Wim Deweerd

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High work function, manufacturable top electrode
- Patent number 9,224,878
- Issue date Dec 29, 2015
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adsorption site blocking method for co-doping ALD films
- Patent number 9,178,010
- Issue date Nov 3, 2015
- Intermolecular, Inc.
- Sandra Malhotra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Molybdenum oxide top electrode for DRAM capacitors
- Patent number 8,975,633
- Issue date Mar 10, 2015
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for EUV mask having diffusion barrier
- Patent number 8,940,463
- Issue date Jan 27, 2015
- Intermolecular, Inc.
- Wim Y. Deweerd
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for EUV mask having diffusion barrier
- Patent number 8,936,889
- Issue date Jan 20, 2015
- Intermolecular, Inc.
- Wim Y. Deweerd
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wet etch and clean chemistries for MoOx
- Patent number 8,906,812
- Issue date Dec 9, 2014
- Intermolecular, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Band gap improvement in DRAM capacitors
- Patent number 8,878,269
- Issue date Nov 4, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single-sided non-noble metal electrode hybrid MIM stack for DRAM de...
- Patent number 8,853,049
- Issue date Oct 7, 2014
- Intermolecular, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High work function, manufacturable top electrode
- Patent number 8,847,397
- Issue date Sep 30, 2014
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a DRAM capacitor
- Patent number 8,836,002
- Issue date Sep 16, 2014
- Intermolecular, Inc.
- Karthik Ramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a DRAM capacitor
- Patent number 8,813,325
- Issue date Aug 26, 2014
- Intermolecular, Inc.
- Karthik Ramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing MIM capacitors to reduce leakage current
- Patent number 8,815,677
- Issue date Aug 26, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Band gap improvement in DRAM capacitors
- Patent number 8,772,123
- Issue date Jul 8, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molybdenum oxide top electrode for DRAM capacitors
- Patent number 8,765,569
- Issue date Jul 1, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturable high-k DRAM MIM capacitor structure
- Patent number 8,765,570
- Issue date Jul 1, 2014
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Leakage reduction in DRAM MIM capacitors
- Patent number 8,741,712
- Issue date Jun 3, 2014
- Intermolecular, Inc.
- Tony P. Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interfacial layer for DRAM capacitor
- Patent number 8,722,504
- Issue date May 13, 2014
- Intermolecular, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturable high-k DRAM MIM capacitor structure
- Patent number 8,679,939
- Issue date Mar 25, 2014
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable resistance memory with a select device
- Patent number 8,654,560
- Issue date Feb 18, 2014
- Intermolecular, Inc.
- Wim Deweerd
- G11 - INFORMATION STORAGE
Information Patent Grant
Integration of non-noble DRAM electrode
- Patent number 8,652,927
- Issue date Feb 18, 2014
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced non-noble electrode layers for DRAM capacitor cell
- Patent number 8,647,943
- Issue date Feb 11, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anneal to minimize leakage current in DRAM capacitor
- Patent number 8,647,960
- Issue date Feb 11, 2014
- Intermolecular, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced non-noble electrode layers for DRAM capacitor cell
- Patent number 8,581,318
- Issue date Nov 12, 2013
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a DRAM capacitor having increased thermal an...
- Patent number 8,574,983
- Issue date Nov 5, 2013
- Intermolecular, Inc.
- Karthik Ramani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Blocking layers for leakage current reduction in DRAM devices
- Patent number 8,574,999
- Issue date Nov 5, 2013
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blocking layers for leakage current reduction in DRAM devices
- Patent number 8,569,818
- Issue date Oct 29, 2013
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an ALD material
- Patent number 8,563,392
- Issue date Oct 22, 2013
- Intermolecular, Inc.
- Sandra Malhotra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High performance dielectric stack for DRAM capacitor
- Patent number 8,546,236
- Issue date Oct 1, 2013
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blocking layers for leakage current reduction in DRAM devices
- Patent number 8,541,282
- Issue date Sep 24, 2013
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a DRAM capacitor having increased thermal an...
- Patent number 8,542,523
- Issue date Sep 24, 2013
- Intermolecular, Inc.
- Karthik Ramani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
High Work Function, Manufacturable Top Electrode
- Publication number 20140187016
