William N. Partlo

Person

Berkeley, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
EUV light source with subsystem(s) for maintaining LPP drive laser...
- Patent number 10,966,308
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Alignment of light source focus
- Patent number 9,832,853
- Issue date Nov 28, 2017
- ASML Netherlands B.V.
- Matthew R. Graham
- G01 - MEASURING TESTING
Information Patent Grant
Material supply apparatus for extreme ultraviolet light source havi...
- Patent number 9,669,334
- Issue date Jun 6, 2017
- ASML Netherlands B.V.
- Igor V. Fomenkov
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
High pulse repetition rate gas discharge laser
- Patent number 9,620,920
- Issue date Apr 11, 2017
- Cymer, LLC
- Walter D. Gillespie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for buffer gas flow stabilization in a laser pr...
- Patent number 9,516,730
- Issue date Dec 6, 2016
- ASML Netherlands B.V.
- Vladimir B. Fleurov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source with subsystem(s) for maintaining LPP drive laser...
- Patent number 9,390,827
- Issue date Jul 12, 2016
- ASML Netherlands B.V.
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Corrosion resistant electrodes for laser chambers
- Patent number 9,246,298
- Issue date Jan 26, 2016
- Cymer, LLC
- Janine Kardokus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and apparatus for aligning and synchronizing target...
- Patent number 9,119,278
- Issue date Aug 25, 2015
- ASML Netherlands B.V.
- Christopher C. Chrobak
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Source collector, lithographic apparatus and device manufacturing m...
- Patent number 9,091,944
- Issue date Jul 28, 2015
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods for cooling an optic
- Patent number 9,066,412
- Issue date Jun 23, 2015
- ASML Netherlands B.V.
- Alexander I. Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Filter for material supply apparatus of an extreme ultraviolet ligh...
- Patent number 9,029,813
- Issue date May 12, 2015
- ASML Netherlands B.V.
- Igor V. Fomenkov
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Systems and methods for optics cleaning in an EUV light source
- Patent number 9,000,404
- Issue date Apr 7, 2015
- ASML Netherlands, B.V.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Master oscillator—power amplifier drive laser with pre-pulse for EU...
- Patent number 8,958,143
- Issue date Feb 17, 2015
- ASML Netherlands B.V.
- Kai-Chung Hou
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laser system
- Patent number 8,908,735
- Issue date Dec 9, 2014
- Cymer, LLC
- Alexander I. Ershov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System method and apparatus for selecting and controlling light sou...
- Patent number RE45249
- Issue date Nov 18, 2014
- Cymer, LLC
- Efrain Figueroa
- 372 - Coherent light generators
Information Patent Grant
System, method and apparatus for laser produced plasma extreme ultr...
- Patent number 8,847,183
- Issue date Sep 30, 2014
- ASML Netherlands B.V.
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source with subsystem(s) for maintaining LPP drive laser...
- Patent number 8,653,437
- Issue date Feb 18, 2014
- Cymer, LLC
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System, method and apparatus for aligning and synchronizing target...
- Patent number 8,653,491
- Issue date Feb 18, 2014
- Cymer, Inc.
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Master oscillator-power amplifier drive laser with pre-pulse for EU...
- Patent number 8,654,438
- Issue date Feb 18, 2014
- Cymer, LLC
- Kai-Chung Hou
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Alignment of light source focus
- Patent number 8,648,999
- Issue date Feb 11, 2014
- Cymer, LLC
- Matthew R. Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods for optics cleaning in an EUV light source
- Patent number 8,633,459
- Issue date Jan 21, 2014
- Cymer, LLC
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System, method and apparatus for laser produced plasma extreme ultr...
- Patent number 8,575,575
- Issue date Nov 5, 2013
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Oscillator-amplifier drive laser with seed protection for an EUV li...
- Patent number 8,462,425
- Issue date Jun 11, 2013
- Cymer, Inc.
- Kai-Chung Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas discharge laser line narrowing module
- Patent number 8,379,687
- Issue date Feb 19, 2013
- Cymer, Inc.
- Raymond F. Cybulski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for compensating for thermal effects in an EUV li...
- Patent number 8,368,041
- Issue date Feb 5, 2013
- Cymer, Inc.
- Matthew R. Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source glint reduction system
- Patent number 8,368,039
- Issue date Feb 5, 2013
- Cymer, Inc.
- Abhiram Govindaraju
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laser thin film poly-silicon annealing optical system
- Patent number 8,362,391
- Issue date Jan 29, 2013
- TCZ, LLC
- William N. Partlo
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light producing system and method utilizing an alignment laser
- Patent number 8,304,752
- Issue date Nov 6, 2012
- Cymer, Inc.
- Igor V. Fomenkov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods for drive laser beam delivery in an EUV light s...
- Patent number 8,283,643
- Issue date Oct 9, 2012
- Cymer, Inc.
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods for target material delivery protection in a la...
- Patent number 8,263,953
- Issue date Sep 11, 2012
- Cymer, Inc.
