Wang Yueh

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and compositions for reducing line wide roughness
- Patent number 7,867,687
- Issue date Jan 11, 2011
- Intel Corporation
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phenolic/alicyclic copolymers and photoresists
- Patent number 7,700,256
- Issue date Apr 20, 2010
- Rohm and Haas Electronic Materials LLC
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods and compositions for providing photoresist with improved pr...
- Patent number 7,678,527
- Issue date Mar 16, 2010
- Intel Corporation
- Robert P Meagley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of reducing sensitivity of EUV photoresists to out-of-band r...
- Patent number 7,459,260
- Issue date Dec 2, 2008
- Intel Corporation
- Manish Chandhok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low outgassing and non-crosslinking series of polymers for EUV nega...
- Patent number 7,442,487
- Issue date Oct 28, 2008
- Intel Corporation
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresists with reduced outgassing for extreme ultraviolet lithog...
- Patent number 7,427,463
- Issue date Sep 23, 2008
- Intel Corporation
- Heidi Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion liquids with siloxane polymer for immersion lithography
- Patent number 7,391,501
- Issue date Jun 24, 2008
- Intel Corporation
- Hai Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Basic quencher/developer solutions for photoresists
- Patent number 7,241,560
- Issue date Jul 10, 2007
- Intel Corporation
- Shan C. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-outgassing low activation energy resist
- Patent number 7,226,718
- Issue date Jun 5, 2007
- Intel Corporation
- Heidi B. Cao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist compounds including acid labile groups having hydrophilic gr...
- Patent number 7,147,985
- Issue date Dec 12, 2006
- Intel Corporation
- Wang Yueh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist compounds including acid labile groups attached to polymeric...
- Patent number 7,147,986
- Issue date Dec 12, 2006
- Intel Corporation
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming an opening for an interconnect structure in a di...
- Patent number 7,125,793
- Issue date Oct 24, 2006
- Intel Corporation
- Huey-Chiang Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer and photoresist compositions
- Patent number 7,118,847
- Issue date Oct 10, 2006
- Shipley Company LLC
- Charles R. Szmanda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers containing oxygen and sulfur alicyclic units and photoresi...
- Patent number 7,105,266
- Issue date Sep 12, 2006
- Shipley Company, L.L.C.
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Monomers, polymers, methods of synthesis thereof and photoresist co...
- Patent number 7,022,454
- Issue date Apr 4, 2006
- Shipley Company, L.L.C.
- George G. Barclay
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
One component EUV photoresist
- Patent number 7,005,227
- Issue date Feb 28, 2006
- Intel Corporation
- Wang Yueh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Langmuir-blodgett chemically amplified photoresist
- Patent number 6,864,192
- Issue date Mar 8, 2005
- Intel Corporation
- Huey-Chiang Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Copolymers and photoresist compositions comprising same
- Patent number 6,849,381
- Issue date Feb 1, 2005
- Shipley Company, L.L.C.
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Copolymers and photoresist compositions comprising same
- Patent number 6,777,157
- Issue date Aug 17, 2004
- Shipley Company, L.L.C.
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers containing oxygen and sulfur alicyclic units and photoresi...
- Patent number 6,680,159
- Issue date Jan 20, 2004
- Shipley Company, L.L.C.
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer and photoresist compositions
- Patent number 6,599,677
- Issue date Jul 29, 2003
- Shipley Company, L.L.C.
- Charles R. Szmanda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Phenolic/alicyclic copolymers and photoresists
- Patent number 6,492,086
- Issue date Dec 10, 2002
- Shipley Company, L.L.C.
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer and photoresist compositions
- Patent number 6,406,828
- Issue date Jun 18, 2002
- Shipley Company, L.L.C.
- Charles R. Szmanda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers containing oxygen and sulfur alicyclic units and photoresi...
- Patent number 6,306,554
- Issue date Oct 23, 2001
- Shipley Company, L.L.C.
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Photoresist developer
- Publication number 20240219842
- Publication date Jul 4, 2024
- Manish Chandhok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Luminescent photoresist
- Publication number 20080076058
- Publication date Mar 27, 2008
- Michael J. Leeson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Molecular photoresist
- Publication number 20070122734
- Publication date May 31, 2007
- Jeanette M. Roberts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NON-OUTGASSING LOW ACTIVATION ENERGY RESIST
- Publication number 20070059634
- Publication date Mar 15, 2007
- Heidi B. Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cure during rinse to prevent resist collapse
- Publication number 20060292500
- Publication date Dec 28, 2006
- Jeanette Roberts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of reducing sensitivity of EUV photoresists to out-of-band r...
- Publication number 20060223000
- Publication date Oct 5, 2006
- Intel Corporation
- Manish Chandhok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist formulation with surfactant additive
- Publication number 20060046183
- Publication date Mar 2, 2006
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Basic quencher/developer solutions for photoresists
- Publication number 20060024616
- Publication date Feb 2, 2006
- Shan C. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Basic supercritical solutions for quenching and developing photores...
- Publication number 20060003271
- Publication date Jan 5, 2006
- Shan C Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist compounds including acid labile groups having hydrophilic gr...
- Publication number 20050221217
- Publication date Oct 6, 2005
- Intel Corporation
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist compounds including acid labile groups attached to polymeric...
- Publication number 20050221219
- Publication date Oct 6, 2005
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer and photoresist compositions
- Publication number 20050170278
- Publication date Aug 4, 2005
- Charles R. Szmanda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Immersion liquids for immersion lithography
- Publication number 20050164502
- Publication date Jul 28, 2005
- Hai Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reducing outgassing of reactive material upon exposure of photolith...
- Publication number 20050158654
- Publication date Jul 21, 2005
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
One component EUV photoresist
- Publication number 20050158650
- Publication date Jul 21, 2005
- Wang Yueh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Low outgassing and non-crosslinking series of polymers for EUV nega...
- Publication number 20050147916
- Publication date Jul 7, 2005
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and materials for self-aligned dual damascene interconnect s...
- Publication number 20050133920
- Publication date Jun 23, 2005
- Huey-Chiang Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and compositions for reducing line wide roughness
- Publication number 20050084793
- Publication date Apr 21, 2005
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and compositions for providing photoresist with improved pr...
- Publication number 20050084794
- Publication date Apr 21, 2005
- Robert P. Meagley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reducing photoresist line edge roughness using chemically-assisted...
- Publication number 20050084807
- Publication date Apr 21, 2005
- Robert P. Meagley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresists with reduced outgassing for extreme ultraviolet lithog...
- Publication number 20050079438
- Publication date Apr 14, 2005
- Heidi Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist performance through control of polymer characteristics
- Publication number 20040265734
- Publication date Dec 30, 2004
- Wang Yueh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers containing oxygen and sulfur alicyclic units and photoresi...
- Publication number 20030224282
- Publication date Dec 4, 2003
- Shipley Company, L.L.C.
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel copolymers and photoresist compositions comprising same
- Publication number 20030215742
- Publication date Nov 20, 2003
- George G. Barclay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phenolic/alicyclic copolymers and photoresists
- Publication number 20030207200
- Publication date Nov 6, 2003
- Shipley Company, L.L.C.
- George G. Barclay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers containing oxygen and sulfur alicyclic units and photoresi...
- Publication number 20030073030
- Publication date Apr 17, 2003
- Shipley Company, L.L.C.
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer and photoresist compositions
- Publication number 20020173680
- Publication date Nov 21, 2002
- Shipley Company, L.L.C.
- Charles R. Szmanda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer and photoresist compositions
- Publication number 20020160302
- Publication date Oct 31, 2002
- Shipley Company, L.L.C.
- Charles R. Szmanda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer and photoresist compositions
- Publication number 20020155380
- Publication date Oct 24, 2002
- Shipley Company, L.L.C.
- Charles R. Szmanda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel monomers, polymers, methods of synthesis thereof and photores...
- Publication number 20020013448
- Publication date Jan 31, 2002
- Shipley Company, L.L.C.
- George G. Barclay
- C07 - ORGANIC CHEMISTRY

