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing a low K dielectric with organo silane
- Patent number 6,730,593
- Issue date May 4, 2004
- Applied Materials Inc.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated low k dielectrics and etch stops
- Patent number 6,669,858
- Issue date Dec 30, 2003
- Applied Materials Inc.
- Claes H. Bjorkman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR REPAIRING A RECESS OF A CHAMBER COMPONENT
- Publication number 20210035767
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- Gang Grant PENG
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
CHAMBER COMPONENT WITH WEAR INDICATOR
- Publication number 20160336149
- Publication date Nov 17, 2016
- Applied Materials, Inc.
- Mats LARSSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20140190632
- Publication date Jul 10, 2014
- Applied Materials, Inc.
- Ajay KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING A MOLYBDENUM LAYER SUITABLE FOR PHOTOMASK FABRIC...
- Publication number 20130040231
- Publication date Feb 14, 2013
- Madhavi Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MITIGATING SUBSTRATE DAMAGE DURING DEPOSITION PROCESSES
- Publication number 20120083134
- Publication date Apr 5, 2012
- Hui-Jung WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW DIELECTRIC CONSTANT FILM PRODUCED FROM SILICON COMPOUNDS COMPRI...
- Publication number 20080064225
- Publication date Mar 13, 2008
- WAI-FAN YAU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW DIELECTRIC CONSTANT FILM PRODUCED FROM SILICON COMPOUNDS COMPRI...
- Publication number 20080061439
- Publication date Mar 13, 2008
- WAI-FAN YAU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW DIELECTRIC CONSTANT FILM PRODUCED FROM SILICON COMPOUNDS COMPRI...
- Publication number 20080044557
- Publication date Feb 21, 2008
- WAI-FAN YAU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL VAPOR DEPOSITION CHAMBER WITH DUAL FREQUENCY BIAS AND METH...
- Publication number 20070119373
- Publication date May 31, 2007
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical vapor deposition chamber with dual frequency bias and meth...
- Publication number 20070031609
- Publication date Feb 8, 2007
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20070017898
- Publication date Jan 25, 2007
- Ajay Kumar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for photomask plasma etching using a protected mask
- Publication number 20060166106
- Publication date Jul 27, 2006
- APPLIED MATERIALS, INC.
- Madhavi Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for etching a molybdenum layer suitable for photomask fabric...
- Publication number 20060166108
- Publication date Jul 27, 2006
- APPLIED MATERIALS, INC.
- Madhavi Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for photomask plasma etching
- Publication number 20060000802
- Publication date Jan 5, 2006
- Ajay Kumar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of depositing low k films
- Publication number 20050260864
- Publication date Nov 24, 2005
- APPLIED MATERIALS, INC.
- Tzu-Fang Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processes for depositing low dielectric constant films
- Publication number 20050191846
- Publication date Sep 1, 2005
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low dielectric constant film produced from silicon compounds compri...
- Publication number 20050156317
- Publication date Jul 21, 2005
- APPLIED MATERIALS, INC.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for planarizing an interconnect structure
- Publication number 20050079703
- Publication date Apr 14, 2005
- APPLIED MATERIALS, INC.
- Hui Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD plasma assisted low dielectric constant films
- Publication number 20050059264
- Publication date Mar 17, 2005
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integrated low k dielectrics and etch stops
- Publication number 20050023694
- Publication date Feb 3, 2005
- Claes H. Bjorkman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for etching an aluminum layer using an amorphous carbon mask
- Publication number 20040229470
- Publication date Nov 18, 2004
- APPLIED MATERIALS, INC.
- Ying Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low dielectric constant film produced from silicon compounds compri...
- Publication number 20040201103
- Publication date Oct 14, 2004
- WAI-FAN YAU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of decreasing the K value in SIOC layer deposited by chemica...
- Publication number 20040166665
- Publication date Aug 26, 2004
- APPLIED MATERIALS, INC.
- Frederic Gaillard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low dielectric constant film produced from silicon compounds compri...
- Publication number 20040147109
- Publication date Jul 29, 2004
- APPLIED MATERIALS, INC.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processes for depositing low dielectric constant films
- Publication number 20040082199
- Publication date Apr 29, 2004
- APPLIED MATERIALS, INC.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processes for depositing low dielectric constant films
- Publication number 20040038545
- Publication date Feb 26, 2004
- APPLIED MATERIALS, INC.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of decreasing the K value in SIOC layer deposited by chemica...
- Publication number 20040029400
- Publication date Feb 12, 2004
- APPLIED MATERIALS, INC.
- Frederic Gaillard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for removal of metallic residue after plasma etching of a me...
- Publication number 20030219912
- Publication date Nov 27, 2003
- Xiaoyi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING AN ORGANIC ANTI-REFLECTIVE COATING
- Publication number 20030209520
- Publication date Nov 13, 2003
- APPLIED MATERIALS, INC.
- Hui Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated etch, rinse and dry, and anneal method and system
- Publication number 20030194877
- Publication date Oct 16, 2003
- APPLIED MATERIALS, INC.
- Wai-Fan Yau
- H01 - BASIC ELECTRIC ELEMENTS