- Igor V. Fomenkov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER...
- Publication number 20180184509
- Publication date Jun 28, 2018
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER...
- Publication number 20180020532
- Publication date Jan 18, 2018
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
FILTER FOR MATERIAL SUPPLY APPARATUS OF AN EXTREME ULTRAVIOLET LIGH...
- Publication number 20150209701
- Publication date Jul 30, 2015
- ASML NETHERLANDS B.V.
- Igor V. Fomenkov
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
ALIGNMENT OF LIGHT SOURCE FOCUS
- Publication number 20140151583
- Publication date Jun 5, 2014
- Matthew R. Graham
- G01 - MEASURING TESTING
Information Patent Application
EUV Light Source With Subsystem(s) For Maintaining LPP Drive Laser...
- Publication number 20140145096
- Publication date May 29, 2014
- CYMER, LLC
- William N. Partlo
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Master Oscillator-Power Amplifier Drive Laser With Pre-Pulse for EU...
- Publication number 20140146387
- Publication date May 29, 2014
- CYMER, LLC
- Kai-Chung Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTICS CLEANING IN AN EUV LIGHT SOURCE
- Publication number 20140110609
- Publication date Apr 24, 2014
- CYMER, LLC
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
System, Method and Apparatus for Aligning and Synchronizing Target...
- Publication number 20140103229
- Publication date Apr 17, 2014
- CYMER, LLC
- Christopher C. Chroback
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
System, Method and Apparatus for Laser Produced Plasma Extreme Ultr...
- Publication number 20140048099
- Publication date Feb 20, 2014
- CYMER, LLC
- William N. Partlo
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CORROSION RESISTANT ELECTRODES FOR LASER CHAMBERS
- Publication number 20130329763
- Publication date Dec 12, 2013
- Cymer, Inc.
- Janine Kardokus
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SYSTEMS AND METHODS FOR BUFFER GAS FLOW STABILIZATION IN A LASER PR...
- Publication number 20120313016
- Publication date Dec 13, 2012
- Vladimir B. Fleurov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Filter for Material Supply Apparatus
- Publication number 20120292527
- Publication date Nov 22, 2012
- Cymer, Inc.
- Igor V. Fomenkov
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SYSTEM AND METHOD FOR COMPENSATING FOR THERMAL EFFECTS IN AN EUV LI...
- Publication number 20120248341
- Publication date Oct 4, 2012
- Matthew R. Graham
- G02 - OPTICS
Information Patent Application
SYSTEMS AND METHODS FOR OPTICS CLEANING IN AN EUV LIGHT SOURCE
- Publication number 20120223256
- Publication date Sep 6, 2012
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SOURCE COLLECTOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING M...
- Publication number 20120182536
- Publication date Jul 19, 2012
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
OSCILLATOR-AMPLIFIER DRIVE LASER WITH SEED PROTECTION FOR AN EUV LI...
- Publication number 20120092746
- Publication date Apr 19, 2012
- Cymer, Inc.
- Kai-Chung Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER SYSTEM
- Publication number 20120087386
- Publication date Apr 12, 2012
- Cymer, Inc.
- Daniel J.W. Brown
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER...
- Publication number 20120080584
- Publication date Apr 5, 2012
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ALIGNMENT OF LIGHT SOURCE FOCUS
- Publication number 20120019826
- Publication date Jan 26, 2012
- Cymer, Inc.
- Matthew R. Graham
- G01 - MEASURING TESTING
Information Patent Application
Laser System
- Publication number 20120002687
- Publication date Jan 5, 2012
- Cymer, Inc.
- Alexander I. Ershov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASTER OSCILLATOR-POWER AMPLIFIER DRIVE LASER WITH PRE-PULSE FOR EU...
- Publication number 20110317256
- Publication date Dec 29, 2011
- Cymer, Inc.
- Kai-Chung Hou
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEMS AND METHODS FOR COOLING AN OPTIC
- Publication number 20110253349
- Publication date Oct 20, 2011
- Cymer, Inc.
- Alexander I. Ershov
- G02 - OPTICS
Information Patent Application
SYSTEMS AND METHODS FOR TARGET MATERIAL DELIVERY PROTECTION IN A LA...
- Publication number 20110248191
- Publication date Oct 13, 2011
- Cymer, Inc.
- Igor V. Fomenkov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Extreme Ultraviolet Light Source
- Publication number 20110240890
- Publication date Oct 6, 2011
- CYMER INC.
- Abhiram Govindaraju
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Line Narrowing Module
- Publication number 20110194580
- Publication date Aug 11, 2011
- Cymer, Inc.
- J. Martin Algots
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER THIN FILM POLY-SILICON ANNEALING OPTICAL SYSTEM
- Publication number 20110163077
- Publication date Jul 7, 2011
- TCZ LLC
- William N. Partlo
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Metrology for Extreme Ultraviolet Light Source
- Publication number 20110141865
- Publication date Jun 16, 2011
- CYMER INC.
- Vahan Senekerimyan
- G01 - MEASURING TESTING
Information Patent Application
Beam Transport System for Extreme Ultraviolet Light Source
- Publication number 20110140008
- Publication date Jun 16, 2011
- CYMER INC.
- Robert A. Bergstedt
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM
- Publication number 20110122901
- Publication date May 26, 2011
- Cymer, Inc.
- Richard L. Sandstrom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Laser System
- Publication number 20110102759
- Publication date May 5, 2011
- Cymer, Inc.
- Alexander I. Ershov
- H01 - BASIC ELECTRIC ELEMENTS

