William D. Budinger

Person

Chadds Ford, PA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of polishing a semiconductor device
- Patent number 6,903,021
- Issue date Jun 7, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Heinz F. Reinhardt
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for a semiconductor device having a dissolvable subst...
- Patent number 6,899,611
- Issue date May 31, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Heinz F. Reinhardt
- B24 - GRINDING POLISHING
Information Patent Grant
Window portion with an adjusted rate of wear
- Patent number 6,860,793
- Issue date Mar 1, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- William D. Budinger
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and methods for chemical-mechanical polishing of semicond...
- Patent number 6,518,188
- Issue date Feb 11, 2003
- Rodel Holdings, Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with a transparent portion
- Patent number 6,517,417
- Issue date Feb 11, 2003
- Rodel Holdings, Inc.
- William D. Budinger
- B24 - GRINDING POLISHING
Information Patent Grant
Method relating to a polishing system having a multi-phase polishin...
- Patent number 6,488,570
- Issue date Dec 3, 2002
- Rodel Holdings Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polymeric polishing pad having continuously regenerated work surface
- Patent number 6,439,989
- Issue date Aug 27, 2002
- Rodel Holdings Inc.
- Heinz F. Reinhardt
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Polishing slurry compositions capable of providing multi-modal part...
- Patent number 6,375,694
- Issue date Apr 23, 2002
- Rodel Holdings Inc.
- John V. H. Roberts
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing system having a multi-phase polishing substrate and metho...
- Patent number 6,375,559
- Issue date Apr 23, 2002
- Rodel Holdings Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Fixed abrasive polishing system for the manufacture of semiconducto...
- Patent number 6,337,281
- Issue date Jan 8, 2002
- Rodel Holdings Inc.
- David B. James
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Apparatus and methods for chemical-mechanical polishing of semicond...
- Patent number 6,245,679
- Issue date Jun 12, 2001
- Rodel Holdings, Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing a polymeric polishing pad having photolitho...
- Patent number 6,210,254
- Issue date Apr 3, 2001
- Rodel Holdings Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and methods for chemical-mechanical polishing of semicond...
- Patent number 6,210,525
- Issue date Apr 3, 2001
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing system having a multi-phase polishing substrate and metho...
- Patent number 6,099,394
- Issue date Aug 8, 2000
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing slurry compositions capable of providing multi-modal part...
- Patent number 6,093,649
- Issue date Jul 25, 2000
- Rodel Holdings, Inc.
- John V. H. Roberts
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fixed abrasive polishing system for the manufacture of semiconducto...
- Patent number 6,069,080
- Issue date May 30, 2000
- Rodel Holdings, Inc.
- David B. James
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Polymeric polishing pad having photolithographically induced surfac...
- Patent number 6,036,579
- Issue date Mar 14, 2000
- Rodel Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and methods for recirculating chemical-mechanical polishi...
- Patent number 6,030,899
- Issue date Feb 29, 2000
- Rodel, Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad and methods relating thereto
- Patent number 6,022,264
- Issue date Feb 8, 2000
- Rodel Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and methods for recirculating chemical-mechanical polishi...
- Patent number 5,932,486
- Issue date Aug 3, 1999
- Rodel, Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Method for planarizing a semiconductor device surface with polymeri...
- Patent number 5,900,164
- Issue date May 4, 1999
- Rodel, Inc.
- William D. Budinger
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Polymeric polishing pad containing hollow polymeric microelements
- Patent number 5,578,362
- Issue date Nov 26, 1996
- Rodel, Inc.
- Heinz F. Reinhardt
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Poromeric material having uniformly distributed electrets for maint...
- Patent number 5,384,337
- Issue date Jan 24, 1995
- William D. Budinger
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method and apparatus for determination and display of critical gas...
- Patent number 5,016,483
- Issue date May 21, 1991
- William D. Budinger
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Method and apparatus for determination and display of gas consumpti...
- Patent number 4,970,897
- Issue date Nov 20, 1990
- William D. Budinger
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Pad material for grinding, lapping and polishing
- Patent number 4,927,432
- Issue date May 22, 1990
- Rodel, Inc.
- William D. Budinger
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method and apparatus for determination and display of critical gas...
- Patent number 4,926,703
- Issue date May 22, 1990
- William D. Budinger
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Method and apparatus for determination and display of critical gas...
- Patent number 4,876,903
- Issue date Oct 31, 1989
- William D. Budinger
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Workpiece holder for polishing operation
- Patent number 4,512,113
- Issue date Apr 23, 1985
- William D. Budinger
- B24 - GRINDING POLISHING
Information Patent Grant
Printing roller with polymeric coner and method of making the same
- Patent number 4,198,739
- Issue date Apr 22, 1980
- Rodel, Inc.
- William D. Budinger
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
Polymeric polishing pad having continuously regenerated work surface
- Publication number 20050221741
- Publication date Oct 6, 2005
- Heinz F. Reinhardt
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Method of polishing a semiconductor device
- Publication number 20040224142
- Publication date Nov 11, 2004
- Heinz F. Reinhardt
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Polymeric polishing pad having continuously regenerated work surface
- Publication number 20030068960
- Publication date Apr 10, 2003
- Heinz F. Reinhardt
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Apparatus and methods for chemical-mechanical polishing of semicond...
- Publication number 20020098702
- Publication date Jul 25, 2002
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Application
Apparatus and methods for chemical-mechanical polishing of semicond...
- Publication number 20020020495
- Publication date Feb 21, 2002
- David B. James
- B24 - GRINDING POLISHING
Information Patent Application
Window portion with an adjusted rate of wear
- Publication number 20010053658
- Publication date Dec 20, 2001
- William D. Budinger
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad with a transparent portion
- Publication number 20010031610
- Publication date Oct 18, 2001
- William D. Budinger
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
System for ordering and manufacturing a tangible device
- Publication number 20010032111
- Publication date Oct 18, 2001
- Elmer W. Jensen
- G06 - COMPUTING CALCULATING COUNTING

