Wenxian Zhu

Person

E. Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma treatment of low-K surface to improve barrier deposition
- Patent number 9,245,793
- Issue date Jan 26, 2016
- Intermolecular, Inc.
- Ratsamee Limdulpaiboon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma densification of dielectrics for improved dielectric loss ta...
- Patent number 9,224,783
- Issue date Dec 29, 2015
- Intermolecular, Inc.
- Frank Greer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Halogen-free noble gas assisted H2 plasma etch process in depositio...
- Patent number 7,476,621
- Issue date Jan 13, 2009
- Novellus Systems, Inc.
- Minh Anh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Helium-based etch process in deposition-etch-deposition gap fill
- Patent number 7,344,996
- Issue date Mar 18, 2008
- Novellus Systems, Inc.
- Chi-I Lang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen treatment enhanced gap fill
- Patent number 7,211,525
- Issue date May 1, 2007
- Novellus Systems, Inc.
- Sunil Shanker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Biased H2 etch process in deposition-etch-deposition gap fill
- Patent number 7,163,896
- Issue date Jan 16, 2007
- Novellus Systems, Inc.
- Wenxian Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling etch process repeatability
- Patent number 7,078,312
- Issue date Jul 18, 2006
- Novellus Systems, Inc.
- Siswanto Sutanto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low dielectric constant fluorine-doped silica glass film for use in...
- Patent number 6,844,612
- Issue date Jan 18, 2005
- Novellus Systems, Inc.
- Jason Tian
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Annealed dielectrics and heat-tolerant conductors for superconduct...
- Publication number 20150179914
- Publication date Jun 25, 2015
- INTERMOLECULAR INC.
- Frank Greer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Rapid Generation of ALD Saturation Curves Using Segment...
- Publication number 20150176124
- Publication date Jun 25, 2015
- Intermolecular, Inc.
- Frank Greer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Treatment of Low-K Surface to Improve Barrier Deposition
- Publication number 20150179509
- Publication date Jun 25, 2015
- Intermolecular, Inc.
- Ratsamee Limdulpaiboon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma densification of dielectrics for improved dielectric loss t...
- Publication number 20150179436
- Publication date Jun 25, 2015
- INTERMOLECULAR INC.
- Frank Greer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tantalum-Based Copper Barriers and Methods for Forming the Same
- Publication number 20150179508
- Publication date Jun 25, 2015
- INTERMOLECULAR INC.
- Edwin Adhiprakasha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Combinatorial Site Isolated Plasma Assisted Deposition
- Publication number 20140134849
- Publication date May 15, 2014
- INTERMOLECULAR INC.
- Sandip Niyogi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Wenxian Zhu

Person

Patents Grantslast 30 patents

Plasma treatment of low-K surface to improve barrier deposition

Plasma densification of dielectrics for improved dielectric loss ta...

Halogen-free noble gas assisted H2 plasma etch process in depositio...

Helium-based etch process in deposition-etch-deposition gap fill

Hydrogen treatment enhanced gap fill

Biased H2 etch process in deposition-etch-deposition gap fill

Method for controlling etch process repeatability

Low dielectric constant fluorine-doped silica glass film for use in...

Patents Applicationslast 30 patents

Annealed dielectrics and heat-tolerant conductors for superconduct...

Methods for Rapid Generation of ALD Saturation Curves Using Segment...

Plasma Treatment of Low-K Surface to Improve Barrier Deposition

Plasma densification of dielectrics for improved dielectric loss t...

Tantalum-Based Copper Barriers and Methods for Forming the Same

Combinatorial Site Isolated Plasma Assisted Deposition