William Volk

Person

San Francisco, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for inspection of wafers and reticles using des...
- Patent number 11,348,222
- Issue date May 31, 2022
- KLA-Tencor Technologies Corp.
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for inspection of wafers and reticles using des...
- Patent number 10,713,771
- Issue date Jul 14, 2020
- KLA-Tencor Technologies Corp.
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for inspection of wafers and reticles using des...
- Patent number 9,002,497
- Issue date Apr 7, 2015
- KLA-Tencor Technologies Corp.
- William Volk
- G01 - MEASURING TESTING
Information Patent Grant
Mask inspection
- Patent number 8,498,468
- Issue date Jul 30, 2013
- KLA-Tencor Corporation
- William W. Volk
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Computer-implemented methods and systems for determining different...
- Patent number 8,102,408
- Issue date Jan 24, 2012
- KLA-Tencor Technologies Corp.
- Gaurav Verma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Films for prevention of crystal growth on fused silica substrates f...
- Patent number 7,604,906
- Issue date Oct 20, 2009
- KLA-Tencor Technologies Corporation
- William Volk
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Use of calcium fluoride substrate for lithography masks
- Patent number 7,541,115
- Issue date Jun 2, 2009
- KLA-Tencor Technologies Corporation
- William Volk
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...
- Publication number 20200074619
- Publication date Mar 5, 2020
- KLA-Tencor Technologies Corporation
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...
- Publication number 20180247403
- Publication date Aug 30, 2018
- KLA-Tencor Technologies Corporation
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods and Systems for Inspection of Wafers and Reticles Using Des...
- Publication number 20150178914
- Publication date Jun 25, 2015
- KLA-Tencor Technologies Corporation
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK DEFECT REPAIR THROUGH WAFER PLANE MODELING
- Publication number 20090060317
- Publication date Mar 5, 2009
- William Volk
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...
- Publication number 20080081385
- Publication date Apr 3, 2008
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPUTER-IMPLEMENTED METHODS AND SYSTEMS FOR DETERMINING DIFFERENT...
- Publication number 20080072207
- Publication date Mar 20, 2008
- Gaurav Verma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and systems for inspection of wafers and reticles using des...
- Publication number 20050004774
- Publication date Jan 6, 2005
- William Volk
- G06 - COMPUTING CALCULATING COUNTING

William Volk

Person

Patents Grantslast 30 patents

Methods and systems for inspection of wafers and reticles using des...

Methods and systems for inspection of wafers and reticles using des...

Methods and systems for inspection of wafers and reticles using des...

Mask inspection

Computer-implemented methods and systems for determining different...

Films for prevention of crystal growth on fused silica substrates f...

Use of calcium fluoride substrate for lithography masks

Patents Applicationslast 30 patents

METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...

METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...

Methods and Systems for Inspection of Wafers and Reticles Using Des...

MASK DEFECT REPAIR THROUGH WAFER PLANE MODELING

METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...

COMPUTER-IMPLEMENTED METHODS AND SYSTEMS FOR DETERMINING DIFFERENT...

Methods and systems for inspection of wafers and reticles using des...