William J. Cote

Person

Poughquag, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Probe-able voltage contrast test structures
- Patent number 9,213,060
- Issue date Dec 15, 2015
- International Business Machines Corporation
- William J. Cote
- G01 - MEASURING TESTING
Information Patent Grant
Probe-able voltage contrast test structures
- Patent number 9,103,875
- Issue date Aug 11, 2015
- International Business Machines Corporation
- William J. Cote
- G01 - MEASURING TESTING
Information Patent Grant
Probe-able voltage contrast test structures
- Patent number 9,097,760
- Issue date Aug 4, 2015
- International Business Machines Corporation
- William J. Cote
- G01 - MEASURING TESTING
Information Patent Grant
Uniform finFET gate height
- Patent number 8,928,057
- Issue date Jan 6, 2015
- International Business Machines Corporation
- William Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement metal gate transistors using bi-layer hardmask
- Patent number 8,748,252
- Issue date Jun 10, 2014
- International Business Machines Corporation
- Effendi Leobandung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to mitigate plasma damage in organosilicate dielectrics
- Patent number 8,481,423
- Issue date Jul 9, 2013
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to mitigate plasma damage in organosilicate dielectrics
- Patent number 8,470,706
- Issue date Jun 25, 2013
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Probe-able voltage contrast test structures
- Patent number 8,350,583
- Issue date Jan 8, 2013
- International Business Machines Corporation
- William J. Cote
- G01 - MEASURING TESTING
Information Patent Grant
Monitoring a process sector in a production facility
- Patent number 8,340,800
- Issue date Dec 25, 2012
- International Business Machines Corporation
- William Cote
- G05 - CONTROLLING REGULATING
Information Patent Grant
Structures and methods for improving solder bump connections in sem...
- Patent number 8,293,634
- Issue date Oct 23, 2012
- International Business Machines Corporation
- Felix P. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing amine based contaminants
- Patent number 8,288,281
- Issue date Oct 16, 2012
- International Business Machines Corporation
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure having reduced amine-based contaminants
- Patent number 8,242,544
- Issue date Aug 14, 2012
- International Business Machines Corporation
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing amine based contaminants
- Patent number 7,803,708
- Issue date Sep 28, 2010
- International Business Machines Corporation
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grounding front-end-of-line structures on a SOI substrate
- Patent number 7,732,866
- Issue date Jun 8, 2010
- International Business Machines Corporation
- William J. Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grounding front-end-of-line structures on a SOI substrate
- Patent number 7,518,190
- Issue date Apr 14, 2009
- International Business Machines Corporation
- William J. Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making conductor contacts having enhanced reliability
- Patent number 7,480,990
- Issue date Jan 27, 2009
- International Business Machines Corporation
- John A. Fitzsimmons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intralevel decoupling capacitor, method of manufacture and testing...
- Patent number 7,323,382
- Issue date Jan 29, 2008
- International Business Machines Corporation
- Kerry Bernstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing an intralevel decoupling capacitor
- Patent number 7,195,971
- Issue date Mar 27, 2007
- International Business Machines Corporation
- Kerry Bernstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing amine based contaminants
- Patent number 7,153,776
- Issue date Dec 26, 2006
- International Business Machines Corporation
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming damascene structure utilizing planarizing materi...
- Patent number 7,030,031
- Issue date Apr 18, 2006
- International Business Machines Corporation
- William C. Wille
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intralevel decoupling capacitor, method of manufacture and testing...
- Patent number 6,882,015
- Issue date Apr 19, 2005
- International Business Machines Corporation
- Kerry Bernstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry for mechanical polishing (CMP) of metals and use thereof
- Patent number 6,812,193
- Issue date Nov 2, 2004
- International Business Machines Corporation
- Michael Todd Brigham
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Chemical-mechanical planarization of barriers or liners for copper...
- Patent number 6,743,268
- Issue date Jun 1, 2004
- International Business Machines Corporation
- William J. Cote
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Intralevel decoupling capacitor, method of manufacture and testing...
- Patent number 6,677,637
- Issue date Jan 13, 2004
- International Business Machines Corporation
- Kerry Bernstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming a damascene structure
- Patent number 6,649,531
- Issue date Nov 18, 2003
- International Business Machines Corporation
- William J. Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cu/low-k BEOL with nonconcurrent hybrid dielectric interface
- Patent number 6,548,901
- Issue date Apr 15, 2003
- International Business Machines Corporation
- William Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer polishing and endpoint detection
- Patent number RE38029
- Issue date Mar 11, 2003
- IBM Corporation
- William J. Cote
- 438 - Semiconductor device manufacturing: process
Information Patent Grant
Semiconductor device structure with hydrogen-rich layer for facilit...
- Patent number 6,483,172
- Issue date Nov 19, 2002
- Siemens Aktiengesellschaft
- Donna Rizzone Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical planarization of barriers or liners for copper...
- Patent number 6,375,693
- Issue date Apr 23, 2002
- International Business Machines Corporation
- William J. Cote