- Publication date Jul 3, 2014
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Work Function, Manufacturable Top Electrode
- Publication number 20140183697
- Publication date Jul 3, 2014
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Leakage reduction in DRAM MIM capacitors
- Publication number 20140080282
- Publication date Mar 20, 2014
- Elpida Memory, Inc.
- Tony P. Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Leakage reduction in DRAM MIM capacitors
- Publication number 20140077336
- Publication date Mar 20, 2014
- INTERMOLECULAR INC.
- Tony P. Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURABLE HIGH-K DRAM MIM CAPACITOR STRUCTURE
- Publication number 20130330903
- Publication date Dec 12, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturable High-k dram mim capacitor structure
- Publication number 20130328168
- Publication date Dec 12, 2013
- INTERMOLECULAR INC.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED NON-NOBLE ELECTRODE LAYERS FOR DRAM CAPACITOR CELL
- Publication number 20130330902
- Publication date Dec 12, 2013
- Elpida Memory, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integration of Non-Noble DRAM Electrode
- Publication number 20130320495
- Publication date Dec 5, 2013
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR
- Publication number 20130217202
- Publication date Aug 22, 2013
- Elpida Memory, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus For EUV Mask Having Diffusion Barrier
- Publication number 20130209927
- Publication date Aug 15, 2013
- INTERMOLECULAR INC.
- Wim Y. Deweerd
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus For EUV Mask Having Diffusion Barrier
- Publication number 20130196257
- Publication date Aug 1, 2013
- INTERMOLECULAR INC.
- Wim Y. Deweerd
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Fabricating a DRAM Capacitor
- Publication number 20130154057
- Publication date Jun 20, 2013
- Elpida Memory, Inc.
- Karthik Ramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Performance Dielectric Stack for DRAM Capacitor
- Publication number 20130140619
- Publication date Jun 6, 2013
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING AN ALD MATERIAL
- Publication number 20130143383
- Publication date Jun 6, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR
- Publication number 20130143384
- Publication date Jun 6, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Band Gap Improvement In DRAM Capacitors
- Publication number 20130127015
- Publication date May 23, 2013
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOP ELECTRODE TEMPLATING FOR DRAM CAPACITOR
- Publication number 20130122681
- Publication date May 16, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNEAL TO MINIMIZE LEAKAGE CURRENT IN DRAM CAPACITOR
- Publication number 20130122682
- Publication date May 16, 2013
- Elpida Memory, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Top Electrode Templating for DRAM Capacitor
- Publication number 20130119512
- Publication date May 16, 2013
- Elpida Memory, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A DRAM CAPACITOR HAVING INCREASED THERMAL AN...
- Publication number 20130119515
- Publication date May 16, 2013
- INTERMOLECULAR INC.
- Karthik Ramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLOCKING LAYERS FOR LEAKAGE CURRENT REDUCTION IN DRAM DEVICES
- Publication number 20130122683
- Publication date May 16, 2013
- Elpida Memory, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADSORPTION SITE BLOCKING METHOD FOR CO-DOPING ALD FILMS
- Publication number 20130122678
- Publication date May 16, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Adsorption Site Blocking Method for Co-Doping ALD Films
- Publication number 20130119513
- Publication date May 16, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BLOCKING LAYERS FOR LEAKAGE CURRENT REDUCTION IN DRAM DEVICES
- Publication number 20130115750
- Publication date May 9, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Blocking Layers for Leakage Current Reduction in DRAM Devices
- Publication number 20130113079
- Publication date May 9, 2013
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTIAL ETCH OF DRAM ELECTRODE
- Publication number 20130071986
- Publication date Mar 21, 2013
- Elpida Memory, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERFACIAL LAYER FOR DRAM CAPACITOR
- Publication number 20130071988
- Publication date Mar 21, 2013
- Elpida Memory, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE-SIDED NON-NOBLE METAL ELECTRODE HYBRID MIM STACK FOR DRAM DE...
- Publication number 20130071989
- Publication date Mar 21, 2013
- Elpida Memory, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Band Gap Improvement In DRAM Capacitors
- Publication number 20130071987
- Publication date Mar 21, 2013
- Elpida Memory, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Molybdenum Oxide Top Electrode for DRAM Capacitors
- Publication number 20130056851
- Publication date Mar 7, 2013
- Elpida Memory, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS

