Wilbur C. Krusell

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for cleaning semiconductor substrates after p...
- Patent number 6,927,198
- Issue date Aug 9, 2005
- Lam Research Corporation
- Liming Zhang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Linear reciprocating disposable belt polishing method and apparatus
- Patent number 6,746,320
- Issue date Jun 8, 2004
- Lam Research Corporation
- Wilbur Krusell
- B24 - GRINDING POLISHING
Information Patent Grant
Integrated pad and belt for chemical mechanical polishing
- Patent number 6,656,025
- Issue date Dec 2, 2003
- Lam Research Corporation
- Anil K. Pant
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for in-situ monitoring of thickness during che...
- Patent number 6,621,584
- Issue date Sep 16, 2003
- Lam Research Corporation
- Jiri Pecen
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for wafer proximity cleaning and drying
- Patent number 6,616,772
- Issue date Sep 9, 2003
- Lam Research Corporation
- John Martin de Larios
- B08 - CLEANING
Information Patent Grant
Single wafer residue, thin film removal and clean
- Patent number 6,594,847
- Issue date Jul 22, 2003
- Lam Research Corporation
- Wilbur Krusell
- B08 - CLEANING
Information Patent Grant
Method of transporting a semiconductor wafer in a wafer polishing s...
- Patent number 6,517,418
- Issue date Feb 11, 2003
- Lam Research Corporation
- Erik H. Engdahl
- B24 - GRINDING POLISHING
Information Patent Grant
Linear reciprocating disposable belt polishing method and apparatus
- Patent number 6,500,056
- Issue date Dec 31, 2002
- Lam Research Corporation
- Wilbur Krusell
- B24 - GRINDING POLISHING
Information Patent Grant
Capillary proximity heads for single wafer cleaning and drying
- Patent number 6,488,040
- Issue date Dec 3, 2002
- Lam Research Corporation
- John Martin de Larios
- B08 - CLEANING
Information Patent Grant
Cleaning solution and method for cleaning semiconductor substrates...
- Patent number 6,479,443
- Issue date Nov 12, 2002
- Lam Research Corporation
- Liming Zhang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method and apparatus for chemical mechanical planarization and poli...
- Patent number 6,428,394
- Issue date Aug 6, 2002
- Lam Research Corporation
- Ben Mooring
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for polishing semiconductor wafers
- Patent number 6,336,845
- Issue date Jan 8, 2002
- Lam Research Corporation
- Erik H. Engdahl
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for cleaning edges of contaminated substrates
- Patent number 6,334,229
- Issue date Jan 1, 2002
- Lam Research Corporation
- Mansour Moinpour
- B08 - CLEANING
Information Patent Grant
Integrated pad and belt for chemical mechanical polishing
- Patent number 6,328,642
- Issue date Dec 11, 2001
- Lam Research Corporation
- Anil K. Pant
- B24 - GRINDING POLISHING
Information Patent Grant
Use of zeta potential during chemical mechanical polishing for end...
- Patent number 6,325,706
- Issue date Dec 4, 2001
- Lam Research Corporation
- Wilbur C. Krusell
- B24 - GRINDING POLISHING
Information Patent Grant
Method to remove metals in a scrubber
- Patent number 6,274,059
- Issue date Aug 14, 2001
- Lam Research Corporation
- Wilbur C. Krusell
- B08 - CLEANING
Information Patent Grant
Method and apparatus for in-situ end-point detection and optimizati...
- Patent number 6,261,155
- Issue date Jul 17, 2001
- Lam Research Corporation
- Rahul Jairath
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for stabilizing the process temperature during...
- Patent number 6,224,461
- Issue date May 1, 2001
- Lam Research Corporation
- Robert G. Boehm
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for performing end point detection on a linear...
- Patent number 6,186,865
- Issue date Feb 13, 2001
- Lam Research Corporation
- Brian Thornton
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and apparatus for cleaning semiconductor substrates after p...
- Patent number 6,165,956
- Issue date Dec 26, 2000
- Lam Research Corporation
- Liming Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for cleaning semiconductor substrates after p...
- Patent number 6,162,301
- Issue date Dec 19, 2000
- Lam Research Corporation
- Liming Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for in-situ end-point detection and optimizati...
- Patent number 6,146,248
- Issue date Nov 14, 2000
- Lam Research Corporation
- Rahul Jairath
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for cleaning of semiconductor substrates using...
- Patent number 6,145,148
- Issue date Nov 14, 2000
- Lam Research Corporation
- Diane J. Hymes
- B08 - CLEANING
Information Patent Grant
Method and apparatus for in-situ monitoring of thickness using a mu...
- Patent number 6,111,634
- Issue date Aug 29, 2000
- Lam Research Corporation
- Jiri Pecen
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for in-situ monitoring of thickness during che...
- Patent number 6,108,091
- Issue date Aug 22, 2000
- Lam Research Corporation
- Jiri Pecen
- B24 - GRINDING POLISHING
Information Patent Grant
Hesitation free roller
- Patent number 6,003,185
- Issue date Dec 21, 1999
- Ontrak Systems, Inc.
- Albert M. Saenz
- B08 - CLEANING
Information Patent Grant
Method and apparatus for cleaning of semiconductor substrates using...
- Patent number 5,868,863
- Issue date Feb 9, 1999
- Ontrak Systems, Inc.
- Diane J. Hymes
- B08 - CLEANING
Information Patent Grant
Method and apparatus for cleaning edges of contaminated substrates
- Patent number 5,861,066
- Issue date Jan 19, 1999
- Ontrak Systems, Inc.
- Mansour Moinpour
- B08 - CLEANING
Information Patent Grant
Drip chemical delivery apparatus
- Patent number 5,853,522
- Issue date Dec 29, 1998
- Ontrak Systems, Incorporated
- Wilbur C. Krusell
- B08 - CLEANING
Information Patent Grant
Hesitation free roller
- Patent number 5,840,129
- Issue date Nov 24, 1998
- Ontrak Systems, Inc.
- Albert M. Saenz
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
Integrated pad and belt for chemical mechanical polishing
- Publication number 20050118936
- Publication date Jun 2, 2005
- Lam Research Corporation
- Anil K. Pant
- B24 - GRINDING POLISHING
Information Patent Application
Methods and apparatus for cleaning semiconductor substrates after p...
- Publication number 20040033917
- Publication date Feb 19, 2004
- Lam Research Corporation
- Liming Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for wafer proximity cleaning and drying
- Publication number 20030075204
- Publication date Apr 24, 2003
- LAM RESEARCH CORPORATION
- John Martin de Larios
- B08 - CLEANING
Information Patent Application
Linear reciprocating disposable belt polishing method and apparatus
- Publication number 20020123298
- Publication date Sep 5, 2002
- Lam Research Corporation
- Wilbur Krusell
- B24 - GRINDING POLISHING
Information Patent Application
Method and apparatus for in-situ monitoring of thickness during che...
- Publication number 20020089676
- Publication date Jul 11, 2002
- Jiri Pecen
- G01 - MEASURING TESTING
Information Patent Application
System and method for creating and navigating a linear hypermedia r...
- Publication number 20020031988
- Publication date Mar 14, 2002
- Lam Research Corporation
- Anil K. Pant
- B24 - GRINDING POLISHING
Information Patent Application
Method of transporting a semiconductor wafer in a wafer polishing s...
- Publication number 20010039168
- Publication date Nov 8, 2001
- Lam Research Corporation
- Erik H. Engdahl
- B24 - GRINDING POLISHING

