Willard Earl Conley

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Forming multiple aerial images in a single lithography exposure pass
- Patent number 12,001,144
- Issue date Jun 4, 2024
- Cymer, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for imaging using narrowed bandwidth
- Patent number 11,747,739
- Issue date Sep 5, 2023
- ASML Netherlands
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Forming multiple aerial images in a single lithography exposure pass
- Patent number 11,526,082
- Issue date Dec 13, 2022
- Cymer, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization of source and bandwidth for new and existing patternin...
- Patent number 10,416,566
- Issue date Sep 17, 2019
- ASML Netherlands B.V.
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer-based light source parameter control
- Patent number 10,268,123
- Issue date Apr 23, 2019
- Cymer, LLC
- Eric Anders Mason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control of a spectral feature of a pulsed light beam
- Patent number 9,997,888
- Issue date Jun 12, 2018
- Cymer, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer-based light source parameter control
- Patent number 9,989,866
- Issue date Jun 5, 2018
- Cymer, LLC
- Eric Anders Mason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Controlling for wafer stage vibration
- Patent number 9,835,959
- Issue date Dec 5, 2017
- Cymer, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS
- Publication number 20240310736
- Publication date Sep 19, 2024
- CYMER, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE
- Publication number 20240045341
- Publication date Feb 8, 2024
- ASML NETHERLANDS B.V.
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS
- Publication number 20230152707
- Publication date May 18, 2023
- CYMER, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR ENHANCING TARGET FEATURES OF A PATTERN IMAGED...
- Publication number 20230010700
- Publication date Jan 12, 2023
- CYMER, LLC
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR IMAGING USING NARROWED BANDWIDTH
- Publication number 20220163899
- Publication date May 26, 2022
- ASML Nethlands B. V.
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO CREATE THE IDEAL SOURCE SPECTRA WITH SOURCE AND MASK OPTI...
- Publication number 20210349404
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS
- Publication number 20200301286
- Publication date Sep 24, 2020
- CYMER, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION OF SOURCE AND BANDWIDTH FOR NEW AND EXISTING PATTERNIN...
- Publication number 20180356734
- Publication date Dec 13, 2018
- CYMER, LLC
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER-BASED LIGHT SOURCE PARAMETER CONTROL
- Publication number 20180164697
- Publication date Jun 14, 2018
- CYMER, LLC
- Eric Anders Mason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER-BASED LIGHT SOURCE PARAMETER CONTROL
- Publication number 20180107123
- Publication date Apr 19, 2018
- CYMER, LLC
- Eric Anders Mason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROL OF A SPECTRAL FEATURE OF A PULSED LIGHT BEAM
- Publication number 20180109068
- Publication date Apr 19, 2018
- CYMER, LLC
- Willard Earl Conley
- H01 - BASIC ELECTRIC ELEMENTS

Willard Earl Conley

Person

Patents Grantslast 30 patents

Forming multiple aerial images in a single lithography exposure pass

Method and apparatus for imaging using narrowed bandwidth

Forming multiple aerial images in a single lithography exposure pass

Optimization of source and bandwidth for new and existing patternin...

Wafer-based light source parameter control

Control of a spectral feature of a pulsed light beam

Wafer-based light source parameter control

Controlling for wafer stage vibration

Patents Applicationslast 30 patents

FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS

OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE

FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS

METHOD AND SYSTEM FOR ENHANCING TARGET FEATURES OF A PATTERN IMAGED...

METHOD AND APPARATUS FOR IMAGING USING NARROWED BANDWIDTH

METHOD TO CREATE THE IDEAL SOURCE SPECTRA WITH SOURCE AND MASK OPTI...

FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS

OPTIMIZATION OF SOURCE AND BANDWIDTH FOR NEW AND EXISTING PATTERNIN...

WAFER-BASED LIGHT SOURCE PARAMETER CONTROL

WAFER-BASED LIGHT SOURCE PARAMETER CONTROL

CONTROL OF A SPECTRAL FEATURE OF A PULSED LIGHT BEAM