Wim Deweerd

Person

Patents Grantslast 30 patents

High work function, manufacturable top electrode

Adsorption site blocking method for co-doping ALD films

Molybdenum oxide top electrode for DRAM capacitors

Method and apparatus for EUV mask having diffusion barrier

Method and apparatus for EUV mask having diffusion barrier

Wet etch and clean chemistries for MoOx

Band gap improvement in DRAM capacitors

Single-sided non-noble metal electrode hybrid MIM stack for DRAM de...

High work function, manufacturable top electrode

Method for fabricating a DRAM capacitor

Method for fabricating a DRAM capacitor

Method of processing MIM capacitors to reduce leakage current

Band gap improvement in DRAM capacitors

Molybdenum oxide top electrode for DRAM capacitors

Manufacturable high-k DRAM MIM capacitor structure

Leakage reduction in DRAM MIM capacitors

Interfacial layer for DRAM capacitor

Manufacturable high-k DRAM MIM capacitor structure

Variable resistance memory with a select device

Integration of non-noble DRAM electrode

Enhanced non-noble electrode layers for DRAM capacitor cell

Anneal to minimize leakage current in DRAM capacitor

Enhanced non-noble electrode layers for DRAM capacitor cell

Method for fabricating a DRAM capacitor having increased thermal an...

Blocking layers for leakage current reduction in DRAM devices

Blocking layers for leakage current reduction in DRAM devices

Method of forming an ALD material

High performance dielectric stack for DRAM capacitor

Blocking layers for leakage current reduction in DRAM devices

Method for fabricating a DRAM capacitor having increased thermal an...

Patents Applicationslast 30 patents

High Work Function, Manufacturable Top Electrode

High Work Function, Manufacturable Top Electrode

Leakage reduction in DRAM MIM capacitors

Leakage reduction in DRAM MIM capacitors

MANUFACTURABLE HIGH-K DRAM MIM CAPACITOR STRUCTURE

Manufacturable High-k dram mim capacitor structure

ENHANCED NON-NOBLE ELECTRODE LAYERS FOR DRAM CAPACITOR CELL

Integration of Non-Noble DRAM Electrode

HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR

Method and Apparatus For EUV Mask Having Diffusion Barrier

Method and Apparatus For EUV Mask Having Diffusion Barrier

Method for Fabricating a DRAM Capacitor

High Performance Dielectric Stack for DRAM Capacitor

METHOD OF FORMING AN ALD MATERIAL

HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR

Band Gap Improvement In DRAM Capacitors

TOP ELECTRODE TEMPLATING FOR DRAM CAPACITOR

ANNEAL TO MINIMIZE LEAKAGE CURRENT IN DRAM CAPACITOR

Top Electrode Templating for DRAM Capacitor

METHOD FOR FABRICATING A DRAM CAPACITOR HAVING INCREASED THERMAL AN...

BLOCKING LAYERS FOR LEAKAGE CURRENT REDUCTION IN DRAM DEVICES

ADSORPTION SITE BLOCKING METHOD FOR CO-DOPING ALD FILMS

Adsorption Site Blocking Method for Co-Doping ALD Films

BLOCKING LAYERS FOR LEAKAGE CURRENT REDUCTION IN DRAM DEVICES

Blocking Layers for Leakage Current Reduction in DRAM Devices

PARTIAL ETCH OF DRAM ELECTRODE

INTERFACIAL LAYER FOR DRAM CAPACITOR

SINGLE-SIDED NON-NOBLE METAL ELECTRODE HYBRID MIM STACK FOR DRAM DE...

Band Gap Improvement In DRAM Capacitors

Molybdenum Oxide Top Electrode for DRAM Capacitors