William D. Budinger

Person

Patents Grantslast 30 patents

Method of polishing a semiconductor device

Polishing pad for a semiconductor device having a dissolvable subst...

Window portion with an adjusted rate of wear

Apparatus and methods for chemical-mechanical polishing of semicond...

Polishing pad with a transparent portion

Method relating to a polishing system having a multi-phase polishin...

Polymeric polishing pad having continuously regenerated work surface

Polishing slurry compositions capable of providing multi-modal part...

Polishing system having a multi-phase polishing substrate and metho...

Fixed abrasive polishing system for the manufacture of semiconducto...

Apparatus and methods for chemical-mechanical polishing of semicond...

Method of manufacturing a polymeric polishing pad having photolitho...

Apparatus and methods for chemical-mechanical polishing of semicond...

Polishing system having a multi-phase polishing substrate and metho...

Polishing slurry compositions capable of providing multi-modal part...

Fixed abrasive polishing system for the manufacture of semiconducto...

Polymeric polishing pad having photolithographically induced surfac...

Apparatus and methods for recirculating chemical-mechanical polishi...

Polishing pad and methods relating thereto

Apparatus and methods for recirculating chemical-mechanical polishi...

Method for planarizing a semiconductor device surface with polymeri...

Polymeric polishing pad containing hollow polymeric microelements

Poromeric material having uniformly distributed electrets for maint...

Method and apparatus for determination and display of critical gas...

Method and apparatus for determination and display of gas consumpti...

Pad material for grinding, lapping and polishing

Method and apparatus for determination and display of critical gas...

Method and apparatus for determination and display of critical gas...

Workpiece holder for polishing operation

Printing roller with polymeric coner and method of making the same

Patents Applicationslast 30 patents

Polymeric polishing pad having continuously regenerated work surface

Method of polishing a semiconductor device

Polymeric polishing pad having continuously regenerated work surface

Apparatus and methods for chemical-mechanical polishing of semicond...

Apparatus and methods for chemical-mechanical polishing of semicond...

Window portion with an adjusted rate of wear

Polishing pad with a transparent portion

System for ordering and manufacturing a tangible device