Wan Jae Park

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Albany, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Plasma treatment method to improve photo resist roughness and remov...
- Patent number 11,372,332
- Issue date Jun 28, 2022
- Tokyo Electron Limited
- Wan Jae Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective atomic layer deposition (ALD) of protective caps to enhan...
- Patent number 10,770,294
- Issue date Sep 8, 2020
- Tokyo Electron Limited
- David O'Meara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Treatment Method to Improve Photo Resist Roughness and Remov...
- Publication number 20200133133
- Publication date Apr 30, 2020
- TOKYO ELECTRON LIMITED
- Wan Jae Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE ATOMIC LAYER DEPOSITION (ALD) OF PROTECTIVE CAPS TO ENHAN...
- Publication number 20190393035
- Publication date Dec 26, 2019
- TOKYO ELECTRON LIMITED
- David O'Meara
- H01 - BASIC ELECTRIC ELEMENTS