Wai Fan Yau

Person

Patents Grantslast 30 patents

CVD flowable gap fill

Method for etching a molybdenum layer suitable for photomask fabric...

CVD flowable gap fill

Density gradient-free gap fill

Method for photomask plasma etching using a protected mask

Method of forming low-temperature conformal dielectric films

Chemical vapor deposition chamber with dual frequency bias and meth...

Low dielectric constant film produced from silicon compounds compri...

CVD flowable gap fill

Plasma processes for depositing low dielectric constant films

Conformal nanolaminate dielectric deposition and etch bag gap fill...

Method for removal of metallic residue after plasma etching of a me...

Integrated low k dielectrics and etch stops

CVD plasma assisted low dielectric constant films

Method of depositing low k films

Method of decreasing the k value in sioc layer deposited by chemica...

Method and apparatus for depositing antireflective coating

Low dielectric constant film produced from silicon compounds compri...

Plasma processes for depositing low dielectric constant films

Plasma processes for depositing low dielectric constant films

Integrated low K dielectrics and etch stops

Method of depositing low K films

CVD plasma assisted low dielectric constant films

Method for planarizing a copper interconnect structure

Method of decreasing the K value in SIOC layer deposited by chemica...

Method of depositing a low dielectric with organo silane

Method of improving moisture resistance of low dielectric constant...

Plasma processes for depositing low dielectric constant films

Method of depositing a low K dielectric with organo silane

Integrated low k dielectrics and etch stops

Patents Applicationslast 30 patents

METHODS FOR REPAIRING A RECESS OF A CHAMBER COMPONENT

CHAMBER COMPONENT WITH WEAR INDICATOR

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

METHOD FOR ETCHING A MOLYBDENUM LAYER SUITABLE FOR PHOTOMASK FABRIC...

METHOD OF MITIGATING SUBSTRATE DAMAGE DURING DEPOSITION PROCESSES

LOW DIELECTRIC CONSTANT FILM PRODUCED FROM SILICON COMPOUNDS COMPRI...

LOW DIELECTRIC CONSTANT FILM PRODUCED FROM SILICON COMPOUNDS COMPRI...

LOW DIELECTRIC CONSTANT FILM PRODUCED FROM SILICON COMPOUNDS COMPRI...

CHEMICAL VAPOR DEPOSITION CHAMBER WITH DUAL FREQUENCY BIAS AND METH...

Chemical vapor deposition chamber with dual frequency bias and meth...

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

Method for photomask plasma etching using a protected mask

Method for etching a molybdenum layer suitable for photomask fabric...

Method and apparatus for photomask plasma etching

Method of depositing low k films

Plasma processes for depositing low dielectric constant films

Low dielectric constant film produced from silicon compounds compri...

Method for planarizing an interconnect structure

CVD plasma assisted low dielectric constant films

Integrated low k dielectrics and etch stops

Method for etching an aluminum layer using an amorphous carbon mask

Low dielectric constant film produced from silicon compounds compri...

Method of decreasing the K value in SIOC layer deposited by chemica...

Low dielectric constant film produced from silicon compounds compri...

Plasma processes for depositing low dielectric constant films

Plasma processes for depositing low dielectric constant films

Method of decreasing the K value in SIOC layer deposited by chemica...

Method for removal of metallic residue after plasma etching of a me...

METHODS FOR ETCHING AN ORGANIC ANTI-REFLECTIVE COATING

Integrated etch, rinse and dry, and anneal method and system