Wilbur C. Krusell

Person

Patents Grantslast 30 patents

Methods and apparatus for cleaning semiconductor substrates after p...

Linear reciprocating disposable belt polishing method and apparatus

Integrated pad and belt for chemical mechanical polishing

Method and apparatus for in-situ monitoring of thickness during che...

Methods for wafer proximity cleaning and drying

Single wafer residue, thin film removal and clean

Method of transporting a semiconductor wafer in a wafer polishing s...

Linear reciprocating disposable belt polishing method and apparatus

Capillary proximity heads for single wafer cleaning and drying

Cleaning solution and method for cleaning semiconductor substrates...

Method and apparatus for chemical mechanical planarization and poli...

Method and apparatus for polishing semiconductor wafers

Apparatus for cleaning edges of contaminated substrates

Integrated pad and belt for chemical mechanical polishing

Use of zeta potential during chemical mechanical polishing for end...

Method to remove metals in a scrubber

Method and apparatus for in-situ end-point detection and optimizati...

Method and apparatus for stabilizing the process temperature during...

Apparatus and method for performing end point detection on a linear...

Methods and apparatus for cleaning semiconductor substrates after p...

Methods and apparatus for cleaning semiconductor substrates after p...

Method and apparatus for in-situ end-point detection and optimizati...

Method and apparatus for cleaning of semiconductor substrates using...

Method and apparatus for in-situ monitoring of thickness using a mu...

Method and apparatus for in-situ monitoring of thickness during che...

Hesitation free roller

Method and apparatus for cleaning of semiconductor substrates using...

Method and apparatus for cleaning edges of contaminated substrates

Drip chemical delivery apparatus

Hesitation free roller

Patents Applicationslast 30 patents

Integrated pad and belt for chemical mechanical polishing

Methods and apparatus for cleaning semiconductor substrates after p...

Methods for wafer proximity cleaning and drying

Linear reciprocating disposable belt polishing method and apparatus

Method and apparatus for in-situ monitoring of thickness during che...

System and method for creating and navigating a linear hypermedia r...

Method of transporting a semiconductor wafer in a wafer polishing s...