Person

Patents Grantslast 30 patents

Methods and compositions for reducing line wide roughness

Phenolic/alicyclic copolymers and photoresists

Methods and compositions for providing photoresist with improved pr...

Method of reducing sensitivity of EUV photoresists to out-of-band r...

Low outgassing and non-crosslinking series of polymers for EUV nega...

Photoresists with reduced outgassing for extreme ultraviolet lithog...

Immersion liquids with siloxane polymer for immersion lithography

Basic quencher/developer solutions for photoresists

Non-outgassing low activation energy resist

Resist compounds including acid labile groups having hydrophilic gr...

Resist compounds including acid labile groups attached to polymeric...

Method for forming an opening for an interconnect structure in a di...

Polymer and photoresist compositions

Polymers containing oxygen and sulfur alicyclic units and photoresi...

Monomers, polymers, methods of synthesis thereof and photoresist co...

One component EUV photoresist

Langmuir-blodgett chemically amplified photoresist

Copolymers and photoresist compositions comprising same

Copolymers and photoresist compositions comprising same

Polymers containing oxygen and sulfur alicyclic units and photoresi...

Polymer and photoresist compositions

Phenolic/alicyclic copolymers and photoresists

Polymer and photoresist compositions

Polymers containing oxygen and sulfur alicyclic units and photoresi...

Patents Applicationslast 30 patents

Photoresist developer

Luminescent photoresist

Molecular photoresist

NON-OUTGASSING LOW ACTIVATION ENERGY RESIST

Cure during rinse to prevent resist collapse

Method of reducing sensitivity of EUV photoresists to out-of-band r...

Photoresist formulation with surfactant additive

Basic quencher/developer solutions for photoresists

Basic supercritical solutions for quenching and developing photores...

Resist compounds including acid labile groups having hydrophilic gr...

Resist compounds including acid labile groups attached to polymeric...

Polymer and photoresist compositions

Immersion liquids for immersion lithography

Reducing outgassing of reactive material upon exposure of photolith...

One component EUV photoresist

Low outgassing and non-crosslinking series of polymers for EUV nega...

Method and materials for self-aligned dual damascene interconnect s...

Methods and compositions for reducing line wide roughness

Methods and compositions for providing photoresist with improved pr...

Reducing photoresist line edge roughness using chemically-assisted...

Photoresists with reduced outgassing for extreme ultraviolet lithog...

Photoresist performance through control of polymer characteristics

Polymers containing oxygen and sulfur alicyclic units and photoresi...

Novel copolymers and photoresist compositions comprising same

Phenolic/alicyclic copolymers and photoresists

Polymers containing oxygen and sulfur alicyclic units and photoresi...

Polymer and photoresist compositions

Polymer and photoresist compositions

Polymer and photoresist compositions

Novel monomers, polymers, methods of synthesis thereof and photores...