William R. Brunsvold

Person

Poughkeepsie, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Underlayer compositions for multilayer lithographic processes
- Patent number 6,927,015
- Issue date Aug 9, 2005
- International Business Machines Corporation
- Mahmoud M. Khojasteh
- G11 - INFORMATION STORAGE
Information Patent Grant
Underlayer compositions for multilayer lithographic processes
- Patent number 6,818,381
- Issue date Nov 16, 2004
- International Business Machines Corporation
- Mahmoud M. Khojasteh
- G11 - INFORMATION STORAGE
Information Patent Grant
Deactivated aromatic amines as additives in acid-catalyzed resists
- Patent number 6,372,406
- Issue date Apr 16, 2002
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive silicon-containing resists
- Patent number 6,344,305
- Issue date Feb 5, 2002
- International Business Machines Corporation
- Qinghuang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive silicon-containing resists
- Patent number 6,187,505
- Issue date Feb 13, 2001
- International Business Machines Corporation
- Qinghuang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Top antireflective coating film
- Patent number 6,057,080
- Issue date May 2, 2000
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for preparing photoresist compositions
- Patent number 5,919,597
- Issue date Jul 6, 1999
- IBM Corporation of Armonk
- Roger F. Sinta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating films
- Patent number 5,744,537
- Issue date Apr 28, 1998
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid Scavengers for use in chemically amplified photoresists
- Patent number 5,733,705
- Issue date Mar 31, 1998
- International Business Machines Corporation
- Nageshwer Rao Bantu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid scavengers for use in chemically amplified photoresists
- Patent number 5,667,938
- Issue date Sep 16, 1997
- International Business Machines Corporation
- Nageshwer Rao Bantu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quinone diazo compound containing non-metallic atom
- Patent number 5,644,038
- Issue date Jul 1, 1997
- International Business Machines Corporation
- Ari Aviram
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acid scavengers for use in chemically amplified photoresists
- Patent number 5,609,989
- Issue date Mar 11, 1997
- International Business Machines, Corporation
- Nageshwer R. Bantu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing a positive pattern utilizing naphtho quinone...
- Patent number 5,567,569
- Issue date Oct 22, 1996
- International Business Machines Corporation
- Ari Aviram
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition containing naphthoquinonediazide compou...
- Patent number 5,552,256
- Issue date Sep 3, 1996
- International Business Machines Corporation
- Ari Aviram
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicon containing positive resist for DUV lithography
- Patent number 5,338,818
- Issue date Aug 16, 1994
- International Business Machines Corporation
- William R. Brunsvold
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist system for near-UV to visible imaging
- Patent number 5,272,042
- Issue date Dec 21, 1993
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Speed enhancers for acid sensitized resists
- Patent number 5,164,278
- Issue date Nov 17, 1992
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Highly sensitive dry developable deep UV photoresist
- Patent number 5,023,164
- Issue date Jun 11, 1991
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermally stable photoresists with high sensitivity
- Patent number 4,939,070
- Issue date Jul 3, 1990
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High sensitivity resists having autodecomposition temperatures grea...
- Patent number 4,931,379
- Issue date Jun 5, 1990
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyimide formulation for forming a patterned film on a substrate
- Patent number 4,828,964
- Issue date May 9, 1989
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Underlayer compositions for multilayer lithographic processes
- Publication number 20050019704
- Publication date Jan 27, 2005
- Mahmoud M. Khojasteh
- G11 - INFORMATION STORAGE
Information Patent Application
Underlayer compositions for multilayer lithographic processes
- Publication number 20020058204
- Publication date May 16, 2002
- International Business Machines Corporation
- Mahmoud M. Khojasteh
- G11 - INFORMATION STORAGE

William R. Brunsvold

Person

Patents Grantslast 30 patents

Underlayer compositions for multilayer lithographic processes

Underlayer compositions for multilayer lithographic processes

Deactivated aromatic amines as additives in acid-catalyzed resists

Radiation sensitive silicon-containing resists

Radiation sensitive silicon-containing resists

Top antireflective coating film

Methods for preparing photoresist compositions

Antireflective coating films

Acid Scavengers for use in chemically amplified photoresists

Acid scavengers for use in chemically amplified photoresists

Quinone diazo compound containing non-metallic atom

Acid scavengers for use in chemically amplified photoresists

Process for producing a positive pattern utilizing naphtho quinone...

Positive resist composition containing naphthoquinonediazide compou...

Silicon containing positive resist for DUV lithography

Positive photoresist system for near-UV to visible imaging

Speed enhancers for acid sensitized resists

Highly sensitive dry developable deep UV photoresist

Thermally stable photoresists with high sensitivity

High sensitivity resists having autodecomposition temperatures grea...

Polyimide formulation for forming a patterned film on a substrate

Patents Applicationslast 30 patents

Underlayer compositions for multilayer lithographic processes

Underlayer compositions for multilayer lithographic processes