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Slurry for mechanical polishing (CMP) of metals and use thereof
- Patent number 6,348,076
- Issue date Feb 19, 2002
- International Business Machines Corporation
- Donald F. Canaperi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
REDUCING GATE HEIGHT VARIATION IN RMG PROCESS
- Publication number 20150111373
- Publication date Apr 23, 2015
- GLOBALFOUNDRIES, INC.
- William J. Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM FINFET GATE HEIGHT
- Publication number 20140151772
- Publication date Jun 5, 2014
- International Business Machines Corporation
- William Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT METAL GATE TRANSISTORS USING BI-LAYER HARDMASK
- Publication number 20140148003
- Publication date May 29, 2014
- International Business Machines Corporation
- Effendi Leobandung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS
- Publication number 20120329269
- Publication date Dec 27, 2012
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROBE-ABLE VOLTAGE CONTRAST TEST STRUCTURES
- Publication number 20120319715
- Publication date Dec 20, 2012
- International Business Machines Corporation
- William J. Cote
- G01 - MEASURING TESTING
Information Patent Application
PROBE-ABLE VOLTAGE CONTRAST TEST STRUCTURES
- Publication number 20120319714
- Publication date Dec 20, 2012
- International Business Machines Corporation
- William J. Cote
- G01 - MEASURING TESTING
Information Patent Application
PROBE-ABLE VOLTAGE CONTRAST TEST STRUCTURES
- Publication number 20120319716
- Publication date Dec 20, 2012
- International Business Machines Corporation
- William J. Cote
- G01 - MEASURING TESTING
Information Patent Application
STRUCTURES AND METHODS FOR IMPROVING SOLDER BUMP CONNECTIONS IN SEM...
- Publication number 20120129336
- Publication date May 24, 2012
- International Business Machines Corporation
- Felix P. ANDERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROBE-ABLE VOLTAGE CONTRAST TEST STRUCTURES
- Publication number 20110037493
- Publication date Feb 17, 2011
- International Business Machines Corporation
- William J. Cote
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR REDUCING AMINE BASED CONTAMINANTS
- Publication number 20100279508
- Publication date Nov 4, 2010
- International Business Machines Corporation
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURES AND METHODS FOR IMPROVING SOLDER BUMP CONNECTIONS IN SEM...
- Publication number 20100032829
- Publication date Feb 11, 2010
- Felix P. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING A PROCESS SECTOR IN A PRODUCTION FACILITY
- Publication number 20100017010
- Publication date Jan 21, 2010
- International Business Machines Corporation
- William Cote
- G05 - CONTROLLING REGULATING
Information Patent Application
GROUNDING FRONT-END-OF-LINE STRUCTURES ON A SOI SUBSTRATE
- Publication number 20090146211
- Publication date Jun 11, 2009
- William J. Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS
- Publication number 20090075472
- Publication date Mar 19, 2009
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUNDING FRONT-END-OF-LINE STRUCTURES ON A SOI SUBSTRATE
- Publication number 20070221990
- Publication date Sep 27, 2007
- International Business Machines Corporation
- William J. Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Intralevel decoupling capacitor, method of manufacture and testing...
- Publication number 20070204447
- Publication date Sep 6, 2007
- International Business Machines Corporation
- Kerry Bernstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDUCTOR CONTACTS WITH ENHANCED RELIABILITY
- Publication number 20070161290
- Publication date Jul 12, 2007
- International Business Machines Corporation
- John A. Fitzsimmons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING AMINE BASED CONTAMINANTS
- Publication number 20070026683
- Publication date Feb 1, 2007
- International Business Machines Corporation
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Intralevel decoupling capacitor, method of manufacture and testing...
- Publication number 20050139959
- Publication date Jun 30, 2005
- International Business Machines Corporation
- Kerry Bernstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for reducing amine based contaminants
- Publication number 20050095841
- Publication date May 5, 2005
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING DAMASCENE STRUCTURE UTILIZING PLANARIZING MATERI...
- Publication number 20040266201
- Publication date Dec 30, 2004
- International Business Machines Corporation
- William C. Wille
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING AMINE BASED CONTAMINANTS
- Publication number 20040099954
- Publication date May 27, 2004
- International Business Machines Corporation
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Intralevel decoupling capacitor, method of manufacture and testing...
- Publication number 20040046230
- Publication date Mar 11, 2004
- International Business Machines Corporation
- Kerry Bernstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for forming a damascene structure
- Publication number 20030100190
- Publication date May 29, 2003
- International Business Machines Corporation
- William J. Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low k dielectric film deposition process
- Publication number 20030087043
- Publication date May 8, 2003
- International Business Machines Corporation
- Daniel C. Edelstein
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Slurry for mechanical polishing (CMP) of metals and use thereof
- Publication number 20030073593
- Publication date Apr 17, 2003
- Michael Todd Brigham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTRALEVEL DECOUPLING CAPACITOR, METHOD OF MANUFACTURE AND TESTING...
- Publication number 20020081832
- Publication date Jun 27, 2002
- KERRY BERNSTEIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical-mechanical planarization of barriers or liners for copper...
- Publication number 20020066234
- Publication date Jun 6, 2002
- International Business Machines Corporation
- William J. Cote
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