William N. Partlo

Person

Patents Grantslast 30 patents

EUV light source with subsystem(s) for maintaining LPP drive laser...

Alignment of light source focus

Material supply apparatus for extreme ultraviolet light source havi...

High pulse repetition rate gas discharge laser

Systems and methods for buffer gas flow stabilization in a laser pr...

EUV light source with subsystem(s) for maintaining LPP drive laser...

Corrosion resistant electrodes for laser chambers

System, method and apparatus for aligning and synchronizing target...

Source collector, lithographic apparatus and device manufacturing m...

Systems and methods for cooling an optic

Filter for material supply apparatus of an extreme ultraviolet ligh...

Systems and methods for optics cleaning in an EUV light source

Master oscillator—power amplifier drive laser with pre-pulse for EU...

Laser system

System method and apparatus for selecting and controlling light sou...

System, method and apparatus for laser produced plasma extreme ultr...

EUV light source with subsystem(s) for maintaining LPP drive laser...

System, method and apparatus for aligning and synchronizing target...

Master oscillator-power amplifier drive laser with pre-pulse for EU...

Alignment of light source focus

Systems and methods for optics cleaning in an EUV light source

System, method and apparatus for laser produced plasma extreme ultr...

Oscillator-amplifier drive laser with seed protection for an EUV li...

Gas discharge laser line narrowing module

System and method for compensating for thermal effects in an EUV li...

EUV light source glint reduction system

Laser thin film poly-silicon annealing optical system

EUV light producing system and method utilizing an alignment laser

Systems and methods for drive laser beam delivery in an EUV light s...

Systems and methods for target material delivery protection in a la...

Patents Applicationslast 30 patents

EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER...

EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER...

FILTER FOR MATERIAL SUPPLY APPARATUS OF AN EXTREME ULTRAVIOLET LIGH...

ALIGNMENT OF LIGHT SOURCE FOCUS

EUV Light Source With Subsystem(s) For Maintaining LPP Drive Laser...

Master Oscillator-Power Amplifier Drive Laser With Pre-Pulse for EU...

SYSTEMS AND METHODS FOR OPTICS CLEANING IN AN EUV LIGHT SOURCE

System, Method and Apparatus for Aligning and Synchronizing Target...

System, Method and Apparatus for Laser Produced Plasma Extreme Ultr...

CORROSION RESISTANT ELECTRODES FOR LASER CHAMBERS

SYSTEMS AND METHODS FOR BUFFER GAS FLOW STABILIZATION IN A LASER PR...

Filter for Material Supply Apparatus

SYSTEM AND METHOD FOR COMPENSATING FOR THERMAL EFFECTS IN AN EUV LI...

SYSTEMS AND METHODS FOR OPTICS CLEANING IN AN EUV LIGHT SOURCE

SOURCE COLLECTOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING M...

OSCILLATOR-AMPLIFIER DRIVE LASER WITH SEED PROTECTION FOR AN EUV LI...

LASER SYSTEM

EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER...

ALIGNMENT OF LIGHT SOURCE FOCUS

Laser System

MASTER OSCILLATOR-POWER AMPLIFIER DRIVE LASER WITH PRE-PULSE FOR EU...

SYSTEMS AND METHODS FOR COOLING AN OPTIC

SYSTEMS AND METHODS FOR TARGET MATERIAL DELIVERY PROTECTION IN A LA...

Extreme Ultraviolet Light Source

Line Narrowing Module

LASER THIN FILM POLY-SILICON ANNEALING OPTICAL SYSTEM

Metrology for Extreme Ultraviolet Light Source

Beam Transport System for Extreme Ultraviolet Light Source

HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM

Laser System