Weihong Liu

Person

Bridgewater, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
DNQ-type photoresist composition including alkali-soluble acrylic r...
- Patent number 11,822,242
- Issue date Nov 21, 2023
- Merck Patent GmbH
- Weihong Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-working ultra thick film photoresist
- Patent number 11,698,586
- Issue date Jul 11, 2023
- Merck Patent GmbH
- Aritaka Hishida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enviromentally stable, thick film, chemically amplified resist
- Patent number 11,385,543
- Issue date Jul 12, 2022
- Merck Patent GmbH
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photosensitive material
- Patent number 10,976,662
- Issue date Apr 13, 2021
- Merck Patent GmbH
- Weihong Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-working photoresist compositions for laser ablation and us...
- Patent number 10,705,424
- Issue date Jul 7, 2020
- Merck Patent GmbH
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive material
- Patent number 9,012,126
- Issue date Apr 21, 2015
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Weihong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working thick film photoresist
- Patent number 8,906,594
- Issue date Dec 9, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photosensitive material
- Patent number 8,841,062
- Issue date Sep 23, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Weihong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating composition and process thereof
- Patent number 8,039,201
- Issue date Oct 18, 2011
- AZ Electronic Materials USA Corp.
- Huirong Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION
- Publication number 20250028245
- Publication date Jan 23, 2025
- Merck Patent GmbH
- Weihong LIU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DNQ-FREE CHEMICALLY AMPLIFIED RESIST COMPOSITION
- Publication number 20230112024
- Publication date Apr 13, 2023
- Merck Patent GmbH
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DNQ-TYPE PHOTORESIST COMPOSITION INCLUDING ALKALI-SOLUBLE ACRYLIC R...
- Publication number 20220357658
- Publication date Nov 10, 2022
- Merck Patent GmbH
- Weihong LIU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIALS
- Publication number 20220342308
- Publication date Oct 27, 2022
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
- Publication number 20220019141
- Publication date Jan 20, 2022
- Merck Patent GmbH
- Weihong LIU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST
- Publication number 20210382390
- Publication date Dec 9, 2021
- Merck Patent GmbH
- Medhat A. Toukhy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE-WORKING ULTRA THICK FILM PHOTORESIST
- Publication number 20200393758
- Publication date Dec 17, 2020
- Merck Patent GmbH
- Aritaka HISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST
- Publication number 20200183278
- Publication date Jun 11, 2020
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
- Publication number 20190064662
- Publication date Feb 28, 2019
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND US...
- Publication number 20170285475
- Publication date Oct 5, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND US...
- Publication number 20170176856
- Publication date Jun 22, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
- Publication number 20140154624
- Publication date Jun 5, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE MATERIAL
- Publication number 20130337380
- Publication date Dec 19, 2013
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE-WORKING THICK FILM PHOTORESIST
- Publication number 20130337381
- Publication date Dec 19, 2013
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Chunwei CHEN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS
- Publication number 20110250544
- Publication date Oct 13, 2011
- AZ Electronic Materials USA Corp.
- Weihong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOSPHATE ESTER FLAME RETARDANT AND RESINS CONTAINING SAME
- Publication number 20100137465
- Publication date Jun 3, 2010
- Jeffrey Stowell
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Bottom Antireflective Coating Compositions
- Publication number 20100092894
- Publication date Apr 15, 2010
- Weihong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOSPHORAMIDE ESTER FLAME RETARDANT AND RESINS CONTAINING SAME
- Publication number 20100063169
- Publication date Mar 11, 2010
- Jeffrey Stowell
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DUAL DAMASCENE VIA FILLING COMPOSITION
- Publication number 20100015550
- Publication date Jan 21, 2010
- Weihong Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective Coating Composition and Process Thereof
- Publication number 20090130591
- Publication date May 21, 2009
- Huirong Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Underlayer Coating Composition Based on a Crosslinkable Polymer
- Publication number 20090035704
- Publication date Feb 5, 2009
- Hong Zhuang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Weihong Liu

Person

Patents Grantslast 30 patents

DNQ-type photoresist composition including alkali-soluble acrylic r...

Negative-working ultra thick film photoresist

Enviromentally stable, thick film, chemically amplified resist

Positive working photosensitive material

Negative-working photoresist compositions for laser ablation and us...

Positive photosensitive material

Negative-working thick film photoresist

Positive working photosensitive material

Antireflective coating composition and process thereof

Patents Applicationslast 30 patents

POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION

DNQ-FREE CHEMICALLY AMPLIFIED RESIST COMPOSITION

DNQ-TYPE PHOTORESIST COMPOSITION INCLUDING ALKALI-SOLUBLE ACRYLIC R...

POSITIVE WORKING PHOTOSENSITIVE MATERIALS

POSITIVE WORKING PHOTOSENSITIVE MATERIAL

NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST

NEGATIVE-WORKING ULTRA THICK FILM PHOTORESIST

ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST

POSITIVE WORKING PHOTOSENSITIVE MATERIAL

NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND US...

NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND US...

POSITIVE WORKING PHOTOSENSITIVE MATERIAL

POSITIVE PHOTOSENSITIVE MATERIAL

NEGATIVE-WORKING THICK FILM PHOTORESIST

BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS

PHOSPHATE ESTER FLAME RETARDANT AND RESINS CONTAINING SAME

Bottom Antireflective Coating Compositions

PHOSPHORAMIDE ESTER FLAME RETARDANT AND RESINS CONTAINING SAME

DUAL DAMASCENE VIA FILLING COMPOSITION

Antireflective Coating Composition and Process Thereof

Underlayer Coating Composition Based on a Crosslinkable Polymer