William J. Cote

Person

Patents Grantslast 30 patents

Probe-able voltage contrast test structures

Probe-able voltage contrast test structures

Probe-able voltage contrast test structures

Uniform finFET gate height

Replacement metal gate transistors using bi-layer hardmask

Methods to mitigate plasma damage in organosilicate dielectrics

Methods to mitigate plasma damage in organosilicate dielectrics

Probe-able voltage contrast test structures

Monitoring a process sector in a production facility

Structures and methods for improving solder bump connections in sem...

Method for reducing amine based contaminants

Semiconductor structure having reduced amine-based contaminants

Method for reducing amine based contaminants

Grounding front-end-of-line structures on a SOI substrate

Grounding front-end-of-line structures on a SOI substrate

Method of making conductor contacts having enhanced reliability

Intralevel decoupling capacitor, method of manufacture and testing...

Method of manufacturing an intralevel decoupling capacitor

Method for reducing amine based contaminants

Method for forming damascene structure utilizing planarizing materi...

Intralevel decoupling capacitor, method of manufacture and testing...

Slurry for mechanical polishing (CMP) of metals and use thereof

Chemical-mechanical planarization of barriers or liners for copper...

Intralevel decoupling capacitor, method of manufacture and testing...

Process for forming a damascene structure

Cu/low-k BEOL with nonconcurrent hybrid dielectric interface

Wafer polishing and endpoint detection

Semiconductor device structure with hydrogen-rich layer for facilit...

Chemical-mechanical planarization of barriers or liners for copper...

Slurry for mechanical polishing (CMP) of metals and use thereof

Patents Applicationslast 30 patents

REDUCING GATE HEIGHT VARIATION IN RMG PROCESS

UNIFORM FINFET GATE HEIGHT

REPLACEMENT METAL GATE TRANSISTORS USING BI-LAYER HARDMASK

METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS

PROBE-ABLE VOLTAGE CONTRAST TEST STRUCTURES

PROBE-ABLE VOLTAGE CONTRAST TEST STRUCTURES

PROBE-ABLE VOLTAGE CONTRAST TEST STRUCTURES

STRUCTURES AND METHODS FOR IMPROVING SOLDER BUMP CONNECTIONS IN SEM...

PROBE-ABLE VOLTAGE CONTRAST TEST STRUCTURES

METHOD FOR REDUCING AMINE BASED CONTAMINANTS

STRUCTURES AND METHODS FOR IMPROVING SOLDER BUMP CONNECTIONS IN SEM...

MONITORING A PROCESS SECTOR IN A PRODUCTION FACILITY

GROUNDING FRONT-END-OF-LINE STRUCTURES ON A SOI SUBSTRATE

METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS

GROUNDING FRONT-END-OF-LINE STRUCTURES ON A SOI SUBSTRATE

Intralevel decoupling capacitor, method of manufacture and testing...

CONDUCTOR CONTACTS WITH ENHANCED RELIABILITY

METHOD FOR REDUCING AMINE BASED CONTAMINANTS

Intralevel decoupling capacitor, method of manufacture and testing...

Method for reducing amine based contaminants

METHOD FOR FORMING DAMASCENE STRUCTURE UTILIZING PLANARIZING MATERI...

METHOD FOR REDUCING AMINE BASED CONTAMINANTS

Intralevel decoupling capacitor, method of manufacture and testing...

Process for forming a damascene structure

Low k dielectric film deposition process

Slurry for mechanical polishing (CMP) of metals and use thereof

INTRALEVEL DECOUPLING CAPACITOR, METHOD OF MANUFACTURE AND TESTING...

Chemical-mechanical planarization of barriers or liners for copper...